ATOMIC FORCE MICROSCOPY CANTILEVER, SYSTEM AND METHOD

(19)

(11)

EP 3 447 504 A8

(12)	CORRECTED EUROPEAN PATENT APPLICATION
	Note: Bibliography reflects the latest situation

(15)	Correction information:
	Corrected version no 1 (W1 A1)

(48)	Corrigendum issued on:
	10.04.2019 Bulletin 2019/15

(43)	Date of publication:
	27.02.2019 Bulletin 2019/09

(21)	Application number: 17187809.3

(22)	Date of filing: 24.08.2017

(51)

International Patent Classification (IPC):

G01Q 60/38^(2010.01)
G01Q 20/02^(2010.01)

G01Q 70/10^(2010.01)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
	Designated Extension States:
	BA ME
	Designated Validation States:
	MA MD

(71)	Applicant: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
	2595 DA 's-Gravenhage (NL)

(72)	Inventors:
	VAN ES, Maarten Hubertus 2595 DA 's-Gravenhage (NL) SADEGHIAN MARNANI, Hamed 2595 DA 's-Gravenhage (NL)

(74)	Representative: V.O.
	P.O. Box 87930 Carnegieplein 5 2508 DH Den Haag 2508 DH Den Haag (NL)

(54)	ATOMIC FORCE MICROSCOPY CANTILEVER, SYSTEM AND METHOD

(57) The surface of the atomic force microscopy (AFM) cantilever is defined by a main cantilever body and an island. The island is partly separated from the main body by a separating space between facing edges of the main body and the island. At least one bridge connects the island to the main body, along a line around which the island is able to rotate through torsion of the at least one bridge. The island has a probe tip located on the island at a position offset from said line and a reflection area. In an AFM a light source directs light to the reflection area and a light spot position detector detects a displacement of a light spot formed from light reflected by the reflection area, for measuring an effect of forces exerted on the probe tip.