(57) Provided is an actinic ray-sensitive or radiation-sensitive resin composition capable
of forming a pattern having excellent pattern line width roughness (LWR) and critical
dimension uniformity (CDU). In addition, provided are a resist film, a pattern forming
method, and a method for manufacturing an electronic device, for which the actinic
ray-sensitive or radiation-sensitive resin composition is used. The actinic ray-sensitive
or radiation-sensitive resin composition contains a resin having an acid-decomposable
group whose polarity increases through decomposition by the action of an acid, an
acid generator A capable of generating a first acid upon irradiation with actinic
rays or radiation, and an acid generator B capable of generating a second acid upon
irradiation with actinic rays or radiation, and the first acid and the second acid
satisfy predetermined requirements.
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