(19)
(11) EP 3 460 081 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
15.05.2019 Bulletin 2019/20

(43) Date of publication A2:
27.03.2019 Bulletin 2019/13

(21) Application number: 18196022.0

(22) Date of filing: 21.09.2018
(51) International Patent Classification (IPC): 
C22C 9/00(2006.01)
C22F 1/08(2006.01)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
KH MA MD TN

(30) Priority: 22.09.2017 JP 2017182738

(71) Applicant: JX Nippon Mining & Metals Corporation
Tokyo 100-8164 (JP)

(72) Inventor:
  • HORIE, Hiroyasu
    Hitachi-shi, Ibaraki 317-0056 (JP)

(74) Representative: Mewburn Ellis LLP 
City Tower 40 Basinghall Street
London EC2V 5DE
London EC2V 5DE (GB)

   


(54) TITANIUM COPPER FOR ELECTRONIC COMPONENTS


(57) The present invention is intended to improve bending workability of titanium copper for electronic components, and to provide a titanium copper for electronic components, which has excellent bending workability even when subjected to beating process, and to provide a method for manufacturing the same. One embodiment of the present invention is a titanium copper, comprising 2.0 to 4.5 mass% of Ti, and at least one element selected from the group consisting of Fe, Co, Ni, Cr, Zn, Zr, P, B, Mo, V, Nb, Mn, Mg, and Si in total of 0 to 0.5 mass% as a third element(s), and the rest consisting of copper and inevitable impurities, wherein in a crystal orientation analysis by EBSD measurement on the rolled surface, when an orientation difference of 5° or more is defined as a crystal grain boundary, a coefficient of variation of crystal grain size is 45% or less, and an area ratio of Cube orientation {001} <100> is 5% or less.





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