Field of the invention
[0001] The invention relates to an anode for use in method for electrolytically depositing
a metal layer onto a metal substrate and to a process for electrolytically depositing
a metal layer onto a metal substrate using said anode.
Background of the invention
[0002] Electrolytically depositing a metal layer onto a substrate, or electroplating, is
a process that uses an electric current to reduce dissolved metal cations in an electrolyte
so that they form a thin coherent metal coating on an electrically conductive substrate.
[0004] In case of tinplating in an electroplating line the electrolyte is replenished with
tin cations by anodically dissolving tin into the electrolyte. As known, see also
Fig. 36-5 of said handbook, in the said known process the tin is dissolved into the
electrolyte from anode bars hanging in the electrolyte from an anode bar (see Figure
1). The anode bars must be replaced regularly, and the anode bar positions have to
be adjusted regularly along the anode bridge to ensure that the distance between the
anode bar surface and the steel strip to be plated remains constant (See Figure 2).
This continuous handling of the anode bars is labour intensive because of the weight
of the anode bars of typically 50 kg, potentially hazardous in view of fumes, strong
acids and high electrical currents and deteriorates the uniform tin coating thickness
over the strip width. Since optimal placement of the anodes is important for stable
and uniform plating, the anode positions must be adjusted regularly.
[0005] When the anode bars are spent to an agreed minimum thickness, they are removed from
the plating section and recycled in a remelting process for new cast anodes.
[0006] To dispense with the continuous replacing of the anode bars, so-called dimensionally
stable soluble anodes were developed.
EP1699949 discloses such a DSSA. The anode bars and the anode bridge onto which the anode bars
are mounted were replaced by a DSSA, e.g. in the form of a titanium basket filled
with tin pellets (See Figure 3). The baskets are resistant to the plating conditions,
and the pellets dissolve anodically into the electrolyte through openings (holes,
gauze, etc.) in the basket where the pellets contact the electrolyte.
[0007] The high electrical resistance of the steel strip is enough to cause an appreciable
voltage (IR) drop in the steel strip. Because the current is fed from the top (via
the conductor roll 7 in Figure 3), the current density will be higher at the top of
the pass than at the bottom. This can be largely overcome by tilting the anode so
that it is closer to the strip at the bottom than at the top. This is also schematically
depicted in Figure 3. By doing so, the current density is more uniform along the strip
between the tilted anodes compared to using anodes that are not tilted.
[0008] Anode baskets can also be used in electroplating processes for depositing zinc, chromium,
iron, copper, cobalt and nickel plating, as well as for depositing alloys thereof,
such as brass.
Objectives of the invention
[0009] It is an object of the invention to provide an anode for a process for depositing
a metal layer onto a metal substrate in a continuous high-speed metal strip electroplating
line that can provide a uniform current density distribution on the metal substrate
to be plated during plating.
[0010] It is also an object of the invention to provide a process for depositing a metal
layer onto a metal substrate in a continuous electroplating line that has a uniform
current density distribution along the strip when travelling between the anodes.
[0011] It is also an object of the invention to provide a process for depositing a metal
layer onto a metal substrate in a continuous electroplating that has a uniform current
density distribution along the substrate when travelling between the anodes which
is less sensitive or even insensitive for the distance between the strip and the anodes.
Description of the invention
[0012] One or more of the objects is reached with a dimensionally stable anode or dimensionally
stable soluble anode for use in a continuous plating line for depositing a metal layer
onto a metal substrate wherein, in use, the distance between the anode and the cathode
(x) is given by:

And

wherein
x = distance between anode and metal substrate (=cathode) [m]
xA = distance of cathode to ideal anode [m]
xL = distance of cathode to tilted anode [m]
x0 = offset at y=0 [m]
y = vertical position on cathode [m]
ρs = resistivity of strip [Ω m]
ρe = resistivity of electrolyte [Ω m]
d = thickness (gauge) of strip [m]
c = constant [-]
wherein c = between 0 and 0.75.
[0013] It is noted that the metal substrate to be plated acts as the cathode in a continuous
plating line, and is provided in the form of a metal strip.
[0014] It is also noted that the invention is described for the situation where the strip
(cathode) moves between the anode(s) in a substantially vertical direction. This is
the most used configuration in continuous plating lines. However, the invention is
also applicable for plating lines where the strip (cathode) moves between the anode(s)
in a different reaction, e.g. horizontally. The situation is schematically depicted
in Figure 4 for a vertical (i.e. the most used) configuration.
[0015] The inventors found that for an anode to have a uniform current density along the
anode, the distance of the anode surface facing the cathode to the cathode is given
by (eq. 2):

[0016] The inventors found that this is the case in any electrodeposition process. By means
of non-limiting examples reference is made to the deposition of tin in a tinplating
line, nickel in a nickel-plating line or chromium in a chromium plating line, nickel-cobalt
or brass in an alloy plating line.
[0017] Eq. 2 describes the ideal shape of the anode surface, and it is a parabolic shape.
It is noted that the anode surface facing the cathode according to the invention is
parallel to the cathode for values of y=0. However, any anode that has a shape which
can be described by this equation for values of y from 0 to h benefits from the advantage
of uniform current density and insensitivity for the distance between the anode and
the cathode. For example, an anode surface facing the cathode with a distance to the
cathode as prescribed by eq. 2 having a length of ½h and running from y=0.25h to y=0.75h
will also provide the benefits of the invention, albeit that the anode is shorter,
and therefore less metal will be deposited as compared to a full length anode running
from y=0 to y=h, wherein h is the maximum height of the anode. The maximum height
of the anode depends on the specific installation, and is different for each installation,
but the principle as described herein above is the same.
[0018] To maintain the shape of the anode it is important that the anode is a dimensionally
stable anode (DSA): an anode that preserves its shape and voltage characteristics
even under the most severe conditions prevailing in electrolysis. An anode that dissolves
during plating has the ideal shape only at the beginning of its lifetime and is thus
not ideal.
[0019] A DSA may be provided in one of two different types:
- a. A dimensionally stable anode (DSA): an anode with an anode surface that, in use,
faces the cathode, has the desired shape, which is dimensionally stable and does not
dissolve under the operating conditions, wherein the concentration of the metal cations
is kept constant by replenishing the metal cations in the electrolyte by known means,
or by using
- b. A dimensionally stable soluble anode (DSSA): an anode basket with a surface that,
in use, faces the cathode, has the desired shape containing metal pellets. The basket
does not dissolve and is dimensionally stable, and its contents (suitable metal pellets)
anodically dissolve into the electrolyte.
[0020] A suitable material for a DSSA that does not dissolve under most operating conditions
is titanium. Other known DSSA basket materials that may be suitable depending on the
plating conditions and the electrolyte are zirconium, niobium, stainless steel, carbon
steel and monel. A suitable material for a DSA that does not dissolve under most operating
conditions is titanium provided with a catalytic coating such as platinum or a mixed
metal oxide for promoting the oxygen evolution reaction.
[0021] DSSA are like DSA in the sense that these also preserve their shape and voltage characteristics
even under the most severe conditions prevailing in electrolysis, but additionally
serve as receptacles for metal pellets which dissolve into the electrolyte and enter
the solution as metal cations available to be deposited onto the metal strip.
[0022] Pellets in the sense of the invention intend to encompass metal pellets, chunks,
lumps, particles, balls, and the like, which can be deposited into the DSSA, e.g.
by means of an automated feeder system or otherwise.
[0023] In the following DS(S)A will be used to refer to both DSA and DSSA.
[0024] By shaping the surface of the DS(S)A facing the cathode such that the distance between
the anode surface and the strip (cathode) is given by eq. 1 for c=0 the system becomes
insensitive for the exact placement of the anode. In the ideal case the offset value
xo is as small as possible. The minimum value is limited because too small an offset
value could result in the cathode touching the anode which would lead to short circuiting
and damage to strip and installation. When the strip moves between the anodes there
is always a risk of some sideways movement due to flutter of the moving strip or deviations
in strip shape.
[0025] If the offset is smaller, then the voltage between anode and cathode is also smaller.
For any larger value of the offset xo the current density is also homogeneous at the
cathode if the anode has the ideal shape according to the invention. Whether the anode
is placed close to the strip or further away, the current density at the strip is
the homogeneous along its length when it is between the anodes. Consequently, the
ideal shape of the anode face facing the strip is given by eq. 2 because it ensures
a constant current density along its length, and the system is insensitive for the
distance between the strip and the anode.
[0026] Of course, the resistance of the system increases or decreases depending on the placement
of the anode because the distance between the anode and the strip changes. Consequently,
the voltage between the anode and the cathode will increase or decrease accordingly.
[0027] As a reference point the distance between the cathode and the tilted straight anode
is defined as x
L(y). The distance between the cathode and the surface facing the cathode of the ideal
DS(S)A is defined as x
A(y) (see Figure 4).
[0028] The inventors found that deviations from the ideal shape of the DS(S)A still result
in an improvement compared to the tilted straight DS(S)A. Although the optimum result
is obtained for c=0, the benefits of the invention are still obtained for values of
c larger than 0. The smaller the value of c, the more the current density approaches
the ideal situation of complete uniformity between the anode and the cathode. Consequently,
the invention is embodied in a DS(S)A that is provided with a surface that, in use,
faces the cathode (i.e. the strip to be plated) wherein the surface of the anode facing
the cathode is curved such that, in use, the distance between the anode and the cathode,
x, is between x
0 + x
A(y) ± c·(x
L(y)-x
A(y)), where c is between 0 and 0.75, wherein x
L(y)-x
A(y) is 0 at y=0 and at y=h, wherein h is the height of the anode.
[0029] Using a DS(S)A with this shape of the surface facing the cathode results in a significantly
improved homogeneity of the current density at the cathode.
[0030] The homogeneity of the current density at the cathode is ideal by providing the DS(S)A
with a surface that, in use, faces the cathode (i.e. the strip to be plated) wherein
the surface is curved such that, in use, the distance between the anode and the cathode,
x, is given by x
A(y). Using such a DS(S)A provides the best homogeneity of the current density at the
anode, and the homogeneity is also not dependent on the distance between the anode
and the cathode. For cases where c≠0 the homogeneity depends on the distance between
the anode and the cathode and some optimisation is needed to determine the optimal
distance, whereas for the case where c=0 this is not needed from a homogeneity point
of view. The distance does affect the voltage needed to execute the plating process,
but not the homogeneity at the cathode.
[0031] The homogeneity of the current density at the cathode can be further improved by
providing the DS(S)A with a surface that, in use, faces the cathode (i.e. the strip
to be plated) wherein the surface is curved such that, in use, the distance between
the anode and the cathode, x, is in the range of x
A(y)±c·(x
L(y)-x
A(y)), where c is between 0 and 0.50 or still further if c is between 0 and 0.25 ,
wherein x
L(y)-x
A(y) is 0 at y=0, and at y=h, wherein h is the height of the anode.
[0032] The homogeneity of the current density at the cathode can be even further improved
by providing the DS(S)A with a surface that, in use, faces the cathode (i.e. the metal
strip to be plated) wherein the surface is curved such that, in use, the distance
between the anode and the cathode, x, is in the range of x
A(y)±c·(x
L(y)-x
A(y)), where c is between 0 and 0.10, or even between 0 and 0.05, wherein x
L(y)-x
A(y) is 0 at y=0, and at y=h, wherein h is the height of the anode.
[0033] Although an anode with a value of c=0 is ideal, the producibility and maintenance
of these large anodes, and potentially some distortion of the anode ideal shape during
use, allow for some deviation from the ideal shape, and therefore a value of c=0.15,
0.10 or even 0.05 is achievable consistently in practice.
[0034] The invention is also embodied in an electrolytic plating line comprising one or
more DS(S)A's. The principle of the DS(S)A according to the invention is such that
straight tilted anodes (DS(S)A or conventional replaceable anodes) can be easily replaced
by the DS(S)A's according to the invention. The dimensions are comparable to the conventional
tilted anodes. However, the use of the anodes according to the invention will result
in the line providing a more homogeneous current density during the plating.
[0035] In an embodiment the anode or anodes according to the invention are used in a continuous
plating line operating at a line speed of at least 10 m/min. The benefit of these
anodes is also useful in continuous high speed plating line operating at much higher
line speeds of between 50 and 750 m/min. Preferably the line speed is at least 75
m/min, more preferably at least 100 m/min, even more preferably at least 150 m/min.
Experiments
[0036] To calculate the primary current distribution two differential equations have to
be solved numerically: Ohm's law (i = -κ∇φ) and Laplace's equation (∇
2φ = 0), where 'φ' is the local potential [V], 'i' is the current density [A m
-2] and 'κ' is the electrolyte conductivity [Ω
-1 m
-1] (∇ is the well-known del or nabla vector differential operator).
[0037] Both differential equations have been solved numerically by using a Boundary Element
Method (BEM). The calculations were performed with the software package EISy2D Version
2016 for a closed geometry consisting of line segments (see Figure 6). In practice,
there are two anodes on the opposite sides of the steel strip. In the EISy2D model,
the plating cell was cut in half along its symmetry axis (i.e. the steel strip) and
the actual thickness of the steel strip was divided by 2.
[0038] Each line segment becomes either an insulator or an electrode as defined by the user.
The cell geometry is shown in Figure 6. In this figure, line segment 3 is the anode
and line segment 5 is the cathode (i.e. the strip). Within EISy2D, the voltage drop
over an electrode is calculated by assigning a value for the resistivity and the thickness
of the electrode and the contact point of the electrode, which is either the 'Begin'
or the 'End' of the line segment. The line segments are divided into a number of elements
and the local current density is calculated for each element. In order to obtain a
unique numerical solution, at least one electrode should receive an imposed potential.
Description of the drawings
[0039] The invention will now be explained by means of the following, non-limiting figures.
[0040] A typical soluble anode system for a tinplating line is illustrated in Figure 1.
In Figure 1 tin is supplied by tin anode 1 which has an anode gap 2 and an anode notch
3. Each of a series of tin anodes 1 is supported by an anode bridge 4 at a top portion
near its anode notch 3 and at a bottom portion in anode box 5. Isolated plate 6 separates
two tinning sections in one plating cell. Electrical power is supplied to the strip
via conductor roll 7. Near the bottom of the plating cell the strip is guided by sink
roll 8. Hold-down roll 9 is also shown. Anode bridge 4 comprises an insulated parking
space 1 0 for a fresh tin anode 1. The tin anodes 1 are connected to the anode bridge
4 via contact strip 14.
[0041] The thickness of the worn anodes is regularly checked with a thickness gauge. When
the anode thickness becomes too small, the anode is detached from the anode bridge
and placed on the nearest insulated parking space, see Figure 2 where the arrows indicate
how the anodes "move" along the anode bridge. On the other side a new anode is placed
on the insulated parking space and transferred to the anode bridge. After each replacement,
anodes need to be repositioned again. In Figure 2 a fresh tin anode is designated
with N and a worn one with W.
[0042] Figure 3 shows, instead of individual tin bars, anode baskets 12 mounted on the anode
bar 4 via contact strip 14. The contact strips 14, made of copper in the experiments
according to this example, may be coated on their surface contacting the anode basket
12 with a noble metal like Au or Pt. The anode baskets 12 in Figure 6 were filled
with tin pellets and, to replenish anodic substance, tin pellets are supplied regularly,
which can be done while the plating line is fully operational. The anode baskets 12
can be made of titanium and are designed and positioned.
[0043] Figure 4 shows a schematic drawing of the geometry of the cathode and the anode (tilted
and ideal) shown on one side. It shows the offset value x
0 at y=0 and the values of x
A and x
L as well as the difference in distance between the ideally curved anode and the tilted
linear anode: (x
L-x
A). From this figure it is also clear that a value of c=1 describes the distance between
the linear anode and the cathode, and a value of c=0 describes the distance between
the cathode and the ideal curved anode.
[0044] Figure 5a shows a schematic drawing of a strip moving downwardly as a cathode in
a plating cell with a straight tilted anode shown on one side, which is distanced
from the cathode at a distance b at the top and at a distance a at the bottom of the
anode. The distance between the top and the bottom of the anode as seen by the cathode
is h. The distance from the anode to the cathode between the top and the bottom of
the anode is given by x
L. The value of x
L is b at the top and xo at the bottom of the anode.
[0045] Figure 5b shows a schematic drawing of a strip moving downwardly as a cathode in
a plating cell with an anode according to the invention shown on one side, which is
distanced from the cathode at a distance b at the top and at a distance xo at the
bottom of the anode. The distance between the top and the bottom of the anode as seen
by the cathode is h. The distance from the anode to the cathode between the top and
the bottom of the anode is given by x
A. The value of x(y) is b=x
0 + x
A(h) at the top and xo at the bottom of the anode (because x
A=0). Figure 5c and 5d schematically show that it is also possible to use anodes wherein
the surface facing the cathode is described is only a section (as indicated by the
dashed box) of the complete surface as described in figure 5b.
[0046] Figure 6 shows the definition of the system for the BEM calculations.
[0047] Figure 7 shows the value of x(y) for the linear tilted anode (dashed line) and the
anode according to the invention (ideal), as well as for three variations on the ideal
line. The lines indicated with the circles enclose the shapes that cover values of
x(y) = x
A(y)±0.25·(x
L(y)-x
A(y)) (x
0=30 mm) and as such cover the ideal shape of the anode as well as a deviation thereof.
The line indicated with the triangle described by the line x = x
A(y)-0.5·(x
L(y)-x
A(y));
[0048] Figure 8 shows the results of the calculations of the current density divided by
the average current density. If the value is 1, then the current density is equal
to the average current density.
1. Dimensionally stable anode or dimensionally stable soluble anode for use in a continuous
plating line for depositing a metal layer onto a metal substrate wherein, in use,
the distance between the anode and the cathode (x) is given by:

And

wherein
x = distance between anode and metal substrate (=cathode) [m]
xA = distance of cathode to ideal anode [m]
xL = distance of cathode to tilted anode [m]
x0 = offset at y=0 [m]
y = vertical position on cathode [m]
ρs = resistivity of strip [Ω m]
ρe = resistivity of electrolyte [Ω m]
d = thickness (gauge) of strip [m]
c = constant [-]
wherein c = between 0 and 0.75.
2. Anode as claimed in claim 1 wherein c is between 0 and 0.50.
3. Anode as claimed in claim 1 wherein c is between 0 and 0.10.
4. Anode as claimed in any one of claims 1 to 3 wherein the anode is a dimensionally
stable soluble anode.
5. Anode as claimed in any one of claims 1 to 3 wherein part of the side or sides of
the anodes is masked out using adjustable masking means that are controlled and guided
dependent on strip width and/or coating thickness distribution.
6. Anode as claimed in claim 5, characterised in that the masking means comprise a shutter or blind.
7. Anode as claimed in any one of claims 1 to 6 wherein the anode is composed mainly
of titanium or of titanium coated with a catalytic coating.
8. Process for electrolytically depositing a metal layer onto a metal substrate in a
continuous plating line comprising one or more of dimensionally stable anodes and/or
dimensionally stable soluble anodes wherein, in use, the distance between the surface
of the anode facing the metal substrate cathode and the metal substrate (x) is given
by:

And

Wherein
x = distance between anode and metal substrate (=cathode) [m]
xA = distance of cathode to ideal anode [m]
xL = distance of cathode to tilted anode [m]
x0 = offset at y=0 [m]
y = vertical position on cathode [m]
ρs = resistivity of strip [Ω m]
ρe = resistivity of electrolyte [Ω m]
d = thickness (gauge) of strip [m]
c = constant [-]
wherein c = between 0 and 0.75.
9. Process as claimed in claim 8 wherein c is between 0 and 0.50.
10. Process as claimed in claim 9 wherein c is between 0 and 0.10.
11. Process as claimed in any one of claims 8 to 10 wherein the anode is a dimensionally
stable soluble anode.
12. Process as claimed in any one of claims 8 to 11 for plating a metal strip with tin,
zinc, nickel, chromium, cobalt, molybdenum, copper, zinc or alloys thereof, such as
brass.
13. Process as claimed in claim 12 wherein a tin layer is electroplated onto a steel strip.
14. Process as claimed in claim 13 wherein a chromium layer is electroplated onto a steel
strip from a trivalent chromium based electrolyte.
15. Process as claimed in any of the claims 8 to 14 wherein the anode is, or the anodes
are, composed mainly of titanium or of titanium coated with a catalytic coating.