FIBER LASER-BASED SYSTEM FOR UNIFORM CRYSTALLIZATION OF AMORPHOUS SILICON SUBSTRATE - Patent 3314633

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EP 3 314 633 A1

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(43)	Date of publication:
	02.05.2018 Bulletin 2018/18

(21)	Application number: 16818736.7

(22)	Date of filing: 29.06.2016

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International Patent Classification (IPC):

H01L 21/268^(2006.01)
H01L 21/02^(2006.01)

H01L 21/324^(2006.01)

(86)	International application number:
	PCT/US2016/040222

(87)	International publication number:
	WO 2017/004280 (05.01.2017 Gazette 2017/01)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
	Designated Extension States:
	BA ME
	Designated Validation States:
	MA MD

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Priority:

29.06.2015 US 201562186057 P
30.03.2016 US 201662315310 P

(71)	Applicant: IPG Photonics Corporation
	Oxford, Massachusetts 01540 (US)

(72)	Inventors:
	LEONARDO, Manuel Oxford, MA 01540 (US) VON DADELSZEN, Michael Oxford, MA 01540 (US) EROKHIN, Yuri Oxford, MA 01540 (US)

(74)	Representative: Kobiako von Gamm, Iouri
	Bettinger Scheffelt Kobiako von Gamm Rechtsanwälte Patentanwälte Partnergesellschaft mbB Bavariaring 14 80336 München 80336 München (DE)

(54)	FIBER LASER-BASED SYSTEM FOR UNIFORM CRYSTALLIZATION OF AMORPHOUS SILICON SUBSTRATE