(19)
(11) EP 4 377 749 A1

(12)

(43) Date of publication:
05.06.2024 Bulletin 2024/23

(21) Application number: 22848773.2

(22) Date of filing: 21.07.2022
(51) International Patent Classification (IPC): 
G03F 1/20(2012.01)
H01J 37/317(2006.01)
G03F 1/78(2012.01)
(52) Cooperative Patent Classification (CPC):
G03F 1/78; G03F 1/36; G03F 7/705; G03F 7/70441; H01J 37/3174; H01J 2237/31776
(86) International application number:
PCT/IB2022/056722
(87) International publication number:
WO 2023/007321 (02.02.2023 Gazette 2023/05)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME
Designated Validation States:
KH MA MD TN

(30) Priority: 30.07.2021 US 202117444140
30.07.2021 US 202117444142

(71) Applicant: D2S, Inc.
San Jose, CA 95117 (US)

(72) Inventors:
  • FUJIMURA, Akira
    San Jose, California 95117 (US)
  • UNGAR, P. Jeffrey
    San Jose, California 95117 (US)
  • SHIRALI, Nagesh
    San Jose, California 95131 (US)

(74) Representative: Haseltine Lake Kempner LLP 
One Portwall Square Portwall Lane
Bristol BS1 6BH
Bristol BS1 6BH (GB)

   


(54) METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE MANUFACTURED ON A SUBSTRATE