(19)
(11) EP 4 111 132 A1

(12)

(43) Date of publication:
04.01.2023 Bulletin 2023/01

(21) Application number: 21706841.0

(22) Date of filing: 28.01.2021
(51) International Patent Classification (IPC): 
G01B 9/02(2022.01)
G03F 7/20(2006.01)
G01B 11/00(2006.01)
(52) Cooperative Patent Classification (CPC):
G01B 2290/15; G01B 2290/25; G01B 9/02061; G01B 11/002; G01B 9/02057; G01B 9/0205; G01B 9/02018; G03F 7/7085; G03F 7/70775
(86) International application number:
PCT/EP2021/051901
(87) International publication number:
WO 2021/170333 (02.09.2021 Gazette 2021/35)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
KH MA MD TN

(30) Priority: 25.02.2020 EP 20159279

(71) Applicant: ASML Netherlands B.V.
5500 AH Veldhoven (NL)

(72) Inventors:
  • LIEDECKE, Christian
    5500 AH Veldhoven (NL)
  • BAGGEN, Marcel, Koenraad, Marie
    5500 AH Veldhoven (NL)
  • JANSEN, Maarten, Jozef
    5500 AH Veldhoven (NL)
  • MRIDHA, Manoj Kumar
    5500 AH Veldhoven (NL)

(74) Representative: ASML Netherlands B.V. 
Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven
5500 AH Veldhoven (NL)

   


(54) INTERFEROMETER SYSTEM AND LITHOGRAPHIC APPARATUS