(19)
(11) EP 3 656 579 A8

(12) CORRECTED EUROPEAN PATENT APPLICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 A1)

(48) Corrigendum issued on:
16.02.2022 Bulletin 2022/07

(43) Date of publication:
27.05.2020 Bulletin 2020/22

(21) Application number: 20151512.9

(22) Date of filing: 09.06.2016
(51) International Patent Classification (IPC): 
B42D 25/445(2014.01)
(52) Cooperative Patent Classification (CPC):
B42D 25/445
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

(30) Priority: 10.06.2015 GB 201510073

(62) Application number of the earlier application in accordance with Art. 76 EPC:
16729622.7 / 3307553

(71) Applicant: De La Rue International Limited
Basingstoke, Hampshire RG22 4BS (GB)

(72) Inventors:
  • LISTER, Adam
    Andover, Hampshire SP10 2ND (GB)
  • HOLMES, Brian William
    Fleet, Hampshire GU51 5HZ (GB)

(74) Representative: Gill Jennings & Every LLP 
The Broadgate Tower 20 Primrose Street
London EC2A 2ES
London EC2A 2ES (GB)

 
Remarks:
13-01-2020 as a divisional application to the application mentioned under INID code 62.
 


(54) SECURITY DEVICE


(57) A method of manufacturing an image element array for a security device is disclosed. The method comprises: (a) providing a metallised substrate web comprising a substrate having a first metal layer thereon on a first surface of the substrate, the first metal layer being soluble in a first etchant substance; (b) applying a first photosensitive resist layer to the first metal layer; (c) exposing the first photosensitive resist layer to radiation of a wavelength to which the resist layer is responsive through a patterned mask, by conveying the substrate web along a transport path and, during the exposure, moving the patterned mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web, wherein the patterned mask comprises first pattern elements in which the mask is substantially opaque to the radiation and second pattern elements in which the mask is substantially transparent to the radiation, whereupon the exposed second pattern elements of the first photosensitive resist layer react resulting in increased solubility by a second etchant substance, the non-exposed first pattern elements remaining relatively insoluble by the second etchant substance; and (d) applying the first and second etchant substances to the substrate web whereupon the second pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image element array.