(19)
(11) EP 3 605 226 A8

(12) CORRECTED EUROPEAN PATENT APPLICATION
published in accordance with Art. 153(4) EPC

(15) Correction information:
Corrected version no 1 (W1 A1)

(48) Corrigendum issued on:
01.04.2020 Bulletin 2020/14

(43) Date of publication:
05.02.2020 Bulletin 2020/06

(21) Application number: 18774945.2

(22) Date of filing: 23.02.2018
(51) International Patent Classification (IPC): 
G03F 7/004(2006.01)
G03F 7/039(2006.01)
G03F 7/038(2006.01)
(86) International application number:
PCT/JP2018/006632
(87) International publication number:
WO 2018/180070 (04.10.2018 Gazette 2018/40)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
MA MD TN

(30) Priority: 31.03.2017 JP 2017071291

(71) Applicant: FUJIFILM Corporation
Tokyo 106-8620 (JP)

(72) Inventors:
  • SAKITA Kyohei
    Haibara-gun Shizuoka 421-0396 (JP)
  • FUJITA Mitsuhiro
    Haibara-gun Shizuoka 421-0396 (JP)
  • TANAKA Takumi
    Haibara-gun Shizuoka 421-0396 (JP)
  • YAMAMOTO Keishi
    Haibara-gun Shizuoka 421-0396 (JP)
  • GOTO Akiyoshi
    Haibara-gun Shizuoka 421-0396 (JP)
  • KATO Keita
    Haibara-gun Shizuoka 421-0396 (JP)

(74) Representative: Hoffmann Eitle 
Patent- und Rechtsanwälte PartmbB Arabellastraße 30
81925 München
81925 München (DE)

   


(54) ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE


(57) Provided is an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent pattern line width roughness (LWR) and critical dimension uniformity (CDU). In addition, provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, for which the actinic ray-sensitive or radiation-sensitive resin composition is used. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.