[0001] The present invention refers to a polishing pad (or polishing pad) comprising a top
surface for releasable attachment of the polishing pad to a bottom surface of a plate-like
backing pad of a hand-held power tool and a bottom surface directed towards a surface
of a workpiece to be polished during an intended use of the hand-held power tool.
The backing pad (or backing pad) is actuated by an electric or pneumatic motor of
the hand-held power tool, in order to make the backing pad together with the polishing
pad attached thereto perform a purely rotating, a random orbital or a roto-orbital
working movement.
[0002] The invention also refers to a plate-like backing pad of a hand-held power tool,
the backing pad comprising a bottom surface to which a polishing pad is releasably
attachable with its top surface. The backing pad is actuated by an electric or pneumatic
motor of the hand-held power tool, in order to make the backing pad together with
the polishing pad attached thereto perform a purely rotating, a random orbital or
a roto-orbital working movement.
[0003] Finally, the invention refers to a hand-held power tool comprising a plate-like backing
pad with a bottom surface and a polishing pad with a top surface for releasable attachment
of the polishing pad to the bottom surface of the backing pad. The power tool further
comprises an electric or pneumatic motor adapted for actuating the backing pad, in
order to make the backing pad together with the polishing pad attached thereto perform
a purely rotating, a random orbital or a roto-orbital working movement.
[0004] Power tools of the above mentioned kind for polishing a surface of a workpiece, for
example a vehicle body or a boat hull, are well known in the art. The polishing pad
wears off during the polishing process. Therefore, the polishing pad has to be replaced
by a new one from time to time. Furthermore, there are different types of polishing
action (different degrees of intensity of the polishing process). For example, foam
pads having a large rigidity are adapted for effecting a more intense cutting polishing
action of a workpiece to be polished, in order to remove a larger amount of material
from a working surface of the workpiece to be polished and to eliminate larger scratches
and other defects in the working surface. In contrast thereto, foam pads having a
smaller rigidity are adapted for effecting a soft finishing polishing action of the
working surface to be polished, in order to delete any swirls or other fine marks
which may result from the previous cutting polishing action and to obtain a very even
and smooth polished surface. The different rigidities of the foam material are a result
either of different materials used (e.g. Polyamide (PA), Polyester, etc.), different
cell structures (closed-cell or open-cell structure), different sizes of the cells
and different thicknesses of the polishing pads. Therefore, polishing pads will also
have to be replaced by other types of polishing pads for conducting another type of
polishing action.
[0005] The bottom surface of conventional backing pads is flat or even. Similarly, the top
surface of conventional polishing pads is flat or even. Conventional polishing pads
are usually attached to the bottom surface of a backing pad by means of releasable
attachment means, for example a hook-and-loop fastener (e.g. Velcro
®), comprising hooks on one of the corresponding surfaces (e.g. bottom surface of the
backing pad) and loops on the other one of the corresponding surfaces (e.g. top surface
of the polishing pad). The hooks and loops interact with one another in order to provide
for a releasable attachment of the polishing pad to the backing pad. Alternatively,
the attachment means may also comprises an appropriate adhesive on at least one of
the corresponding surfaces. Conventional polishing pads can be attached to conventional
backing pads in almost any (translational and rotational) position and alignment.
[0006] One problem of the known power tools is the positioning of the polishing pads on
the bottom surface of the backing pad. If the polishing pad is attached not exactly
concentrically to the backing pad or its rotational axis, respectively, the entire
power tool will be subject to rather strong vibrations which are detrimental to a
proper long term use of the power tool and can make working with the power tool even
impossible. Furthermore, the backing pad and the polishing pad may be provided with
corresponding through holes for realizing an air flow running from the working surface
through the through holes and at least part of the power tool to a filter or a suction
device, such as a vacuum cleaner. The air flow serves for removing dust, particles
of abrasive paste and other pulverulent particles from the working surface of the
work piece. It is a precondition for a proper functioning of the dust suction device
that the through holes in the backing pad on the one hand and in the polishing pad
on the other hand are properly positioned in respect to one another, in particular
aligned in respect to each other.
[0007] It is an object of the present invention to provide for an easy and efficient way
of properly positioning and aligning the polishing pad in respect to the backing pad
during attachment of the polishing pad to the backing pad radially in respect to the
rotational axis of the backing pad as well as in a proper rotational (angular) position
in respect to the rotational axis of the backing pad.
[0008] This object is solved by a polishing pad with the features of claim 1, by a backing
pad with the features of claim 7 and by a hand-held power tool with the features of
claim 14.
[0009] In particular, it is suggested that the top surface of the polishing pad comprises
at least one recess adapted for receiving at least one corresponding protrusion located
at and protruding from the bottom surface of the plate-like backing pad. When placing
the polishing pad on the bottom surface of the backing pad, it is positioned and aligned
such that the at least one protrusion enters into the at least one corresponding recess.
Therefore, the at least one protrusion and recess provide for a precise positioning
and possibly also alignment of the polishing pad in respect to the bottom surface
of the backing pad. In particular the co-operation of the at least one recess on the
top surface of the polishing pad with the at least one corresponding protrusion on
the bottom surface of the backing pad allows an exact and fast positioning and attachment
of the polishing pad in respect to the backing pad. The positioning can be effected
in a translational direction (e.g. providing for an easy centering of the polishing
pad in respect to the bottom surface of the backing pad) as well as in a desired rotational
(angular) direction (e.g. providing for an easy alignment of dust suction holes in
the backing pad with respective openings in the polishing pad).
[0010] There are many different possibilities for realizing the at least one protrusion
on the bottom surface of the plate-like backing pad and the corresponding at least
one recess on the top surface of the polishing pad within the realm of the present
invention.
[0011] According to a preferred embodiment of the present invention it is suggested that
the at least one recess in the polishing pad comprises an annular groove extending
in the top surface of the polishing pad in an equidistant manner in respect to a rotational
axis of the polishing pad. Accordingly, the at least one protrusion of the plate-like
backing pad comprises an annular collar protruding from the bottom surface of the
backing pad and extending in an equidistant manner in respect to a rotational axis
of the backing pad. The rotational axis of the backing pad is preferably congruent
with the rotational axis of the polishing pad. The distances of the annular groove
on the one hand and of the annular collar on the other hand in respect to these axes
are preferably identical. Hence, when attaching the polishing pad to the backing pad
the collar enters into and is received by the groove. This allows a precise positioning
of the polishing pad in the plane of extension of the bottom surface of the backing
pad. However, the polishing pad can be attached to the backing pad in any desired
rotational alignment in respect to the rotational axis of the backing pad. In order
to allow attachment of the polishing pad in only one or more discrete rotational positions,
the backing pad could be provided with at least one further protrusion located eccentrically
on the bottom surface of the backing pad and the polishing pad could be provided with
one or more corresponding further recesses for receiving the at least one protrusion.
For example, the annular collar could be provided with a single further protrusion
extending radially inwards towards the rotational axis of the backing pad and the
annular groove could be provided with one or more grooves extending radially inwards
towards the rotational axis of the polishing pad. The polishing pad can be attached
to the backing pad in one or more discrete rotational positions in respect to the
axes, in which the further protrusion is received by one of the further recesses.
[0012] Instead of a groove in the top surface of the polishing pad, it is also possible
to provide an outer annular recess on the top surface of the polishing pad. The annular
protrusion of the backing pad can enter into this annular recess. In this case, starting
from the outer circumference of the polishing pad, the polishing pad has an annular
section with a smaller thickness and, going further towards the rotational axis, the
polishing pad has a circular section with a larger thickness. The annular protrusion
enters into the annular section and encompasses the circular section, thereby positioning
the polishing pad on the bottom surface of the backing pad. To this end it is suggested
that the at least one recess comprises an annular recess located along a circumference
of the top surface of the polishing pad in an equidistant manner in respect to a rotational
axis of the polishing pad.
[0013] Furthermore, it is suggested that the at least one recess comprises a plurality of
separate recesses located in the top surface of the polishing pad in an equidistant
manner in respect to a rotational axis of the polishing pad. Similarly, the at least
one protrusion comprises a plurality of separate protrusions each protruding from
the bottom surface of the backing pad and located there in an equidistant manner in
respect to a rotational axis of the backing pad. The positions of the separate recesses
in the top surface of the polishing pad correspond to the positions of the separate
protrusions on the bottom surface of the backing pad, in order to allow the protrusions
to enter into the corresponding recesses when attaching the polishing pad to the backing
pad. This allows a precise positioning of the polishing pad in the plane of extension
of the bottom surface of the backing pad as well as an attachment of the polishing
pad to the backing pad in a precise rotational alignment in respect to the rotational
axis of the backing pad.
[0014] Alternatively, it is suggested that the at least one recess comprises a plurality
of separate recesses located in the top surface of the polishing pad with different
distances in respect to a rotational axis of the polishing pad. Similarly, the at
least one protrusion comprises a plurality of separate protrusions each protruding
from the bottom surface of the backing pad and located there with different distances
in respect to a rotational axis of the backing pad. Again, the positions of the separate
recesses in the top surface of the polishing pad correspond to the positions of the
separate protrusions on the bottom surface of the backing pad, in order to allow the
protrusions to enter into the corresponding recesses when attaching the polishing
pad to the backing pad.
[0015] Alternatively or additionally it is suggested that the separate recesses are located
in the top surface of the polishing pad with different circumferential distances in
respect to one another. Similarly, the separate protrusions are located on the bottom
surface of the backing pad with different circumferential distances in respect to
one another.
[0016] The polishing pads can be made of an open-cell foamed material. They are available
in different rigidities for different intended uses of the pad. The different rigidities
of the foam material are a result either of different materials used (e.g. Polyamide
(PA), Polyester, Polyurethane, etc.), different cell structures (closed-cell or open-cell
structure) and different sizes of the cells.
[0017] Furthermore, the polishing pads may have a bottom working surface comprising wool
or a microfiber material. The wool or microfibers are usually fixed to a supporting
surface of the pad, which is releasably attached to the bottom surface of the plate-like
backing pad. The supporting surface can be made of rigid plastic or a foam-like material.
Wool or microfiber pads are available in different rigidities for different intended
uses of the pad. The rigidities of the wool or microfiber material can be varied by
different densities of the wool or microfiber strands or threads, by different diameters
of each of the wool or microfiber strands or threads, or by using different materials.
[0018] Further characteristics and advantages of the present invention will be described
hereinafter in more detail making reference to the accompanying figures. The figures
show:
- Fig. 1
- a hand-held power tool comprising a backing pad and a polishing pad according to the
present invention;
- Fig. 2
- a detail of a polishing pad according to a preferred embodiment of the invention in
a sectional view;
- Fig. 3
- a combination of a plate-like backing pad and a polishing pad according to the embodiment
of Fig. 2 in a sectional view;
- Fig. 4
- the combination of the plate-like backing pad and the polishing pad according to the
embodiment of Fig. 3 in a perspective view;
- Fig. 5
- a detail of a polishing pad according to another preferred embodiment of the invention
in a sectional view;
- Fig. 6
- a combination of a plate-like backing pad and a polishing pad according to the embodiment
of Fig. 5 in a perspective view;
- Fig. 7
- a detail of a polishing pad according to another preferred embodiment of the invention
in a sectional view;
- Fig. 8
- a combination of a plate-like backing pad and a polishing pad according to the embodiment
of Fig. 7 in a sectional view;
- Fig. 9
- the combination of the plate-like backing pad and the polishing pad according to the
embodiment of Fig. 8 in a perspective view;
- Fig. 10
- a detail of a polishing pad according to another preferred embodiment of the invention
in a sectional view;
- Fig. 11
- a combination of a plate-like backing pad and a polishing pad according to the embodiment
of Fig. 10 in a perspective view;
- Fig. 12
- a combination of a plate-like backing pad and a polishing pad according to another
preferred embodiment of the invention in a perspective view;
- Fig. 13
- a combination of a plate-like backing pad and a polishing pad according to another
preferred embodiment of the invention in a perspective view; and
- Fig. 14
- the combination of the plate-like backing pad attached the polishing pad according
to the embodiment of Fig. 3 in a perspective view.
[0019] With reference now to the drawings, Fig. 1 shows a hand-held power tool 1 according
to the present invention adapted to be used with a backing pad and a polishing pad
attached to a bottom surface of the backing pad according to the present invention.
In Fig. 1 a hand-held power tool 1 in the form of a random orbital polishing tool
(or polisher) 1 is shown. The polisher 1 has a housing 2, essentially made of a plastic
material. The polisher 1 is provided with a handle 3 at its rear end and a grip 4
at its front end. An electric power supply line 5 with an electric plug at its distal
end exits the housing 2 at the rear end of the handle 3, in order to provide an electric
motor and an electronic control unit both located inside the housing 2 with electric
energy. At the bottom side of the handle 3 a switch 6 is provided for activating and
deactivating the electric motor of the power tool 1. The switch 6 can be continuously
held in its activated position by means of a push button 7. The power tool 1 can be
provided with a rotary adjustment means (not shown) for adjusting the rotational speed
of the tool's motor. The housing 2 can be provided with cooling openings 8 for allowing
heat from the electronic control unit and/or the electric motor to dissipate into
the environment.
[0020] The power tool 1 shown in Fig. 1 has an electric motor. Of course, the machine tool
according to the present invention could also be equipped with a pneumatic motor,
which is especially advantageous in explosive environments, where sparks from an electric
motor could provoke an explosion of an explosive mixture (e.g. oxygen and very fine
dust) contained in the environment. Furthermore, instead of the connection of the
machine tool 1 to a mains power supply by means of the electric cable 5, the machine
tool 1 could alternatively be equipped with a rechargeable battery (not shown) located
inside the housing 2. In that case the electric energy for driving the electric motor
would be provided by the battery. Nonetheless, an electric cable 5 could be provided
in order to recharge the battery.
[0021] The power tool 1 has a plate-like backing pad 9 rotatable about a rotational axis
10 and having a connection element (not shown) extending along the backing pad's rotational
axis 10. The connection element is adapted for connecting the backing pad 9 to a backing
pad holder (not shown) of the power tool 1. A bottom surface 9a of the backing pad
9 is provided with means for releasably attaching a polishing pad 11 according to
the present invention. The attachment means can comprise a first layer of a hook-and-loop
fastener (or Velcro
®), wherein the top surface 11a of the polishing pad 11 is provided with the second
layer of the hook-and-loop fastener. The two layers of the hook-and-loop fastener
interact with one another in order to releasably but safely fix the polishing pad
11 to the bottom surface 9a of the backing pad 9.
[0022] The plate-like backing pad 9 is made of a semi-rigid material, preferably a plastic
material possibly with a metal insert 17 (see Figs. 3 and 8) for stability reasons.
The metal insert 17 may comprise a central hollow shaft with an internal thread for
connection of the backing pad 9 to a motor shaft of a power tool 1. The metal insert
17 is form-fit or positive-fit, respectively, into the plastics material during manufacturing
of the backing pad 9, e.g. by means of an injection molding process. Of course, differently
to what is shown in Figs. 3 and 8, for stability reasons part of the metal insert
17 could also extend into at least part of the horizontally extending plate-like plastics
material providing for the bottom surface 9a of the backing pad 9. The plastic material
may be, for example, PA66 (polyamide) reinforced with up to 30% of glass fiber. Any
other plastics material can be used, which on the one hand is rigid enough to carry
and support the polishing pad 11 during the intended use of the power tool 1 and to
apply a force to the polishing pad 11 in a direction essentially downwards and parallel
to the backing pad's rotational axis 10 and which on the other hand is flexible enough
to avoid damage or scratching of the surface to be worked by the polishing pad 11.
It is even possible that the entire backing pad is made of metal, for example aluminum.
[0023] The polishing pad 11 is in particular used for polishing a workpiece in the form
of a vehicle or car body or the hull or any other part of a boat or ship. The workpiece
is preferably made of wood, metal, plastic or a composite material (e.g. glass fiber
reinforced, GFR, or carbon fiber reinforced, CFR, material) and may be provided with
or without some kind of base coat, primer, paint and/or varnish. Some kind of polishing
paste or polishing liquid may be applied to the working surface in order to enhance
the polishing effect of the polishing pad 11 during its intended use. For example,
the polishing pad can be made of a sponge-like material, in particular a plastics
material like polyurethane with an open-cell structure. Furthermore, the polishing
pad can comprise a support structure consisting of a plate-like element made of a
plastics material, like polyurethane with a closed-cell structure, with microfibers
attached to the bottom surface of the support structure. The microfibers are made
of polyester and/or polyamide. Finally, the polishing pad can comprise a support structure
consisting of a sponge-like element made of a plastics material, like polyurethane
with an open-cell structure, with natural or synthetic wool attached to the bottom
surface of the support structure. In the following embodiments the polishing pad 11
is made of sponge-like material but of course, the invention could be perfectly well
also realized for other types of polishing pads 11.
[0024] The polishing pad 11 comprises a bottom working surface 11b with which the surface
of the workpiece can be polished. The polishing pad 11 is preferably made of foamed
plastics material having an open-cell structure (e.g. Polyamide (PA), Polyester, Polyurethane,
etc.). The polishing pads 11 are available in different rigidities for different intended
uses of the pad 11 (e.g. a more intense cutting polishing action of a workpiece or
a softer finishing polishing action). The different rigidities of the foamed material
are a result either of different materials used, different thicknesses of the pad
11, different cell structures (closed-cell or open-cell structure) and different sizes
of the cells. The bottom working surface 11b is preferably made of the foamed plastic
material of the pad 11. Alternatively, polishing pad 11 may comprise wool or microfiber
material on its bottom surface 11b. Further, the polishing pad 11 preferably has the
form of a truncated cone resulting in the top surface 11a having a smaller diameter
than the bottom working surface 11b and in a slanting circumferential side wall 11c
between the top surface 11a and the bottom surface 11b. Of course, the polishing pad
11 may also have the form of a cylinder with top and bottom surfaces 11a, 11b of the
same diameter and an upright circumferential side wall 11c, running perpendicular
in respect to the top and bottom surfaces 11a, 11b. The bottom working surface 11b
of the polishing pad 11 may comprise any type of three-dimensional structure, if desired,
for example a waffle structure having depressions and hills located displaced in respect
to one another (not shown).
[0025] The present invention suggests a polishing pad 11 and a plate-like backing pad 9,
which are both adapted for providing for a fast and efficient attachment of the polishing
pad 11 to the backing pad 9 in a predefined position in the plane of extension of
the bottom surface 9a of the backing pad 9 and possibly also in a predefined rotational
position in respect to a rotational axis 10 of the backing pad 9. In particular, by
means of the present invention the polishing pad 11 can be easily centered in respect
to the backing pad 9. If the polishing pad 11 is properly attached to the backing
pad 9 a rotational axis 14 of the polishing pad 11 runs congruent in respect to the
rotational axis 10 of the backing pad 9.
[0026] According to a first embodiment of the invention shown in Figs. 2 to 4 a top surface
11a of the polishing pad 11 comprises at least one recess 12a adapted for receiving
at least one corresponding protrusion 13a located at and protruding from the bottom
surface 9a of the plate-like backing pad 9. In this embodiment the protrusion 13a
comprises an annular collar extending along the entire outer circumference of the
bottom surface 9a of the backing pad 9 in an equidistant manner in respect to the
rotational axis 10 of the backing pad 9. Of course, it would also be possible that
there is a plurality of protrusions 13a each of which extending along a certain section
of the outer circumference of the bottom surface 9a of the backing pad 9. Correspondingly,
in the embodiment of Figs. 2 to 4 the at least one recess 12a comprises an annular
groove extending along the entire circumference in the top surface 11a of the polishing
pad 11 in an equidistant manner in respect to the rotational axis 14 of the polishing
pad 11. Of course, it would also be possible that there is a plurality of recesses
12a each of which extending along a certain section of the circumference of the top
surface 11a of the polishing pad 11. The advantage of this embodiment is that the
backing pad 9 can be easily made out of a plastics material, for example PA66 reinforced
with glass fibers, by means of an injection molding process.
[0027] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing
pad 9 are at least partly provided with attachment means, preferably a hook-and-loop
fastener (Velcro
®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
In this embodiment, preferably only center part 15 of the top surface 11a of the polishing
pad 11 within the annular groove 12a is provided with the attachment means. Hence,
the outer annular part 16 of the top surface 11a of the polishing pad 11 extending
outside of the annular groove 12a has no attachment means. In that case the entire
bottom surface 9a of the backing pad 9 inside the annular collar 13a would be provided
with corresponding attachment means.
[0028] The co-operation of the at least one recess 12a on the top surface 11a of the polishing
pad 11 with the at least one corresponding protrusion 13a on the bottom surface 9a
of the backing pad 9 allows an exact and fast positioning and attachment of the polishing
pad 11 in respect to the backing pad 9. The positioning can be effected in a translational
direction (e.g. providing for an easy centering of the polishing pad 11 in respect
to the bottom surface 9a of the backing pad 9) as well as in a desired rotational
(angular) direction (e.g. providing for an easy alignment of dust suction holes in
the backing pad 9 with respective openings in the polishing pad 11).
[0029] The described embodiment allows exact positioning of the polishing pad 11 in respect
to the backing pad 9 in a predefined translational position within the plane of extension
of the bottom surface 9a of the backing pad 9. This may be sufficient in many cases.
However, it is noted that with the annular groove 12a and the annular collar 13a only,
the polishing pad 11 can be attached to the bottom surface 9a of the backing pad 9
in any angular position (0°...360°) in respect to the rotational axes 10, 14. In this
embodiment no alignment of the polishing pad 11 in respect to the backing pad 9 in
a desired rotational (angular) position is possible. In order to achieve this object
one or more further protrusions and corresponding recesses may be realized on the
bottom surface 9a of the backing pad 9 or in the top surface 11a of the polishing
pad 11, respectively, both not extending circumferentially (e.g. at least partly in
a radial direction in respect to the rotational axes 10, 14). An example for such
an embodiment is shown in Fig. 12, where the additional protrusions are indicated
with reference sign 13b and the additional corresponding recesses are indicated with
reference sign 12b. The additional protrusions 13b are designed as even plain-like
elements having an essentially radial extension. The additional recesses 12b are designed
as corresponding linear grooves having an essentially radial extension. Of course,
the polishing pad 11 could be provided with the additional recesses 12b only, without
the annular groove 12a. Correspondingly, the backing pad 9 could be provided with
the additional protrusions 13b only, without the annular collar 13a. Furthermore,
the number, form, translational and angular position of the additional protrusions
13b and the corresponding additional recesses 12b could vary from what is shown in
Fig. 12.
[0030] Another embodiment, which allows a fast and precise centering of the polishing pad
11 in respect to the backing pad 9 as well as a fast and precise angular positioning
of the polishing pad 11 in respect to the backing pad 9 in a desired rotational position
about the axes 10, 14, is shown in Fig. 13. There, the additional protrusions are
indicated with reference sign 13c and the additional corresponding recesses are indicated
with reference sign 12c. The one or more additional protrusions 13c and the corresponding
additional recesses 12c do also not extend circumferentially but are rather located
at discrete rotational positions about the axes 10, 14. The additional protrusions
13c have the form of cylinders but of course may have any other form, too. The distances
between the further protrusions 13c and the rotational axis 10 may be identical or
different. Similarly, the distances between the corresponding further recesses 12c
and the rotational axis 14 may be identical or different. Of course, the backing pad
9 could be provided with the additional protrusions 13c only, without the annular
collar 13a. In that case the polishing pad 11 could be provided with the additional
recesses 12c only, without the annular groove 12a. Furthermore, the number, form,
translational and angular position of the additional protrusions 13c and the corresponding
additional recesses 12c could vary from what is shown in Fig. 13.
[0031] A further embodiment of the present invention is shown in Figs. 5 and 6. In contrast
to the embodiment of Figs. 2 to 4, in this further embodiment an annular collar 13d
is not provided at the outer edge of the backing pad 9 but rather in a distance to
the outer edge leaving a space 18 between the outer edge of the polishing pad 11 and
the outer edge of the backing pad 9. During intended use of the power tool 1 and the
backing and polishing pads 9, 11 according to this embodiment the outer edge portion
of the polishing pad 11 may be pressed upwards into the space 18. The upward movement
of the outer edge portion of the polishing pad 11 is limited by the outer edge portion
of the backing pad 9 providing for some kind of stopper for the outer edge portion
of the polishing pad 11. In this embodiment, the at least one recess 12d in the top
surface 11a of the polishing pad 11 comprises the space 18 and extends right to the
outer edge of the polishing pad 11.
[0032] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing
pad 9 are at least partly provided with attachment means, preferably a hook-and-loop
fastener (Velcro
®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
In this embodiment, preferably only center part 15 of the top surface 11a of the polishing
pad 11 within the annular recess 12d is provided with the attachment means. Hence,
the outer annular part 16 (forming the bottom surface of the recess 12d) of the polishing
pad 11 has no attachment means. Similarly, preferably only center part 19 of the bottom
surface 9a of the backing pad 9 within the annular protrusion 13d is provided with
the attachment means. Hence, an outer annular part 20 of the backing pad 9 outside
of the annular collar 13d has no attachment means. In this embodiment the protrusion
13d comprises an annular collar extending along the entire circumference of the bottom
surface 9a of the backing pad 9 in an equidistant manner in respect to the rotational
axis 10 of the backing pad 9 and in respect to the outer circumferential edge of the
backing pad 9. Of course, it would also be possible that there is a plurality of protrusions
13d each of which extending along a certain section of the outer circumference of
the bottom surface 9a of the backing pad 9. It would also be possible that there is
a plurality of recesses 12d each of which extending along a certain section of the
circumference of the outer edge portion of the top surface 11a of the polishing pad
11.
[0033] Furthermore, it is also possible in the embodiment of Figs. 5 and 6 that there are
additional protrusions, like the protrusions 13b and 13c of Figs. 12 and 13, protruding
from the bottom surface 9a of the backing pad 9. Correspondingly, the top surface
11a of the polishing pad 11 may also be provided with additional recesses, like the
recesses 12b, 12c of Figs. 12 and 13.
[0034] Yet another embodiment is shown in Figs. 7 to 9. In that embodiment, the annular
circumferential protrusion 13a of Figs. 2 to 4 is combined with the annular circumferential
recess 12d of Figs. 5 and 6.
[0035] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing
pad 9 are at least partly provided with attachment means, preferably a hook-and-loop
fastener (Velcro
®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
In this embodiment, preferably only center part 15 of the top surface 11a of the polishing
pad 11 within the annular recess 12d is provided with the attachment means. Hence,
the outer annular part 16 (forming the bottom surface of the recess 12d) of the polishing
pad 11 has no attachment means. In that case the entire bottom surface 9a of the backing
pad 9 inside the annular collar 13a would be provided with corresponding attachment
means.
[0036] In this embodiment the protrusion 13a comprises an annular collar extending along
the entire outer circumference of the bottom surface 9a of the backing pad 9 in an
equidistant manner in respect to the rotational axis 10 of the backing pad 9. Of course,
it would also be possible that there is a plurality of protrusions 13a each of which
extending along a certain section of the outer circumference of the bottom surface
9a of the backing pad 9. It would also be possible that there is a plurality of recesses
12d each of which extending along a certain section of the circumference of the outer
edge portion of the top surface 11a of the polishing pad 11.
[0037] Furthermore, it is also possible in the embodiment of Figs. 7 to 9 that there are
additional protrusions, like the protrusions 13b and 13c of Figs. 12 and 13, protruding
from the bottom surface 9a of the backing pad 9. Correspondingly, the top surface
11a of the polishing pad 11 may also be provided with additional recesses, like the
recesses 12b, 12c of Figs. 12 and 13.
[0038] Yet another embodiment is shown in Figs. 10 and 11. In that embodiment, the annular
protrusion 13d of Figs. 5 and 6 is combined with the annular circumferential groove
12a of Figs. 2 to 4.
[0039] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing
pad 9 are at least partly provided with attachment means, preferably a hook-and-loop
fastener (Velcro
®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
In this embodiment, to provide the entire bottom surface 9a (comprising partial surfaces
19 and 20) of the backing pad 9 and the entire top surface 11a (comprising partial
surfaces 15 and 16) of the polishing pad 11 with corresponding attachment means.
[0040] In this embodiment the protrusion 13d comprises an annular collar extending along
the entire circumference of the bottom surface 9a of the backing pad 9 in an equidistant
manner in respect to the rotational axis 10 and to the outer circumferential edge
of the backing pad 9. Of course, it would also be possible that there is a plurality
of protrusions 13d each of which extending along a certain section of the circumference
of the bottom surface 9a of the backing pad 9. It would also be possible that there
is a plurality of grooves 12a each of which extending in the top surface 11a along
a certain section of the circumference of the polishing pad 11.
[0041] Furthermore, it is also possible in the embodiment of Figs. 10 and 11 that there
are additional protrusions, like the protrusions 13b and 13c of Figs. 12 and 13, protruding
from the bottom surface 9a of the backing pad 9. Correspondingly, the top surface
11a of the polishing pad 11 may also be provided with additional recesses, like the
recesses 12b, 12c of Figs. 12 and 13.
[0042] Finally, Fig. 14 shows a perspective view of the polishing pad 11 releasably attached
to the backing pad 9 according to the embodiment of Figs. 2 to 4.
[0043] It is an aspect of the present invention to provide for a plug-and-socket-type of
releasable connection between the top surface 11a of a polishing pad 11 and the bottom
surface 9a of a backing pad 9. To this end at least one protrusion 13a; 13b; 13c;
13d and at least one corresponding recess 12a; 12b; 12c; 12d for receiving the protrusions
13a; 13b; 13c; 13d are provided on the bottom surface 9a of the backing pad 9 and
in the top surface 11a of the polishing pad 11, respectively. Preferably but not necessarily
the number of protrusions 13a; 13b; 13c; 13d and recesses 12a; 12b; 12c; 12d is the
same. This allows a fast attachment of a polishing pad 11 to a backing pad 9 in a
desired translational position thereby permitting an easy centering of the polishing
pad 11 in respect to the backing pad 9. Furthermore, by positioning and designing
the at least one protrusion 13a; 13b; 13c; 13d and the at least one corresponding
recess 12a; 12b; 12c; 12d accordingly, the polishing pad 11 can even be positioned
in a desired rotational (or angular) position (about the rotational axes 10, 14) in
respect to the backing pad 9 thereby permitting alignment of suction holes provided
in the backing pad 9 with corresponding openings in the polishing pad 11.
1. Polishing pad (11) comprising a top surface (11a) adapted for releasable attachment
of the polishing pad (11) to a bottom surface (9a) of a plate-like backing pad (9)
of a hand-held power tool (1) and a bottom surface (11b) adapted for polishing a surface
of a workpiece, the backing pad (9) being actuated by an electric or pneumatic motor
of the hand-held power tool (1) in order to make the backing pad (9) together with
the polishing pad (11) attached thereto perform a purely rotating, a random orbital
or a roto-orbital working movement, characterized in that the top surface (11a) of the polishing pad (11) comprises at least one recess (12a;
12b; 12c; 12d) adapted for receiving at least one corresponding protrusion (13a; 13b;
13c; 13d) located at and protruding from the bottom surface (9a) of the plate-like
backing pad (9) when the polishing pad (11) is attached to the backing pad (9).
2. Polishing pad (11) according to claim 1, wherein the at least one recess comprises
an annular groove (12a) extending in the top surface (11a) of the polishing pad (11)
in an equidistant manner in respect to a rotational axis (14) of the polishing pad
(11).
3. Polishing pad (11) according to claim 1, wherein the at least one recess comprises
an annular recess (12d) located along an outer circumference of the top surface (11a)
of the polishing pad (11) in an equidistant manner in respect to a rotational axis
(14) of the polishing pad (11).
4. Polishing pad (11) according to claim 1, wherein the at least one recess comprises
a plurality of separate recesses (12a; 12b; 12c; 12d) located in the top surface (11a)
of the polishing pad (11) in an equidistant manner to a rotational axis (14) of the
polishing pad (11).
5. Polishing pad (11) according to claim 1, wherein the at least one recess comprises
a plurality of separate recesses (12a; 12b; 12c; 12d) located in the top surface (11a)
of the polishing pad (11) with different distances to a rotational axis (14) of the
polishing pad (11).
6. Polishing pad (11) according to claim 4 or 5, wherein the separate recesses (12a;
12b; 12c; 12d) are located in the top surface (11a) of the polishing pad (11) with
different circumferential distances in respect to one another.
7. Plate-like backing pad (9) of a hand-held power tool (1), the backing pad (9) comprising
a bottom surface (9a) adapted for releasably attaching a top surface (11a) of a polishing
pad (11), the backing pad (9) being actuated by an electric or pneumatic motor of
the hand-held power tool (1) in order to make the backing pad (9) together with the
polishing pad (11) attached thereto perform a purely rotating, a random orbital or
a roto-orbital working movement, characterized in that the bottom surface (9a) of the plate-like backing pad (9) comprises at least one
protrusion (13a; 13b; 13c; 13d) protruding from the bottom surface (9a) of the backing
pad (9) and adapted for entering into a corresponding recess (12a; 12b; 12c; 12d)
located in the top surface (8a) of the polishing pad (11) when the polishing pad (11)
is attached to the backing pad (9).
8. Backing pad (9) according to claim 7, wherein the at least one protrusion comprises
an annular collar (13a; 13d) protruding from the bottom surface (9a) of the backing
pad (9) and extending in an equidistant manner in respect to a rotational axis (10)
of the backing pad (9).
9. Backing pad (9) according to claim 8, wherein the annular collar (13a; 13d) extends
along the outer circumference of the backing pad (9).
10. Backing pad (9) according to claim 8, wherein the annular collar (13a; 13d) extends
in an equidistant manner in respect to the outer circumference of the backing pad
(9).
11. Backing pad (9) according to one of the claims 7 to 10, wherein the at least one protrusion
comprises a plurality of separate protrusions (13a; 13b; 13c; 13d) each protruding
from the bottom surface (9a) of the backing pad (9) and located there in an equidistant
manner to a rotational axis (10) of the backing pad (9).
12. Backing pad (9) according to one of the claims 7 to 10, wherein the at least one protrusion
(14) comprises a plurality of separate protrusions (13a; 13b; 13c; 13d) each protruding
from the bottom surface (9a) of the backing pad (9) and located there with different
distances to a rotational axis (10) of the backing pad (9).
13. Backing pad (9) according to claim 11 or 12, wherein the separate protrusions (13a;
13b; 13c; 13d) are located on the bottom surface (7a) of the backing pad (7) with
different circumferential distances in respect to one another.
14. Hand-held power tool (1) comprising a plate-like backing pad (9) with a bottom surface
(9a) and a polishing pad (11) with a top surface (11a), the bottom surface (9a) and
the top surface (11a) adapted for releasable attachment of the polishing pad (11)
to the backing pad (9), and further comprising an electric or pneumatic motor adapted
for actuating the backing pad (9), in order to make the backing pad (9) together with
the polishing pad (11) attached thereto perform a purely rotating, a random orbital
or a roto-orbital working movement, characterized in that the bottom surface (9a) of the plate-like backing pad (9) comprises at least one
protrusion (13a; 13b; 13c; 13d) protruding from the bottom surface (9a) of the backing
pad (9) and the top surface (11a) of the polishing pad (11) comprises at least one
corresponding recess (12a; 12b; 12c; 12d), wherein the at least one protrusion (13a;
13b; 13c; 13d) is received by the at least one recess (12a; 12b; 12c; 12d) when the
polishing pad (11) is attached to the plate-like backing pad (9).
15. Power tool (1) according to claim 14, wherein the plate-like backing pad (9) is designed
according to one of the claims 7 to 13.
16. Power tool (1) according to claim 14 or 15, wherein the polishing pad (11) is designed
according to one of the claims 2 to 6.