(19)
(11) EP 4 419 967 A1

(12)

(43) Date of publication:
28.08.2024 Bulletin 2024/35

(21) Application number: 22802820.5

(22) Date of filing: 18.10.2022
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)
G03F 1/36(2012.01)
G02F 1/13(2006.01)
(52) Cooperative Patent Classification (CPC):
G03F 7/70291; G03F 1/36; G02F 1/13718; G02F 1/13775; G02F 1/134309
(86) International application number:
PCT/US2022/047021
(87) International publication number:
WO 2023/069433 (27.04.2023 Gazette 2023/17)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
KH MA MD TN

(30) Priority: 19.10.2021 US 202163257363 P
06.10.2022 US 202217961164

(71) Applicant: META PLATFORMS TECHNOLOGIES, LLC
Menlo Park, CA 94025 (US)

(72) Inventors:
  • REKHI, Sandeep
    Menlo Park, California 94025 (US)
  • WALLIN, Thomas John Farrell
    Menlo Park, California 94025 (US)
  • PICHUMANI, Pradip Sairam
    Menlo Park, California 94025 (US)

(74) Representative: Murgitroyd & Company 
165-169 Scotland Street
Glasgow G5 8PL
Glasgow G5 8PL (GB)

   


(54) EUV LITHOGRAPHY USING POLYMER CRYSTAL BASED RETICLE