FABRICATION OF ENHANCED SUPERCAPACITORS USING ATOMIC LAYER DEPOSITION OF METAL OXIDE ON NANOSTRUCTURES - Patent 3097574

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EP 3 097 574 A1

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(43)	Date of publication:
	30.11.2016 Bulletin 2016/48

(21)	Application number: 15740256.1

(22)	Date of filing: 21.01.2015

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International Patent Classification (IPC):

H01G 9/00^(2006.01)

(86)	International application number:
	PCT/US2015/012290

(87)	International publication number:
	WO 2015/112628 (30.07.2015 Gazette 2015/30)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
	Designated Extension States:
	BA ME

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Priority:

23.01.2014 US 201461930917 P

(71)	Applicants:
	Masdar Institute of Science and Technology Abu Dhabi (AE) The Regents of the University of California Oakland, CA 94607 (US)

(72)	Inventors:
	WARREN, Roseanne Abu Dhabi 54224 (AE) SAMMOURA, Firas Abu Dhabi 54224 (AE) LIN, Liwei Abu Dhabi 54224 (AE)

(74)	Representative: Habermann, Hruschka & Schnabel
	Montgelasstrasse 2 81679 Munich 81679 Munich (DE)

(54)	FABRICATION OF ENHANCED SUPERCAPACITORS USING ATOMIC LAYER DEPOSITION OF METAL OXIDE ON NANOSTRUCTURES