(19)
(11) EP 4 159 009 A1

(12)

(43) Date of publication:
05.04.2023 Bulletin 2023/14

(21) Application number: 21723675.1

(22) Date of filing: 29.04.2021
(51) International Patent Classification (IPC): 
H05G 2/00(2006.01)
(52) Cooperative Patent Classification (CPC):
H05G 2/006; H05G 2/005; H05G 2/008
(86) International application number:
PCT/EP2021/061258
(87) International publication number:
WO 2021/239382 (02.12.2021 Gazette 2021/48)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
KH MA MD TN

(30) Priority: 29.05.2020 US 202063032187 P

(71) Applicant: ASML Netherlands B.V.
5500 AH Veldhoven (NL)

(72) Inventors:
  • SWERDLOW, Ethan, Marcus
    San Diego, California 92127 (US)
  • BESSEMS, David
    San Diego, California 92127 (US)
  • TEDROW, Jon, David
    San Diego, California 32127 (US)
  • RAI, Sandeep
    San Diego, California 92127 (US)
  • CAVALIER, Grant, Steven
    San Diego, California 92127 (US)
  • DRIESSEN, Theodorus, Wilhelmus
    San Diego, California 92127 (US)
  • SAMS, Benjamin, Andrew
    San Diego, California 92127 (US)
  • TREES, Dietmar, Uwe, Herbert
    San Diego, California 92127 (US)
  • ATENCIO, Edgardo, Zamora
    San Diego, California 92127 (US)
  • JOHNSON, Brandon, Michael
    San Diego, California 92127 (US)

(74) Representative: ASML Netherlands B.V. 
Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven
5500 AH Veldhoven (NL)

   


(54) HIGH PRESSURE AND VACUUM LEVEL SENSOR IN METROLOGY RADIATION SYSTEMS