<?xml version="1.0" encoding="UTF-8"?><!--This XML data has been generated under the supervision of the European Patent Office --><!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.7//EN" "ep-patent-document-v1-7.dtd">
<ep-patent-document country="EP" date-publ="20250326" doc-number="4526999" dtd-version="ep-patent-document-v1-7" file="22762007.7" id="EP22762007A1" kind="A1" lang="en" status="n"><SDOBI lang="en"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIROMKCYALTRBGCZEEHUPLSKBAHRIS..MTNORSMESMMAKHTNMD..........</B001EP><B003EP>*</B003EP><B005EP>X</B005EP><B007EP>0009010-RPUB02</B007EP></eptags></B000><B100><B110>4526999</B110><B130>A1</B130><B140><date>20250326</date></B140><B190>EP</B190></B100><B200><B210>22762007.7</B210><B220><date>20220805</date></B220><B240><B241><date>20241217</date></B241></B240><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B400><B405><date>20250326</date><bnum>202513</bnum></B405><B430><date>20250326</date><bnum>202513</bnum></B430></B400><B500><B510EP><classification-ipcr sequence="1"><text>H03H   9/02        20060101AFI20240219BHEP        </text></classification-ipcr><classification-ipcr sequence="2"><text>H03H   3/10        20060101ALI20240219BHEP        </text></classification-ipcr></B510EP><B520EP><classifications-cpc><classification-cpc sequence="1"><text>H03H   9/02574     20130101 FI20230320BHEP        </text></classification-cpc><classification-cpc sequence="2"><text>H03H   3/10        20130101 LI20230320BHEP        </text></classification-cpc><classification-cpc sequence="3"><text>H03H   9/02834     20130101 LI20230320BHEP        </text></classification-cpc></classifications-cpc></B520EP><B540><B541>de</B541><B542>VERFAHREN ZUR HERSTELLUNG EINES OBERFLÄCHENWELLENRESONATORS</B542><B541>en</B541><B542>METHOD FOR PRODUCING A SURFACE ACOUSTIC WAVE RESONATOR</B542><B541>fr</B541><B542>PROCÉDÉ DE FABRICATION D'UN RÉSONATEUR À ONDES ACOUSTIQUES DE SURFACE</B542></B540></B500><B700><B710><B711><snm>Huawei Technologies Co., Ltd.</snm><iid>102027903</iid><irf>249EP 3333 DL</irf><adr><str>Huawei Administration Building
Bantian
Longgang District</str><city>Shenzhen, Guangdong 518129</city><ctry>CN</ctry></adr></B711></B710><B720><B721><snm>YANTCHEV, Ventsislav</snm><adr><city>16440 Kista</city><ctry>SE</ctry></adr></B721><B721><snm>KUSTANOVICH, Kiryl</snm><adr><city>16440 Kista</city><ctry>SE</ctry></adr></B721></B720><B740><B741><snm>Pfenning, Meinig &amp; Partner mbB</snm><iid>100060642</iid><adr><str>Patent- und Rechtsanwälte
Theresienhöhe 11a</str><city>80339 München</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>AL</ctry><ctry>AT</ctry><ctry>BE</ctry><ctry>BG</ctry><ctry>CH</ctry><ctry>CY</ctry><ctry>CZ</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>EE</ctry><ctry>ES</ctry><ctry>FI</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>HR</ctry><ctry>HU</ctry><ctry>IE</ctry><ctry>IS</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LT</ctry><ctry>LU</ctry><ctry>LV</ctry><ctry>MC</ctry><ctry>MK</ctry><ctry>MT</ctry><ctry>NL</ctry><ctry>NO</ctry><ctry>PL</ctry><ctry>PT</ctry><ctry>RO</ctry><ctry>RS</ctry><ctry>SE</ctry><ctry>SI</ctry><ctry>SK</ctry><ctry>SM</ctry><ctry>TR</ctry></B840><B844EP><B845EP><ctry>BA</ctry></B845EP><B845EP><ctry>ME</ctry></B845EP></B844EP><B848EP><B849EP><ctry>KH</ctry></B849EP><B849EP><ctry>MA</ctry></B849EP><B849EP><ctry>MD</ctry></B849EP><B849EP><ctry>TN</ctry></B849EP></B848EP><B860><B861><dnum><anum>EP2022072044</anum></dnum><date>20220805</date></B861><B862>en</B862></B860><B870><B871><dnum><pnum>WO2024027920</pnum></dnum><date>20240208</date><bnum>202406</bnum></B871></B870></B800></SDOBI></ep-patent-document>