|
(11) | EP 3 889 319 A8 |
(12) | CORRECTED EUROPEAN PATENT APPLICATION |
Note: Bibliography reflects the latest situation |
|
|
|
|
||||||||||||||||||||||||||||||||
(54) | CONTROLLED DEPOSITION OF A FUNCTIONAL MATERIAL ONTO A TARGET SURFACE |
(57) A plate (1) is provided herein, comprising functional material (2) to be deposited
onto a target surface (51) using monochromatic photon radiation (R3) having a wavelength
(λR3). The plate comprises a substrate (10) with a first surface (11) to be directed towards
the target surface and with a second surface (12) to receive the monochromatic photon
radiation. The first surface (11) is patterned with one or more recessed areas (111)
that have a dielectric coating (4) and that are filled with the functional material.
The dielectric coating (4) comprises a sequence of dielectric coating layers (41,
42, 43) alternating in refractive index. The dielectric coating (4) therewith has
a relatively high reflectivity for said monochromatic radiation (R3) incident perpendicular
to the dielectric coating (4) in comparison to a reflectivity for said monochromatic
radiation (R3) incident at an angle of 45 degrees to the dielectric coating (4). Therewith
shear forces are mitigated without requiring a high alignment accuracy. The present application further provides a deposition device comprising the plate and a method involving the plate. |