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<ep-patent-document id="EP16769992B8W1" file="EP16769992W1B8.xml" lang="en" country="EP" doc-number="3353605" kind="B8" correction-code="W1" date-publ="20230301" status="c" dtd-version="ep-patent-document-v1-5-1">
<SDOBI lang="en"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIROMKCYALTRBGCZEEHUPLSK..HRIS..MTNORS..SM..................</B001EP><B003EP>*</B003EP><B005EP>J</B005EP><B007EP>BDM Ver 2.0.16 (1th of February 2022) -  2999001/0</B007EP></eptags></B000><B100><B110>3353605</B110><B120><B121>CORRECTED EUROPEAN PATENT 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20060101ALI20211112BHEP        </text></classification-ipcr></B510EP><B520EP><classifications-cpc><classification-cpc sequence="1"><text>B08B   3/10        20130101 LI20161207BHEP        </text></classification-cpc><classification-cpc sequence="2"><text>B08B   7/0057      20130101 LI20161207BHEP        </text></classification-cpc><classification-cpc sequence="3"><text>G03F   1/82        20130101 LI20161207BHEP        </text></classification-cpc><classification-cpc sequence="4"><text>G03F   7/70925     20130101 LI20170406BHEP        </text></classification-cpc><classification-cpc sequence="5"><text>H01L  21/67051     20130101 LI20161207BHEP        </text></classification-cpc><classification-cpc sequence="6"><text>C11D  11/0047      20130101 LA20170530BHEP        </text></classification-cpc><classification-cpc sequence="7"><text>G03F   7/42        20130101 LI20171010BHEP        </text></classification-cpc><classification-cpc sequence="8"><text>G03F   7/423       20130101 LI20171010BHEP   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WÄSSRIGEN FLÜSSIGMEDIUM</B542><B541>en</B541><B542>A METHOD FOR TREATING SUBSTRATES WITH AN AQUEOUS LIQUID MEDIUM EXPOSED TO UV-RADIATION</B542><B541>fr</B541><B542>PROCÉDÉ PERMETTANT DE TRAITER DES SUBSTRATS À L'AIDE D'UN MILIEU LIQUIDE AQUEUX EXPOSÉ À UN RAYONNEMENT UV</B542></B540><B560><B561><text>EP-A2- 1 793 276</text></B561><B561><text>DE-A1-102009 058 962</text></B561><B561><text>JP-A- 2004 241 726</text></B561><B561><text>US-A1- 2003 205 240</text></B561><B561><text>US-A1- 2005 078 286</text></B561></B560></B500><B700><B720><B721><snm>DATILO, Davide</snm><adr><str>c/o Süss Microtec Photomask Equipment GmbH &amp; Co. KG
Ferdinand-von-Steinbeis-Ring 10</str><city>75447 Sternenfels</city><ctry>DE</ctry></adr></B721><B721><snm>DIETZE, Uwe</snm><adr><str>105 Rupen Court</str><city>Austin, Texas 78734</city><ctry>US</ctry></adr></B721><B721><snm>SINGH, SherJang</snm><adr><str>38 Longwood Drive</str><city>Clifton Park, New York 12065</city><ctry>US</ctry></adr></B721></B720><B730><B731><snm>Suss MicroTec Photomask Equipment GmbH &amp; Co. KG</snm><iid>101977502</iid><irf>HAM-E-37624</irf><adr><str>Ferdinand-von-Steinbeis-Ring 10</str><city>75447 Sternenfels</city><ctry>DE</ctry></adr></B731></B730><B740><B741><snm>Carstens, Dirk Wilhelm</snm><iid>100774030</iid><adr><str>Wagner &amp; Geyer Partnerschaft mbB 
Patent- und Rechtsanwälte 
Gewürzmühlstraße 5</str><city>80538 München</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>AL</ctry><ctry>AT</ctry><ctry>BE</ctry><ctry>BG</ctry><ctry>CH</ctry><ctry>CY</ctry><ctry>CZ</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>EE</ctry><ctry>ES</ctry><ctry>FI</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>HR</ctry><ctry>HU</ctry><ctry>IE</ctry><ctry>IS</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LT</ctry><ctry>LU</ctry><ctry>LV</ctry><ctry>MC</ctry><ctry>MK</ctry><ctry>MT</ctry><ctry>NL</ctry><ctry>NO</ctry><ctry>PL</ctry><ctry>PT</ctry><ctry>RO</ctry><ctry>RS</ctry><ctry>SE</ctry><ctry>SI</ctry><ctry>SK</ctry><ctry>SM</ctry><ctry>TR</ctry></B840><B860><B861><dnum><anum>EP2016072325</anum></dnum><date>20160920</date></B861><B862>en</B862></B860><B870><B871><dnum><pnum>WO2017050774</pnum></dnum><date>20170330</date><bnum>201713</bnum></B871></B870></B800></SDOBI>
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