(19)
(11) EP 3 417 457 A1

(12)

(43) Date of publication:
26.12.2018 Bulletin 2018/52

(21) Application number: 17753632.3

(22) Date of filing: 01.02.2017
(51) International Patent Classification (IPC): 
G11C 29/42(2006.01)
G06F 11/10(2006.01)
(86) International application number:
PCT/US2017/015944
(87) International publication number:
WO 2017/142706 (24.08.2017 Gazette 2017/34)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
MA MD

(30) Priority: 18.02.2016 US 201615046666

(71) Applicant: Micron Technology, Inc.
Boise, ID 83716-9632 (US)

(72) Inventors:
  • HE, Deping
    Boise, Idaho 83706 (US)
  • RATNAM, Sampath K.
    Boise, Idaho 83716 (US)

(74) Representative: Beresford Crump LLP 
16 High Holborn
London WC1V 6BX
London WC1V 6BX (GB)

   


(54) ERROR RATE REDUCTION