TECHNICAL FIELD
[0001] This invention is related to the field of automotive lighting devices, and more particularly,
to the way light patterns are managed when the light pattern projected by two lighting
devices generate an overlapping section.
STATE OF THE ART
[0003] These products can be distinguished by a higher resolution with respect to the old
lighting technologies. But these lighting elements may lead to some technical issues,
which are more visible with high definition projections and requires a controlled
solution, such as "optical butting" problem.
[0004] When different beams coming from different light modules intersect on the road, the
overlapped area is differently exposed than the rest of the zones, which do not suffer
this overlapping. This situation causes a zone with saturated illumination and the
corresponding lack of homogeneity between the different beams. This overlapping zone
usually has a triangular shape with respect to the distance of projection. This effect
is commonly known as "optical butting effect".
[0005] Further, the pitch angle of each lighting device,
[0006] Solutions are often focused on avoid glaring on pedestrians or other vehicles, but
no solution is known to face this problem.
SUMMARY OF THE INVENTION
[0007] The invention provides an alternative solution for this optical butting effect by
a method for correcting a light pattern according to claim 1 and an automotive lighting
device according to claim 9.
[0008] Preferred embodiments of the invention are defined in dependent claims.
[0009] Unless otherwise defined, all terms (including technical and scientific terms) used
herein are to be interpreted as is customary in the art. It will be further understood
that terms in common usage should also be interpreted as is customary in the relevant
art and not in an idealised or overly formal sense unless expressly so defined herein.
[0010] In this text, the term "comprises" and its derivations (such as "comprising", etc.)
should not be understood in an excluding sense, that is, these terms should not be
interpreted as excluding the possibility that what is described and defined may include
further elements, steps, etc.
[0011] In a first inventive aspect, the invention provides a method for correcting a light
pattern provided by a first lighting device and a second lighting device, wherein
the first lighting device comprises a plurality of light sources and projects a first
light pattern;
the second lighting device comprises a plurality of light sources and projects a second
light pattern; and
there is an overlapping zone between the first light pattern and the second light
pattern,
wherein the method comprises the steps of
for each lighting device, dividing the light sources in groups, each group being associated
to a projection distance,
calculating an overlapping region as a function of the projection distance;
calculating a number of affected light sources for each group as a function of a representative
dimension of the overlapping region, wherein, for each lighting device, the first
affected light source is the affected light source which is closest to the other lighting
device and the last affected light source is the affected light source which is farthest
to the other lighting device;
attenuate the intensity of the light emitted by the affected light sources in each
group of each lighting device, following a monotonic attenuation pattern from 100%
attenuation in the first affected light source to 0% in the last affected light source.
[0012] The position of the affected light sources is calculated in several steps. Firstly,
an overlapping zone is estimated. The contribution of each group of light sources
is classified depending on the projection distance that this group of light sources
performs. For example, in a lighting device, some light sources aim to project light
in 10-20 m from the lighting device, other group aims to project light in 20-30 m
and other group on 30-50 m. Secondly, the region of overlapping is divided accordingly:
a first zone from 10 to 20 m from the lighting device, another zone from 20 to 30
m from the lighting device and a final zone from 30 to 50 m from the lighting device.
For each zone (i.e., for each group of light sources), the size of the overlapping
region is used to calculate how many light sources are associated to this overlapping
region at this projection distance. Finally, the intensity of these affected light
sources is attenuated in every group of both lighting devices, but following an attenuation
pattern which varies from 0% to 100%, in such a way that there is a progression in
the attenuation. The attenuation of the luminous intensity of the affected light sources
aims to correct or even solve the problem of overlapping, and the monotonic pattern
aims to compensate the effect of the variation in the pitch angle of the lighting
devices over the combined light pattern.
[0013] According to the invention, the step of attenuation is symmetrical in both lighting
devices, in such a way that the attenuation in the first affected light source of
one lighting device is the same as the attenuation in the first affected light source
of the other lighting device, and the attenuation pattern is the same from the first
affected light source to the last affected light source in both lighting devices.
[0014] In each lighting device, the attenuation follows the same pattern. Since the lighting
devices are arranged symmetrically from the middle plane of the vehicle, the first
affected light source of one of the lighting devices is symmetrically located with
the first affected light source of the other lighting device. Since the contribution
to the overlapping zone is symmetrical in both lighting devices, a single calculation
may be made, and then the attenuation pattern may be applied symmetrically to the
affected light sources of both projectors.
[0015] In some particular embodiments of this method, the attenuation pattern of the affected
light sources within each lighting device is anti-symmetrical with respect to a central
affected light source, which is the affected light source which is at the same distance
from the first affected light source and from the last affected light source, wherein
the anti-symmetrical pattern means that a first light source which is in a symmetrical
position of a second light source has an attenuation which is 100% - a, wherein a
is the attenuation of the second light source.
[0016] Since the lighting devices have a symmetrical attenuation pattern, a way of obtaining
a 100% of luminous intensity when summing the beams of both lighting devices is setting
an anti-symmetrical attenuation pattern within each lighting device. For each lighting
device, the attenuation pattern in the light sources of this lighting device follows
an anti-symmetrical pattern with respect to a central affected light source, which
is the affected light source which is at the same distance from the first affected
light source and from the last affected light source. The anti-symmetrical attenuation
pattern of one lighting device aims that the combination with the anti-symmetrical
attenuation pattern of the other lighting device makes a total 100% luminous intensity.
[0017] In some particular embodiments of this method, the attenuation pattern is linear.
[0018] Linearity is an easy example of this anti-symmetry; the attenuation goes linearly
from 100% in the first affected light source to 0% in the last affected light source.
[0019] In some particular embodiments of this method,
the step of calculating a region of overlapping comprises calculating an angle of
overlapping in each lighting device as a function of the projection distance; and
the step of calculating a number of affected light sources comprises calculating a
number of affected light sources for each group as a function of the angle of overlapping.
[0020] Since the lighting devices usually projects a triangular beam, which causes a triangular
overlapping zone, the angle of overlapping is a useful magnitude. In each light group,
each light source corresponds to an angle range, so that when the overlapping angle
is calculated, the number of affected light sources in each group is easily obtained.
[0021] In some particular embodiments of this method, each group of light sources comprises
more than one column of light sources, in such a way that each column is associated
to an angle range, so that for a given angle, a number of columns are associated to
this angle in each group.
[0022] In some particular embodiments of this method,
each lighting device comprises a matrix arrangement of solid-state light sources,
with columns and rows;
the step of dividing the solid-state light sources in groups comprising dividing the
rows into groups of rows, so that each group of rows correspond to a range of projection
distance;
the step of attenuation comprises attenuate all the affected light sources of each
group with the same attenuation percentage.
[0023] The term "solid state" refers to light emitted by solid-state electroluminescence,
which uses semiconductors to convert electricity into light. Compared to incandescent
lighting, solid state lighting creates visible light with reduced heat generation
and less energy dissipation. The typically small mass of a solid-state electronic
lighting device provides for greater resistance to shock and vibration compared to
brittle glass tubes/bulbs and long, thin filament wires. They also eliminate filament
evaporation, potentially increasing the life span of the illumination device. Some
examples of these types of lighting comprise semiconductor light-emitting diodes (LEDs),
organic light-emitting diodes (OLED), or polymer light-emitting diodes (PLED) as sources
of illumination rather than electrical filaments, plasma or gas.
[0024] A matrix arrangement is a typical example for this method. The rows may be grouped
in projecting distance ranges and each column of each group represent an angle interval.
This angle value depends on the resolution of the matrix arrangement, which is typically
comprised between 0.01° per column and 0.5° per column. As a consequence, when the
overlapping angle is calculated, the number of affected columns is very easy to obtain.
E. g., in a matrix with a resolution of 0.1° per column, if the overlapping angle
for a particular group is 2.5°, 25 columns of this group will be affected, and then
dimmed.
[0025] In some particular embodiments, the method further comprises the step of performing
a linear interpolation in the calculation of the affected light sources for each row.
[0026] If a group comprises several rows, instead of actuating on all the light sources
of the columns, a linear interpolation between groups may be made: if one group has
10 rows and, after the calculation, has 10 columns of affected light sources, and
the adjacent one has 20 columns affected, instead of having 10 rows of 10 light sources
and then 10 rows of 20 light sources, a linear interpolation may be adopted between
the 20 rows of both groups.
[0027] In some particular embodiments, the method further comprises the step of capping
the number of affected light sources for the groups of rows which has a projection
distance which is infinite.
[0028] Due to the pitch angle of the lighting devices, there are some rows which project
to the infinite (pitch angle = 0°) or even higher (pitch angle > 0°). For those rows,
there is no need of following a linear progression, since all the rows above the row
which projects in 0° will have the same number of affected light sources.
[0029] In a second inventive aspect, the invention provides an automotive lighting device
assembly comprising a first lighting device and a second lighting device, each lighting
device comprising
a matrix arrangement of solid-state light sources, intended to provide a light pattern;
control means for accomplishing the steps of the method according to any of the preceding
claims.
[0030] This lighting device assembly solves the problem of the overlapping region between
the two lighting devices.
[0031] In some particular embodiments, the matrix arrangement comprises at least 2000 solid-state
light sources.
BRIEF LIST OF DRAWINGS AND REFERENCE NUMBERS
[0032] To complete the description and in order to provide for a better understanding of
the invention, a set of drawings is provided. Said drawings form an integral part
of the description and illustrate an embodiment of the invention, which should not
be interpreted as restricting the scope of the invention, but just as an example of
how the invention can be carried out. The drawings comprise the following figures:
Figure 1 shows a general perspective view of an automotive lighting device assembly
according to the invention.
Figure 2 shows a closer view of one of the lighting devices of a particular embodiment
of a lighting device assembly according to the invention.
Figure 3 shows a map of the overlapping zone and the relation with the projecting
distance in an automotive lighting device assembly according to the invention.
Figure 4 shows how to obtain geometric parameters for a method according to the invention.
Figure 5 shows some of the attenuation steps of a method according to the invention.
Figure 6a shows the attenuation pattern in a group of rows.
Figure 6b shows the sum of luminous intensities in a pattern like the one shown in
figure 6a.
Figure 7a to 7d show the luminous intensities in a pattern like the one shown above
when the pitch angle varies.
Figures 8a and 8b show the effect of this correction on a left light pattern and on
a right light pattern of an automotive lighting device assembly according to the invention.
[0033] Elements of the example embodiments are consistently denoted by the same reference
numerals throughout the drawings and detailed description where appropriate:
- 1
- First lighting device
- 11
- First light pattern of the first lighting device
- 2
- Second lighting device
- 12
- Second light pattern of the second lighting device
- 3
- LED
- 31
- First group of LEDs
- 32
- Second group of LEDs
- 33
- Third group of LEDs
- 34
- Fourth group of LEDs
- 35
- Fifth group of LEDs
- 4
- Overlapping zone
- 41
- First affected column
- 42
- Last affected column
- 43
- Central affected column
- 51
- Upper zone of light pattern
- 100
- Automotive vehicle
DETAILED DESCRIPTION OF THE INVENTION
[0034] The example embodiments are described in sufficient detail to enable those of ordinary
skill in the art to embody and implement the systems and processes herein described.
It is important to understand that embodiments can be provided in many alternate forms
and should not be construed as limited to the examples set forth herein.
[0035] Accordingly, while embodiment can be modified in various ways and take on various
alternative forms, specific embodiments thereof are shown in the drawings and described
in detail below as examples. There is no intent to limit to the particular forms disclosed.
[0036] Figure 1 shows a general perspective view of an automotive lighting device assembly
according to the invention.
[0037] This lighting device assembly is installed in an automotive vehicle 100 and comprises
a first lighting device 1 and a second lighting device 2.
[0038] Each lighting device 1, 2 comprises
a matrix arrangement of LEDs, intended to provide a light pattern;
control means for controlling the intensity of each LED, to perform lighting functions
and, particularly, to control the intensity in the overlapping zone between the two
lighting devices.
[0039] As may be seen in this figure, the first lighting device 1 projects a first light
pattern 11 and the second lighting device 2 projects a second light pattern 12. These
two light patterns 11, 12 create an overlapping zone 4, where the luminous intensity
of both patterns is summed. Hence, if no method was performed to solve this problem,
the intensity in this overlapping zone would be 200%, compared to the 100% in the
rest of the light patterns. This matrix configuration is a high-resolution module,
having a resolution greater than 10000 pixels. However, no restriction is attached
to the technology used for producing the projection modules.
[0040] A first example of this matrix configuration comprises a monolithic source. This
monolithic source comprises a matrix of monolithic electroluminescent elements arranged
in several columns by several rows. In a monolithic matrix, the electroluminescent
elements can be grown from a common substrate and are electrically connected to be
selectively activatable either individually or by a subset of electroluminescent elements.
The substrate may be predominantly made of a semiconductor material. The substrate
may comprise one or more other materials, for example non-semiconductors (metals and
insulators). Thus, each electroluminescent element/group can form a light pixel and
can therefore emit light when its/their material is supplied with electricity. The
configuration of such a monolithic matrix allows the arrangement of selectively activatable
pixels very close to each other, compared to conventional light-emitting diodes intended
to be soldered to printed circuit boards. The monolithic matrix may comprise electroluminescent
elements whose main dimension of height, measured perpendicularly to the common substrate,
is substantially equal to one micrometre.
[0041] The monolithic matrix is coupled to the control centre so as to control the generation
and/or the projection of a pixilated light beam by the matrix arrangement. The control
centre is thus able to individually control the light emission of each pixel of the
matrix arrangement.
[0042] Alternatively to what has been presented above, the matrix arrangement may comprise
a main light source coupled to a matrix of mirrors. Thus, the pixelated light source
is formed by the assembly of at least one main light source formed of at least one
light emitting diode emitting light and an array of optoelectronic elements, for example
a matrix of micro-mirrors, also known by the acronym DMD, for "Digital Micro-mirror
Device", which directs the light rays from the main light source by reflection to
a projection optical element. Where appropriate, an auxiliary optical element can
collect the rays of at least one light source to focus and direct them to the surface
of the micro-mirror array.
[0043] Each micro-mirror can pivot between two fixed positions, a first position in which
the light rays are reflected towards the projection optical element, and a second
position in which the light rays are reflected in a different direction from the projection
optical element. The two fixed positions are oriented in the same manner for all the
micro-mirrors and form, with respect to a reference plane supporting the matrix of
micro-mirrors, a characteristic angle of the matrix of micro-mirrors defined in its
specifications. Such an angle is generally less than 20° and may be usually about
12°. Thus, each micro-mirror reflecting a part of the light beams which are incident
on the matrix of micro-mirrors forms an elementary emitter of the pixelated light
source. The actuation and control of the change of position of the mirrors for selectively
activating this elementary emitter to emit or not an elementary light beam is controlled
by the control centre.
[0044] In different embodiments, the matrix arrangement may comprise a scanning laser system
wherein a laser light source emits a laser beam towards a scanning element which is
configured to explore the surface of a wavelength converter with the laser beam. An
image of this surface is captured by the projection optical element.
[0045] The exploration of the scanning element may be performed at a speed sufficiently
high so that the human eye does not perceive any displacement in the projected image.
[0046] The synchronized control of the ignition of the laser source and the scanning movement
of the beam makes it possible to generate a matrix of elementary emitters that can
be activated selectively at the surface of the wavelength converter element. The scanning
means may be a mobile micro-mirror for scanning the surface of the wavelength converter
element by reflection of the laser beam. The micro-mirrors mentioned as scanning means
are for example MEMS type, for "Micro-Electro-Mechanical Systems". However, the invention
is not limited to such a scanning means and can use other kinds of scanning means,
such as a series of mirrors arranged on a rotating element, the rotation of the element
causing a scanning of the transmission surface by the laser beam.
[0047] In another variant, the light source may be complex and include both at least one
segment of light elements, such as light emitting diodes, and a surface portion of
a monolithic light source.
[0048] Figure 2 shows a closer view of one of the lighting devices of a particular embodiment
of a lighting device assembly according to the invention.
[0049] As mentioned above, each lighting device (in this figure only first lighting device
1 is represented) comprises a matrix arrangement of LEDs 3, with columns and rows.
Each column projects a light beam in a determined angle, and each row projects a light
beam in a predetermined projecting distance. As a consequence, each row may be associated
to a projecting distance and each column may be associated to an angle range. The
difference between rows and between columns depends on the resolution of the matrix
arrangement.
[0050] The pitch angle of the lighting device will cause that, from a determined row and
above, the projecting distance is infinite, because the beam will be projected parallel
to the road or even with a positive angle.
[0051] Figure 3 shows a map of the overlapping zone and the relation with the projecting
distance. For each projecting distance, which are labelled as Dp0, Dp1, Dp2, etc,
the overlapping zone varies, and the angle of the light pattern which is affected
by the overlapping zone varies as well.
[0052] For example, for Dp0, there is no overlapping zone, so the rows of LEDs which project
light at this distance or at a lower distance will not be affected by the correction
defined by the method of the invention. For Dp1, there is an overlapping zone with
an overlapping angle α1, and for Dp2, there is an overlapping zone with an overlapping
angle α2. Of course, only three projecting distances have been analysed in this figure,
but the method of the invention may analyse any number of different projecting distances,
depending on the accuracy that is required.
[0053] This angle α may be obtained as a function of some geometric parameters, as will
be shown in figure 4. Once this angle α is calculated as a function of the projecting
distance Dp, the method of the invention comprises dimming the luminous intensity
of some affected light sources in each row to mitigate or even solve the problem of
the overlapping zone. As each row defines a projection distance and, for each row,
each column defines an angle range, it is straightforward to assign the affected light
sources in each row. Figures 5 to 8 will develop more detailed examples of choosing
these affected light sources.
[0054] Figure 4 shows how to obtain the angle α as a function of the projecting distance
Dp and other geometric parameters.
[0055] As may be seen in this figure, the two lighting devices are separated at a distance
D1, and both of them project a symmetric light pattern which has an inner angle α
0. For a projecting distance Dp1, there is an overlapping zone 4 which defines a side
b in a triangle a-b-c, where a is the distance between one of the lighting devices
and the point where the overlapping zone 4 starts and c is the distance between the
same lighting device and the most outer point where the overlapping zone 4 finishes.
[0057] And the angle α, using the Al-Kashi theorem, may be expressed as a function of these
three sides:

[0058] Once this angle is calculated as a function of the projecting distance, figures 5,
6 and 7 will show particular examples of choosing the affected light sources in each
row.
[0059] Figure 5 shows some of the attenuation steps of a method according to the invention,
in particular the determination of the number of affected columns in each group of
rows.
[0060] In this figure, the rows have been grouped into row groups, so that each row group
is associated to a range of projecting distance. For the sake of convenience, in this
example, five groups are defined: a first group of rows 31 from 0 to 20 m of projecting
distance, a second group of rows 32 from 20 to 40 m of projecting distance, a third
group or rows 33 from 40 m to 60 m of projecting distance, a fourth group of rows
34 from 60 m to infinite and a fifth group of rows 35 which projects in a positive
angle with respect of the plane of the road.
[0061] In this example, when calculating α as a function of the projecting distance, 1°
corresponds to 20 m of projecting distance, 2° corresponds to 40 m of projecting distance
and 3° corresponds to 60 m of projecting distance. The resolution of the matrix is
0.2° per column.
[0062] Hence, in the first group, the range includes the projecting distance for 1°, so
5 columns (each column corresponds to 0.2°, so to reach 1°, 5 columns are necessary)
will be affected. In the second group, which includes the projection distance for
2°, 10 columns will be affected, and in the third group, which includes the projection
distance for 3°, 15 columns will be affected. In the fourth and fifth groups, 15 columns
will be affected as well, since 4° is a value which is not reached with this configuration.
[0063] Once the number of affected columns is chosen in each group of rows, light intensity
is attenuated according to the pattern which is shown in figure 6a.
[0064] This figure 6a shows the attenuation pattern in a group of rows. In each group of
rows, all the light sources of the same column have the same luminous intensity, so
the parameters of the attenuation is the luminous intensity against the position of
the column.
[0065] The ordinate shows the luminous intensity and the abscissa shows the position of
the light column. In each group of rows, the first affected column 41 is the affected
column which is closest to the other lighting device and the last affected column
42 is the affected column which is farthest to the other lighting device.
[0066] In all these figures, the luminous intensity of the first lighting device is shown
in a dotted line, the luminous intensity of the second lighting device is shown in
a continuous line and the sum is shown in a dashed line.
[0067] The attenuation pattern is linear from 100% attenuation (0% luminous intensity) in
the first affected column 41 to 0% attenuation (100% luminous intensity) in the last
affected column 42. Further, attenuation is symmetrical in both lighting devices 1,
2, in such a way that the attenuation in the first affected column 41 of one group
of rows in the first lighting device 1 is the same as the attenuation in the first
affected column of the same group of rows of the second lighting device 2, and the
linear attenuation pattern is the same from the first affected column to the last
affected column in the same group of rows of both lighting devices. The result is
a symmetric attenuation pattern, as shown in figure 5.
[0068] Since the linear pattern is anti-symmetrical with respect to a central affected column
43, which is the affected column which is at the same distance from the first affected
column and from the last affected column, the sum of the luminous intensities of both
lighting devices in the overlapping zone is 100%.
[0069] Figure 6b shows the combined light pattern and the sum of the lighting intensities
in the overlapping zone. The dotted line shows the sum of both intensities, and is
100% during all the light range, especially in the overlapping zone 4.
[0070] Further, due to this linear attenuation pattern, the sum of these luminous intensities
is less sensitive to a variation in the pitch angle of the lighting devices. Figures
7a to 7d show the effect of a variation in the pitch angle in the sum of luminous
intensities in the overlapping zone.
[0071] Figure 7a shows the variation in the attenuation pattern when the pitch angle is
+0.5°. In this case, the effective lighting pattern varies, since the projecting distance
of each row changes. However, with an attenuation pattern as the one shown in figure
6a, this variation due to the pitch angle is not dramatical. Figure 7b shows the effect
of this variation in the pitch angle if the attenuation pattern was a constant. When
the angle varies, there are regions where the luminous intensity falls abruptly from
100% to 50%. In the case of figure 7a, the variation in the pitch angle just causes
a light decrease in the luminous intensity, but this decrease is not abrupt and merely
means a 10% decrease in the luminous intensity of the overlapping zone.
[0072] Figures 7c and 7d shows the same example in the event of a negative variation in
the pitch angle.
[0073] Figures 8a and 8b show the effect of this correction on a left light pattern and
on a right light pattern of an automotive lighting device assembly according to the
invention.
[0074] In these figures, a linear interpolation is carried out row by row, starting from
the results of the method illustrated in figure 5.
[0075] As may be seen in these figures, there is an upper zone 51 which reflects an attenuation
for those rows which project light over the horizon, in a positive angle with respect
to the road surface.
[0076] Further, each row has a different number of affected light sources, and in each row,
a linear attenuation pattern from 100% attenuation (0% luminous intensity) in the
first affected light source of each row to 0% attenuation (100% luminous intensity)
in the last affected light source of each row has been performed. As may be seen,
attenuation is symmetrical in both lighting devices 1, 2. The result is a symmetric
attenuation pattern.
1. Method for correcting a light pattern provided by a first lighting device (1) and
a second lighting device (2); wherein
the first lighting device (1) comprises a plurality of light sources (3) and projects
a first light pattern (11);
the second lighting device (2) comprises a plurality of light sources (3) and projects
a second light pattern (12), wherein each of lighting devices (1, 2) comprises a matrix
arrangement of solid-state light sources (3), with columns and rows;
there is an overlapping zone (4) between the first light pattern (11) and the second
light pattern (12),
characterized in that
the method comprises the steps of
for each lighting device (1, 2), dividing the light sources in groups, each group
being associated to a projection distance;
calculating an overlapping region as a function of the projection distance (Dp);
calculating a number of affected light sources for each group as a function of a representative
dimension of the overlapping region, wherein, for each lighting device, the first
affected light source is the affected light source which is closest to the other lighting
device and the last affected light source is the affected light source which is farthest
to the other lighting device;
attenuate the intensity of the light emitted by the affected light sources in each
group of each lighting device, following a monotonic attenuation pattern from 100%
attenuation in the first affected light source to 0% in the last affected light source;
and
wherein the step of attenuation is symmetrical in both lighting devices (1, 2), in
such a way that the attenuation in the first affected light source of one lighting
device is the same as the attenuation in the first affected light source of the other
lighting device, and the attenuation pattern is the same from the first affected light
source to the last affected light source in both lighting devices.
2. Method according to claim 1, wherein the attenuation pattern of the affected light
sources within each lighting device is anti-symmetrical with respect to a central
affected light source, which is the affected light source which is at the same distance
from the first affected light source and from the last affected light source, wherein
the anti-symmetrical pattern means that a first light source which is in a symmetrical
position of a second light source has an attenuation which is 100% - a, wherein a
is the attenuation of the second light source.
3. Method according to claim 2, wherein the attenuation pattern is linear.
4. Method according to any of the preceding claims, wherein
the step of calculating a region of overlapping comprises calculating an angle of
overlapping (α) in each lighting device as a function of the projection distance (Dp);
andthe step of calculating a number of affected light sources comprises calculating
a number of affected light sources for each group as a function of the angle of overlapping
(α).
5. Method according to claim 4, wherein each group of light sources comprises more than
one column of light sources, in such a way that each column is associated to an angle
range, so that for a given angle, a number of columns are associated to this angle
in each group.
6. Method according to claim 4 or 5, wherein
each lighting device comprises a matrix arrangement of solid-state light sources (3),
with columns and rows;
the step of dividing the solid-state light sources (3) in groups comprising dividing
the rows into groups of rows, so that each group of rows correspond to a range of
projection distance (Dp);
the step of attenuation comprises attenuate all the affected light sources of each
group with the same attenuation percentage.
7. Method according to claim 6, further comprising the step of performing a linear interpolation
in the calculation of the affected light sources for each row.
8. Method according to claim 7, further comprising the step of capping the number of
affected light sources for the groups of rows which has a projection distance which
is infinite.
9. Automotive lighting device assembly comprising a first lighting device and a second
lighting device, each lighting device comprising
a matrix arrangement of solid-state light sources (3), intended to provide a light
pattern (11, 12);
control means for accomplishing the steps of the method according to any of the preceding
claims.
10. Automotive lighting device assembly according to claim 9, wherein the matrix arrangement
comprises at least 2000 solid-state light sources (3).
1. Verfahren zur Korrektur eines Lichtmusters, das durch eine erste Beleuchtungsvorrichtung
(1) und eine zweite Beleuchtungsvorrichtung (2) bereitgestellt wird; wobei
die erste Beleuchtungsvorrichtung (1) eine Vielzahl von Lichtquellen (3) umfasst und
ein erstes Lichtmuster (11) projiziert;
die zweite Beleuchtungsvorrichtung (2) eine Vielzahl von Lichtquellen (3) umfasst
und ein zweites Lichtmuster (12) projiziert, wobei jede der Beleuchtungsvorrichtungen
(1, 2) eine Matrixanordnung aus Festkörperlichtquellen (3) mit Spalten und Zeilen
umfasst;
eine Überlappungszone (4) zwischen dem ersten Lichtmuster (11) und dem zweiten Lichtmuster
(12) vorhanden ist,
dadurch gekennzeichnet, dass das Verfahren den Schritt umfasst:
Unterteilen der Lichtquellen in Gruppen für jede Beleuchtungsvorrichtung (1, 2), wobei
jede Gruppe mit einem Projektionsabstand assoziiert ist;
Berechnen einer Überlappungsregion als Funktion des Projektionsabstands (Dp);
Berechnen einer Anzahl betroffener Lichtquellen für jede Gruppe als Funktion einer
repräsentativen Dimension der Überlappungsregion, wobei für jede Beleuchtungsvorrichtung
die erste betroffene Lichtquelle die betroffene Lichtquelle ist, die sich der anderen
Beleuchtungsvorrichtung am nächsten befindet, und die letzte betroffene Lichtquelle
die betroffene Lichtquelle ist, die von der anderen Lichtquelle am weitesten entfernt
ist;
Abschwächen der Intensität des Lichts, das durch die betroffenen Lichtquellen in jeder
Gruppe von jeder Beleuchtungsvorrichtung emittiert wird, gemäß einem monotonen Abschwächungsmuster
von 100 % Abschwächung in der ersten betroffenen Lichtquelle auf 0 % in der letzten
betroffenen Lichtquelle; und
wobei der Abschwächungsschritt in beiden Beleuchtungsvorrichtungen (1, 2) in einer
solchen Weise symmetrisch ist, dass die Abschwächung in der ersten betroffenen Lichtquelle
von einer Beleuchtungsvorrichtung die gleiche wie die Abschwächung in der ersten betroffenen
Lichtquelle der anderen Beleuchtungsvorrichtung ist, und das Abschwächungsmuster von
der ersten betroffenen Lichtquelle zu der letzten betroffenen Lichtquelle in beiden
Beleuchtungsvorrichtungen das gleiche ist.
2. Verfahren nach Anspruch 1, wobei das Abschwächungsmuster der betroffenen Lichtquellen
innerhalb jeder Beleuchtungsvorrichtung in Bezug auf eine zentrale betroffene Lichtquelle
antisymmetrisch ist, wobei die zentrale betroffene Lichtquelle die betroffene Lichtquelle
ist, die in dem gleichen Abstand von der ersten betroffenen Lichtquelle und der letzten
betroffenen Lichtquelle ist, wobei das antisymmetrische Muster bedeutet, dass eine
erste Lichtquelle, die in einer symmetrischen Position einer zweiten Lichtquelle ist,
eine Abschwächung hat, die 100 % - a beträgt, wobei a die Abschwächung der zweiten
Lichtquelle ist.
3. Verfahren nach Anspruch 2, wobei das Abschwächungsmuster linear ist.
4. Verfahren nach einem der vorhergehenden Ansprüche, wobei
der Schritt des Berechnens einer Überlappungsregion Berechnen eines Überlappungswinkels
(α) in jeder Beleuchtungsvorrichtung als Funktion des Projektionsabstands (Dp) umfasst;
und der Schritt des Berechnens einer Anzahl betroffener Lichtquellen Berechnen einer
Anzahl von betroffenen Lichtquellen für jede Gruppe als Funktion des Überlappungswinkels
(α) umfasst.
5. Verfahren nach Anspruch 4, wobei jede Gruppe von Lichtquellen mehr als eine Spalte
von Lichtquellen in einer solchen Weise umfasst, dass jede Spalte mit einem Winkelbereich
assoziiert wird, so dass für einen gegebenen Winkel eine Anzahl von Spalten mit diesem
Winkel in jeder Gruppe assoziiert wird.
6. Verfahren nach Anspruch 4 oder 5, wobei:
jede Beleuchtungsvorrichtung eine Matrixanordnung von Festkörperlichtquellen (3) mit
Spalten und Zeilen umfasst;
der Schritt des Unterteilens der Festkörperlichtquellen (3) in Gruppen Unterteilen
der Zeilen in Gruppen von Zeilen umfasst, so dass jede Gruppe von Zeilen einem Bereich
des Projektionsabstands (Dp) entspricht;
der Abschwächungsschritt Abschwächen aller betroffenen Lichtquellen von jeder Gruppe
mit demselben Abschwächungsprozentsatz umfasst.
7. Verfahren nach Anspruch 6, des Weiteren umfassend den Schritt des Durchführens einer
linearen Interpolation in der Berechnung der betroffenen Lichtquellen für jede Zeile.
8. Verfahren nach Anspruch 7, des Weiteren umfassend den Schritt des Kappens der Anzahl
betroffener Lichtquellen, um die Gruppen von Zeilen auszuschließen, die einen Projektionsabstand
haben, der unendlich ist.
9. Kraftfahrzeugbeleuchtungsvorrichtungsanordnung, umfassend eine erste Beleuchtungsvorrichtung
und eine zweite Beleuchtungsvorrichtung, wobei jede Beleuchtungsvorrichtung umfasst:
eine Matrixanordnung von Festkörperlichtquellen (3), die vorgesehen ist, um ein Lichtmuster
(11, 12) bereitzustellen;
Steuermittel zum Bewirken der Schritte des Verfahrens nach einem der vorhergehenden
Ansprüche.
10. Kraftfahrzeugbeleuchtungsvorrichtungsanordnung nach Anspruch 9, wobei die Matrixanordnung
mindestens 2000 Festkörperlichtquellen (3) umfasst.
1. Procédé de correction d'un motif lumineux fourni par un premier dispositif lumineux
(1) et un second dispositif lumineux (2) ; dans lequel :
le premier dispositif lumineux (1) comprend une pluralité de sources de lumière (3)
et projette un premier motif lumineux (11) ;
le second dispositif lumineux (2) comprend une pluralité de sources de lumière (3)
et projette un second motif lumineux (12), dans lequel chacun des dispositifs lumineux
(1, 2) comprend un agencement matriciel de sources de lumière à semi-conducteurs (3),
avec des colonnes et des rangées ;
il y a une zone de recouvrement (4) entre le premier motif lumineux (11) et le second
motif lumineux (12),
caractérisé en ce que le procédé comprend les étapes suivantes :
pour chaque dispositif lumineux (1, 2), répartir les sources de lumière en groupes,
chaque groupe étant associé à une distance de projection ;
calculer une zone de recouvrement en fonction de la distance de projection (Dp) ;
calculer un nombre de sources de lumière affectées pour chaque groupe en tant qu'une
fonction d'une dimension représentative de la zone de recouvrement, dans lequel, pour
chaque dispositif lumineux, la première source de lumière affectée est la source de
lumière affectée qui est la plus proche de l'autre dispositif lumineux et la dernière
source de lumière affectée est la source de lumière affectée qui est la plus éloignée
de l'autre dispositif lumineux ;
atténuer l'intensité de la lumière émise par les sources de lumière concernées dans
chaque groupe de chaque dispositif lumineux, en suivant un modèle d'atténuation monotone
allant d'une atténuation de 100 % dans la première source de lumière concernée à 0
% dans la dernière source de lumière concernée ;
et dans lequel l'étape pour atténuer est symétrique dans les deux dispositifs lumineux
(1, 2), de telle sorte que l'atténuation dans la première source de lumière affectée
d'un dispositif lumineux est la même que l'atténuation dans la première source de
lumière affectée de l'autre dispositif lumineux, et le motif d'atténuation est le
même de la première source de lumière affectée à la dernière source de lumière affectée
dans les deux dispositifs lumineux.
2. Procédé selon la revendication 1, dans lequel le motif d'atténuation des sources de
lumière affectées dans chaque dispositif lumineux est antisymétrique par rapport à
une source de lumière affectée centrale, qui est la source de lumière affectée qui
est à la même distance de la première source de lumière affectée et de la dernière
source lumineuse de lumière, dans lequel le motif antisymétrique signifie qu'une première
source de lumière qui est dans une position symétrique d'une seconde source de lumière
a une atténuation qui est de 100 %- a, où a est l'atténuation de la seconde source
de lumière.
3. Procédé selon la revendication 2, dans lequel le motif d'atténuation est linéaire.
4. Procédé selon l'une quelconque des revendications précédentes, dans lequel
l'étape pour calculer une zone de recouvrement comprend le calcul d'un angle de recouvrement
(α) dans chaque dispositif lumineux en fonction de la distance de projection (Dp)
; et l'étape pour calculer un nombre de sources de lumière affectées comprend le calcul
d'un nombre de sources de lumière affectées pour chaque groupe en fonction de l'angle
de recouvrement (α).
5. Procédé selon la revendication 4, dans lequel chaque groupe de sources de lumière
comprend plus d'une colonne de sources de lumière, de telle sorte que chaque colonne
est associée à une plage angulaire, de sorte que pour un angle donné, un certain nombre
de colonnes sont associées à cet angle dans chaque groupe.
6. Procédé selon la revendication 4 ou 5, dans lequel
chaque dispositif lumineux comprend un arrangement matriciel de sources de lumière
à semi-conducteurs (3), avec des colonnes et des rangées ;
l'étape consistant à diviser les sources de lumière à l'état solide (3) en groupes
comprenant la division des rangées en groupes de rangées, de sorte que chaque groupe
de rangées correspond à une plage de distance de projection (Dp) ;
l'étape pour atténuer comprend l'atténuation de toutes les sources de lumière affectées
de chaque groupe avec le même pourcentage d'atténuation.
7. Procédé selon la revendication 6, comprenant en outre l'étape consistant à effectuer
une interpolation linéaire dans le calcul des sources de lumière affectées pour chaque
rangée.
8. Procédé selon la revendication 7, comprenant en outre l'étape consistant à écrêter
le nombre de sources de lumière concernées afin d'exclure les groupes de lignes ayant
une distance de projection qui est infinie.
9. Dispositif d'éclairage automobile comprenant un premier dispositif lumineux et un
deuxième dispositif lumineux, chaque dispositif lumineux comprenant :
un réseau matriciel de sources de lumière à l'état solide (3), qui est prévu pour
réaluser un motif lumineux (11, 12) ;
des moyens de commande pour effectuer les étapes du procédé selon l'une des revendications
précédentes.
10. Dispositif d'éclairage de véhicule automobile selon la revendication 9, dans lequel
le réseau matriciel comprend au moins 2000 sources de lumière à l'état solide (3).