(19)
(11) EP 3 488 030 A1

(12)

(43) Date of publication:
29.05.2019 Bulletin 2019/22

(21) Application number: 17734749.9

(22) Date of filing: 05.07.2017
(51) International Patent Classification (IPC): 
C25F 3/16(2006.01)
C25F 7/00(2006.01)
C25F 5/00(2006.01)
(86) International application number:
PCT/EP2017/066768
(87) International publication number:
WO 2018/019532 (01.02.2018 Gazette 2018/05)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
MA MD

(30) Priority: 25.07.2016 EP 16181110

(71) Applicant: Leibniz-Institut für Plasmaforschung und Technologie e.V.
17489 Greifswald (DE)

(72) Inventors:
  • POLAK, Martin
    17498 Hinrichshagen OT Hof II (DE)
  • WELTMANN, Klaus-Dieter
    18609 Ostseebad Binz (DE)
  • IHRKE, Roland
    17498 Karrendorf (DE)
  • FRÖHLICH, Maik
    17493 Greifswald (DE)
  • QUADE, Antje
    17094 Rowa (DE)

(74) Representative: Schulz Junghans Patentanwälte PartGmbB 
Großbeerenstraße 71
10963 Berlin
10963 Berlin (DE)

   


(54) METHOD FOR POLISHING CONDUCTIVE METAL SURFACES