A TARGET FOR SUBSEQUENT EXPOSURE TO AN ACCELERATED PROTON BEAM AND METHOD OF MAKING SAME - Patent 4537634

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EP 4 537 634 A1

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(43)	Date of publication:
	16.04.2025 Bulletin 2025/16

(21)	Application number: 23853791.4

(22)	Date of filing: 18.08.2023

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International Patent Classification (IPC):

H05H 6/00^(2006.01)
C25D 7/00^(2006.01)

C25D 3/54^(2006.01)

(52)	Cooperative Patent Classification (CPC):
	G21G 1/10; C25D 9/08; C25D 9/12; C25D 7/00; H05H 6/00; C25D 17/10; C25D 9/00; H05H 2277/116; H05H 2277/11

(86)	International application number:
	PCT/CA2023/051100

(87)	International publication number:
	WO 2024/036411 (22.02.2024 Gazette 2024/08)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
	Designated Extension States:
	BA
	Designated Validation States:
	KH MA MD TN

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Priority:

19.08.2022 US 202263371985 P

(71)	Applicant: Atomic Energy of Canada Limited/ Énergie Atomique du Canada Limitée
	Chalk River, Ontario K0J 1J0 (CA)

(72)	Inventor:
	PERRON, Randy Chalk River, Ontario K0J 1J0 (CA)

(74)	Representative: Marks & Clerk LLP
	15 Fetter Lane London EC4A 1BW London EC4A 1BW (GB)

(54)	A TARGET FOR SUBSEQUENT EXPOSURE TO AN ACCELERATED PROTON BEAM AND METHOD OF MAKING SAME