(19)
(11) EP 3 105 777 A1

(12)

(43) Date of publication:
21.12.2016 Bulletin 2016/51

(21) Application number: 15745915.7

(22) Date of filing: 10.02.2015
(51) International Patent Classification (IPC): 
H01L 21/00(2006.01)
H01L 21/465(2006.01)
H01L 21/46(2006.01)
(86) International application number:
PCT/US2015/015112
(87) International publication number:
WO 2015/120424 (13.08.2015 Gazette 2015/32)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME

(30) Priority: 10.02.2014 US 201461937736 P

(71) Applicant: Rensselaer Polytechnic Institute
Troy, NY 12180 (US)

(72) Inventors:
  • DAHAL, Rajendra P.
    Troy, New York 12180 (US)
  • BHAT, Ishwara B.
    Troy, New York 12180 (US)
  • CHOW, Tat-Sing
    Troy, New York 12180 (US)

(74) Representative: Friese Goeden Patentanwälte PartGmbB 
Widenmayerstraße 49
80538 München
80538 München (DE)

   


(54) SELECTIVE, ELECTROCHEMICAL ETCHING OF A SEMICONDUCTOR