(57) A method for depositing a coating on a substrate is disclosed. A first precursor
comprising fluoro-acrylate monomers, fluoro-alkyl acrylate monomers, fluoromethacrylate
monomers, fluoro-alkyl methacrylate monomers, fluoro-silane monomers, or a combination
or derivates thereof is provided. A second precursor comprising linear siloxanes,
silane monomers, cyclosiloxanes, cyclosilane monomers, or a combination or derivates
thereof is provided. The first and second precursors are co-injected in a treatment
region. An atmospheric or reduced pressure plasma discharge is created in said treatment
region. The substrate coating comprises alternated multi-stacked nanostructures and
is formed by copolymerization of the first and second precursors.
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