MEMORY CELLS, SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR DEVICES, AND METHODS OF FABRICATION - Patent 3130014

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EP 3 130 014 A1

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(43)	Date of publication:
	15.02.2017 Bulletin 2017/07

(21)	Application number: 15777034.8

(22)	Date of filing: 02.04.2015

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International Patent Classification (IPC):

H01L 43/10^(2006.01)
H01L 43/12^(2006.01)

H01L 43/02^(2006.01)

(86)	International application number:
	PCT/US2015/024031

(87)	International publication number:
	WO 2015/157080 (15.10.2015 Gazette 2015/41)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
	Designated Extension States:
	BA ME
	Designated Validation States:
	MA

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Priority:

09.04.2014 US 201414249183

(71)	Applicant: Micron Technology, Inc.
	Boise, ID 83707-0006 (US)

(72)	Inventors:
	SANDHU, Gurtej S. Boise, Idaho 83706 (US) PANDEY, Sumeet C. Boise, Idaho 83716 (US)

(74)	Representative: Carpmaels & Ransford LLP
	One Southampton Row London WC1B 5HA London WC1B 5HA (GB)

(54)	MEMORY CELLS, SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR DEVICES, AND METHODS OF FABRICATION