FIELD
[0001] Embodiments described here generally relate to an inkjet head and an inkjet recording
apparatus.
BACKGROUND
[0002] For example, an on-demand inkjet head ejects ink drops toward recording paper, and
an image is thereby formed on the recording paper. Such kind of inkjet head includes
nozzles and actuators corresponding to each other one to one.
[0003] Piezoelectric actuators are formed on the surface of a substrate, and nozzle holes
are formed corresponding to the actuators.
[0004] Further, pressure cells are formed in the substrate corresponding to the actuators,
the pressure cell starting from the back surface of the substrate and ending at the
actuator.
[0005] Further, ink is introduced from the back surface of the substrate and filled in the
pressure cells, the actuators pressurize the ink filled in the pressure cells, and
the inkjet head ejects the ink from the nozzle holes.
[0006] In the inkjet head, when printing, air bubbles may enter the pressure cells from
the nozzles and the ink supply paths.
[0007] In this case, the actuators cannot pressurize the ink, and the ink is ejected poorly.
[0008] In order to recover from such poor ink ejection, it is necessary to stop printing,
and to suck out the ink from the nozzles.
BRIEF DESCRIPTION OF THE DRAWINGS
[0009]
Fig. 1 is a longitudinal sectional view schematically showing an inkjet recording
apparatus of a first embodiment.
Fig. 2 is a diagram schematically showing the structure of an ink-supply system of
an inkjet printer of the first embodiment.
Fig. 3 is a plan view showing how pressure cells are formed and arranged on the substrate
of the inkjet head of the first embodiment.
Fig. 4 is a longitudinal sectional view showing the main part of the cross sectional
structure around one nozzle of the inkjet head.
Fig. 5 is a cross sectional view showing the main part of the ink supply member of
the inkjet head of the first embodiment.
Fig. 6 is a cross sectional view in the F6-F6 line of Fig. 4.
Fig. 7 is a plan view showing how pressure cells are formed and arranged on the substrate
of the inkjet head of a second embodiment.
DETAILED DESCRIPTION
[0010] According to one embodiment, an inkjet head includes a pressure cell structure, a
nozzle plate, and an ink flow path structure.
[0011] The pressure cell structure includes pressure cells that retain ink, each of the
pressure cells being formed in a thickness direction of the pressure cell structure
from one end surface to the other end surface.
[0012] The pressure cell structure further includes flow control paths that control flow
of the ink flowing into the pressure cells, the flow control paths being formed at
both the sides of the pressure cells, the pressure cells being interposed between
the flow control paths, each of the flow control paths being formed in the thickness
direction of the pressure cell structure from the one end surface of the pressure
cell structure to the other end surface.
[0013] The pressure cell structure further includes slits, each of the slits being in communication
with each of the pressure cells and each of the flow control paths, each of the slits
having a width smaller than a width of each of the pressure cells.
[0014] The nozzle plate includes actuators formed on the one end surface of the pressure
cell structure, each of the actuators covering each of the pressure cells, the actuators
deforming in the thickness direction of the pressure cell structure depending on a
drive voltage.
[0015] The nozzle plate further includes nozzles, each of the nozzles being formed corresponding
to each of the actuators, each of the nozzles being in communication with each of
the pressure cells, each of the nozzles ejecting the ink retained in each of the pressure
cells.
[0016] The ink flow path structure is bonded to the other end surface of the pressure cell
structure. The ink flow path structure includes ink flow paths in communication with
each of the pressure cells via each of the flow control paths and each of the slits.
[0017] Preferably, the ink flow paths of the ink flow path structure include an ink supply
flow path in communication with the flow control path at one side of the pressure
cell, and an ink recovery flow path in communication with the flow control path at
the other side of the pressure cell.
[0018] Preferably, the flow control path is a path segmented for each of the pressure cells.
[0019] Preferably, the ink flow path structure includes a first connection port in communication
with the flow control path at one side of the pressure cell, and a second connection
port in communication with the flow control path at the other side of the pressure
cell, the ink flows into the flow control path at the one side of the pressure cell
from the ink supply flow path via the first connection port, and the ink flows into
the ink recovery flow path from the flow control path at the other side of the pressure
cell via the second connection port.
[0020] Preferably, the slit has a width the same as the width of the nozzle.
[0021] Preferably, the flow control path at the one side of the pressure cells is a common
path in communication with each other, and the flow control path at the other side
of the pressure cells is a common path in communication with each other.
[0022] The present invention also relates to an inkjet recording apparatus, comprising:
a conveyer apparatus that conveys recording paper; and an inkjet head that ejects
ink on the recording paper conveyed by the conveyer apparatus to form an image. According
to the present invention, the inkjet head includes a pressure cell structure, a nozzle
plate, and an ink flow path structure. According to the present invention, the pressure
cell structure includes pressure cells that retain ink, each of the pressure cells
being formed in a thickness direction of the pressure cell structure from one end
surface to the other end surface, flow control paths that control flow of the ink
flowing into the pressure cells, the flow control paths being formed at both the sides
of the pressure cells, the pressure cells being interposed between the flow control
paths, each of the flow control paths being formed in the thickness direction of the
pressure cell structure from the one end surface of the pressure cell structure to
the other end surface, and slits, each of the slits being in communication with each
of the pressure cells and each of the flow control paths, each of the slits having
a width smaller than a width of each of the pressure cells. According to the present
invention, the nozzle plate includes
actuators formed on the one end surface of the pressure cell structure, each of the
actuators covering each of the pressure cells, the actuators deforming in the thickness
direction of the pressure cell structure depending on a drive voltage, and nozzles,
each of the nozzles being formed corresponding to each of the actuators, each of the
nozzles being in communication with each of the pressure cells, each of the nozzles
ejecting the ink retained in each of the pressure cells. According to the present
invention, the ink flow path structure includes ink flow paths in communication with
each of the pressure cells via each of the flow control paths and each of the slits,
the ink flow path structure being bonded to the other end surface of the pressure
cell structure.
[0023] Preferalby, the ink flow paths of the ink flow path structure include an ink supply
flow path in communication with the flow control path at one side of the pressure
cell, and an ink recovery flow path in communication with the flow control path at
the other side of the pressure cell.
[0024] Preferalby, the flow control path is a path segmented for each of the pressure cells.
[0025] Preferalby, the ink flow path structure includes a first connection port in communication
with the flow control path at one side of the pressure cell, and a second connection
port in communication with the flow control path at the other side of the pressure
cell, the ink flows into the flow control path at the one side of the pressure cell
from the ink supply flow path via the first connection port, and the ink flows into
the ink recovery flow path from the flow control path at the other side of the pressure
cell via the second connection port.
[0026] Preferably, the slit has a width the same as the width of the nozzle.
[0027] Preferably, the flow control path at the one side of the pressure cells is a common
path in communication with each other, and the flow control path at the other side
of the pressure cells is a common path in communication with each other.
[0028] Hereinafter, embodiments will be described, as non-limiting examples, with reference
to the drawings. In the drawings, the same reference symbols show the same or similar
parts.
[First embodiment]
[0029] Fig. 1 to Fig. 6 show a first embodiment. Note that each element, which can be expressed
by some terms, may sometimes be expressed by another term or other terms. However,
it does not mean that any element, which is only expressed by a single term, is never
expressed by another term or other terms. In addition, it does not mean that another
term or other terms, which is/are not exemplified, is/are never used to express each
element.
[0030] Fig. 1 is a cross sectional view showing the inkjet printer 1 of the first embodiment.
[0031] The inkjet printer 1 is an example of an inkjet recording apparatus. Note that an
inkjet recording apparatus may be another apparatus such as a copy machine instead
of the inkjet printer.
[0032] As shown in Fig. 1, the inkjet printer 1 conveys recording paper P, for example,
as a recording medium, and at the same time, performs various processes such as image
forming.
[0033] The inkjet printer 1 includes the housing 10, the paper cassette 11, the copy receiving
tray 12, the holding roller (drum) 13, the conveyer apparatus 14, the holding apparatus
15, the image forming apparatus 16, the static-eliminating and peeling apparatus 17,
the inversing apparatus 18, and the cleaning apparatus 19.
[0034] The paper cassette 11 stores a plurality of sheets of recording paper P, and arranged
in the housing 10. The copy receiving tray 12 is arranged at the top of the housing
10. The inkjet printer 1 forms an image on recording paper P, and discharges the recording
paper P to the copy receiving tray 12.
[0035] The conveyer apparatus 14 includes guides and conveyer rollers arranged along the
path on which the recording paper P is conveyed.
[0036] The conveyer roller is driven by a motor, rotates, and thus conveys the recording
paper P from the paper cassette 11 to the copy receiving tray 12.
[0037] The holding roller 13 includes a cylindrical frame made of a conductor, and a thin
insulation layer formed on the surface of the frame.
[0038] The frame is grounded. The holding roller 13 rotates where it holds the recording
paper P on its surface, and thus conveys the recording paper P.
[0039] The holding apparatus 15 presses the recording paper P, which is discharged from
the paper cassette 11 by the conveyer apparatus 14, on the surface (outer surface)
of the holding roller 13.
[0040] The holding apparatus 15 presses the recording paper P on the holding roller 13,
and then attaches the recording paper P to the holding roller 13 by an electrostatic
force of the electrostatically-charged recording paper P.
[0041] The holding roller 13 holds the recording paper P where the recording paper P is
attached to the holding roller 13. The holding roller 13 rotates, and thereby conveys
the held recording paper P.
[0042] The image forming apparatus 16 forms an image on the recording paper P on the outer
surface of the holding roller 13, the recording paper P being held by the holding
apparatus 15.
[0043] The image forming apparatus 16 includes the inkjet heads 21, which face the surface
of the holding roller 13.
[0044] The inkjet heads 21 eject four-color inks (for example, cyan, magenta, yellow, and
black) toward the recording paper P, and thereby form an image on the recording paper
P.
[0045] The static-eliminating and peeling apparatus 17 eliminates static electricity from
the recording paper P, on which the image is formed, and thereby peels the the recording
paper P from the holding roller 13.
[0046] Specifically, the static-eliminating and peeling apparatus 17 electrically charges
the recording paper P, and thereby eliminates static electricity from the recording
paper P. Further, the static-eliminating and peeling apparatus 17 includes a peeling
nail (not shown), and inserts the peeling nail between the static-eliminated recording
paper P and the holding roller 13. As a result, the recording paper P is peeled from
the holding roller 13.
[0047] The conveyer apparatus 14 conveys the recording paper P, which is peeled from the
holding roller 13, to the copy receiving tray 12 or the inversing apparatus 18.
[0048] The cleaning apparatus 19 cleans the holding roller 13.
[0049] The cleaning apparatus 19 is arranged at the downstream of the static-eliminating
and peeling apparatus 17 in the rotational direction of the holding roller 13. The
cleaning apparatus 19 includes the cleaning member 19a. The cleaning apparatus 19
causes the cleaning member 19a to come into close contact with the surface of the
rotating holding roller 13, and thereby cleans the surface of the rotating holding
roller 13.
[0050] In order to form images on the two sides of the recording paper P, the inversing
apparatus 18 turns the recording paper P, which is peeled from the holding roller
13, upside down, and supplies the the recording paper P to the surface of the holding
roller 13 again.
[0051] Specifically, the conveyer apparatus 14 switches back the peeled recording paper
P the other way around, and thereby conveys the recording paper P to the inversing
apparatus 18.
[0052] The inversing apparatus 18 includes a predetermined inversion path. The inversing
apparatus 18 conveys the recording paper P along the inversion path, and thereby turns
the recording paper P upside down.
[0053] Fig. 2 shows an ink-supply system of the inkjet printer 1.
[0054] The inkjet printer 1 includes the ink tanks 501, 502, the pressure control pumps
503, 504, and the ink circulation pump 505, which are connected to each of the inkjet
heads 21. Each inkjet head 21 is connected to the ink tanks 501, 502, which store
ink of the corresponding color.
[0055] The inkjet head 21 includes an ink inlet port (not shown) and an ink outlet port
(not shown). The ink inlet port is connected to the ink tank 501, and the ink outlet
port is connected to the other ink tank 502.
[0056] Further, the ink tank 501, which is connected to the ink inlet port, is connected
to the ink tank 502, which is connected to the ink outlet port, via the ink circulation
pump 505. Thanks to this structure, the ink circulation pump 505 causes the ink in
the ink tank 502, which is at the ink outlet port side, to flow into the ink tank
501, which is at the ink inlet port side.
[0057] Hereinafter, with reference to Fig. 3 and Fig. 4, the internal structure of one ink
circulation-type inkjet head 21 of the image forming apparatus 16 will be described
schematically.
[0058] Fig. 3 is a plan view showing how pressure cells are formed and arranged on the substrate
of the inkjet head 21.
[0059] Fig. 4 is a longitudinal sectional view showing the main part of the cross sectional
structure around one nozzle of the inkjet head 21.
[0060] Note that, for illustrative purposes, Figs. 3 and 4 show various elements, which
are actually hidden, in solid lines.
[0061] In addition, Figs. 3 and 4 show the inkjet head 21 of this embodiment schematically.
The sizes shown in Figs. 3 and 4 may sometimes be different from those described in
this embodiment.
[0062] The inkjet head 21 ejects ink drops toward the recording paper P held by the holding
roller 13, and thereby forms texts and images thereon.
[0063] As shown in Fig. 4, the inkjet head 21 includes the nozzle plate 100, the pressure
cell structure 200, and the ink flow path structure 300.
[0064] The pressure cell structure 200 is an example of the substrate.
[0065] The nozzle plate 100 has a rectangular plate shape. The nozzle plate 100 is formed
on the pressure cell structure 200, the nozzle plate 100 and the pressure cell structure
200 being an assembly.
[0066] The nozzle plate 100 includes the nozzles (orifices, ink ejecting holes) 101 and
the actuators 102.
[0067] The nozzles 101 are circular holes. The diameter of the nozzle 101 is, for example,
20 µm. As shown in Fig. 3, the nozzles 101 are arrayed in the longer-side direction
(horizontal direction of Fig. 3) and the shorter-side direction (vertical direction
of Fig. 3) of the nozzle plate 100. In other words, the nozzles 101 are arranged in
matrix. The nozzles 101 are arranged such that the nozzles 101 in one line are spaced
apart from the nozzles 101 in the next line in the longer-side direction of the nozzle
plate 100. According to this structure, the actuators 102 are arranged in a higher
density.
[0068] The distance between the center of one nozzle 101 and the center of the next nozzle
101, the nozzles 101 being adjacent to each other in the longer-side direction of
the nozzle plate 100, is 340 µm, for example. The distance between the center of one
line of the nozzles 101 and the center of the next line of the nozzles 101, the lines
being adjacent to each other in the shorter-side direction of the nozzle plate 100,
is 240 µm, for example.
[0069] The actuators 102 are arranged corresponding to the nozzles 101 one to one. As shown
in Fig. 3, the actuator 102 and the corresponding nozzle 101 are arranged coaxially.
The actuator 102 has an annular shape, and surrounds the corresponding nozzle 101.
Alternatively, the actuator 102 may have a semi-open annular shape (C shape), for
example.
[0070] The pressure cell structure 200 is made of a silicon wafer, and has a rectangular
plate shape. Alternatively, the pressure cell structure 200 may be another semiconductor
such as a silicon carbide (SiC) substrate and a germanium substrate, for example.
[0071] Alternatively, the substrate (the pressure cell structure 200) may be made of another
material such as ceramics, glass, quartz, resin, and metal.
[0072] Ceramics such as, for example, nitride, carbide, and oxide such as alumina ceramics,
zirconia, silicon carbide, silicon nitride, and barium titanate is used. Resin such
as, for example, a plastic material such as ABS (acrylonitrile butadiene styrene),
polyacetal, polyamide, polycarbonate, and polyethersulfone is used. Metal such as,
for example, aluminum and titanium is used.
[0073] The thickness of the pressure cell structure 200 is, for example, 725 µm. The thickness
of the pressure cell structure 200 is preferably, for example, in the range of 100
to 775 µm.
[0074] As shown in Fig. 4, the pressure cell structure 200 includes the first end surface
200a, the second end surface 200b, and the pressure cells (ink cells) 201. The first
and second end surfaces 200a, 200b are flat. The second end surface 200b is opposite
to the first end surface 200a. The nozzle plate 100 is fixed to the first end surface
200a.
[0075] The pressure cells 201 are circular holes. The diameter of the pressure cell 201
is, for example, 190 µm. Note that the shape of the pressure cell 201 is not limited
to this. The pressure cell 201 penetrates through the pressure cell structure 200
in its thickness direction, and has an opening through the first end surface 200a
and an opening through the second end surface 200b. The nozzle plate 100 covers the
pressure cells 201 having the openings through the first end surface 200a.
[0076] The pressure cells 201 are arranged corresponding to the nozzles 101 one to one.
In other words, the pressure cell 201 and the corresponding nozzle 101 are arranged
coaxially. According to this structure, the pressure cell 201 is in communication
with the corresponding nozzle 101. The pressure cell 201 is in communication with
the outside of the inkjet head 21 via the nozzle 101.
[0077] Next, the nozzle plate 100 will be described.
[0078] As shown in Fig. 3 and Fig. 4, the nozzle plate 100 includes the above-mentioned
nozzles 101 and actuators 102, the shared electrode 106, the wiring electrodes 108,
the vibration plate 109, the protective film (insulation film) 113, and the ink-repellent
film 116.
[0079] The shared electrode 106 is an example of a first electrode (common electrode). The
wiring electrode 108 is an example of a second electrode (individual electrode). The
nozzle 101 penetrates through the vibration plate 109 and the protective film 113,
the vibration plate 109 being layered on the first end surface 200a of the pressure
cell structure 200, the protective film 113 being layered on the vibration plate 109.
[0080] The vibration plate 109 is formed on the first end surface 200a of the pressure cell
structure 200, and has a rectangular plate shape. The thickness of the vibration plate
109 is, for example, 2 µm. Preferably, the thickness of the vibration plate 109 is
in the range of 1 µm to 50 µm, approximately. The protective film 113 is an example
of an insulator.
[0081] The vibration plate 109 is, for example, an SiO
2 (silicon dioxide) film formed on the first end surface 200a of the pressure cell
structure 200, and has a rectangular plate shape. In other words, the vibration plate
109 is an oxide film of the pressure cell structure 200, which is a silicon wafer.
[0082] The vibration plate 109 may be made of another material such as single-crystal Si
(silicon), Al
2O
3 (aluminum oxide), HfO
2 (hafnium oxide), ZrO
2 (zirconium oxide), and DLC (Diamond Like Carbon).
[0083] The vibration plate 109 includes the first surface 109a and the second surface 109b.
[0084] The first surface 109a is fixed to the first end surface 200a of the pressure cell
structure 200, and covers the pressure cell 201.
[0085] The second surface 109b is opposite to the first surface 109a.
[0086] The actuator 102, the shared electrode 106, and the wiring electrode 108 are arranged
on the second surface 109b of the vibration plate 109.
[0087] As shown in Fig. 4, each actuator 102 includes the piezoelectric film 111, the electrode
part 106a of the shared electrode 106, the electrode part 108a of the wiring electrode
108, and the insulation film 112. The piezoelectric film 111 is an example of a piezoelectric
member.
[0088] The piezoelectric film 111 is a film made of lead zirconium titanate (PZT). Alternatively,
the piezoelectric film 111 may be made of any one of various materials such as, for
example, PTO (PbTiO
3: lead titanate), PMNT (Pb(Mg
1/3Nb
2/3)O
3-PbTiO
3), PZNT (Pb(Zn
1/3Nb
2/3)O
3-PbTiO
3), ZnO, and AlN.
[0089] The piezoelectric film 111 has an annular shape. The piezoelectric film 111 is arranged
coaxially with the nozzle 101 and the pressure cell 201. The piezoelectric film 111
surrounds the nozzle 101. The outer diameter of the piezoelectric film 111 is, for
example, 144 µm. The inner diameter of the piezoelectric film 111 is, for example,
30 µm.
[0090] The thickness of the piezoelectric film 111 is, for example, 2 µm. The thickness
of the piezoelectric film 111 is determined based on its piezoelectric property, dielectric
breakdown voltage, and the like. The thickness of the piezoelectric film 111 is preferably
in the range of 0.1 µm to 5 µm, approximately.
[0091] The piezoelectric film 111 is arranged between the electrode part 108a of the wiring
electrode 108 and the electrode part 106a of the shared electrode 106. In other words,
the electrode part 108a of the wiring electrode 108 is formed on one side of the piezoelectric
film 111, and the electrode part 106a of the shared electrode 106 is formed on the
other side of the piezoelectric film 111.
[0092] The piezoelectric film 111 is polarized in the thickness direction (Z direction)
at the time when the film is formed. In other words, for example, the piezoelectric
film 111 is polarized, the side on the electrode part 106a being positive, the side
of the piezoelectric film 111 on the electrode part 108a being negative.
[0093] Drive voltage is applied to the electrode parts 106a, 108a of the shared electrode
106 and the wiring electrodes 108. When the drive voltage is applied, the electric
field in the thickness direction (Z direction) of the piezoelectric film 111 is applied
to the polarized piezoelectric film 111.
[0094] At this time, the piezoelectric film 111 expands or contracts in the electric field
direction (Z direction), and contracts or expands in the direction (X, Y directions)
perpendicular to the electric field direction, at the same time.
[0095] As a result, the actuator 102, which includes the piezoelectric film 111, expands
or contracts in the electric field direction (Z direction) and contracts or expands
in the direction (X, Y directions) perpendicular to the electric field direction,
at the same time.
[0096] When the actuators 102 expands and contracts, the vibration plate 109 deforms in
the thickness direction (Z direction) of the nozzle plate 100. As a result, the pressure
of the ink in the pressure cell 201 is changed.
[0097] The electrode part 108a of the wiring electrode 108 is one of the two electrodes
connected to the piezoelectric film 111. The electrode part 108a of the wiring electrode
108 has an annular shape larger than the piezoelectric film 111, and is at the ejection
side (external side of the inkjet head 21) of the piezoelectric film 111. The outer
diameter of the electrode part 108a is, for example, 148 µm. The inner diameter of
the electrode part 108a is, for example, 26 µm. In other words, the inner peripheral
part of the electrode part 108a is apart from the nozzle 101.
[0098] The electrode part 106a of the shared electrode 106 is the other of the two electrodes
connected to the piezoelectric film 111. The electrode part 106a of the shared electrode
106 has an annular shape smaller than the piezoelectric film 111, and is arranged
on the second surface 109b of the vibration plate 109. The outer diameter of the electrode
part 106a is, for example, 140 µm. The inner diameter of the electrode part 106a is,
for example, 34 µm.
[0099] The insulation film 112 is outside of the area in which the piezoelectric film 111
is formed, and is interposed between the shared electrode 106 and the wiring electrode
108. In other words, the shared electrode 106 is separated from the wiring electrode
108, the piezoelectric film 111 or the insulation film 112 being interposed therebetween.
The insulation film 112 is made of, for example, SiO
2. The insulation film 112 may be made of another insulation material. The thickness
of the insulation film 112 is, for example, 0.2 µm.
[0100] A wiring electrode terminal unit (not shown) is arranged at the end of the wiring
electrode 108. The wiring electrode terminal unit is connected to a controller (not
shown) via a flexible cable, for example, and transmits signals output from the controller
to drive the actuator 102.
[0101] A shared electrode terminal unit (not shown) is arranged on the second surface 109b
of the vibration plate 109. The shared electrode terminal unit is at the end of the
shared electrode 106, and is connected to GND (grounded=0 V), for example.
[0102] The wiring electrode 108 is connected to the piezoelectric film 111 of the corresponding
actuator 102 one to one, and transmits signals to drive the actuator 102. The wiring
electrode 108 is an individual electrode that drives the piezoelectric film 111 independently.
Each of the wiring electrodes 108 includes the electrode part 108a, a wiring part,
and the wiring electrode terminal unit.
[0103] The wiring part of the wiring electrode 108 extends from the electrode part 108a
to the wiring electrode terminal unit. The electrode part 108a of the wiring electrode
108 and the nozzle 101 are arranged coaxially. The inner peripheral part of the electrode
part 108a is slightly apart from the nozzle 101.
[0104] The wiring electrodes 108 are thin films made of Pt (platinum). Note that the wiring
electrodes 108 may be made of another material such as Ni (nickel), Cu (copper), Al
(aluminum), Ag (silver), Ti (titanium), W (tantalum), Mo (molybdenum), and Au (gold).
The thickness of the wiring electrode 108 is, for example, 0.5 µm. Preferably, the
film thickness of the wiring electrodes 108 is from 0.01 µm to 1 µm, approximately.
[0105] The shared electrode 106 is connected to the piezoelectric films 111. The shared
electrode 106 includes the electrode parts 106a, wiring parts, and two shared electrode
terminal units. The wiring parts of the shared electrode 106 extend from the electrode
parts 106a to the opposite sides of the wiring parts of the wiring electrodes 108.
The wiring parts of the shared electrode 106 join together at the end of the nozzle
plate 100 in the Y direction, and extend along both the edges of the nozzle plate
100 in the X direction. The electrode part 106a and the nozzle 101 are arranged coaxially.
The shared electrode terminal units are arranged at both the edges of the nozzle plate
100 in the X direction.
[0106] The shared electrode 106 is made of a Pt (platinum)/Ti (titanium) thin film. The
shared electrode 106 may be made of another material such as Ni, Cu, Al, Ti, W, Mo,
and Au. The thickness of the shared electrode 106 is, for example, 0.5 µm. The thickness
of the shared electrode 106 is approximately 0.01 to 1 µm, preferably.
[0107] The width of the wiring part of the wiring electrode 108 is 80 µm, and the width
of the wiring part of the shared electrode 106 is 80 µm, for example. The wiring parts
of some of the wiring electrodes 108 pass through two adjacent actuators 102.
[0108] As shown in Fig. 4, the protective film 113 is arranged on the second surface 109b
of the vibration plate 109. The protective film 113 is made of, for example, insulating
polyimide. Alternatively, the protective film 113 may be made of another material
such as resin, ceramics, and metal (alloy). Resin such as, for example, a plastic
material such as ABS (acrylonitrile butadiene styrene), polyacetal, polyamide, polycarbonate,
and polyethersulfone is used. Ceramics such as, for example, nitride, carbide, and
oxide such as zirconia, silicon carbide, silicon nitride, and barium titanate is used.
Metal such as, for example, aluminum, SUS, and titanium is used.
[0109] The Young's modulus of the material of the protective film 113 is largely different
from the Young's modulus of the material of the vibration plate 109. The deformation
amount of a member having a plate shape is affected by the Young's modulus of the
material and the thickness of the plate. The smaller the Young's modulus and the smaller
the thickness of a plate, the larger the deformation amount of the plate when a force
is applied constantly. The vibration plate 109 is made of SiO
2, the Young's modulus thereof being 80.6 GPa. The protective film 113 is made of polyimide,
the Young's modulus thereof being 4 GPa. The difference between the Young's modulus
of the vibration plate 109 and the Young's modulus of the protective film 113 is 76.6
GPa.
[0110] The thickness of the protective film 113 is, for example, 4 µm. Preferably, the thickness
of the protective film 113 is approximately in the range of 1 µm to 50 µm. The protective
film 113 covers the second surface 109b of the vibration plate 109, the shared electrode
106, the wiring electrode 108, and the piezoelectric film 111.
[0111] The ink-repellent film 116 covers the surface 113a of the protective film 113. The
ink-repellent film 116 is made of a silicon-series liquid-repellent material having
liquid repellency. Note that the ink-repellent film 116 may be made of another material
such as a fluorinated organic material. The thickness of the ink-repellent film 116
is, for example, 1 µm. The ink-repellent film 116 does not cover but exposes the protective
film 113 around the shared electrode terminal unit and the wiring electrode terminal
unit.
[0112] As shown in Fig. 4, the ink flow path structure 300 includes the fixing surface 301,
the ink supply flow paths 304, and the ink recovery flow paths 305. The ink flow path
structure 300 is made of, for example, stainless steel, and has a rectangular plate
shape. The thickness of the ink flow path structure 300 is, for example, 4 mm. The
fixing surface 301 of the ink flow path structure 300 is bonded to the second end
surface 200b of the pressure cell structure 200 with, for example, epoxy-based adhesive.
[0113] The ink flow path structure 300 may not be made of stainless steel. The ink flow
path structure 300 may be made of any other material such as ceramics, resin, and
metal (alloy) as long as the pressure is not increased to eject the ink, in consideration
of the difference between the expansion coefficient of the ink flow path structure
300 and the expansion coefficient of the nozzle plate 100. Ceramics such as, for example,
nitride and oxide such as alumina ceramics, zirconia, silicon carbide, silicon nitride,
and barium titanate is used. Resin such as, for example, a plastic material such as
ABS, polyacetal, polyamide, polycarbonate, and polyethersulfone is used. Metal such
as, for example, aluminum and titanium is used.
[0114] An ink inlet port (not shown) is arranged at one end of the ink flow path structure
300. The ink inlet port is connected to the ink tank 501 via a path such as a tube,
for example. For example, the pressure control pump 504 supplies the ink stored in
the ink tank 501 to the ink inlet port.
[0115] An ink recovery port (not shown) is arranged at the other end of the ink flow path
structure 300. The ink inlet port and the ink recovery port may not be arranged at
both the ends of the ink flow path structure 300. For example, both the ink inlet
port and the ink recovery port may be arranged at one end of the ink flow path structure
300, or may be arranged at the center of the ink flow path structure 300.
[0116] The ink recovery port is connected to the ink tank 502 via a path such as a tube,
for example. For example, the pressure control pump 503 recovers the ink flowing into
the ink recovery port, in the ink tank 502.
[0117] As shown in Fig. 5, the ink supply flow paths 304 are grooves on the fixing surface
301. The ink supply flow paths 304 extend in parallel in a predetermined direction.
The depth of the ink supply flow path 304 is, for example, 1 mm. One end of the ink
supply flow path 304 is connected to the ink inlet port. According to this structure,
ink, which is supplied from the ink tank 501 to the ink inlet port, flows into the
ink supply flow path 304.
[0118] The ink recovery flow paths 305 are grooves on the fixing surface 301. As shown in
Fig. 5, each ink recovery flow path 305 is arranged between each two ink supply flow
paths 304. The ink recovery flow paths 305 extend in parallel with the ink supply
flow paths 304 in the predetermined direction. The depth of the ink recovery flow
path 305 is, for example, 1 mm. One end of the ink recovery flow path 305 is connected
to the ink recovery port. According to this structure, ink, which is flowed into the
ink recovery flow path 305, is recovered in the ink tank 502 via the ink recovery
port.
[0119] In this embodiment, as shown in Fig. 3, Fig. 4, and Fig. 6, the pressure cell structure
200 includes the flow control paths 202, 203 and the slits 204, 205. The flow control
paths 202, 203 and the slits 204, 205 control ink flowing into the pressure cell 201.
The the flow control path 202 and the the slit 204 are at one side of the pressure
cell 201, and the the flow control path 203 and the the slit 205 are at the other
side of the pressure cell 201, the pressure cell 201 being interposed therebetween.
[0120] Each of the flow control paths 202, 203 corresponds to each pressure cell 201, is
an approximately rectangular long through hole, and is formed from the first end surface
200a of the pressure cell structure 200 to the second end surface 200b thereof in
the thickness direction of the pressure cell structure 200.
[0121] The slit 204 is formed between the flow control path 202 at one side of the pressure
cell 201 and the pressure cell 201. Similarly, the slit 205 is formed between the
flow control path 203 at the other side of the pressure cell 201 and the pressure
cell 201. Each of the slits 204, 205 is a narrow groove, and is formed from the first
end surface 200a of the pressure cell structure 200 to the second end surface 200b
thereof in the thickness direction of the pressure cell structure 200. The slit 204
is in communication with the pressure cell 201 and the flow control path 202, the
slit 205 is in communication with the pressure cell 201 and the flow control path
203, and the width of each slit 204, 205 is smaller than the width of the pressure
cell 201.
[0122] In this case, the width of each slit 204, 205 is, for example, the width 204w, 205w
of Fig. 6. The width of the pressure cell 201 is the width 201w (diameter of pressure
cell) of Fig. 6.
[0123] In other words, the width 204w, 205w is the width of each slit 204, 205 in the direction
slightly inclined from X direction to Y direction.
[0124] In other words, similarly, the width 201w is the width of the pressure cell 201 in
the direction inclined.
[0125] Note that, in Fig. 3, the nozzles 101 are arrayed in the direction inclined. Further,
in Fig. 5, the ink supply flow paths 304 and the ink recovery flow paths 305 are arrayed
in the direction inclined.
[0126] Note that, preferably, the width of each slit 204, 205 is the same as the width of
the nozzle 101 (diameter of nozzle).
[0127] As shown in Fig. 4, the ink flow path structure 300 includes the first connection
ports 307 and the second connection ports 308. The first connection ports 307 are
in communication with the ink supply flow paths 304. The second connection ports 308
are in communication with the ink recovery flow paths 305. The first and second connection
ports 307, 308 are formed by bonding the pressure cell structure 200 and the ink flow
path structure 300. As shown in Fig. 4, the end of the flow control path 202 and the
end of the ink supply flow path 304 form the first connection port 307. Further, the
end of the flow control path 203 and the end of the ink recovery flow path 305 form
the second connection port 308. The end of the ink supply flow path 304, which forms
the first connection port 307, is in parallel with the end of the ink recovery flow
path 305, which forms the second connection port 308.
[0128] Further, the first connection ports 307 are in communication with the flow control
paths 202, and the second connection ports 308 are in communication with the flow
control paths 203. Here, each first connection port 307 is in communication with each
flow control path 202 of the pressure cell structure 200. Similarly, each second connection
port 308 is in communication with each flow control path 203 of the pressure cell
structure 200.
[0129] With this structure, ink flows into the ink supply flow path 304, passes through
the first connection port 307, and flows into the flow control path 202 of the pressure
cell structure 200. Then, the ink flows from the flow control path 202, passes through
the slit 204, and flows into the pressure cell 201. Then, the ink in the pressure
cell 201 passes through the slit 205, flows into the flow control path 203 side, passes
through the second connection port 308, and flows into the ink recovery flow path
305.
[0130] Next, how the piezoelectric film 111 of the actuator 102 works will be described
further. As described above, the piezoelectric film 111 expands or contracts in the
film thickness direction (Z direction), and contracts or expands in the direction
(in-plane direction, X, Y directions) perpendicular to the film thickness direction.
[0131] In the following description, expansion and contraction of the piezoelectric film
111 only in the in-plane direction will be described, and expansion of the piezoelectric
film 111 in the film thickness direction will not be described.
[0132] When the piezoelectric film 111 contracts in the in-plane direction (X, Y directions),
the actuator 102 including the piezoelectric film 111 deforms (bends) in the direction
apart from the pressure cell 201. In other words, the actuator 102 deforms (bends)
in the direction in which the volume of the pressure cell 201 is increased. As a result,
when the actuator 102 bends as described above, the vibration plate 109, which is
connected to the piezoelectric film 111, bends in the direction in which the volume
of the pressure cell 201 is increased.
[0133] When the vibration plate 109 bends in the direction in which the volume of the pressure
cell 201 is increased, negative pressure is applied to the ink retained in the pressure
cell 201.
[0134] When the negative pressure is applied, the ink flows from the ink flow path structure
300 into the flow control path 202 of the pressure cell structure 200. Further, the
ink in the flow control path 202 passes through the slit 204, and is supplied to the
pressure cell 201.
[0135] When the piezoelectric film 111 expands in the in-plane direction, the actuator 102
deforms (bends) in the direction toward the pressure cell 201. In other words, the
actuator 102 bends in the direction in which the volume of the pressure cell 201 is
decreased. As a result, when the actuator 102 bends as described above, the vibration
plate 109, which is connected to the piezoelectric film 111, bends in the direction
in which the volume of the pressure cell 201 is decreased.
[0136] When the vibration plate 109 bends in the direction in which the volume of the pressure
cell 201 is decreased, positive pressure is applied to the ink retained in the pressure
cell 201.
[0137] When the positive pressure is applied, ink drops are ejected from the nozzle 101.
[0138] The ink is ejected in Z direction.
[0139] When the volume of the pressure cell 201 is decreased, part of the vibration plate
109 near the nozzle 101 deforms in the direction of the ejection of the ink, because
the piezoelectric film 111 deforms (expands in in-plane direction).
[0140] In other words, the actuator 102 works in the bending mode to eject ink.
[0141] The inkjet head 21 performs printing (forms images) as follows, for example. Ink
is supplied from the ink tank 501 to the ink inlet port of the ink flow path structure
300 .
[0142] The ink passes through the ink supply flow path 304 and the first connection port
307, and flows into the flow control path 202 of the pressure cell structure 200.
Further, the ink in the flow control path 202 passes through the slit 204, and is
supplied to the pressure cell 201.
[0143] The ink supplied to the pressure cell 201 is supplied to the corresponding nozzle
101, and forms a meniscus on the nozzle 101. In the inkjet printer 1,
the pressure control pumps 503, 504 control the pressure of the ink supplied from
the ink inlet port to obtain an appropriate negative pressure, and the ink is thereby
kept in the nozzle 101 such that the ink may not leak from the nozzle 101.
[0144] For example, in response to an operation from a user, a print instruction signal
is input in a controller (not shown). In response to the printing instruction, the
controller outputs the signal to the actuator 102 via the wiring electrode 108. In
other words, the controller applies a drive voltage to the electrode part 108a of
the wiring electrode 108. As a result, an electric field in the film thickness direction
(Z direction) is applied to the piezoelectric film 111, and the piezoelectric film
111 expands and contracts as described above. Then the actuator 102 bends as described
above.
[0145] The actuator 102 is sandwiched between the vibration plate 109 and the protective
film 113. With this structure, when the piezoelectric film 111 expands in X, Y directions
and the actuator 102 bends, a force is applied to the vibration plate 109, and the
vibration plate 109 deforms in a concave shape in the direction toward the pressure
cell 201 side. To the contrary, a force is applied to the protective film 113, and
the protective film 113 deforms in a convex shape in the direction toward the pressure
cell 201 side.
[0146] When the piezoelectric film 111 contracts in X, Y directions and the actuator 102
bends, a force is applied to the vibration plate 109, and the vibration plate 109
deforms in a convex shape in the direction toward the pressure cell 201. To the contrary,
a force is applied to the protective film 113, and the protective film 113 deforms
in a concave shape in the direction toward the pressure cell 201.
[0147] The Young's modulus of a polyimide film, which forms the protective film 113, is
smaller than the Young's modulus of an SiO
2 film, which forms the vibration plate 109. Because of this, when the same amount
of force is applied to the protective film 113 and the vibration plate 109, the protective
film 113 deforms larger than the vibration plate 109. When the piezoelectric film
111 of the actuator 102 expands in X, Y directions, the nozzle plate 100 deforms in
a convex shape in the direction toward the pressure cell 201 side. As a result, the
volume of the pressure cell 201 is decreased (because the deformation amount of the
protective film 113 in a convex shape in the direction toward the pressure cell 201
is larger).
[0148] To the contrary, when the piezoelectric film 111 of the actuator 102 contracts in
X, Y directions, the nozzle plate 100 deforms in a concave shape in the direction
toward the pressure cell 201 side. As a result, the volume of the pressure cell 201
is increased (because the deformation amount of the protective film 113 in a concave
shape in the direction toward the pressure cell 201 is larger).
[0149] When the vibration plate 109 deforms and the volume of the pressure cell 201 is changed,
the pressure of the ink in the pressure cell 201 is changed. When the pressure is
changed, the ink in the nozzle 101 is ejected.
[0150] At this time, the slits 204, 205 control the ink pressurized in the pressure cell
201 such that the ink may not flow into the flow control paths 202, 203 The slits
204, 205 thereby prevent the volume and the ejection speed of the ink ejected from
the nozzle 101 from being decreased.
[0151] The larger the difference between the Young's modulus of the vibration plate 109
and the Young's modulus of the protective film 113, the larger the deformation amount
of the vibration plate 109 when a predetermined voltage is applied to the actuator
102. Because of this, the larger the difference between the Young's modulus of the
vibration plate 109 and the Young's modulus of the protective film 113, the lower
the voltage of the ink ejection.
[0152] If the film thickness and the Young's modulus of the vibration plate 109 are the
same as those of the protective film 113, when voltage is applied to the actuator
102, the same amount of forces are applied to the vibration plate 109 and the protective
film 113, and the plate 109 and the protective film 113 thereby deform in the opposite
directions by the same amount. As a result, the vibration plate 109 does not deform.
[0153] Note that, as described above, not only the Young's modulus of the material but also
the thickness of the plate affects the deformation amount of the plate member. In
view of this, in order to make the deformation amount of the vibration plate 109 and
the deformation amount of the protective film 113 different, not only the Young's
moduli of the materials but also the thicknesses of films are considered. Even if
the Young's modulus of the material of the vibration plate 109 is the same as that
of the protective film 113, if the thickness of one film is different from that of
the other, it is possible to eject ink, which requires the higher drive voltage, though.
[0154] The ink outlet port is an opening at the end of the ink recovery flow path 305. The
ink outlet port is connected to the ink tank 502 via a tube, for example. The ink,
which is not ejected from the nozzle 101, flows from the pressure cell 201, passes
through the slit 205, the flow control path 203, the second connection port 308, the
ink recovery flow path 305, and the ink outlet port, and is discharged to the ink
tank 502. As described above, the ink circulates in the ink tank 501, the ink supply
flow path 304, the flow control path 202, the pressure cells 201, the flow control
path 203, the ink recovery flow path 305 the ink tank 502, and the ink circulation
pump 505. Because the ink circulates, the temperature of the inkjet head 21 and the
temperature of the ink are kept constant, and the quality of the ink is less changed
affected by heat, for example.
[0155] Next, an example of a method of manufacturing the inkjet head 21 will be described.
First, before forming the pressure cells 201, the flow control paths 202, 203, and
the slits 204, 205, an SiO
2 film is formed as the vibration plate 109 on the entire area of the first end surface
200a of the pressure cell structure 200 (silicon wafer). The SiO
2 film is formed by a thermally-oxidized film-forming method, for example. Note that
the SiO
2 film may be formed by using another method such as a CVD method.
[0156] A silicon wafer, from which the pressure cell structure 200 is formed, is one large
circular plate. The pressure cell structures 200 are cut out from the silicon wafer
later. Alternatively, one pressure cell structure 200 may be one rectangular silicon
wafer.
[0157] The silicon wafer is repeatedly heated and thin films are formed when the inkjet
head 21 is manufactured. In view of this, the silicon wafer is heat-resistant, complies
with SEMI (Semiconductor Equipment and Materials International) standard, and is mirror-polished
and smoothed.
[0158] Next, a metal film as the shared electrode 106 is formed on the second surface 109b
of the vibration plate 109. First, Ti and Pt are sputtered, and Ti and Pt films are
formed in order. The film thickness of Ti is, for example, 0.45 µm. The film thickness
of Pt is, for example, 0.05 µm. Note that the metal films may be formed by another
method such as vapor deposition and metal plating.
[0159] After the metal film is formed, the shared electrode 106 is formed by patterning.
An etching mask is formed on the electrode film, part of the electrode material uncovered
by the etching mask is etched and removed, and the shared electrode 106 is thereby
patterned.
[0160] Because the nozzle 101 is formed at the center of each electrode part 106a of the
shared electrode 106, a portion without the electrode film is formed, the portion
and the electrode part 106a being concentric, the center of the portion and the center
of the electrode part 106a being the same. After the shared electrode 106 is patterned,
the vibration plate 109 is exposed except for the electrode part 106a, wiring part,
and the shared electrode terminal unit of the shared electrode 106.
[0161] Next, the piezoelectric film 111 is formed on the shared electrode 106. The piezoelectric
film 111 is formed by, for example, an RF magnetron sputtering method at the substrate
temperature 350°C. After the piezoelectric film 111 is formed, the piezoelectric film
111 is heated at 500°C for 3 hours in order to apply piezoelectricity. As a result,
the piezoelectric film 111 obtains good piezoelectricity. The piezoelectric film 111
may be formed by another method such as, for example, CVD (chemical vapor deposition),
a sol-gel method, an AD method (aerosol deposition method), and a hydrothermal synthesis
method. After the piezoelectric film 111 is formed, it is etched and patterned.
[0162] Because the nozzle 101 is formed at the center of the piezoelectric film 111, a portion
without the piezoelectric film is formed, the portion and the piezoelectric film 111
being concentric. The vibration plate 109 is exposed except for the piezoelectric
film 111. The piezoelectric film 111 covers the electrode part 106a of the shared
electrode 106.
[0163] Next, the insulation film 112 is formed on part of the piezoelectric film 111 and
part of the shared electrode 106. The insulation film 112 is formed by the CVD method,
which realizes a good insulation properties at a low temperature. The insulation film
112 is formed and then patterned. The insulation film 112 covers only part of the
piezoelectric film 111 in order to reduce troubles resulting from non-uniform patterning.
The insulation film 112 covers the piezoelectric film 111 so as not to reduce the
deformation amount of the piezoelectric film 111.
[0164] Next, a metal film is formed on the vibration plate 109, the piezoelectric film 111,
and the insulation film 112 to form the wiring electrodes 108. The metal film is formed
by a sputtering method. The metal film may be formed by another method such as a vacuum
vapor deposition and a metal plating.
[0165] The metal film is patterned, and the wiring electrodes 108 are thereby formed. An
etching mask is formed on the electrode film, part of the electrode material uncovered
by the etching mask is etched and removed, and the wiring electrodes 108 are thereby
patterned.
[0166] Because the nozzle 101 is formed at the center of the electrode part 108a of the
wiring electrode 108, a portion without the electrode film is formed, the portion
and the electrode part 108a of the wiring electrode 108 being concentric, the center
of the portion and the center of the electrode part 108a being the same. The electrode
part 108a of the wiring electrode 108 covers the piezoelectric film 111.
[0167] Next, the SiO
2 film of the vibration plate 109 is patterned, and part of the nozzle 101 is thereby
formed. An etching mask is formed on the SiO
2 film, part of the SiO
2 film uncovered by the etching mask is etched and removed, and part of the nozzle
101 is thereby patterned.
[0168] The etching mask is formed as follows. The vibration plate 109 is coated with a photosensitive
resist, then prebaked, exposed with light where it is covered with a mask on which
a desired pattern is formed, developed, and postbaked.
[0169] Next, the protective film 113 is formed on the second surface 109b of the vibration
plate 109 by a spin coating method. The protective film 113 may be formed by another
method such as, for example, CVD, vacuum vapor deposition, and metal plating.
[0170] Next, the protective film 113 is patterned, and the nozzles 101 are thereby formed.
Holes are formed through the protective film 113, the holes being in communication
with part of the nozzles 101 through the vibration plate 109, and the nozzles 101
are thereby formed. Further, by patterning the protective film 113, the shared electrode
terminal unit and the wiring electrode terminal unit are exposed.
[0171] For example, polyimide precursor-containing solution is spin coated to form a film.
The solution is baked for thermal polymerization, removed, and thereby burned and
formed. After that, an etching mask is formed on the polyimide film, part of the polyimide
film uncovered by the etching mask is etched and removed, and the polyimide film is
thereby patterned. The etching mask is formed as follows. The polyimide film is coated
with a photosensitive resist, then prebaked, exposed with light where it is covered
with a mask on which a desired pattern is formed, developed, and postbaked.
[0172] Next, a cover tape is adhered to the protective film 113. The cover tape is, for
example, a back-side protective tape for chemical mechanical polishing (CMP) for a
silicon wafer. The pressure cell structure 200 with the cover tape is turned upside
down, and the pressure cells 201, the flow control paths 202, 203, and the slits 204,
205 are formed through the pressure cell structure 200. The pressure cells 201, the
flow control paths 202, 203, and the slits 204, 205 are formed by patterning.
[0173] An etching mask is formed on the pressure cell structure 200 being a silicon wafer,
and part of the silicon wafer uncovered by the etching mask is removed by using a
so-called vertical deep dry etching dedicated to silicon substrates. As a result,
the pressure cells 201, the flow control paths 202, 203, and the slits 204, 205 are
formed.
[0174] SF6 gas is used for this etching. The SiO
2 film of the vibration plate 109 and the polyimide film of the protective film 113
are not etched when SF6 gas is used. Because of this, the silicon wafer, which forms
the pressure cells 201, is dry etched, but the vibration plate 109 and the other members
are not dry etched.
[0175] Note that, instead of that etching, any one of various methods may be used such as
wet etching in which chemical solution is used and dry etching in which plasma is
used. The etching methods and the etching conditions may be changed depending on the
materials of the insulation film, the electrode film, the piezoelectric film, and
the like. After the etching process, in which each photosensitive resist film is used,
is finished, the remaining photosensitive resist film is removed by using solution.
[0176] Next, the ink flow path structure 300 is bonded to the pressure cell structure 200.
By bonding the ink flow path structure 300 to the pressure cell structure 200, the
first and second connection ports 307, 308 are formed.
[0177] Next, a cover tape is adhered to the protective film 113, and the cover tape thereby
covers the shared electrode terminal unit and the wiring electrode terminal unit.
The cover tape is made of resin, and the cover tape can thereby be removed from the
protective film 113 easily. Thanks to the cover tape, dusts and the ink-repellent
film 116 (described later) less attach to the shared electrode terminal unit and the
wiring electrode terminal unit.
[0178] Next, the ink-repellent film 116 is formed on the protective film 113. A liquid ink-repellent
film material is spin coated on the protective film 113, and the ink-repellent film
116 is thereby formed. At this time, positive pressure air injected into the ink inlet
port and the ink recovery port. As a result, positive pressure air is discharged from
the nozzle 101 in communication with the ink supply flow path 304. When the liquid
ink-repellent film material is coated on the protective film 113 in this situation,
the ink-repellent film material less attaches to the inner wall of the nozzle 101.
After the ink-repellent film 116 is formed, the cover tape is peeled from the protective
film 113.
[0179] The inkjet head 21 is manufactured as the result of those steps. The inkjet head
21 is mounted in the inkjet printer 1. A controller is connected to the wiring electrode
terminal unit via, for example, a flexible cable. Further, the ink inlet port and
the ink recovery port of the ink flow path structure 300 are connected to the ink
tanks 501, 502.
[0180] According to the inkjet printer 1 of the first embodiment, the pressure cell structure
200 includes the flow control paths 202, 203 and the slits 204, 205, which control
flow of ink in each pressure cell 201. The flow control path 202 and the slit 204
are at one side of the the pressure cell 201, and the flow control path 203 and the
slit 205 are at the other side of the the pressure cell 201, the pressure cell 201
being therebetween.
[0181] According to this structure, when the inkjet printer 1 operates, ink flows into the
ink supply flow path 304, passes through the first connection port 307, and flows
into the flow control path 202 of the pressure cell structure 200. Further, the ink
flows from the flow control path 202, passes through the slit 204, and flows into
the pressure cell 201. Then, the ink in the pressure cell 201 passes through the slit
205, flows into the flow control path 203 side, passes through the second connection
port 308, and flows into the ink recovery flow path 305.
[0182] As a result, the ink in the pressure cell 201 is constantly refilled. As a result,
even if air bubbles are generated in the pressure cell 201, the air bubbles are discharged
from the second connection port 308 together with ink. So it is possible to prevent
poor ink ejection from occurring due to air bubbles.
[0183] Further, when the actuator 102 pressurizes ink in the pressure cell 201 and the ink
is ejected from the nozzle 101, the slit 204 controls the pressurized ink flowing
from the pressure cell 201 to the flow control path 202, and the slit 205 controls
the pressurized ink flowing from the pressure cell 201 to the flow control path 203.
As a result, the ink pushed out of the pressure cell 201 by the actuator 102 is ejected
from the nozzle 101 effectively.
[0184] Further, because the ink is not kept in the pressure cell 201 but flows, the ink
near the nozzle 101 is refilled constantly. As a result, the following situation is
prevented from occurring; ink solvent in the nozzle 101 dries, the ink pigments aggregate,
and the nozzle 101 is clogged with the pigment aggregates.
[0185] As described above, it is possible to prevent poor ink ejection from occurring due
to air bubbles and aggregated pigments. So it is not necessary to refill the pressure
cell 201 with ink, for example, to maintain the pressure cell 201. As a result, the
operational efficiency of the inkjet printer 1 is increased, and maintenance costs
may be decreased.
[0186] Further, because fresh ink is constantly supplied to the pressure cell 201, it is
possible to keep the temperature of the ink in the pressure cell 201 constant. In
other words, heat is generated when the nozzle plate 100 deforms, and the inkjet head
21 prevents increase of the temperature of the ink due to that heat from occurring.
As a result, it is possible to prevent change of properties of the ink due to change
of the temperature from occurring.
[Second embodiment]
[0187] Fig. 7 shows a second embodiment. This embodiment shows a modification in which the
structure of the inkjet head 21 of the first embodiment (see Fig. 1 to Fig. 6) is
modified as follows.
[0188] In short, the inkjet head 21 of this embodiment includes the ink inlet-side flow
control path 401. In the first embodiment, as shown in Fig. 3, each of the flow control
paths 202 is a path segmented for each corresponding pressure cell 201. To the contrary,
the ink inlet-side flow control path 401 is a common path including the flow control
paths 202 of the first embodiment in communication with each other.
[0189] The slit 403 is formed between the ink inlet-side flow control path 401 and each
pressure cell 201. Further, the ink inlet-side flow control path 401 is in communication
with each pressure cell 201 via each slit 403.
[0190] Further, the inkjet head 21 of this embodiment includes the ink outlet-side flow
control path 402. In the first embodiment, as shown in Fig. 3, each of the flow control
paths 203 is a path segmented for each corresponding pressure cell 201. To the contrary,
the ink outlet-side flow control path 402 is a common path including the flow control
paths 203 of the first embodiment in communication with each other.
[0191] The slit 404 is formed between the ink outlet-side flow control path 402 and each
pressure cell 201. Further, the ink outlet-side flow control path 402 is in communication
with each pressure cell 201 via each slit 404.
[0192] As described above, the inkjet head 21 of this embodiment includes the ink inlet-side
flow control path 401, which includes the ink inlet-side flow control paths 202 for
the pressure cells 201 in communication with each other, and the ink outlet-side flow
control path 402, which includes the ink outlet-side flow control paths 203 for the
pressure cells 201 in communication with each other. With this structure, the structure
of the pressure cell structure 200 is made simple, and the pressure cell structure
200 is manufactured easily.
[0193] According to the inkjet head and the inkjet recording apparatus of the embodiments,
it is possible to prevent air bubbles from remaining in the pressure cell, and to
prevent poor ink ejection from occurring.
[0194] While certain embodiments have been described, these embodiments have been presented
by way of example only, and are not intended to limit the scope of the inventions.
Indeed, the novel embodiments described herein may be embodied in a variety of other
forms; furthermore, various omissions, substitutions and changes in the form of this
embodiments described herein may be made without departing from the framework of the
inventions. The accompanying claims and their equivalents are intended to cover such
forms or modifications as would fall within the scope of the inventions.