Technical Field
[0001] The present disclosure relates to a hot stamping component and a manufacturing method
therefor.
Background Art
[0002] As environmental regulations and fuel economy-related regulations are strengthened
worldwide, the need for lighter materials for vehicles is increasing. Accordingly,
research on and development of ultra-high-strength steel and hot stamping steel have
been actively conducted.
[0003] A hot stamping process generally includes heating/forming/cooling/trimming, and may
use phase transformation of materials and a change in microstructures during the process.
In order to improve the toughness of hot stamping steel, research has been actively
conducted on a method of improving the toughness of a base material by using alloy
components.
[0004] However, when alloy components are changed or increased, the cost may increase and
economical feasibility may decrease.
Disclosure of Invention
Technical Problem
[0006] Embodiments of the present disclosure may improve the toughness of a manufactured
hot stamping component by appropriately forming a decarburization layer and an inner
oxide layer on a surface of a base material, and at the same time, may prevent cracks
from occurring during hot stamping forming.
Solution to Problem
[0007] An embodiment of the present disclosure provides a hot stamping component including:
a base material; a decarburization layer located on a surface of the base material;
and an inner oxide layer located on a surface of the decarburization layer, wherein
the hot stamping component has a tensile strength (TS) of 1350 MPa to 1680 MPa, and
a hardness of the hot stamping component within a depth of 50 µm from a surface of
the hot stamping component in a plate thickness direction of the hot stamping component
and an average hardness of the hot stamping component satisfy Relational Expression
1.

(In Relational Expression 1, A denotes the hardness (Hv(≤50 µm)) within the depth
of 50 µm in the plate thickness direction of the hot stamping component, and B denotes
the average hardness (Hv(avg.)) of the hot stamping component.)
[0008] In the present embodiment, a depth of the inner oxide layer may satisfy Relational
Expression 2.

(In Relational Expression 2, C denotes the depth of the inner oxide layer in the
plate thickness direction of the hot stamping component.)
[0009] In the present embodiment, the hot stamping component may have a VDA bending angle
of 60° or more.
[0010] In the present embodiment, the hot stamping component may have a yield strength (YP)
of 900 MPa to 1300 MPa and an elongation (EL) of 4% to 10%.
[0011] In the present embodiment, the hot stamping component may have a microstructure with
a martensite fraction of 90% or more.
[0012] In the present embodiment, the hot stamping component may further include a plating
layer located on a surface of the inner oxide layer.
[0013] In the present embodiment, a thickness of the plating layer may be 10 µm to 30 µm.
[0014] Another embodiment of the present disclosure provides a method of manufacturing a
hot stamping component, including: forming a blank by cutting a plated steel sheet
having a plating layer formed on at least one surface of a base material; and heating
the blank in a heating furnace having a plurality of sections with different temperature
ranges, wherein the heating of the blank includes: a multi-stage heating step of heating
the blank stepwise; and a soaking step of heating the stepwise heated blank to a temperature
of Ac1 to 910°C, wherein a hardness of the hot stamping component within a depth of
50 µm from a surface of the hot stamping component in a plate thickness direction
of the hot stamping component and an average hardness of the hot stamping component
satisfy Relational Expression 3.

(In Relational Expression 3, A denotes the hardness (Hv(≤50 µm)) within the depth
of 50 µm in the plate thickness direction of the hot stamping component, and B denotes
the average hardness (Hv(avg.)) of the hot stamping component.)
[0015] In the present embodiment, a dew point of an annealing furnace of the base material
may be -15°C to +15°C.
[0016] In the present embodiment, an annealing temperature of the base material may be 750°C
to 900°C.
[0017] In the present embodiment, the method of manufacturing a hot stamping component may
further include: after the heating of the blank, transferring the heated blank; forming
a molded body by pressing the transferred blank with a mold; and cooling the formed
molded body.
[0018] In the present embodiment, the hot stamping component may further include: a decarburization
layer formed on a surface of the base material; and an inner oxide layer formed on
a surface of the decarburization layer.
[0019] In the present embodiment, a depth of the inner oxide layer may satisfy Relational
Expression 4.

(In Relational Expression 4, C denotes the depth of the inner oxide layer in the
plate thickness direction of the hot stamping component.)
[0020] Other aspects, features, and advantages of the present disclosure will become more
apparent from the detailed description, the claims, and the drawings for implementing
the present disclosure.
Advantageous Effects of Invention
[0021] According to an embodiment of the present disclosure as described above, because
a decarburization layer is formed on a surface of a base material, the toughness of
a manufactured hot stamping component may be improved.
[0022] Also, according to an embodiment of the present disclosure, because an inner oxide
layer formed on a surface of the decarburization layer is provided below a preset
depth, cracks may be prevented from occurring during a hot stamping process.
Brief Description of Drawings
[0023]
FIG. 1 is a cross-sectional view schematically illustrating a hot stamping component,
according to an embodiment of the present disclosure.
FIG. 2 is a flowchart schematically illustrating a method of manufacturing a hot stamping
component, according to an embodiment of the present disclosure.
FIGS. 3 to 5 are cross-sectional views schematically illustrating a method of manufacturing
a hot stamping component, according to an embodiment of the present disclosure.
FIG. 6 is a flowchart schematically illustrating a hot stamping step, according to
an embodiment of the present disclosure.
FIG. 7 is a flowchart schematically illustrating a heating step, according to an embodiment
of the present disclosure.
FIG. 8 is a diagram for describing a heating furnace having a plurality of sections,
in a heating step of a method of manufacturing a hot stamping component, according
to an embodiment of the present disclosure.
Mode for the Invention
[0024] As the present disclosure allows for various changes and numerous embodiments, certain
embodiments will be illustrated in the drawings and described in the detailed description.
Effects and features of the present disclosure, and methods for achieving them will
be clarified with reference to embodiments described below in detail with reference
to the drawings. However, the present disclosure is not limited to the following embodiments
and may be embodied in various forms.
[0025] Although the terms "first," "second," etc. may be used to describe various elements,
these elements should not be limited by these terms. These terms are only used to
distinguish one element from another.
[0026] As used herein, the singular forms "a," "an," and "the" are intended to include the
plural forms as well, unless the context clearly indicates otherwise.
[0027] It will be further understood that the terms "comprises" or "comprising" used herein
specify the presence of stated features or components, but do not preclude the presence
or addition of one or more other features or components.
[0028] It will be further understood that, when a layer, region, or component is referred
to as being "on" another layer, region, or component, it may be directly on the other
layer, region, or component, or may be indirectly on the other layer, region, or component
with intervening layers, regions, or components therebetween.
[0029] Sizes of components in the drawings may be exaggerated or reduced for convenience
of explanation. For example, because sizes and thicknesses of elements in the drawings
are arbitrarily illustrated for convenience of explanation, the present disclosure
is not limited thereto.
[0030] "A and/or B" is used herein to select only A, select only B, or select both A and
B. Also, "at least one of A and B" is used herein to select only A, select only B,
or select both A and B.
[0031] In the following embodiments, "a plan view of an object" refers to "a view of an
object seen from above, and "a cross-sectional view of an object" refers to "a view
of an object vertically cut and seen from the side. In the following embodiments,
when elements "overlap," it may mean that the elements overlap in a "plan view" and
a "cross-sectional view".
[0032] Hereinafter, embodiments of the present disclosure will be described in detail with
reference to the accompanying drawings, wherein the same or corresponding elements
are denoted by the same reference numerals throughout.
[0033] FIG. 1 is a cross-sectional view schematically illustrating a hot stamping component,
according to an embodiment of the present disclosure.
[0034] Referring to FIG. 1, a hot stamping component 1 according to an embodiment may include
a base material 100, a decarburization layer 200, an inner oxide layer 300, and a
plating layer 400. The base material 100, the decarburization layer 200, the inner
oxide layer 300, and the plating layer 400 may be sequentially stacked in a plate
thickness direction of the hot stamping component 1.
[0035] In an embodiment, the base material 100 may include carbon (C), silicon (Si), manganese
(Mn), phosphorus (P), sulfur (S), chromium (Cr), boron (B), remaining iron (Fe), and
other unavoidable impurities. For example, the base material 100 may include about
0.15 wt% to about 0.3 wt% of carbon (C), about 0.05 wt% to about 0.8 wt% of silicon
(Si), about 0.8 wt% to about 3.0 wt% of manganese (Mn), more than 0 wt% but not more
than about 0.1 wt% of phosphorus (P), more than 0 wt% but not more than about 0.1
wt% of sulfur (S), about 0.1 wt% to about 0.9 wt% of chromium (Cr), about 0.001 wt%
to about 0.005 wt% of boron (B), remaining iron (Fe), and other unavoidable impurities.
[0036] Also, the base material 100 may further include at least one component from among
titanium (Ti), niobium (Nb), and vanadium (V). Also, the base material 100 may further
include calcium (Ca). For example, the base material 100 may further include at least
one component from among about 0.01 wt% to about 0.1 wt% of titanium (Ti), about 0.01
wt% to about 0.1 wt% of niobium (Nb), about 0.01 wt% to about 0.1 wt% of vanadium
(V), and about 0.0001 wt% to about 0.01 wt% of calcium (Ca).
[0037] Carbon (C) is a major element that determines the strength and hardness of steel,
and may be added to ensure a tensile strength of a steel material after a hot stamping
(or hot pressing) process. Also, carbon (C) may be added to ensure hardenability characteristics
of the steel material. In an embodiment, carbon (C) may be included in an amount of
about 0.15 wt% to about 0.3 wt% based on a total weight of the base material 100.
When carbon (C) is included in an amount less than about 0.15 wt% based on the total
weight of the base material 100, it may be difficult to achieve a desired mechanical
strength. On the other hand, when carbon (C) is included in an amount more than about
0.3 wt% based on the total weight of the base material 100, the toughness of the steel
material may be reduced or a problem of controlling brittleness of steel may occur.
[0038] Silicon (Si) may function as a ferrite stabilizing element in the base material 100.
Silicon (Si) may improve ductility by purifying ferrite, and may improve a carbon
concentration in austenite by suppressing formation of low-temperature carbide. Furthermore,
silicon (Si) may be a key element for hot-rolled, cold-rolled, and hot-stamped structure
homogenization (perlite and manganese segregation control) and ferrite microdispersion.
In an embodiment, silicon (Si) may be included in an amount of about 0.05 wt% to about
0.8 wt% based on the total weight of the base material 100. When silicon (Si) is included
in an amount less than about 0.05 wt% based on the total weight of the base material
100, the above-described effects may not be sufficiently obtained. On the other hand,
when silicon (Si) is included in an amount greater than about 0.8 wt% based on the
total weight of the base material 100, hot rolling and cold rolling loads may increase,
hot rolling red scale may be excessive, and adhesion may deteriorate.
[0039] Manganese (Mn) may be added to increase hardenability and strength during heat treatment.
In an embodiment, manganese (Mn) may be included in an amount of about 0.8 wt% to
about 3.0 wt% based on the total weight of the base material 100. When manganese (Mn)
is included in an amount less than about 0.8 wt% based on the total weight of the
base material 100, there may be a high possibility that a material after hot stamping
is insufficient (e.g., insufficient hard phase fraction) due to insufficient hardenability.
On the other hand, when manganese (Mn) is included in an amount greater than about
3.0 wt% based on the total weight of the base material 100, ductility and toughness
may be reduced due to manganese (Mn) segregation or perlite bands, bending performance
may be reduced, and a inhomogeneous microstructure may be generated.
[0040] Phosphorus (P) may be an element that easily segregates and reduces the toughness
of steel. In an embodiment, phosphorus (P) may be included in an amount more than
0 wt% and less than or equal to about 0.1 wt% based on the total weight of the base
material 100. When phosphorus (P) is included in the above range based on the total
weight of the base material 100, a decrease in the toughness of steel may be prevented.
On the other hand, when phosphorus (P) is included in an amount greater than about
0.1 wt% based on the total weight of the base material 100, cracks may occur during
the process, and an iron phosphide compound may be formed, thereby reducing the toughness
of steel.
[0041] Sulfur (S) may be an element that reduces workability and physical properties. In
an embodiment, sulfur (S) may be included in an amount more than 0 wt% and less than
or equal to about 0.1 wt% based on the total weight of the base material 100. When
sulfur (S) is included in an amount greater than about 0.1 wt% based on the total
weight of the base material 100, hot workability may be reduced, and surface defects
such as cracks may occur due to formation of large inclusions.
[0042] Chromium (Cr) may be added to improve the hardenability and strength of steel. In
an embodiment, chromium (Cr) may be included in an amount of about 0.1 wt% to about
0.9 wt% based on the total weight of the base material 100. When chromium (Cr) is
included in the above range based on the total weight of the base material 100, the
hardenability and strength of steel may be improved, an increase in production cost
may be prevented, and a decrease in the toughness of the steel material may be prevented.
[0043] Boron (B) is added to ensure the hardenability and strength of steel by securing
a martensite structure, and may have a grain refinement effect by increasing an austenite
grain growth temperature. In an embodiment, boron (B) may be included in an amount
of about 0.001 wt% to about 0.005 wt% based on the total weight of the base material
100. When boron (B) is included in above range based on the total weight of the base
material 100, hard grain boundary brittleness may be prevented and high toughness
and bendability may be ensured.
[0044] Titanium (Ti) may be added to strengthen hardenability and improve a material by
forming precipitates after hot stamping heat treatment. Also, titanium (Ti) may effectively
contribute to refinement of austenite grains by forming a precipitated phase such
as Ti (C,N) at a high temperature. In an embodiment, titanium (Ti) may be included
in an amount of about 0.01 wt% to about 0.1 wt% based on the total weight of the base
material 100. When titanium (Ti) is included in the above range based on the total
weight of the base material 100, continuous casting defects may be prevented, coarsening
of precipitates may be prevented, physical properties of the steel material may be
easily ensured, and cracks on a surface of the steel material may be prevented or
minimized.
[0045] Niobium (Nb) may be added to increase strength and toughness according to a decrease
in a martensite packet size. In an embodiment, niobium (Nb) may be included in an
amount of about 0.01 wt% to about 0.1 wt% based on the total weight of the base material
100. When niobium (Nb) is included in the above range based on the total weight of
the base material 100, the grain refinement effect of the steel material may be high
in hot rolling and cold rolling processes, cracks in a slob and brittle fracture of
a product during steelmaking/casting may be prevented, and formation of coarse precipitates
in steelmaking may be minimized.
[0046] Vanadium (V) may be added to increase the strength of steel through a precipitation
strengthening effect by forming precipitates. In an embodiment, vanadium (V) may be
included in an amount of about 0.01 wt% to about 0.1 wt% based on the total weight
of the base material 100. When vanadium (V) is included in the above range based on
the total weight of the base material 100, the strength of the steel material may
be improved.
[0047] Calcium (Ca) may be added to form CaS to reduce the content of sulfur in steel, and
to prevent formation of MnS inclusions that are drawn during hot rolling and induce
defects such as hook cracks during electrical resistance welding.
[0048] In an embodiment, the base material 100 may have a microstructure with a martensite
fraction of 90% or more. In detail, the base material 100 may have a microstructure
including 90% or more of martensite, and less than 10% of remaining other unavoidable
structures and other precipitates.
[0049] In an embodiment, the decarburization layer 200 may be located on the base material
100. In detail, the decarburization layer 200 may be located on a surface of the base
material 100. When the decarburization layer 200 is located on the base material 100,
because the decarburization layer 200 is softer than the base material 100, the toughness
of the hot stamping component 1 may be improved.
[0050] A layer having a hardness of about 70% or less compared to an average hardness at
about 1/4 point in the plate thickness direction of the hot stamping component 1 from
the surface of the base material 100 may be defined as the decarburization layer 200.
Alternatively, a layer having a hardness of about 70% or less compared to the average
hardness at about 1/4 point in the plate thickness direction of the hot stamping component
1 from a surface of the hot stamping component 1 may be defined as the decarburization
layer 200. That is, an average hardness of the decarburization layer 200 may be about
70% or less of the average hardness at about 1/4 point in the plate thickness direction
of the hot stamping component 1 from the surface of the base material 100 or from
the surface of the hot stamping component 1. In other words, the average hardness
of the decarburization layer 200 may be about 70% or less of the average hardness
at about 1/4 point in the plate thickness direction of the hot stamping component
1 from the surface of the base material 100 or from the surface of the hot stamping
component 1.
[0051] In an embodiment, the inner oxide layer 300 may be located on the decarburization
layer 200. In detail, the inner oxide layer 300 may be located on a surface of the
decarburization layer 200. The inner oxide layer 300 may include silicon (Si), manganese
(Mn), chromium (Cr), etc.
[0052] In an embodiment, a depth (or thickness t1) of the inner oxide layer 300 may be about
5 µm in the plate thickness direction of the hot stamping component 1, which will
be described below in more detail.
[0053] In an embodiment, the plating layer 400 may be located on the inner oxide layer 300.
In detail, the plating layer 400 may be located on a surface of the inner oxide layer
300. The plating layer 400 may be a zinc (Zn)-based plating layer or an aluminum (Al)-based
plating layer. For example, the plating layer 400 may include zinc (Zn) and/or aluminum
(Al).
[0054] In an embodiment, when the plating layer 400 is a zinc (Zn)-based plating layer,
the plating layer 400 may include iron (Fe), aluminum (Al), manganese (Mn), silicon
(Si), remaining zinc (Zn), and other unavoidable impurities. For example, the plating
layer 400 may include about 10 wt% to about 70 wt% of iron (Fe), more than 0 wt% but
not more than about 5 wt% of aluminum (Al), more than 0 wt% but not more than about
1 wt% of manganese (Mn), more than 0 wt% but not more than about 1 wt% of silicon
(Si), remaining zinc (Zn), and other unavoidable impurities.
[0055] The plating layer 400 may have a depth (or thickness t2) of about 10 µm to about
30 µm in the plate thickness direction of the hot stamping component 1. When the thickness
t2 of the plating layer 400 is less than about 10 µm the sacrificial effect of zinc
may be reduced, and when the thickness t2 of the plating layer 400 is greater than
about 30 µm, the thickness t2 of the plating layer 400 is too large, and thus, the
toughness of the hot stamping component 1 including the plating layer 400 may be reduced.
Accordingly, when the plating layer 400 has the thickness t2 of about 10 µm to about
30 µm, the surface of the base material (or steel material) may be protected, and
at the same time, a decrease in the toughness of the hot stamping component 1 may
be prevented or minimized.
[0056] The decarburization layer 200 is softer than the base material 100, and when the
hot stamping component 1 includes the decarburization layer 200, the toughness of
the hot stamping component 1 including the decarburization layer 200 may be improved.
[0057] However, as described above, when the depth (or thickness t1) of the inner oxide
layer 300 is too large, liquid zinc may more easily penetrate into the base material
100 by the inner oxide layer 300, the risk of cracks during hot stamping forming may
increase, and thus, the bendability of the manufactured hot stamping component 1 may
be reduced. In detail, when the depth (or the thickness t1) of the inner oxide layer
300 is greater than about 5 µm, liquid zinc may more easily penetrate into the base
material 100 due to the inner oxide layer 300, the risk of cracks during hot stamping
forming may increase, and thus, the bendability of the manufactured hot stamping component
1 may be reduced.
[0058] As described below in a method of manufacturing a hot stamping component, the decarburization
layer 200 may be formed on the base material 100 in an annealing step. In this case,
the inner oxide layer 300 may be simultaneously formed on the decarburization layer
200. In detail, in the annealing step, the decarburization layer 200 may be formed
on the surface of the base material 100, and at the same time, the inner oxide layer
300 may be formed on the surface of the decarburization layer 200.
[0059] When a dew point of an annealing furnace where the annealing step is performed increases,
a depth (or thickness) of the decarburization layer 200 may increase. However, when
the depth (or thickness) of the decarburization layer 200 increases, the depth (or
thickness) of the inner oxide layer 300 may also increase. That is, in order to increase
the toughness of the hot stamping component 1, the depth (or thickness) of the decarburization
layer 200 should increase. However, when the depth (or thickness) of the decarburization
layer 200 increases, the depth (or thickness) of the inner oxide layer 300 may also
increase, thereby increasing the risk of cracks during hot stamping forming and reducing
the bendability of the manufactured hot stamping component 1. Accordingly, it is necessary
to appropriately adjust the depth (or thickness) of the decarburization layer 200
and the depth (or thickness) of the inner oxide layer 300.
[0060] Accordingly, the inventors of the present disclosure have derived Relational Expressions
1 and 2 through excessively repeated experiments to enable the hot stamping component
1 to have a VDA bending angle of about 60° or more. In an embodiment, the hot stamping
component 1 may satisfy Relational Expressions 1 and 2. In detail, a hardness within
a depth of about 50 µm in the plate thickness direction of the hot stamping component
1 from the surface of the hot stamping component 1 and an average hardness of the
hot stamping component 1 may satisfy Relational Expression 1, and the depth (or thickness)
of the inner oxide layer 300 may satisfy Relational Expression 2. For example, the
hot stamping component 1 may satisfy both Relational Expression 1 and Relational Expression
2.

[0061] In Relational Expression 1, A denotes the hardness (Hv(≤50 µm)) within the depth
(or thickness) of about 50 µm in the plate thickness direction of the hot stamping
component 1, and B denotes the average hardness (Hv(avg.)) of the hot stamping component
1.
[0062] In this case, the hardness within the depth of about 50 µm in the plate thickness
direction of the hot stamping component 1 from the surface of the hot stamping component
1 may be a hardness value measured with a Vickers hardness tester at a depth of about
50 µm or less in the plate thickness direction of the hot stamping component 1 from
the surface of the hot stamping component 1, and the average hardness (Hv(avg.)) of
the hot stamping component 1 may be a hardness value measured with the Vickers hardness
tester at about 1/4 point in the plate thickness direction of the hot stamping component
1.

[0063] In Relational Expression 2, C denotes the depth (or thickness) of the inner oxide
layer 300 in the plate thickness direction of the hot stamping component 1.
[0064] Because the decarburization layer 200 is located on the surface of the base material
100, the decarburization layer 200 may be located on a portion adjacent to the surface
of the hot stamping component 1. Because the decarburization layer 200 is softer than
the base material 100, a hardness of a portion of the hot stamping component 1 adjacent
to the surface of the hot stamping component 1 may be lower than the average hardness
of the hot stamping component 1. In this case, when the depth (or thickness) of the
decarburization layer 200 increases, a difference between the hardness of the portion
of the hot stamping component 1 adjacent to the surface of the hot stamping component
1 and the average hardness of the hot stamping component 1 may increase. On the other
hand, when the depth (or thickness) of the decarburization layer 200 decreases, a
difference between the hardness of the portion of the hot stamping component 1 adjacent
to the surface of the hot stamping component 1 and the average hardness of the hot
stamping component 1 may decrease.
[0065] When a ratio between the hardness (Hv(≤50 µm)) within the depth (or thickness) of
about 50 µm in the plate thickness direction of the hot stamping component 1 and the
average hardness (Hv(avg.)) of the hot stamping component 1 is greater than 0.7,the
decarburization layer 200 is not formed (or provided) to a sufficient depth (or thickness),
and thus, the toughness of the hot stamping component 1 including the decarburization
layer 200 may be low. In particular, a VDA bending angle of the hot stamping component
1 may be less than about 60°.
[0066] When the ratio between the hardness (Hv(≤50 µm)) within the depth (or thickness)
of about 50 µm in the plate thickness direction of the hot stamping component 1 and
the average hardness (Hv(avg.)) of the hot stamping component 1 is equal to or less
than 0.7,it may mean that the decarburization layer 200 is formed (or provided) to
a sufficient depth (or thickness). Accordingly, when the ratio between the hardness
(Hv(≤50 µm)) within the depth (or thickness) of about 50 µm in the plate thickness
direction of the hot stamping component 1 and the average hardness (Hv(avg.)) of the
hot stamping component 1 satisfies about 0.7 or less, the decarburization layer 200
is formed (or provided) to a sufficient depth (or thickness), and thus, the toughness
of the hot stamping component 1 including the decarburization layer 200 may be improved.
In particular, the hot stamping component 1 may have a VDA bending angle of about
60° or more.
[0067] Also, as described above, the depth (or thickness) of the inner oxide layer 300 included
in the hot stamping component 1 may be about 5 µm or less.
[0068] When the plating layer 400 is a zinc (Zn)-based plating layer, liquid metal embrittlement
(LME) may occur due to a low melting point of zinc, which may cause cracks to occur
inside and may reduce the bendability of the hot stamping component 1. In this case,
when the depth (or thickness) of the inner oxide layer 300 is large, liquid zinc may
more easily penetrate into the inside due to the inner oxide layer 300, the risk of
cracks during hot stamping forming may increase, and thus, the bendability of the
manufactured hot stamping component 1 may be reduced.
[0069] When the depth (or thickness) of the inner oxide layer 300 is greater than about
5 µm, liquid zinc may more easily penetrate into the inside due to the inner oxide
layer 300, the risk of cracks during hot stamping forming may increase, and thus,
the bendability of the manufactured hot stamping component 1 may be reduced.
[0070] Accordingly, when the depth (or thickness) of the inner oxide layer 300 is about
5 µm or less in the plate thickness direction of the hot stamping component 1, cracks
may be prevented from occurring during hot stamping, and thus, the high-temperature
formability of the hot stamping component (or blank) may be improved.
[0071] In an embodiment, the hot stamping component 1 may satisfy Relational Expression
1 and Relational Expression 2 at the same time. When the hot stamping component 1
satisfies Relational Expression 1 and Relational Expression 2 at the same time, the
hot stamping component 1 may have high toughness and the high-temperature formability
of the hot stamping component 1 may be excellent. In detail, when the hardness within
the depth of 50 µm in the plate thickness direction of the hot stamping component
1 from the surface of the hot stamping component 1 and the average hardness of the
hot stamping component 1 satisfy Relational Expression 1, and the depth (or thickness)
of the inner oxide layer 300 satisfies Relational Expression 2, the hot stamping component
1 may have high toughness and the high-temperature formability of the hot stamping
component 1 may be excellent.
[0072] In an embodiment, when the hot stamping component 1 satisfies both Relational Expression
1 and Relational Expression 2, the hot stamping component 1 may have a tensile strength
(TS) of about 1350 MPa to about 1680 MPa, a yield strength (YP) of about 900 MPa to
about 1300 MPa, and an elongation (EL) of about 4% to about 10%. Also, the hot stamping
component 1 may have a VDA bending angle of about 60° or more. In this case, the VDA
bending angle may be measured in accordance with the VDA standard (VDA238-100).
[0073] FIG. 2 is a flowchart schematically illustrating a method of manufacturing a hot
stamping component, according to an embodiment of the present disclosure. FIGS. 3
to 5 are cross-sectional views schematically illustrating a method of manufacturing
a hot stamping component, according to an embodiment of the present disclosure.
[0074] Referring to FIGS. 2 to 5, a method of manufacturing the hot stamping component 1
(see FIG. 1) according to an embodiment may include a hot rolling step S100, a cooling/coiling
step S200, a cold rolling step S300, an annealing step S400, a plating step S500,
and a hot stamping step S600.
[0075] First, a reheating step of the base material 100 (e.g., steel slab) prepared with
the composition described with reference to FIG. 1 may be performed.
In the steel slab reheating step, the steel slab obtained through a continuous casting
process may be reheated to a certain temperature so that components segregated during
casting are resolved. In an embodiment, a slab reheating temperature (SRT) may be
about 1,200°C to about 1,400°C. When the slab reheating temperature (SRT) is lower
than about 1,200°C, the components segregated during the casting may not be sufficiently
resolved, and thus, it may be difficult to have the homogenization effect of alloy
elements significantly and it may be difficult to have the solution effect of titanium
(Ti) significantly. When the slab reheating temperature (SRT) is high, the slab reheating
temperature (SRT) is favorable for homogenization. However, when the slab reheating
temperature (SRT) is higher than about 1,400°C, an austenite crystal grain size may
increase, and thus, it may be difficult to ensure strength and the manufacturing cost
of a steel sheet may increase due to an excessive heating process.
[0076] In the hot rolling step S100, the reheated base material 100 may be hot-rolled at
a certain finishing rolling temperature. A hot-rolled steel sheet may be manufactured
through the hot rolling step S100. In an embodiment, a finishing delivery temperature
(FDT) may be about 880°C to about 950°C. In this case, when the finishing delivery
temperature (FDT) is lower than about 880°C, the workability of the steel sheet may
not be ensured due to the occurrence of a mixed grain structure caused by abnormal
area rolling, workability may be reduced due to microstructure unevenness, and a passing
ability problem may occur during hot rolling due to a rapid phase change. When the
finishing delivery temperature (FDT) is higher than about 950°C, austenite grains
may be coarsened, TiC precipitates may be coarsened, and thus, the performance of
the hot stamping component may deteriorate.
[0077] In the cooling/coiling step S200, the hot-rolled base material 100 may be cooled
and coiled to a certain coiling temperature (CT). In an embodiment, the coiling temperature
(CT) of the cooling/coiling step S300 may be about 550°C to about 800°C. The coiling
temperature (CT) may affect the redistribution of carbon (C), and when the coiling
temperature (CT) is lower than about 550°C, a low-temperature phase fraction may increase
due to subcooling, strength may increase, a rolling load may increase during cold
rolling, and ductility may rapidly decrease. In contrast, when the coiling temperature
(CT) is higher than about 800°C, abnormal crystal grain growth or excessive crystal
grain growth may cause deterioration in formability and strength.
[0078] In the cold rolling step S300, the coiled base material 100 may be uncoiled, pickled,
and then cold rolled. In this case, the pickling may be performed to remove scale
from the coiled steel sheet (or base material), that is, a hot-rolled coil manufactured
through the hot rolling process described above. A cold-rolled steel sheet may be
manufactured through the cold rolling step S300.
[0079] In the annealing step S400, the cold-rolled base material 100 may be annealed at
a temperature of about 700°C or more. For example, the annealing step S400 may include
heating the cold-rolled base material 100 and cooling the heated base material 100
at a certain cooling rate.
[0080] In an embodiment, the base material may be annealed in the annealing step S400. The
annealing step S400 may be performed in an annealing furnace.
[0081] The annealing of the base material 100 may be performed in a gas atmosphere including
about 0.5 vol% to about 25 vol% of hydrogen and remaining nitrogen. In this case,
water may be sprayed into the annealing furnace together with hydrogen gas and nitrogen
gas. When water is sprayed into the annealing furnace, a dew point of the annealing
furnace may increase. Accordingly, the dew point of the annealing furnace may be controlled
by controlling the amount of water sprayed into the annealing furnace.
[0082] In an embodiment, when the dew point of the annealing furnace increases, the decarburization
layer 200 may be formed on the base material 100. For example, carbon may be lost
from a surface of the base material 100 to form the decarburization layer 200. Also,
at the same time, the inner oxide layer 300 may be formed on the decarburization layer
200. That is, the decarburization layer 200 may be formed on the surface of the base
material 100, and the inner oxide layer 300 may be formed on a surface of the decarburization
layer 200. In this case, the decarburization layer 200 and the inner oxide layer 300
may be layers obtained by changing a portion of the base material 100.
[0083] In this case, a layer having a hardness of about 80% or less compared to an average
hardness at about 1/4 point from the surface of the base material 100 may be defined
as the decarburization layer 200. That is, an average hardness of the decarburization
layer 200 may be about 80% or less of the average hardness at about 1/4 point from
the surface of the base material 100.
[0084] In an embodiment, the dew point of the annealing furnace where the annealing of the
base material 100 is performed may be about -15°C to about +15°C. The decarburization
layer 200 is formed on the base material 100 in order to improve the toughness of
the manufactured hot stamping component 1. However, when the dew point of the annealing
furnace is about -15°C or lower, a depth (or thickness) of the decarburization layer
200 may be too small, and thus, the effect of improving the toughness of the manufactured
hot stamping component may be insignificant. On the other hand, when the dew point
of the annealing furnace is about +15°C or higher, a depth (or thickness t3) of the
inner oxide layer 300 may be too large, and thus LME cracks may occur and operability
may be reduced due to equipment oxidation. For example, a large amount of water should
be supplied to the annealing furnace in order to increase the dew point of the annealing
furnace. When a large amount of water is supplied to the annealing furnace, equipment
of the annealing furnace may be oxidized, and it may take a long time to clean the
equipment, thereby reducing operability. Also, when the dew point of the annealing
furnace is high, the depth (or thickness) of the decarburization layer 200 and the
depth (or thickness t3) of the inner oxide layer 300 may increase, and thus, cracks
may occur inside during high-temperature forming due to the inner oxide layer 300.
Accordingly, when the dew point of the annealing furnace where the annealing of the
base material 100 is performed satisfies about -15°C to about +15°C, the toughness
of the manufactured hot stamping component 1 may be improved and the efficiency of
a manufacturing process may be improved.
[0085] In an embodiment, a line speed of the annealing furnace where the annealing of the
base material 100 is performed may be about 30 meters per minute (mpm) to about 200
mpm. When the line speed of the annealing furnace is about 30 mpm or less, a moving
speed of the base material 100 may be too slow, which may lead to a sharp decrease
in productivity. When the line speed of the annealing furnace is about 200 mpm or
more, a staying time of the base material 100 in the annealing furnace may be too
short, the depth (or thickness) of the decarburization layer 200 may decrease, and
thus, the effect of improving the toughness of the manufactured hot stamping component
may be insignificant. Accordingly, when the line speed of the annealing furnace where
the annealing of the base material 100 is performed satisfies about 30 mpm to about
200 mpm, the productivity of the hot stamping component may be improved, and at the
same time, the toughness of the manufactured hot stamping component may be improved.
[0086] In an embodiment, an annealing temperature of the base material 100 may be about
750°C to about 900°C. When the annealing temperature of the base material 100 is lower
than about 750°C, a desired structure may not be obtained, and recrystallization may
not be sufficiently completed. On the other hand, when the annealing temperature of
the base material 100 is higher than about 900°C, the annealing temperature may be
too high, and thus, the efficiency of the manufacturing process may be reduced. Accordingly,
when the annealing temperature of the base material 100 satisfies about 750°C to about
900°C, a desired structure may be obtained, recrystallization may be sufficiently
completed, and the efficiency of the manufacturing process may be improved.
[0087] The plating step S500 may be a step of forming the plating layer 400 on the annealed
base material 100. In an embodiment, the plating layer 400 may be formed on the annealed
base material 100 through the plating step S500. In detail, the plating layer 400
may be formed on a surface of the inner oxide layer 300 through the plating step S500.
In this case, the plating layer 400 may include a zinc (Z)-based plating layer or
an aluminum (Al)-based plating layer.
[0088] In detail, in the plating step S500, the annealed base material 100 may be immersed
in a plating bath. In this case, the plating bath may be maintained at a temperature
of about 400°C to about 700°C. The adhesion amount of the plating layer may be about
40 g/m
2 to about 200 g/m
2 on both surfaces of the base material 100 (or the inner oxide layer 300).
[0089] In an embodiment, a depth (or thickness t4) of the plating layer 400 formed on the
base material 100 or the decarburization layer 200 may be about 5 µm to about 20 µm
in the plate thickness direction of the base material 100. When the depth (or thickness)
of the plating layer 400 is about 5 µm or less, the sacrificial method of the plating
layer 400 may be insufficient. When the depth (or thickness) of the plating layer
400 is about 20 µm or more, the cost of forming the plating layer 400 may increase,
thereby reducing economic feasibility. Accordingly, when the depth (or thickness t4)
of the plating layer 400 satisfies about 5 µm to about 20 µm, corrosion of the base
material 100 of the hot stamping component 1 may be prevented or minimized.
[0090] In an embodiment, the annealing step S400 and the plating step S500 may be performed
on the same line. Accordingly, a line speed at which the plating step S500 is performed
may be about 30 mpm to about 200 mpm. When the line speed is about 30 mpm or less,
the line speed may be too slow, and thus, productivity may be reduced. A plating amount
is controlled by using an air knife. When the line speed is about 200 mpm or more,
the line speed may be too fast, and thus, it may be difficult to control the plating
amount by using the air knife. Accordingly, when the line speed at which the plating
step S500 is performed satisfies about 30 mpm to about 200 mpm, productivity may be
improved, and at the same time, the plating amount may be easily controlled.
[0091] In an embodiment, a plated steel sheet having the plating layer 400 formed on at
least one surface of the base material 100 may be manufactured through the plating
step S500. In this case, the plated steel sheet may include the base material 100,
the decarburization layer 200 formed on the base material 100, the inner oxide layer
300 formed on the decarburization layer 200, and the plating layer 400 formed on the
inner oxide layer 300. In detail, the plated steel sheet may include the base material
100, the decarburization layer 200 formed on the surface of the base material 100,
the inner oxide layer 300 formed on the surface of the decarburization layer 200,
and the plating layer 400 formed on the surface of the inner oxide layer 300.
[0092] FIG. 6 is a flowchart schematically illustrating a hot stamping step, according to
an embodiment of the present disclosure. FIG. 7 is a flowchart schematically illustrating
a heating step, according to an embodiment of the present disclosure.
[0093] Referring to FIGS. 6 and 7, the hot stamping step S600 may be performed after the
plating step S500 (see FIG. 2). The hot stamping step S600 may include a heating step
S610, a transferring step S620, a forming step S630, and a cooling step S640.
[0094] First, a blank may be formed by cutting the plated steel sheet having the plating
layer 400 (see FIG. 5) formed on at least one surface of the base material 100 (see
FIG. 5). In this case, the decarburization layer 200 (see FIG. 5) and the inner oxide
layer 300 (see FIG. 5) may be located between the base material 100 and the plating
layer 400.
[0095] In the heating step S610, the blank may be heated in a heating furnace having a plurality
of sections with different temperature ranges. As shown in FIG. 7, the heating step
S610 may include a multi-stage heating step S611 and a soaking step S612. The multi-stage
heating step S611 and the soaking step S612 may be steps in which the blank is heated
while passing through the plurality of sections provided in the heating furnace.
[0096] In an embodiment, an overall temperature of the heating furnace may be about 680°C
to about 910°C. In detail, the overall temperature of the heating furnace where the
multi-stage heating step S611 and the soaking step S612 are performed may be about
680°C to about 910°C. In this case, a temperature of the heating furnace where the
multi-stage heating step S611 is performed may be about 680°C to about Ac1, and a
temperature of the heating furnace where the soaking step S612 is performed may be
about Ac1 to about 910°C.
[0097] In the multi-stage heating step S611, the blank may be heated stepwise while passing
through the plurality of sections provided in the heating furnace. From among the
plurality of sections provided in the heating furnace, there may be a plurality of
sections in which the multi-stage heating step S611 is performed, and a temperature
may be set for each section so as to increase in a direction from an inlet of the
heating furnace into which the blank is inserted to an outlet of the heating furnace
from which the blank is taken out, and thus, a temperature of the blank may be raised
in stages.
[0098] The soaking step S612 may be performed after the multi-stage heating step S611. In
the soaking step S612, the stepwise heated blank may be heated (or soaked) while passing
through a section of the heating furnace set to a temperature of about Ac1 to about
910°C. From among the plurality of sections provided in the heating furnace, there
may be at least one section in which the soaking step S612 is performed.
[0099] FIG. 8 is a diagram for describing a heating furnace having a plurality of sections,
in a heating step of a method of manufacturing a hot stamping component, according
to an embodiment of the present disclosure.
[0100] Referring to FIG. 8, a heating furnace according to an embodiment may include a plurality
of sections with different temperature ranges. In detail, the heating furnace may
include a first section P
1 with a first temperature range T
1, a second section P
2 with a second temperature range T
2, a third section P
3 with a third temperature range T
3, a fourth section P
4 with a fourth temperature range T
4, a fifth section P
5 with a fifth temperature range T
5, a sixth section P
6 with a sixth temperature range T
6, and a seventh section P
7 with a seventh temperature range T
7.
[0101] In an embodiment, in the multi-stage heating step S611, a blank may be heated stepwise
while passing through the first section P
1 to the fourth section P
4 defined in the heating furnace. Also, in the soaking step S612, the blank stepwise
heated in the first section P
1 to the fourth section P
4 may be soaked while passing through the fifth section P
5 to the seventh section P
7.
[0102] The first section P
1 to the seventh section P
7 may be sequentially arranged in the heating furnace. The first section P
1 with the first temperature range T
1 may be adjacent to an inlet of the heating furnace into which the blank is inserted,
and the seventh section P
7 with the seventh temperature range T
7 may be adjacent to an outlet of the heating furnace from which the blank is taken
out. Accordingly, the first section P
1 with the first temperature range T
1 may be a first section of the heating furnace, and the seventh section P
7 with the seventh temperature range T
7 may be a last section of the heating furnace.
[0103] Temperatures of the plurality of sections provided in the heating furnace, for example,
temperatures of the first section P
1 to the seventh section P
7, may increase in a direction from the inlet of the heating furnace into which the
blank is inserted to the outlet of the heating furnace from which the blank is taken
out. However, temperatures of the fifth section P
5, the sixth section P
6, and the seventh section P
7 may be the same. Also, a temperature difference between two adjacent sections from
among the plurality of sections provided in the heating furnace may be greater than
about 0°C and less than or equal to about 100°C. For example, a temperature difference
between the first section P
1 and the second section P
2 may be greater than about 0°C and less than or equal to about 100°C.
[0104] A heating furnace temperature of the soaking step S612 may be about Ac1 to about
910°C. When the heating furnace temperature of the soaking step S612 is about Ac1
or lower, the manufactured hot stamping component may not have a desired material.
On the other hand, when the heating furnace temperature of the soaking step S612 is
about 910°C or higher, zinc (Zn) included in the plating layer 400 may be vaporized,
resulting in loss of the plating layer 400. Accordingly, when the heating furnace
temperature of the soaking step S612 satisfies about Ac1 to about 910°C, the manufactured
hot stamping component may be formed of a desired material, and loss of the plating
layer 400 may be prevented.
[0105] Although the heating furnace according to an embodiment includes seven sections with
different temperature ranges in FIG. 8, the present disclosure is not limited thereto.
The heating furnace may include five, sixth, or eight sections with different temperature
ranges.
[0106] In an embodiment, because the heating step S610 includes the multi-stage heating
step S611 and the soaking step S612, a temperature of the heating furnace may be set
in stages, and thus, the energy efficiency of the heating furnace may be improved.
[0107] In an embodiment, the heating furnace may have a length of about 20 m to about 40
m along a transfer path of the blank. The heating furnace may include the plurality
of sections with different temperature ranges, and a ratio between a length of a section
where the blank is stepwise heated and a length of a section where the blank is soaked
from among the plurality of sections may satisfy about 1:1 to about 4:1. When the
length of the section where the blank is soaked in the heating furnace increases and
the ratio between the length of the section where the blank is stepwise heated and
the length of the section where the blank is soaked is greater than about 1:1, the
amount of hydrogen penetrating into the blank in the soaking section may increase,
thereby increasing delayed fracture. On the other hand, when the length of the section
where the blank is soaked decreases and the ratio between the length of the section
where the blank is stepwise heated and the length of the section where the blank is
soaked is less than about 4:1, the soaking section (or time) is not sufficiently secured,
and thus, the strength of the hot stamping component manufactured by the process of
manufacturing a hot stamping component may be uneven. For example, the length of the
soaking section from among the plurality of sections provided in the heating furnace
may be about 20% to about 50% of a total length of the heating furnace.
[0108] In an embodiment, a total heating time during which the heating step S610 is performed
may be about 2 min to about 20 min. That is, a total time during which the blank stays
in the heating furnace may be about 2 min to about 20 min. When the total heating
time during which the heating step S610 is performed is about 2 min or less, a heating
time may be insufficient and thus, the manufactured hot stamping component 1 may not
have a desired material. On the other hand, when the total heating time during which
the heating step S610 is performed is about 20 min or more, a heating time may be
too long and thus, a production speed may decrease and economic feasibility may decrease.
Accordingly, when the total heating time during which the heating step S610 is performed
satisfies about 2 min to about 20 min, the manufactured hot stamping component 1 may
have a desired material, and at the same time, a decrease in the economic feasibility
of the manufacturing process may be prevented or minimized.
[0109] After the heating step S610, the transferring step S620, the forming step S630, and
the cooling step S640 may be further performed.
[0110] In an embodiment, the transferring step S620 may be a step of transferring the heated
blank from the heating furnace to a mold. In this case, in the transferring step S620,
the heated blank may be cooled to an atmospheric temperature (or room temperature).
That is, the heated blank may be air-cooled during transfer. When the heated blank
is not air-cooled, a mold entry temperature (e.g., forming start temperature) may
increase, and thus, wrinkles (or bends) may occur on a surface of the manufactured
hot stamping component 1. Also, because the use of a refrigerant may affect a post-process
(hot stamping), it may be preferable that the heated blank is air-cooled during transfer.
[0111] In an embodiment, the forming step S630 may be a step of hot stamping the transferred
blank to form a molded body. In detail, in the forming step S630, the blank may be
pressed with the mold to form a molded body.
[0112] In an embodiment, the forming start temperature may be about 500°C to about 700°C.
When the forming start temperature is lower than about 500°C, the forming start temperature
may be too low, and thus, the formability of the blank may decrease, and the manufactured
hot stamping component 1 may not have a desired structure and properties. On the other
hand, when the forming start temperature is higher than about 700°C, wrinkles (or
bends) may occur on the surface of the manufactured hot stamping component 1. Also,
the plating layer 400 may stick to the mold. Accordingly, when the forming start signal
is about 500°C to about 700°C, the formability of the blank may be improved, the manufactured
hot stamping component 1 may have a desired structure and properties, and the occurrence
of wrinkles (or bends) on the surface of the manufactured hot stamping component 1
may be prevented or minimized.
[0113] In an embodiment, the cooling step S640 may be a step of cooling the molded body.
The cooling step S640 may be performed in the mold in which the blank is pressed.
[0114] In detail, a final product may be formed by cooling the molded body at the same time
as forming the molded body into a final component shape. A cooling channel through
which a refrigerant circulates may be provided in the mold. The molded body may be
rapidly cooled by circulation of the refrigerant supplied through the cooling channel
provided in the mold. In this case, in order to prevent a spring back phenomenon of
a plate material and maintain a desired shape, the blank may be pressed and rapidly
cooled while the mold is closed. When the molded body is formed and cooled, the molded
body may be cooled at an average cooling rate of at least about 10°C/s to a martensite
end temperature.
[0115] In an embodiment, a cooling end temperature at which the cooling step S640 ends may
be about room temperature to about 200°C. When the cooling end temperature is lower
than room temperature, the productivity of the manufacturing process may decrease.
On the other hand, when the cooling end temperature is higher than about 200°C, the
manufactured hot stamping component 1 is air-cooled at room temperature, and in this
case, distortion may occur in the hot stamping component 1, and it may be difficult
to secure a target material. Accordingly, when the cooling end temperature at which
the cooling step S640 ends satisfies room temperature to about 200°C, the productivity
of the manufacturing process may be improved, and distortion of the manufactured hot
stamping component 1 may be prevented or minimized.
[0116] Accordingly, the inventors of the present disclosure have derived Relational Expressions
3 and 4 through excessively repeated experiments to enable the manufactured hot stamping
component 1 to have a VDA bending angle of about 60° or more. In an embodiment, the
manufactured hot stamping component 1 may satisfy Relational Expressions 3 and 4.
In detail, a hardness within a depth of 50 µm in the plate thickness direction of
the hot stamping component 1 from the surface of the hot stamping component 1 and
an average hardness of the hot stamping component 1 may satisfy Relational Expression
3, and a depth (or thickness) of the inner oxide layer 300 may satisfy Relational
Expression 4. For example, the hot stamping component 1 may satisfy both Relational
Expression 3 and Relational Expression 4.

[0117] In Relational Expression 3, A denotes the hardness (Hv(≤50 µm)) within the depth
(or thickness) of about 50 µm in the plate thickness direction of the hot stamping
component 1, and B denotes the average hardness (Hv(avg.)) of the hot stamping component
1.
[0118] In this case, the hardness within the depth of about 50 µm in the plate thickness
direction of the hot stamping component 1 from the surface of the hot stamping component
1 may be a hardness value measured with a Vickers hardness tester at a depth of about
50 µm or less in the plate thickness direction of the hot stamping component 1 from
the surface of the hot stamping component 1, and the average hardness (Hv(avg.)) of
the hot stamping component 1 may be a hardness value measured with the Vickers hardness
tester at about 1/4 point in the plate thickness direction of the hot stamping component
1.

[0119] In Relational Expression 4, C denotes the depth (or thickness) of the inner oxide
layer 300 in the plate thickness direction of the hot stamping component 1.
[0120] In an embodiment, when the manufactured hot stamping component 1 satisfies both Relational
Expression 3 and Relational Expression 4, the toughness of the hot stamping component
1 manufactured through the method of manufacturing a hot stamping component may be
improved. For example, the hot stamping component 1 manufactured through the method
of manufacturing a hot stamping component may have a VDA bending angle of about 60°
or more. Also, the hot stamping component 1 manufactured through the method of manufacturing
a hot stamping component may have a tensile strength (TS) of about 1350 MPa to about
1680 MPa, a yield strength (YP) of about 900 MPa to about 1300 MPa, and an elongation
(EL) of about 4% to about 10%.
<Experimental Examples>
[0121] Hereinafter, the present disclosure will be described through experimental examples.
However, the following experimental examples are intended to explain the present disclosure
in more detail, and the scope of the present disclosure is not limited by the following
experimental examples. The following experimental examples may be appropriately modified
and changed by one of ordinary skill in the art within the scope of the present disclosure.
[Table 1]
Components (wt%) |
C |
Si |
Mn |
P |
S |
Cr |
B |
Ti |
0.22 |
0.3 |
1.5 |
0.02 or less |
0.015 or less |
0.25 |
0.0025 |
0.05 |
[Table 2]
|
SRT (°C) |
FDT (°C) |
CT (°C) |
Annealing temperatu re (°C) |
Anneali ng furnace Dew point (°C) |
Heating temperatur e (°C) |
Heating time (min) |
Embodiment 1 |
1215 |
900 |
713 |
820 |
0 |
870 |
5 |
Embodiment 2 |
1215 |
900 |
713 |
820 |
14 |
870 |
5 |
Comparative Example 1 |
1215 |
900 |
713 |
820 |
20 |
870 |
5 |
Comparative Example 2 |
1215 |
900 |
713 |
820 |
-30 |
870 |
5 |
[0122] Embodiment 1, Embodiment 2, Comparative Example 1, and Comparative Example 2 are
hot stamping components (samples) manufactured using a slab having a composition shown
in Table 1 under process conditions shown in Table 2.
[Table 3]
|
A/B |
C(µm) |
VDA bending angle (°) |
Crack depth (µm) |
Embodiment 1 |
0.70 |
1.3 |
72.19 |
2.8 |
Embodiment 2 |
0.39 |
5 |
75.44 |
4.1 |
Comparative Example 1 |
0.33 |
7.1 |
58.96 |
15.2 |
Comparative Example 2 |
0.72 |
0.1 |
54.77 |
1.0 |
[0123] In Table 3, A denotes the hardness (Hv(≤50 µm)) within the depth (or thickness) of
about 50 µm in the plate thickness direction of the hot stamping component, B denotes
the average hardness (Hv(avg.)) of the hot stamping component, andC denotes the depth
(or thickness) of the inner oxide layer 300 in the plate thickness direction of the
hot stamping component. In this case, the hardness within the depth of about 50 µm
in the plate thickness direction of the hot stamping component 1 from the surface
of the hot stamping component 1 may be a hardness value measured with a Vickers hardness
tester at a depth of about 50 µm or less in the plate thickness direction of the hot
stamping component 1 from the surface of the hot stamping component 1, and the average
hardness (Hv(avg.)) of the hot stamping component 1 may be a hardness value measured
with the Vickers hardness tester at about 1/4 point in the plate thickness direction
of the hot stamping component 1.
[0124] In Table 3, the VDA bending angle was evaluated by using the VDA standard (VDA238-100),
and the crack depth was measured by using a scanning electron microscope. In this
case, the crack depth corresponds to a deepest crack depth measured through the scanning
electron microscope.
[0125] The VDA bending angle of the hot stamping component required by the present disclosure
is 60° or more. Also, when the crack depth in the hot stamping component is large,
the VDA bending angle of the hot stamping component may decrease, and the toughness
of the hot stamping component may decrease. Accordingly, the crack depth in the hot
stamping component required by the present disclosure is 10 µm or less. When the crack
depth is out of the range, it corresponds to a case where the required conditions
are not satisfied.
[0126] Embodiments 1 and 2 correspond to a case where both Relational Expression 1 ((A /
B) ≤ 0.7) and Relational Expression 2 (C≤5) are satisfied, Comparative Example 1 corresponds
to a case where Relational Expression 2 (C≤5) is not satisfied, and Comparative Example
2 corresponds to a case where Relational Expression 1 ((A / B) ≤ 0.7) is not satisfied.
Embodiment 1, Embodiment 2, Comparative Example 1, and Comparative Example 2 correspond
to samples manufactured using the base material 100 (or steel sheet) satisfying the
composition of FIG. 1 according to the method of manufacturing a hot stamping component.
However, Comparative Example 1 and Comparative Example 2 are samples that do not satisfy
Relational Expression 1 ((A / B) ≤ 0.7) and/or Relational Expression 2 (C≤5) due to
a difference in process control conditions.
[0127] When both Relational Expression 1 ((A / B) ≤ 0.7) and Relational Expression 2 (C≤5)
are satisfied, it may be found that the VDA bending angle and the crack depth satisfy
the required conditions. In detail, when both Relational Expression 1 ((A / B) ≤ 0.7)
and Relational Expression 2 (C≤5) are satisfied, it may be found that the VDA bending
angle is 60° or more and the crack depth is 10 µm or less.
[0128] However, when Relational Expression 2 (C≤5) is not satisfied, it may be found that
the VDA bending angle and the crack depth do not satisfy the required conditions.
In detail, when Relational Expression 2 (C≤5) is not satisfied, it may be found that
the VDA bending angle is less than 60° and the crack depth is greater than 10 µm.
[0129] Also, when Relational Expression 1 ((A / B) ≤ 0.7) is not satisfied, it may be found
that the VDA bending angle does not satisfy the required condition. In detail, when
Relational Expression 1 ((A / B) ≤ 0.7) is not satisfied, it may be found that the
VDA bending angle is less than 60°.
[0130] Accordingly, when the hot stamping component 1 satisfies both Relational Expression
1 ((A / B) ≤ 0.7) and Relational Expression 2 (C≤5), the hot stamping component 1
may have the required VDA bending angle, and the crack depth in the hot stamping component
1 may be formed below a preset value. That is, when the hot stamping component 1 satisfies
both Relational Expression 1 ((A / B) ≤ 0.7) and Relational Expression 2 (C≤5), the
hot stamping component 1 may have excellent toughness and high-temperature formability.
[0131] While the present disclosure has been particularly shown and described with reference
to embodiments thereof, they are provided for the purposes of illustration and it
will be understood by one of ordinary skill in the art that various modifications
and equivalent other embodiments made be made from the present disclosure. Accordingly,
the true technical scope of the present disclosure is defined by the technical spirit
of the appended claims.