(19)
(11) EP 4 444 045 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
22.01.2025 Bulletin 2025/04

(43) Date of publication A2:
09.10.2024 Bulletin 2024/41

(21) Application number: 24166558.7

(22) Date of filing: 26.03.2024
(51) International Patent Classification (IPC): 
H05G 2/00(2006.01)
(52) Cooperative Patent Classification (CPC):
H05G 2/0035; H05G 2/0082
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
GE KH MA MD TN

(30) Priority: 07.04.2023 JP 2023062470

(71) Applicant: Ushio Denki Kabushiki Kaisha
Tokyo 100-8150 (JP)

(72) Inventors:
  • HIRATA, Hironobu
    Tokyo, 1008150 (JP)
  • ASHIZAWA, Noritaka
    Tokyo, 1008150 (JP)

(74) Representative: Maiwald GmbH 
Engineering Elisenhof Elisenstrasse 3
80335 München
80335 München (DE)

   


(54) PLASMA GENERATION MECHANISM AND LIGHT SOURCE APPARATUS


(57) [Object] To provide a plasma generation mechanism and a light source apparatus that are capable of stably supplying a plasma raw material to an irradiation position of an energy beam.
[Solving Means] A plasma generation mechanism according to an embodiment of the present invention is a plasma generation mechanism included in a light source apparatus that transforms a liquid plasma raw material into plasma by irradiation of an energy beam to extract radiation, including: a disturbance prevention portion. The disturbance prevention portion separates a supply liquid surface to which a new plasma raw material is supplied, of liquid surfaces of the plasma raw material, and an incident liquid surface that the energy beam enters, of the liquid surfaces of the plasma raw material, from each other and communicates the plasma raw material between a side of the supply liquid surface and a side of the incident liquid surface.







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