FIELD
[0001] Embodiments described herein relate generally to a display device.
BACKGROUND
[0002] Recently, display devices equipped with organic light-emitting diodes (OLED), which
are light emitting elements functioning as display elements, have been put into practical
use.
[0003] In such a display device, the light-emitting elements are driven by pixel circuits,
but the display quality of the display device may be degraded depending on the circuit
configuration of the pixel circuits.
BRIEF DESCRIPTION OF THE DRAWINGS
[0004]
FIG. 1 is a view showing a configuration example of a display device of an embodiment.
FIG. 2 is a view showing an example of layout of a plurality of subpixels included
in a pixel.
FIG. 3 is a view showing another example of the layout of a plurality of subpixels
included in a pixel.
FIG. 4 is a schematic cross-sectional view showing the display device along A-A line
in FIG. 2.
FIG. 5 is a schematic enlarged cross-sectional view showing a partition.
FIG. 6 is a schematic cross-sectional view illustrating the light emitting element
formed using the partition.
FIG. 7 is a schematic cross-sectional view illustrating the light emitting element
formed using the partition.
FIG. 8 is a schematic cross-sectional view illustrating the light emitting element
formed using the partition.
FIG. 9 is a view illustrating an example of a circuit configuration of a pixel circuit.
FIG. 10 is a view showing an outline of PWM drive.
FIG. 11 is a view illustrating an operation of the PWM drive of a pixel circuit.
FIG. 12 is a view illustrating the display quality of the display device to which
PWM drive is applied.
FIG. 13 is a view illustrating an area where ghosting occurs.
FIG. 14 is a view showing an example of the layout of the pixel circuit.
DETAILED DESCRIPTION
[0005] In general, according to one embodiment, a display device includes a base, a plurality
of pixels arranged in a display area on the base, and a data signal line supplying
a data signal to each of the plurality of pixels. Each of the plurality of pixels
includes a pixel circuit including a plurality of transistors and a light emitting
element driven by the pixel circuit. The pixel circuit is configured to drive the
light emitting element to emit light in time division. Preferably, the first transistor
connected to the data signal line, among the plurality of transistors in the pixel
circuit, is an oxide transistor. Additionally or alternatively to the option of the
first transistor being an oxide transistor said first transistor can be configured
to have a smaller leak current as compared to the second transistor supplying a current
to the light emitting element, among the plurality of transistors.
[0006] An embodiment will be described hereinafter with reference to the accompanying drawings.
[0007] The disclosure is merely an example, and proper changes within the spirit of the
invention, which are easily conceivable by a person of ordinary skill in the art,
are included in the scope of the invention as a matter of course. In addition, in
some cases, in order to make the description clearer, the widths, thicknesses, shapes
and the like, of the respective parts are schematically illustrated in the drawings,
compared to the actual modes. However, the schematic illustration is merely an example,
and adds no restriction to the interpretation of the invention. In addition, in the
specification and drawings, structural elements which function in the same or a similar
manner to those described in connection with preceding drawings are denoted by like
reference numbers, detailed description thereof being omitted unless necessary.
[0008] In the figures, an X-axis, a Y-axis and a Z-axis orthogonal to each other are described
to facilitate understanding as needed. A direction along the X-axis is referred to
as a first direction X, a direction along the Y-axis is referred to as a second direction
Y, and a direction along the Z-axis is referred to as a third direction Z. In addition,
viewing various elements parallel to the third direction Z is referred to as plan
view.
[0009] The display device according to the present embodiment is an organic electroluminescent
display device including organic light emitting diodes (OLED) as display elements
(light emitting elements), and is mounted on televisions, personal computers, mobile
terminals, mobile phones, and the like.
[0010] FIG. 1 is a view showing a configuration example of a display device DSP according
to the present embodiment. The display device DSP has a display area DA where images
are displayed and a non-display area NDA around the display area DA, on an insulating
base 10. The base 10 may be glass or a flexible resin film.
[0011] In the present embodiment, the shape of the base 10 in plan view is a rectangular
shape. However, the shape of the base 10 in plan view is not limited to a rectangular
shape, but may also be the other shape such as a square, a circle or an ellipse.
[0012] The display area DA includes a plurality of pixels PX arrayed (arranged) in a matrix
in the first direction X and the second direction Y. Each of the pixels PX includes
a plurality of subpixels SP. In one example, the plurality of subpixels SP include
red subpixels SP1, green subpixels SP2, and blue subpixels SP3. Incidentally, the
plurality of subpixels SP may include subpixels of the other color such as white in
addition to the subpixels SP1, SP2, and SP3. Incidentally, the plurality of subpixels
SP may include subpixels of the other color instead of any subpixels of the subpixels
SP1, SP2, and SP3.
[0013] Incidentally, as described in more detail below, each of the plurality of subpixels
SP includes a pixel circuit and a light emitting element driven by the pixel circuit.
The pixel circuit is composed of, for example, a plurality of transistors (switching
elements composed of thin-film transistors), and the like. The light emitting element
is the above-described organic light emitting diode. For example, the subpixel SP1
includes a light emitting element that emits light so as to emit light of a red wavelength
range, the subpixel SP2 includes a light emitting element that emits light so as to
emit light of a green wavelength range, and the subpixel SP3 includes a light emitting
element that emits light so as to emit light of a blue wavelength range.
[0014] FIG. 2 shows an example of a layout of the plurality of subpixels SP (SP1, SP2, and
SP3) included in the pixel PX. Four pixels PX are focused in this example.
[0015] Each of the subpixels SP1, SP2, and SP3 constituting one pixel PX are formed in a
substantially rectangular shape extending in the second direction Y, and the subpixels
are arranged in the first direction X. When two pixels PX arranged in the first direction
X are focused, the colors displayed in the subpixels SP adjacent in the first direction
X are different from each other. In addition, when two pixels PX arranged in the second
direction Y are focused, the colors displayed in the subpixels SP adjacent in the
second direction Y are the same. Incidentally, the area of the subpixels SP1, SP2,
and SP3 may be the same or different from each other.
[0016] FIG. 3 shows another example of the layout of the plurality of subpixels (SP1, SP2,
and SP3) included in the pixels PX.
[0017] The subpixels SP1 and SP2 constituting one pixel PX are arranged in the second direction
Y, the subpixels SP1 and SP3 are arranged in the first direction X, and the subpixels
SP2 and SP3 are arranged in the first direction X. The subpixel SP1 is formed in a
substantially rectangular shape extending in the first direction X, and the subpixels
SP2 and SP3 are formed in a substantially rectangular shape extending in the second
direction Y. The area of the subpixel SP2 is larger than the area of the subpixel
SP1, and the area of the subpixel SP3 is larger than the area of the subpixel SP2.
Incidentally, the shape and area of the subpixel SP1 may be the same as those of the
subpixel SP2.
[0018] When two pixels PX arranged in the first direction X are focused, the colors displayed
in the subpixels SP adjacent in the first direction X are different from each other
in the area where the subpixels SP1 and SP3 are provided alternately and the area
where the subpixels SP2 and SP3 are provided alternately. In contrast, when two pixels
PX arranged in the second direction Y are focused, the colors displayed in the subpixels
SP adjacent in the second direction Y are different from each other in the area where
the subpixels SP1 and SP2 are provided alternately. In addition, the colors displayed
in the subpixels SP adjacent in the second direction Y are the same in the area where
the plurality of subpixels SP3 are arranged.
[0019] Incidentally, the outer shape of the subpixels SP1, SP2 and SP3 shown in FIG. 2 and
FIG. 3 correspond to the outer shape of the area (i.e., the light emitting area) where
colors are displayed in the subpixels SP, but the shape is simplified and does not
necessarily reflect the actual shape.
[0020] As described in more detail below, a rib and a partition are provided in the display
area DA in the present embodiment. The rib includes an aperture in each of the subpixels
SP1, SP2 and SP3. The partition is provided on a boundary between adjacent subpixels
SP and overlaps with the rib in plan view. More specifically, the partition is provided
between the apertures (subpixels SP) that are adjacent in the first direction X and
between the apertures (subpixels SP) that are adjacent in the second direction Y.
As a result, the partition has a grating shape formed to partition the subpixels SP1,
SP2, and SP3 as a whole. In other words, the partition is considered to include apertures
at the subpixels SP1, SP2, and SP3, similarly to the rib.
[0021] FIG. 4 is a schematic cross-sectional view showing the display device DSP along A-A
line in FIG. 2. In the display device DSP, an insulating layer 11 referred to as an
undercoat layer is provided on the above-described light-transmissive base 10 such
as glass (i.e., on the surface of the side where the light emitting elements, and
the like are provided).
[0022] The insulating layer 11 has, for example, a three-layer stacked structure with a
silicon oxide film (SiO), a silicon nitride film (SiN), and a silicon oxide film (SiO).
Incidentally, the insulating layer 11 is not limited to a three-layer stacked structure.
The insulating layer 11 may have a stacked structure with more than three layers or
may have a single-layer structure or a two-layer stacked structure.
[0023] A circuit layer 12 is provided on the insulating layer 11. The circuit layer 12 includes
pixel circuits (various circuits and wires) that drives the light emitting elements
included in each of the subpixels SP1, SP2, and SP3, as described above. The circuit
layer 12 is covered with an insulating layer 13.
[0024] The insulating layer 13 functions as a planarization film which planarizes uneven
parts generated by the circuit layer 12. Although not shown in FIG. 4, contact holes
for connecting lower electrodes LE to the pixel circuit are provided in the insulating
layer 13.
[0025] The lower electrodes LE (LE1, LE2, and LE3) are provided on the insulating layer
13. The rib 5 is provided on the insulating layer 13 and the lower electrodes LE.
End portions (parts) of the lower electrodes LE are covered with the rib 5.
[0026] The partition 6 includes a lower portion 61 provided on the rib 5 and an upper portion
62 that covers an upper surface of the lower portion 61. The upper portion 62 has
a width greater than that of the lower portion 61 in the first direction X and the
second direction Y. As a result, the partition 6 has a shape in which both end portions
of the upper portion 62 protrude beyond side surfaces of the lower portion 61. This
shape of the partition 6 may be referred to as an overhang shape.
[0027] The organic layers OR (OR1, OR2 and OR3) and the upper electrodes UE (UE1, UE2 and
UE3) constitute the light emitting elements included in the subpixels SP with the
above-described lower electrodes LE (LE1, LE2 and LE3).
[0028] As shown in FIG. 4, the organic layer OR1 includes a first organic layer OR1a and
a second organic layer OR1b that are separated from each other. The upper electrode
UE1 includes a first upper electrode UE1a and a second upper electrode UE1b that are
separated from each other. The first organic layer OR1a is in contact with the lower
electrode LE1 through the aperture AP1 (i.e., an aperture of the rib 5 in the subpixel
SP1) and covers a part of the rib 5. The second organic layer OR1b is located on the
upper portion 62. The first upper electrode UE1a is opposed to the lower electrode
LE1 and covers the first organic layer OR1a. Furthermore, the first upper electrode
UE1a is in contact with side surfaces of the lower portion 61. The second upper electrode
UE1b is located above the partition 6 and covers the second organic layer OR1b.
[0029] In addition, as shown in FIG. 4, the organic layer OR2 includes a first organic layer
OR2a and a second organic layer OR2b that are separated from each other. The upper
electrode UE2 includes a first upper electrode UE2a and a second upper electrode UE2b
that are separated from each other. The first organic layer OR2a is in contact with
the lower electrode LE2 through the aperture AP2 (i.e., an aperture of the rib 5 in
the subpixel SP2) and covers a part of the rib 5. The second organic layer OR2b is
located on the upper portion 62. The first upper electrode UE2a is opposed to the
lower electrode LE2 and covers the first organic layer OR2a. Furthermore, the first
upper electrode UE2a is in contact with side surfaces of the lower portion 61. The
second upper electrode UE2b is located above the partition 6 and covers the second
organic layer OR2b.
[0030] In addition, as shown in FIG. 4, the organic layer OR3 includes a first organic layer
OR3a and a second organic layer OR3b that are separated from each other. The upper
electrode UE3 includes a first upper electrode UE3a and a second upper electrode UE3b
that are separated from each other. The first organic layer OR3a is in contact with
the lower electrode LE3 through the aperture AP3 (i.e., an aperture of the rib 5 in
the subpixel SP3) and covers a part of the rib 5. The second organic layer OR3b is
located on the upper portion 62. The first upper electrode UE3a is opposed to the
lower electrode LE3 and covers the first organic layer OR3a. Furthermore, the first
upper electrode UE3a is in contact with the side surfaces of the lower portion 61.
The second upper electrode UE3b is located above the partition 6 and covers the second
organic layer OR3b.
[0031] In the example shown in FIG. 4, the subpixels SP1, SP2 and SP3 include cap layers
CP1, CP2, and CP3 (optical path adjustment layers) for adjusting the optical property
of the light emitted from light emitting layers of the organic layers OR1, OR2, and
OR3.
[0032] The cap layer CP1 includes a first cap layer CP1a and a second cap layer CP1b that
are separated from each other. The first cap layer CP1a is located in the aperture
AP1 and is provided on the first upper electrode UE1a. The second cap layer CP1b is
located above the partition 6 and is provided on the second upper electrode UE1b.
[0033] The cap layer CP2 includes a first cap layer CP2a and a second cap layer CP2b that
are separated from each other. The first cap layer CP2a is located in the aperture
AP2 and is provided on the first upper electrode UE2a. The second cap layer CP2b is
located above the partition 6 and is provided on the second upper electrode UE2b.
[0034] The cap layer CP3 includes a first cap layer CP3a and a second cap layer CP3b that
are separated from each other. The first cap layer CP3a is located in the aperture
AP3 and is provided on the first upper electrode UE3a. The second cap layer CP3b is
located above the partition 6 and is provided on the second upper electrode UE3b.
[0035] Sealing layers SE1, SE2 and SE3 are provided in the subpixels SP1, SP2 and SP3, respectively.
The sealing layer SE1 continuously covers the members of the subpixel SP1 including
the first cap layer CP1a, the partition 6, and the second cap layer CP1b. The sealing
layer SE2 continuously covers the members of the subpixel SP2 including the first
cap layer CP2a, the partition 6, and the second cap layer CP2b. The sealing layer
SE3 continuously covers the members of the subpixel SP3 including the first cap layer
CP3a, the partition 6, and the second cap layer CP3b.
[0036] In the example shown in FIG. 4, the second organic layer OR1b, the second upper electrode
UE1b, the second cap layer CP1b, and the sealing layer SE1 on the partition 6 between
the subpixels SP1 and SP2 are separated from the second organic layer OR2b, the second
upper electrode UE2b, the second cap layer CP2b, and the sealing layer SE2 on the
partition 6. In addition, the second organic layer OR2b, the second upper electrode
UE2b, the second cap layer CP2b, and the sealing layer SE2 on the partition 6 between
the subpixels SP2 and SP3 are separated from the second organic layer OR3b, the second
upper electrode UE3b, the second cap layer CP3b, and the sealing layer SE3 on the
partition 6.
[0037] The sealing layers SE1, SE2 and SE3 are covered with a resin layer 14 (planarization
film). The resin layer 14 is covered with a sealing layer 15. Furthermore, the sealing
layer 15 is covered with a resin layer 16.
[0038] The insulating layer 13 and the resin layers 14 and 16 are formed of organic materials.
The rib 5, and the sealing layers 15 and SE (SE1, SE2, and SE3) are formed of, for
example, an inorganic material such as silicon nitride (SiNx).
[0039] The lower portion 61 included in the partition 6 is conductive. The upper portion
62 included in the partition 6 may also be conductive. The lower electrode LE may
be formed of a transparent conductive oxide such as indium tin oxide (ITO) or may
have a stacked structure of a metal material such as silver (Ag) and a conductive
oxide. The upper electrode UE may be formed of a conductive oxide such as ITO.
[0040] When the potential of the lower electrode LE is relatively higher than the potential
of the upper electrode UE, the lower electrode LE corresponds to an anode and the
upper electrode UE corresponds to a cathode. In addition, when the potential of the
upper electrode UE is relatively higher than the potential of the lower electrode
LE, the upper electrode UE corresponds to an anode and the lower electrode LE corresponds
to a cathode.
[0041] The organic layer OR includes a pair of functional layers, and a light emitting layer
provided between these functional layers. In an example, the organic layer OR has
a structure in which a hole-injection layer, a hole-transport layer, an electron blocking
layer, a light emitting layer, a hole blocking layer, an electron-transport layer,
and an electron-injection layer are stacked in this order.
[0042] The cap layers CP (CP1, CP2, and CP3) are formed of, for example, a multilayer body
of a plurality of transparent thin films. The multilayer body may include a thin film
formed of an inorganic material and a thin film formed of an organic material as the
plurality of thin films. In addition, these thin films have refractive indices different
from each other. The materials of the thin films constituting the multilayer body
are different from the materials of the upper electrode UE and are also different
from the materials of the sealing layer SE. Incidentally, the cap layers CP may be
omitted.
[0043] A common voltage is supplied to the partition 6. This common voltage is supplied
to each of the upper electrodes UE (first upper electrodes UE1a, UE2a, and UE3a) that
are in contact with the side surfaces of the lower portion 61. A pixel voltage is
supplied to the lower electrodes LE (LE1, LE2, and LE3) through the pixel circuits
included in the respective subpixels SP (SP1, SP2, and SP3).
[0044] When a potential difference is formed between the lower electrode LE1 and the upper
electrode UE1, the light emitting layer of the first organic layer OR1a emits light
in the red wavelength range. When a potential difference is formed between the lower
electrode LE2 and the upper electrode UE2, the light emitting layer of the first organic
layer OR2a emits light in the green wavelength range. When a potential difference
is formed between the lower electrode LE3 and the upper electrode UE3, the light emitting
layer of the first organic layer OR3a emits light in the blue wavelength range.
[0045] As another example, the light emitting layers of the organic layers OR1, OR2, and
OR3 may emit light exhibiting the same color (for example, white). In this case, the
display device DSP may include color filters that convert the light emitted from the
light emitting layers into light exhibiting colors corresponding to the subpixels
SP1, SP2, and SP3. In addition, the display device DSP may include a layer including
quantum dots that are excited by the light emitted from the light emitting layers
to generate the light of the colors corresponding to the subpixels SP1, SP2, and SP3.
[0046] FIG. 5 is a schematic enlarged cross-sectional view of the partition 6. In FIG. 5,
the elements other than the rib 5, the partition 6, the insulating layer 13 and a
pair of lower electrodes LE are omitted. Each of the pair of lower electrodes LE corresponds
to one of the above-described lower electrodes LE1, LE2 and LE3.
[0047] In the example shown in FIG. 5, the lower portion 61 of the partition 6 includes
a barrier layer (bottom portion) 611 provided on the rib 5, and a metal layer (stem
portion) 612 provided on the barrier layer 611. The barrier layer 611 is formed of
a material that is different from the material of the metal layer 612, and is formed
of, for example, a metal material such as molybdenum (Mo), titanium (Ti), and titanium
nitride (TiN). The metal layer 612 is formed to be thicker than the barrier layer
611. The metal layer 612 may have a single-layer structure or a multilayer structure
of different metal materials. In one example, the metal layer 612 is formed of, for
example, aluminum (Al).
[0048] The upper portion (top portion) 62 is thinner than the lower portion 61. In the example
shown in FIG. 5, the upper portion 62 includes a first layer 621 provided on the metal
layer 612, and a second layer 622 provided on the first layer 621. In one example,
the first layer 621 is formed of, for example, titanium (Ti) and the second layer
622 is formed of, for example, ITO.
[0049] In the example shown in FIG. 5, the width of the lower portion 61 decreases toward
the upper portion 62. In other words, the side surfaces 61a and 61b of the lower portion
61 are inclined with respect to the third direction Z. Incidentally, the upper portion
62 includes an end portion 62a protruding from the side surface 61a and an end portion
62b protruding from the side surface 61b.
[0050] The amount D of protrusion of each of the end portions 62a and 62b from the side
surfaces 61a and 61b (hereinafter, referred to as the amount of protrusion D of the
partition 6) is, for example, less than or equal to 2.0 µm. In the embodiment, the
amount of protrusion D of the partition 6 corresponds to the distance of the partition
6 between the lower ends of the side surfaces 61a and 61b (barrier layer 611) and
the end portions 62a and 62b in a width direction (first direction X or second direction
Y) orthogonal to the third direction Z.
[0051] In the example shown in FIG. 5, the side surface of the barrier layer 611 is aligned
with the side surface of the metal layer 612, forming a flat surface with no steps
but, for example, the side surface of the barrier layer 611 may be slightly recessed
with respect to the side surface of the metal layer 612 or may protrude with respect
to the side surface of the metal layer 612. In addition, in FIG. 5, the side surfaces
of the barrier layer 611 and the metal layer 612 (i.e., the side surfaces 61a and
61b of the lower portion 61) are inclined with respect to the third direction Z, but
these sides may also be parallel to the third direction Z.
[0052] The structure of the partition 6 and the materials of the portions of the partition
6 can be appropriately selected in consideration of, for example, the method for forming
the partition 6, and the like.
[0053] In the present embodiment, the partition 6 is formed to divide the subpixels SP in
plan view. The above-described organic layers OR are formed by, for example, a vacuum
deposition method having anisotropy or directionality. When the organic material for
forming each organic layer OR is deposited on the entire base 10 in a state in which
the partition 6 is provided, the organic layers OR are not substantially formed on
the side surfaces of the partition 6 since the partition 6 has the shape shown in
FIG. 4 and FIG. 5. According to this, the organic layer OR (light emitting element)
which is divided for each subpixel SP by the partition 6 can be formed.
[0054] FIG. 6 to FIG. 8 are schematic cross-sectional views illustrating the light emitting
elements formed using the partition 6. Incidentally, in FIG. 6 to FIG. 8, the base
10, the insulating layer 11, and the circuit layer 12 are omitted. In addition, each
of subpixels SPα, SPβ, and SPγ shown in FIG. 6 to FIG. 8 corresponds to one of the
subpixels SP1, SP2 and SP3.
[0055] First, the organic layer OR, the upper electrode UE, the cap layer CP and the sealing
layer SE are formed in order over the entire base 10 by vapor deposition as shown
in FIG. 6, in a state in which the partition 6 is provided as described above. The
organic layer OR includes a light emitting layer which emits light exhibiting a color
corresponding to the subpixel SPα. The partition 6 having an overhang shape divides
the organic layer OR into a first organic layer ORa which is in contact with the lower
electrode LE through the aperture AP and a second organic layer ORb on the partition
6, divides the upper electrode UE into a first upper electrode UEa which covers the
first organic layer ORa and a second upper electrode UEb which covers the second organic
layer ORb, and divides the cap layer CP into a first cap layer CPa which covers the
first upper electrode UEa and a second cap layer CPb which covers the second upper
electrode UEb. The first upper electrode UEa is in contact with the lower portion
61 of the partition 6. The sealing layer SE continuously covers the first cap layer
CPa, the partition 6, and the second cap layer CPb.
[0056] Next, a resist R is formed on the sealing layer SE as shown in FIG. 7. The resist
R covers the subpixel SPα. In other words, the resist R is provided directly above
the first organic layer ORa, the first upper electrode UEa, and the first cap layer
CPa that are located in subpixel SPα. The resist R is also located directly above
portions close to the subpixel SPα, of the second organic layer ORb, the second upper
electrode UEb, and the second cap layer CPb on the partition 6 between the subpixel
SPα and the subpixel SPβ. In other words, at least a part of the partition 6 is exposed
from the resist R.
[0057] Furthermore, the portion exposed from the resist R is removed from the organic layer
OR, the upper electrode UE, the cap layer CP and the sealing layer SE as shown in
FIG. 8 by etching using the resist R as a mask. The light emitting element including
the lower electrode LE, the first organic layer ORa, the first upper electrode UEa,
and the first cap layer CPa is thereby formed in the subpixel SPα. In contrast, the
lower electrode LE is exposed in the subpixels SPβ and SPγ. Incidentally, the above-described
etching includes, for example, dry etching of the sealing layer SE, wet etching and
dry etching of the cap layer CP, wet etching of the upper electrode UE, and dry etching
of the organic layer OR.
[0058] When the light emitting element of the subpixel SPα is formed as described above,
the resist R is removed, and the light emitting elements of the subpixels SPβ and
SPγ are formed in series in the same manner as that of the subpixel SPα.
[0059] The structure of the display device DSP shown in FIG. 4 is realized by forming the
light emitting elements of the subpixels SP1, SP2, and SP3 as exemplified above in
relation to the subpixels SPα, SPβ, and SPγ and further forming the resin layer 14,
the sealing layer 15, and the resin layer 16.
[0060] As described above, each of the plurality of subpixels SP includes the pixel circuit
that drives the light emitting element. An example of the circuit configuration of
the pixel circuit will be described below with reference to FIG. 9. Incidentally,
a pixel circuit 100 shown in FIG. 9 is a 7Tr1C pixel circuit composed of seven transistors
(hereafter referred to as first to seventh transistors) Tr1 to Tr7 and one storage
capacitor Cst.
[0061] In the following descriptions, one of source/drain terminals of each of the first
to seventh transistors Tr1 to Tr7 shown in FIG. 9 is referred to as a first terminal
while the other is referred to as a second terminal. In addition, one of terminals
of (a capacitive element realizing) the storage capacitor Cst shown in FIG. 9 is referred
to as a first terminal while the other terminal is referred to as a second terminal.
[0062] The first terminal of the first transistor Tr1 is connected to the first terminal
of the second transistor Tr2 and the second terminal of the fifth transistor Tr5 via
a node n3. The second terminal of the first transistor Tr1 is connected to a data
signal line that supplies a data signal Data. The data signal Data corresponds to
a signal (pixel signal) written to the pixel. Incidentally, the first transistor Tr1
is, for example, an n-channel transistor.
[0063] The second transistor Tr2 corresponds to a drive transistor (DRT) that supplies a
current to the light emitting element 20 included in the subpixel SP (i.e., the light
emitting element 20 driven by the pixel circuit 100). The first terminal of the second
transistor Tr2 is connected to the first terminal of the first transistor Tr1 and
the second terminal of the fifth transistor Tr5 via the node n3. The second terminal
of the second transistor Tr2 is connected to the second terminal of the third transistor
Tr3, the first terminal of the fourth transistor Tr4, and the first terminal of the
seventh transistor Tr7 via the node n1. Incidentally, the second transistor Tr2 is,
for example, an n-channel transistor.
[0064] The first terminal of the third transistor Tr3 is connected to the gate terminal
of the second transistor Tr2 and the second terminal of the storage capacitor Cst
via a node n2. The second terminal of the third transistor Tr3 is connected to the
second terminal of the second transistor Tr2, the first terminal of the fourth transistor
Tr4, and the first terminal of the seventh transistor Tr7 via the node n1. Incidentally,
the third transistor Tr3 is, for example, an n-channel transistor.
[0065] The first terminal of the fourth transistor Tr4 is connected to the second terminal
of the second transistor Tr2, the second terminal of the second transistor Tr2, the
second terminal of the third transistor Tr3, and the first terminal of the seventh
transistor Tr7 via the node n1. The second terminal of the fourth transistor Tr4 is
connected to a power supply line that supplies a power supply voltage VDDEL. Incidentally,
the fourth transistor Tr4 is, for example, a p-channel transistor.
[0066] The first terminal of the fifth transistor Tr5 is connected to the first terminal
of the sixth transistor Tr6, the first terminal of the storage capacitor Cst, and
the anode terminal of the light emitting element 20 via a node n4. The second terminal
of the fifth transistor Tr5 is connected to the first terminal of the first transistor
Tr1 and the first terminal of the second transistor Tr2 via the node n3. Incidentally,
the fifth transistor Tr5 is, for example, a p-channel transistor.
[0067] The first terminal of the sixth transistor Tr6 is connected to the first terminal
of the fifth transistor Tr5, the first terminal of the storage capacitor Cst, and
the anode terminal of the light emitting element 20 via the node n4. The second terminal
of the sixth transistor Tr6 is connected to the power supply line that supplies an
initialization voltage Vini. Incidentally, the sixth transistor Tr6 is, for example,
an n-channel transistor.
[0068] The first terminal of the seventh transistor Tr7 is connected to the second terminal
of the second transistor Tr2, the second terminal of the third transistor Tr3, and
the first terminal of the fourth transistor Tr4 via the node n1. The second terminal
of the seventh transistor Tr7 is connected to the power supply line that supplies
a power supply voltage VSH. Incidentally, the seventh transistor Tr7 is, for example,
an n-channel transistor.
[0069] In addition, as shown in FIG. 9, the gate terminal of the first transistor Tr1 is
connected to the gate signal line that supplies a gate signal Scan2. The gate terminal
of the third transistor Tr3 is connected to the gate signal line that supplies a gate
signal Scan1. The gate terminals of the fourth to sixth transistors Tr4 to Tr6 are
connected to the control signal line that supplies a control signal EM. The gate terminal
of the seventh transistor Tr7 is connected to the gate signal line that supplies a
gate signal Scan3.
[0070] The first terminal of the storage capacitor Cst is connected to the first terminal
of the fifth transistor Tr5, the first terminal of the sixth transistor Tr6, and the
anode terminal of the light emitting element 20 via the node n4. The second terminal
of the storage capacitor Cst is connected to the gate terminal of the second transistor
Tr2 and the first terminal of the third transistor Tr3 via the node n2.
[0071] The anode terminal of the light emitting element 20 is connected to the first terminal
of the fifth transistor Tr5, the first terminal of the sixth transistor Tr6, and the
first terminal of the storage capacitor Cst via the node n4. The cathode terminal
of the light emitting element 20 is connected to the power supply line that supplies
a power supply voltage VSSEL. The above-mentioned power supply voltage VDDEL corresponds
to the anode voltage supplied to the light emitting element 20, and the power supply
voltage VSSEL corresponds to the cathode voltage supplied to the light emitting element
20.
[0072] Although not shown in FIG. 9, for example, the data signal line that supplies the
data signal Data, the power supply line that supplies the power supply voltage VDDEL,
and the power supply line that supplies the power supply voltage VSH are arranged
in the first direction X to extend in the second direction Y. In other words, the
data signal line, the power supply line that supplies the power supply voltage VDDEL,
and the power supply line that supplies the power supply voltage VSH are connected
to each of the plurality of subpixels SP (pixel circuits 100) arranged in the second
direction Y. In addition, for example, the gate signal lines that supply the gate
signals Scan1 to Scan3, the control signal line that supplies the control signal EM,
and the power supply line that supplies the initialization voltage Vini are arranged
in the second direction Y to extend in the first direction X. In other words, the
gate signal lines, the control signal line, and the power supply line that supplies
the initialization voltage Vini are connected to each of the plurality of subpixels
SP (pixel circuits 100) arranged in the first direction X.
[0073] Incidentally, in the display device DSP, the pixel circuit 100 can display various
screens (images) in the display area DA by driving the light emitting element 20 included
in each of the plurality of subpixels SP, but for example, when the entire screen
displayed in the display area DA is to be darkened, the light emitting element 20
included in each of the plurality of subpixels SP is considered to emit light at low
luminance. However, if the light emitting element 20 included in each of the plurality
of subpixels SP are made to emit light at low luminance, it is likely that irregularities
will occur on the screen.
[0074] For this reason, in the display device DSP, pulse width modulation (PWM) drive of
making the light emitting elements 20 emit light (turn on) at high luminance and in
time division, can be applied instead of making the light emitting elements 20 emit
light (turn on) at low luminance for the entire period, in order to avoid irregularities
occurring on the screen.
[0075] FIG. 10 shows an outline of the PWM drive. In FIG. 10, a vertical axis represents
1 to N lines composed of the plurality of pixels PX (subpixels SP) arranged in the
display area DA(hereafter referred to as 1 to N lines in the display area DA), and
a horizontal axis represents time. In this case, N is an integer of 2 or more.
[0076] In the PWM drive, the data signal Data is written to each line of the display area
DA every frame period to display one frame (images). Incidentally, the data signal
Data is written in order of the 1 to N lines in the display area DA.
[0077] In addition, in the PWM drive, after the data signal Data is written to each line
in the display area DA, the light emitting elements 20 included in the pixels PX (subpixels
SP) constituting each line are repeatedly turned on and off (in other words, the light
emitting elements 20 are turned on and off in time division).
[0078] In the example shown in FIG. 10, a write scan period P1 in which the data signal
Data is written to each of the 1 to N lines, first to fourth emission periods P11
to P14 in which the light emitting elements 20 are turned on, and the first to fourth
non-emission periods P21 to P24 in which the light emitting elements 20 are turned
off, are set in one frame period, and the light emitting elements 20 are repeatedly
turned on four times and turned off four times in the PWM drive.
[0079] Incidentally, FIG. 10 shows an example in which the light emitting elements 20 are
repeatedly turned on four times and turned off four times, but the number of times
of repeatedly turning on and turning off may be other than four.
[0080] According to the PWM drive, compared to a drive method (normal drive) of turning
on the light emitting element 20 at low luminance for the entire one frame period
(i.e., a period other than the write scanning period P1), for example, it is easier
to control the current supplied to the light emitting element 20 via the drive transistor
DRT (the second transistor Tr2 shown in FIG. 9), and it is less likely to cause unevenness
on the screen displayed in the display area DA.
[0081] In addition, since the PWM drive can adjust the luminance of the screen by, for example,
changing the ratio of the first to fourth emission periods P11 to P14 in one frame
period, it is possible to easily adjust the luminance without changing, for example,
the data signal (image data). In addition, the PWM drive may also be used to correct
irregularities (unevenness in image quality) that occur in low-gradation screens (images).
[0082] The operation of the pixel circuit 100 shown in FIG. 9 during the PWM drive will
be described with reference to FIG. 11. FIG. 11 is a timing chart showing an example
of output of the gate signals Scan1 to Scan3 and the control signal EM for the subpixels
SP (pixel circuit 100) arranged in n-1-th and n-th lines among 1 to N lines of the
display area DA described above. Incidentally, n is an integer greater than or equal
to 2 and less than or equal to N.
[0083] The operations of the pixel circuit 100 during the fourth emission period P14, the
fourth non-emission period P24, and the write scanning period P1 that are arranged
in one frame period, and the first emission period P11 that is arranged in a subsequent
frame period as shown in FIG. 10 will be described.
[0084] Incidentally, the plurality of transistors constituting the pixel circuit 100 include
the n-channel transistors and p-channel transistors, and the n-channel transistor
is a switching element which is turned off (non-conductive) when a low (level) signal
is supplied to the gate terminal and which is turned on (conductive) when a high (level)
signal is supplied to the gate terminal. In contrast, the p-channel transistor is
a switching element which is turned off (non-conductive) when a high (level) signal
is supplied to the gate terminal and which is turned on (conductive) when a low (level)
signal is supplied to the gate terminal.
[0085] First, in the fourth emission period P14 shown in FIG. 11, the fourth transistor
Tr4 and the fifth transistor Tr5 of seven transistors included in the pixel circuit
100 are in the on state, and the sixth transistor Tr6 is in the off state since the
control signal EM is low.
[0086] In addition, in the fourth emission period P14, the first transistor Tr1, the third
transistor Tr3, and the seventh transistor Tr7 are in the off state since the gate
signals Scan1 to Scan3 are low.
[0087] According to this, the current controlled by the gate voltage of the second transistor
Tr2 (i.e., the voltage supplied to the gate terminal of the second transistor Tr2
based on the data signal Data of the previous frame) is supplied to the light emitting
element 20 (OLED), and the light emitting element 20 emits light.
[0088] Next, the control signal EM is switched from low to high at the timing when the fourth
non-emission period P24 shown in FIG. 11 starts.
[0089] According to this, since the fourth transistor Tr4 and the fifth transistor Tr5 become
an off state, no current is supplied to the light emitting element 20, and the light
emitting element 20 is turned off.
[0090] Next, the sixth transistor Tr6 is in the on state during the period P1a in the write
scanning period P1 shown in FIG. 11 since the control signal EM is high. In this case,
the initialization voltage Vini is supplied to the node n4 via the sixth transistor
Tr6, but no current flows to the light emitting element 20 during the period P1a (in
other words, the light emitting element 20 does not emit light) since the initialization
voltage Vini is set to a value at which no current flows to the light emitting element
20.
[0091] In addition, the gate signal Scan1 is switched from low to high at the timing of
start of the period P1a. For this reason, the transistor Tr3 becomes the on state
during the period P1a. Furthermore, the gate signal Scan3 is switched from low to
high at the timing of start of the write scanning period P1. For this reason, the
seventh transistor Tr7 becomes the on state during the period P1a. According to this,
the power supply voltage VSH is supplied to the gate terminal of the second transistor
Tr2 via the seventh transistor Tr7 and the third transistor Tr3. In this case, a voltage
VSH-Vini is applied to (an interval between first and second terminals between) the
storage capacitor Cst, and the information of the previous frame is reset.
[0092] Incidentally, the gate signal Scan3 is switched from high to low at the timing of
end of the period P1a.
[0093] In addition, the gate signal Scan2 is switched from low to high at the timing of
start of the period P1b of the write scanning period P1. For this reason, the first
transistor Tr1 becomes the on state during the period P1b. In addition, the seventh
transistor Tr7 is in the off state during the period P1b since the gate signal Scan3
is low.
[0094] In this case, (the voltage Vdata corresponding to) the data signal Data and the threshold
voltage Vth of the second transistor Tr2 (i.e., the voltage corresponding to Vdata
+ Vth) are supplied to the gate terminal of the second transistor Tr2 via the first
transistor Tr1, the second transistor Tr2, and the third transistor Tr3. According
to this, the voltage of Vdath + Vth - Vini is applied to the storage capacitor Cst,
and the information regarding Vdath and Vth is written to the storage capacitor Cst
(in other words, the voltage that controls the current supplied to the light emitting
element 20 by the second transistor Tr2 is held in the storage capacitor Cst).
[0095] Incidentally, the gate signal Scan1 is switched from high to low at the timing of
end of the period P1b.
[0096] Next, the third transistor Tr3 is in the off state during the first emission period
P11 shown in FIG. 11 since the gate signal Scan1 is low. In addition, the first transistor
Tr1 is in the off state since the gate signal Scan2 is switched from high to low before
the first emission period P11 starts. Furthermore, the control signal EM is switched
from high to low at the timing when the first emission period P11 starts. For this
reason, the fourth transistor Tr4 and the fifth transistor Tr5 become the on state,
and the sixth transistor Tr6 becomes the off state.
[0097] If the first terminal of the second transistor Tr2 is assumed to be the source terminal,
a voltage Vgs between the gate terminal and source terminal (nodes n2 to n3) of the
second transistor Tr2 becomes the voltage of the storage capacity Cst (Vdata + Vth
- Vini). In this case, the second transistor Tr2 becomes the on state, and a current
flows from the power line connected to the second terminal of the fourth transistor
Tr4 (i.e., the power line that supplies the power supply voltage VDDEL) to the node
n4. In response to this, when rise in the potential at the node n4 starts and the
potential exceeds the threshold value of the light emitting element 20 (OLED), a current
starts flowing to the light emitting element 20 and the light emission from the light
emitting element 20 is started. Finally, when the current loled flowing to the light
emitting element 20 reaches the output current (output current in the saturation region
of the second transistor Tr2) Idrt supplied by the second transistor Tr2, the rise
in the potential at the node n4 stops and the light emitting element 20 enters a steady-state
emission state.
[0098] Incidentally, if the voltage between the gate and source terminals of the second
transistor Tr2 Vgs = Vdata + Vth - Vini is substituted into the TFT saturation equation
Idrt = 1/2Cox*µ*W/L* (Vgs-Vth)
2, we get Idrt (= loled) = 1/2Cox*µ*W/L* (Vdata-Vini)
2 can be obtained. Cox is a gate capacitance per unit area, µ is the carrier mobility,
W is a channel width of the second transistor Tr2, and L is a channel length of the
second transistor Tr2.
[0099] According to this, it can be understood that Idrts becomes a value that does not
depend on the threshold voltage Vth of the second transistor Tr2 (in other words,
a current that does not depend on the threshold voltage Vth of the second transistor
Tr2 flows to the light emitting element 20), and that the variation in the threshold
voltage Vth can eliminate an influence given to Idrts.
[0100] In other words, it can be said that the pixel circuit 100 (7Tr1C pixel circuit) shown
in FIG. 9 includes a function (Vth correction function) of correcting the variation
in the threshold voltage Vth of the second transistor Tr2.
[0101] The operation of the pixel circuit 100 provided in the n-1-th line as shown in FIG.
11 has been described, and the pixel circuit 100 provided in the n-th line performs
the same operation so as to write the data signal Data to the n-th line after writing
the data signal Data to the n-1th line.
[0102] Displaying a screen (window) as shown on the left side of FIG. 12 in the display
area DA of the display device DSP to which the above-described PWM drive will be considered
below. Incidentally, a black band portion 101 (black band-shaped image) is arranged
in the center of the screen shown on the left side of FIG. 12. In this case, the n-1-th
line in the above-described display area DA corresponds to a line that displays the
black band portion 101, and the n-th line corresponds to a line that displays a portion
(non-black band portion) different from the black band portion 101 located in the
second direction Y with respect to the black band portion 101.
[0103] In the following descriptions, for convenience, an operation of the pixel circuit
100 during the fourth emission period P14 is referred to as an emission operation,
an operation of the pixel circuit 100 during the fourth non-emission period P24 is
referred to as a non-emission operation, and an operation of the pixel circuit 100
during the write scanning period P1 is referred to as a write operation.
[0104] When the pixel circuit 100 arranged in the n-1-th line performs the write operation,
(a black voltage corresponding to) the data signal Data for displaying the black band
portion 101 is supplied to the data signal line to which the first transistor Tr1
constituting the pixel circuit 100 arranged in the n-1-th line is connected. In the
present embodiment, the black voltage corresponds to a voltage that does not cause
the light emitting element 20 to emit light (i.e., a voltage that does not cause a
current to flow through the light emitting element 20).
[0105] In contrast, as described above, the first transistor Tr1 constituting the pixel
circuit 100 arranged in the n-th line is also connected to the data signal line to
which the data signal Data for displaying the black band portion 101 is supplied.
When the pixel circuit 100 arranged in the n-1-th line is performing the write operation,
the pixel circuit 100 arranged in the n-th line is performing the non-emission operation,
and the nodes n1 and n3 of the pixel circuit 100 arranged in the n-th line are in
a floating state.
[0106] In a case where the nodes n1 and n3 of the pixel circuit 100 arranged in the n-th
line are thus in a floating state, if the data signal Data (i.e., black voltage) is
supplied to the data signal line connected to the first transistor Tr1 constituting
the pixel circuit 100 as described above, a leakage current (OFF leakage) which is
to flow from the node n3 side toward the data signal line side flows to the data signal
line, and a potential fluctuation occurs at the nodes n1 and n3 in the floating state.
[0107] The pixel circuit 100 arranged in the n-th line performs the write operation after
the non-emission operation, but the potential fluctuations that occur at the nodes
n1 and n3 during the non-emission operation also affects the gate voltage of the second
transistor Tr2 after the write operation (i.e., remains as a potential difference
in the gate voltage). For this reason, when a screen shown on the left side of FIG.
12 is displayed in the display area DA of the display device DSP to which PWM drive
is applied, a ghost is visually recognized (occurs) in, for example, the area 102
after the n-th line, where the write operation is performed after the n-1-th line
of the display area DA, as shown on the right side of FIG. 12.
[0108] Since the occurrence of the ghost is caused by the fact that the data signal (black
voltage) Data for displaying the black band portion 101 is supplied to the data signal
line during the non-emission period (i.e. while the nodes n1 and n3 are in a floating
state), this ghost does not occur in the display device DSP to which the above-described
normal drive is applied (i.e. where no non-emission period is arranged in a frame
period).
[0109] As described above, the area 102 where the ghost occurs is an area composed of pixels
PX (subpixels SP) where the data signal Data to display the black band portion 101
during the fourth non-emission period P24, which is arranged immediately before the
write scanning period P1, is supplied to the data signal line as shown in FIG. 13.
In other words, the area 102 where the ghost occurs is an area where at least part
of the fourth non-emission period P24 overlaps with the period when writing the black
band portion 101 is performed.
[0110] As described above, when the screen where the black band portion 101 is arranged
is displayed in the display area DA on the display device DSP to which the PWM drive
is applied, a ghost may occur, which may degrade the display quality in the display
device DSP. It has been described for convenience that the black band portion 101
(a black band-shaped image) is displayed in a part of the display area DA but, when
a band-shaped image of the other color is displayed, a ghost may occur similarly,
which may cause degradation in display quality of the display device DSP.
[0111] In this example, in general, the first transistor Tr1 constituting the pixel circuit
100 is, for example, a polysilicon transistor using low temperature polysilicon (LTP).
In the present embodiment, the occurrence of the above-described ghost in response
to the leakage current that occurs in the first transistor Tr1 transistor Tr1 is focused,
and an oxide transistor (oxide TFT) that uses an oxide semiconductor is adopted as
the first transistor Tr1. A leakage current of an oxide transistor is extremely low
as compared to that of a polysilicon transistor. Even if the data signal (black voltage)
for displaying the black band portion 101 is supplied to the data signal line during
the above-described non-emission operation, there is no potential fluctuation at the
nodes n1 and n3 in the pixel circuit 100 arranged in the above-mentioned area 102,
and the occurrence of ghosts can be suppressed.
[0112] FIG. 14 shows an example of the layout of the pixel circuit 100. FIG. 14 shows, for
example, various elements (transistors Tr1 to Tr7, storage capacitor Cst, gate signal
line, control signal line, data signal line, and various power supply lines) of the
pixel circuit 100 formed in the circuit layer 12 composed of first to fifth layers.
[0113] Incidentally, it is assumed that the first layer is a layer formed under the second
layer, that the second layer is a layer formed under the third layer, that the third
layer is a layer formed under the fourth layer, and that the fourth layer is a layer
formed under the fifth layer. In other words, it is assumed that the first to fifth
layers are stacked in order with the first layer being the bottom layer and the fifth
layer being the top layer.
[0114] In addition, the first layer is the layer (p-Si layer) in which the polysilicon semiconductor
layer is formed, the second, fourth, and fifth layers are the layers (metal layers)
in which the electrodes constituting the transistors, the wires connected to the transistors,
and the like are formed, and the third layer is the layer (oxide layer) in which the
oxide semiconductor layer is formed.
[0115] More specifically, the first transistor Tr1, which is an oxide transistor, is formed
across the second to fourth layers, as shown in FIG. 14. In this example, it is assumed
that the first transistor Tr1 has a dual-gate structure in which the oxide semiconductor
is sandwiched between the first gate electrode formed in the fourth layer (upper layer)
and the second gate electrode formed in the second layer (lower layer) (i.e., in the
third layer).
[0116] Incidentally, in order to appropriately hold the voltage supplied to the gate terminal
of the second transistor Tr2 during a single frame period in the storage capacitor
Cst, an oxide transistor is often used as the third transistor Tr3 connected to the
node n2.
[0117] In contrast, the second transistor Tr2 and the fourth to seventh transistors Tr4
to Tr7 are polysilicon transistors, and are formed across the first and second layers.
In other words, the second transistor Tr2 and the fourth to seventh transistors Tr4
to Tr7 are formed in a lower layer than the first transistor Tr1 and the third transistor
Tr3 (oxide transistor). Similarly to the second transistor Tr2 and the fourth to seventh
transistors Tr4 to Tr7, the storage capacitor Cst is formed across the first and second
layers.
[0118] In addition, the gate signal line, the control signal line, and the power supply
line that supplies the initialization voltage Vini are formed in the second layer.
Furthermore, the data signal line and other power supply lines are formed in the fifth
layer.
[0119] The above-described connections between the elements of the pixel circuit 100 have
been described described above with reference to FIG. 9 and their detailed descriptions
will be omitted here. As shown in FIG. 14, the elements formed in different layers
are connected via contact holes CH.
[0120] In addition, it has been described with reference to FIG. 14 that all of the second
transistor Tr2 and the fourth to seventh transistors Tr4 to Tr7 are polysilicon transistors,
but some of the second transistor Tr2 and the fourth to seventh transistors Tr4 to
Tr7 may be oxide transistors. More specifically, for example, polysilicon transistors
with relatively high stability may be employed as the second transistor Tr2, the fourth
transistor Tr4, and the fifth transistor Tr5, which supply a current to the light
emitting element 20, and an oxide transistor may be employed as the other sixth transistor
Tr6 and seventh transistor Tr7.
[0121] Incidentally, the layout of the pixel circuit 100 shown in FIG. 14 is an example,
and the positions and orientations at which the elements of the pixel circuit 100
are arranged may be different from those in the example shown in FIG. 14.
[0122] As described above, the display device DSP of the present embodiment includes the
base 10, the plurality of subpixels SP arranged in the display area DA on the base
10, and the data signal line that supplies the data signal Data to each of the plurality
of subpixels SP. Each of the plurality of subpixels SP includes the pixel circuit
100 composed of a plurality of transistors and the light emitting element 20 driven
by the pixel circuit 100. In addition, the pixel circuit 100 drives the light emitting
element 20 to emit light in time division. Furthermore, the first transistor Tr1 connected
to the data signal line, among the plurality of transistors that constitute the pixel
circuit 100, is an oxide transistor.
[0123] In the present embodiment, with the above-described configuration, it is possible
to suppress the degradation in display quality of the display device DSP (in other
words, to achieve good display quality without ghost) even if a screen in which the
black band portion 101 and the like are arranged is displayed in the display area
DA of the display device DSP to which the PWM drive is applied.
[0124] In addition, in the present embodiment, since the second transistor Tr2 which supplies
a current to the light emitting element 20, among the plurality of transistors constituting
the pixel circuit 100, is a polysilicon transistor, it is possible to supply a stable
current to the light emitting element 20. In the present embodiment, the fourth transistor
Tr4 provided between the power supply line supplying the power supply voltage VDDEL
and the second transistor Tr2, and the fifth transistor Tr5 provided between the light
emitting element 20 and the second transistor Tr2 are also, desirably, polysilicon
transistors.
[0125] Furthermore, in the present embodiment, the first terminal (one of the source and
drain terminals) of the second transistor Tr2 is connected to the first terminal of
the first transistor Tr1, and the third transistor Tr3 having the first terminal (one
of the source and drain terminals) connected to the gate terminal of the second transistor
Tr2 and the second terminal (one of the terminals) of the storage capacitor Cst, and
having the second terminal (the other of the source and drain terminals) connected
to the second terminal (the other of the source and drain terminals) of the second
transistor Tr2, is an oxide transistor. Therefore, the voltage supplied to the gate
terminal of the second transistor Tr2 can be appropriately held in the holding capacity
Cst without being affected by a leakage current.
[0126] In the present embodiment, it has been described that the first transistor Tr1 connected
to the data signal line is an oxide transistor, but the first transistor Tr1 may be
a transistor configured to have a lower leakage current as compared to, for example,
the second transistor that supplies a current to the light emitting element 20, among
the plurality of transistors constituting the pixel circuit 100.
[0127] All display devices, which are implementable with arbitrary changes in design by
a person of ordinary skill in the art based on the display device described above
as the embodiments of the present invention, belong to the scope of the present invention
as long as they encompass the spirit of the present invention.
[0128] Various modifications are easily conceivable within the category of the idea of the
present invention by a person of ordinary skill in the art, and these modifications
are also considered to belong to the scope of the present invention. For example,
additions, deletions or changes in design of the constituent elements or additions,
omissions or changes in condition of the processes may be arbitrarily made to the
above embodiments by a person of ordinary skill in the art, and these modifications
also fall within the scope of the present invention as long as they encompass the
spirit of the present invention.
[0129] In addition, the other advantages of the aspects described in the above embodiments,
which are obvious from the descriptions of the specification or which are arbitrarily
conceivable by a person of ordinary skill in the art, are considered to be achievable
by the present invention as a matter of course.