METHOD FOR PRODUCING AN EUV MODULE, EUV MODULE AND EUV LITHOGRAPHY SYSTEM - Patent 3295248

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EP 3 295 248 A1

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(43)	Date of publication:
	21.03.2018 Bulletin 2018/12

(21)	Application number: 16717626.2

(22)	Date of filing: 19.04.2016

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International Patent Classification (IPC):

G03F 7/20^(2006.01)

(86)	International application number:
	PCT/EP2016/058672

(87)	International publication number:
	WO 2016/180609 (17.11.2016 Gazette 2016/46)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
	Designated Extension States:
	BA ME
	Designated Validation States:
	MA MD

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Priority:

12.05.2015 DE 102015208831

(71)	Applicant: Carl Zeiss SMT GmbH
	73447 Oberkochen (DE)

(72)	Inventor:
	SCHMEHL, Andreas 86720 Nördlingen (DE)

(54)	METHOD FOR PRODUCING AN EUV MODULE, EUV MODULE AND EUV LITHOGRAPHY SYSTEM