TECHNICAL FIELD
[0001] The present invention relates to a cell for a transmit array or a reflect array.
The present invention further relates to a transmit array or reflect array comprising
a plurality of cells. Also, the present invention relates to a system comprising a
transmit array or a reflect array.
STATE OF THE ART
[0002] There are known transmit arrays or reflect arrays comprising a plurality of cells.
A particular important category of said arrays are the ones which comprise cells which
are at a surface of the array and are actively controlled and tunable via a digital
control such that the electric and magnetic properties of the surface, and hence,
the reflection or transmission, respectively, of the electromagnetic waves by the
surface is respectively actively controlled. Hence, the surfaces comprising said reconfigurable
cells are also reconfigurable and are often called Reconfigurable Intelligent Surfaces
(RISs). RISs are being developed for wireless communication systems, particularly
towards 6G technology for communications, localization and sensing applications.
[0003] Over the past few decades, various techniques have been employed to achieve reconfigurability
in RISs, including PIN diodes, MEMS, liquid crystals, and varactor diodes. These elements
exhibit volatile switching behavior, necessitating a continuous power spending to
maintain the desired switch states, which results in an energy demand that may be
critical for the future scaling up of this technology to large areas in building surfaces
and furniture.
[0004] A major disadvantage with the previously known arrays comprising the known conventional
reconfigurable cells is that they do not address the static energy consumption problem
because as mentioned further above the cells in the known arrays comprise elements
which for maintaining their desired switch states require continuous power spending.
Although RF MEMS devices achieve low power consumption, they face challenges due to
their high switching voltages (typically in the range of 10-100 V) and complexities
in fabrication and packaging. Therefore, it can be understood that the known conventional
types of cells for transmit or reflect arrays and RISs, do not allow for solving the
problem of achieving low or zero static energy consumption without requiring high
switching voltages. Solving this problem is particularly important in the search for
greener 6G technologies, i.e. environmentally sustainable in terms of energy and materials
lifecycle.
DESCRIPTION OF THE INVENTION
[0005] The present invention overcomes the drawbacks of the conventional cells for transmit
or reflect arrays because it allows for solving the problem of achieving low or zero
static energy consumption without requiring high switching voltages. Moreover, advantageously
the present invention allows for solving said problem without imposing significant
complications in the fabrication or packaging of the cells. In addition, advantageously
the present invention may allow for solving said problem and, at the same time, for
achieving fast switching time e.g. in the range of 1 microsecond. Also, the present
invention may advantageously also allow for achieving reconfigurability of the cells
at higher frequencies compared to many conventional types of cells and RISs.
[0006] In a first aspect of the invention, a cell for a transmit array or a reflect array
is provided. The cell comprises an antenna which is a patch antenna or a ring resonator
antenna. The cell also comprises at least one memristor which is electrically connected
in series with a respective conductive region of the antenna.
[0007] Compared to conventional cells, the memristor of the cell of the present invention
addresses the static energy problem and allows for achieving a low power consumption
because the memristor typically can act as a non-volatile switch that requires no
hold voltage for operation. Moreover, in preferred embodiments, the memristor of the
present invention may advantageously allow for achieving fast switching times e.g.
switching time in the range of 1 microsecond and low resistance, e.g. 4 ohms, in the
ON state. Additionally, memristors may be of small size, e.g. 1 µm × 1 µm, and low
capacitance e.g. -28 fF/µm
2, which makes them suitable for advantageously achieving reconfigurability at higher
frequencies, e.g. up to 480 GHz, compared to conventional cells or conventional RISs.
[0008] In the cell of the present aspect of the invention, the memristor by being electrically
connected in series with the respective conduction region of the antenna, it can allow
for controlling the resistivity of the combination of the conduction of the region
and the memristor, and hence, for controlling the electrical and magnetic properties
of the antenna that comprises said conduction region.
[0009] It is noted that optionally the cell of the first aspect of the invention may comprise
more than one memristor i.e. two or more memristors. In that case, each of the memristors
may be connected to a respective conduction region of the antenna. Hence, optionally
the antenna of the cell may optionally comprise more than one conductive regions,
and at least one of said conduction regions may be connected to one, two or more memristors.
[0010] Preferably any or each of the at least one memristor comprises two conducting layers
separated via (i.e. by) an insulating sheet. This preferred configuration of the memristor
may advantageously allow the implementation of a non-volatile switching technique,
as is explained further below.
[0011] In a first preferred exemplary embodiment of the invention, the cell further comprises
a first dielectric substrate, wherein the at least one memristor and the respective
conductive region of the antenna are attached to a first surface of the first dielectric
substrate. Some non-limiting examples of said dielectric substrate are fused silica,
PTFE-based materials, ceramic- and hydrocarbon-based circuit laminates, which may
advantageously contribute to the durability and the manufacturability of the cells.
Preferably, the conduction region of the antenna may be formed on said first dielectric
substrate via a metallization fabrication step.
[0012] In a preferred embodiment of the invention that is according to the first exemplary
embodiment, the cell further comprises at least one first conductive channel which
passes through the first dielectric substrate, and the cell also comprises a first
ground plane that is electrically conductive, and wherein preferably a corresponding
first terminal of the at least one memristor is connected to the first ground plane
via the at least one first conductive channel. In the latter case, more preferably
the first ground plane is attached to a second surface of the first dielectric substrate,
the second surface being opposite to the first surface. In the latter embodiment,
the configuration that involves the first conductive channel passing thought he first
dielectric substrate, advantageously allows for achieving a vertical structuring of
the cell. In the optional case that said ground plane is at the aforementioned second
surface of the first dielectric substrate, further optionally, said ground plane may
have been formed on said second surface via a respective metallization step.
[0013] In a preferred embodiment of the invention that is according to the first exemplary
embodiment, the cell further comprises a second dielectric substrate attached at a
second surface of the first dielectric substrate oppositely the first surface of the
first dielectric substrate. Preferably said second dielectric substrate is glued to
the first dielectric substrate via an intermediate layer. It may be understood that
said intermediate layer may be a layer of glue or another material that is configured
to keep the second dielectric substrate glued or firmly attached to the first dielectric
substrate. The use of the second dielectric layer may advantageously further contribute
to the durability of the cell, and allow for the making of multilayer cell configurations,
i.e. cells that comprise stacks of two or more layers.
[0014] In a preferred embodiment that is according to the previous preferred embodiment
and, hence, comprises the second dielectric substrate and the at least one first conductive
channel, moreover, the first ground plane is attached to a surface of the second dielectric
substrate, and the at least one first conductive channel passes through (i.e. crosses)
the second dielectric substrate.
[0015] In a second exemplary embodiment of the invention, the cell further comprises an
electrical configuration which is electrically connected to the antenna and to the
memristor. Said electrical configuration is suitable, this is to say the electrical
configuration is configured, for an application via the same of two or more different
voltage difference values across the at least one memristor for respectively setting
the at least one memristor to a first resistivity state, a second resistivity state
and/or intermediate resistivity states. Preferably the electrical configuration comprises
transistors, radio frequency decoupling elements or stubs, one or more H-bridges or
microcontrollers, two or more conductive or biasing lines, or combinations thereof.
Hence, preferably the electrical configuration may be an assembly of electrically
electrical or electronic elements that is configured for the application via the same
of the of two or more different voltage difference values across the at least one
memristor. It may be understood in said second exemplary embodiment, said electrical
configuration is electrically connected to the at least one memristor. It may also
be understood that two or more voltage different values may refer to the corresponding
values of the voltage difference between a first terminal of the memristor, and a
second terminal of the memristor. Also, the aforementioned first resistivity state
may be a high resistivity state (HRS) of the memristor, and the second resistivity
state may be a low resistivity state (LRS) of the memristor, wherein the terms "high"
and "low" are comparative for indicating that in the HRS the resistivity of the memristor
is higher compared to the resistivity in the LRS. The HRS may also be called high
resistance state, and the LRS may also be called low resistance state. Likewise, it
may be understood that in the optional case that the cell comprises said electrical
configuration, and at least one memristor is such that it can be set to one or more
intermediate resistivity states by said electrical configuration, then the memristor's
resistivity (or resistance) values at said one or more intermediate resistivity (or
resistance) states would be between the value at the HRS and the value at the LRS.
The HRS and LRS may respectively be, or be called, "OFF state" and "ON state".
[0016] In preferred embodiments, the at least one memristor is being configured to selectively
exhibit an HRS (i.e. a first resistance state), an LRS (i.e. a second resistance state)
and one or more intermediate states. It is noted that in the present disclosure the
terms "resistance" and "resistivity" may be used interchangeably. More preferably,
the at least one memristor is configured to exhibit a change in its resistivity between
the HRS, the LRS and any possible intermediate state it may exhibit, without the resistivity
change between the one or more intermediate states being accompanied by a change in
a capacity of the memristor. This is to say, the at least one memristor may be configured
to exhibit substantially the same capacitance when it exhibits and is at one or more
intermediate states. In the latter case, the at least one memristor may advantageously
allow the control of the reflection or transmission range of the antenna.
[0017] In some preferred embodiments that are according to the first and the second exemplary
embodiments, at least a part of the electrical configuration is at the first surface
of the first dielectric substrate, or at a second surface of the first dielectric
substrate, said second surface being opposite to the first surface. Optionally having
at least part of the electrical configuration at the first or the second surface of
the substrate, may advantageously contribute to improving the compactness of the cell.
[0018] In some preferred embodiments which are according to the second exemplary embodiment,
and wherein the cell comprises the second dielectric substrate that is mentioned further
above, at least part of the electrical configuration is attached to a first or a second
surface of the second dielectric substrate. This may contribute to the efficient manufacturability
of the cell, because it may facilitate the fabrication of the cell in a modular manner.
Said fabrication may comprise forming or assembling the at least one memristor and
the respective conductive part of the antenna at the first dielectric substrate, and
separately forming and/or assembling part of the electrical configuration on the second
dielectric substrate, and subsequently attaching to each other the first and the second
dielectric substrates.
[0019] In a preferred embodiment which is according to the previous preferred embodiment,
the cell further comprises at least one second conductive channel which passes (i.e.
crosses) through the second dielectric substrate, and the cell also comprises a second
ground plane that is electrically conductive and is at a second surface of the second
dielectric substrate that is opposite the first surface of the second dielectric substrate,
and a first member of the part of the electrical configuration attached to the first
surface of the second dielectric substrate is connected to the second ground plane
via the second conductive channel. It can be understood that the aforementioned optional
configuration that involves the second conductive channel may advantageously allow
the fabrication of cells that exhibit multilayer structure, are compact and exhibit
optimized performance and properties. Moreover, in said optional configuration the
first ground plane may preferably be an RF ground plane such as a plane that is configured
to provide a direct path to ground potential for electrical currents of right frequency,
for thereby advantageously improving and optimizing the performance of the cell. Likewise,
in said configuration the second ground plane may be a DC ground plane such as a plane
that is configured to provide a direct path to ground potential for DC-type electrical
currents.
[0020] In a preferred embodiment that is according to the previous embodiment, the at least
one first conductive channel also passes through the second dielectric substrate and
electrically contacts a second member of the part of the electrical configuration
attached to the first surface of the second dielectric substrate. In the latter case,
preferably said at least one first conductive channel also passes through a corresponding
opening of the second ground plane such that the at least one first conductive channel
does not contact directly the second ground plane. Hence, said corresponding opening
may have a diameter that is larger than a cross section of the first conductive channel
so that the latter does not directly contact, and hence is electrically isolated from,
the second ground plane when passing through the latter's corresponding opening.
[0021] In a preferred embodiments of the invention the antenna is a patch antenna. In another
preferred embodiment of the invention the antenna is a ring resonator antenna. In
the optional case that the antenna is a patch antenna, advantageously the patch antenna
may exhibit a low profile, so the antenna may be mounted or formed on a surface, and
may be fabricated on a printed circuit board in a way that is not complex, thereby
facilitating the potential use in a portable wireless device application. Advantageously,
a ring resonator antenna may also exhibit a small size and be particularly suitable
for potential portable wireless device applications of the cell.
[0022] In a preferred embodiment of the invention, the antenna is a patch antenna which
comprises a first conductive region, a second conductive region and a third conductive
region, wherein the second and the third conductive regions are separated from each
other and from the first conductive region and are located on opposite positions with
respect to the first conductive region, and the cell comprises two memristors of which
one electrically connects to each other the first and the second conductive regions
of the antenna, and the other one of the two memristors electrically connects to each
other the first and the third conductive regions of the antenna. The latter preferred
embodiment may advantageously allow for controllably switching the patch antenna between
two phase states substantially equal to 0° and 180°, respectively. Said 0° and 180°
phase states may respectively correspond to the case where the first of the two memristors
is off (i.e. at an OFF state) while the second memristor is on (i.e. at an ON state),
and to the case where the first resistor is on while the second memristor is off.
[0023] In a preferred embodiment of the invention, the antenna is a ring resonator antenna
which comprises a first conductive region, a second conductive region, a third conductive
region and a fourth conductive region which are separated from each other, wherein
the first and the second conductive regions are arranged around an area in which the
third and the fourth conductive regions are located, and the cell comprises two memristors
of which one electrically connects to each other the first and the third conductive
regions of the antenna, and the other one of the two memristors electrically connects
to each other the third and the fourth conductive regions of the antenna.
[0024] The use of a ring resonator antenna in the cell may advantageously enable the use
of the cell in a reflect or transmit array that may be electronically controlled via
the element rotation approach which corresponds to the use of an electronically controlled
element arrangement that can mimic a physical element rotation with a controlled phase
shift. This is typically applied for circularly polarized waves. In particular, the
element rotation approach may be used to create a 180° phase shift in a linearly polarized
wave.
[0025] In a preferred embodiment of the invention, the cell comprises two memristors and
an interface circuit connected to the two memristors. Said interface circuit is connectable
to an external circuit and is configured to control the two memristors in opposition
such that the interface circuit can set any of the two memristors to a first or a
second resistivity state. When the interface circuit sets a first one of the two memristors
to a first resistivity state, it also sets a second one of the two memristors to a
second resistivity state. Also, when the interface circuit sets the first memristor
to the second resistivity state, it also sets the second memristor to the first resistivity
state. As mentioned further above, the first resistivity state of the memristor may
be the HRS of the memristor, and the second resistivity state of the memristor may
be the LRS of the memristor. The interface circuit by being configured to control
the two memristors in opposition such that when the first memristor is ON the other
memristor is OFF, it may allow the switching the corresponding antenna of the cell
between two phase states, substantially equal to 0° and to 180°. Preferably the interface
circuit comprises any of an H-bridge or a microcontroller which are electronic elements
that may enable controlling the two memristors in opposition.
[0026] In a second aspect of the invention, a transmit array or a reflect array is provided,
said array comprising a plurality of cells of the first aspect of the invention. Preferably
said array comprises a reconfigurable intelligent surface at which there are at least
some of said cells of the array.
[0027] In a third aspect of the invention, a system is provided, wherein the system comprising
an array of the second aspect of the invention, and further comprises a digital controller
and also, connectable to the digital controller, a corresponding interface circuit
for each cell of the plurality of cells, wherein the digital controller in combination
with the corresponding interface circuit are configured to controllably set the at
least one memristor of each cell to any of a first resistivity state and a second
resistivity state. In a preferred embodiment the digital controller in combination
with the corresponding interface circuit are also configured to controllably set the
at least one memristor of each cell to one or more intermediate states.
[0028] In a preferred embodiment of the system of the third aspect of the invention, the
system further comprises computing equipment that is configured to provide to the
digital controller an encoding to achieve desired transmission/reflection amplitude
and phase distribution and beamforming characteristics.
[0029] In a preferred embodiment of the third aspect of the invention, the digital controller
in combination with the interface circuit is configured to enable a 1-bit phase control
(180 degrees of phase tuneability), through the switching between two states of each
memristor: a high resistance state (e.g. >1000 ohm) to a low resistance state (e.g.
<10 ohm).
[0030] In a preferred embodiment of the third aspect of the invention, the digital controller
in combination with the interface circuit is configured to enable a 2-bit control
of the transmission/reflection amplitude, by considering a multi-level cell operation
regime of each memristor with 4 distinct resistive states levels. In the latter preferred
embodiment, the memristor is correspondingly configured to exhibit said 4 distinct
resistive states.
[0031] In a preferred embodiment of the third aspect of the invention, the digital controller
in combination with the interface circuit is configured to enable an N-bit control
of the transmission/reflection amplitude, by considering the multi-level cell operation
regime of each memristor with 2^N distinct resistive states levels. In the latter
embodiment, the memristor is correspondingly configured to exhibit said 2^N distinct
resistive states.
[0032] In a preferred embodiment of the third aspect of the invention, the digital controller
in combination with the interface circuit is configured to enable an N-bit phase control
(360/(2^N) degrees of transmission/reflection phase tuneability), by considering the
integration of N memristors with 2 states control in each antenna element.
[0033] In a preferred embodiment of the third aspect of the invention, the digital controller
in combination with the interface circuit is configured to enable an N-bit phase control
(360/(2^N) degrees of transmission/reflection phase tuneability), by considering the
integration of N memristors with 2 states control in each antenna element, and M-bit
control of the transmission/reflection amplitude by considering the multi-level cell
operation regime of each memristor with 2^M distinct resistive states levels. In the
latter embodiment, the memristor is preferably correspondingly configured to exhibit
said 2^M distinct resistive states.
[0034] In a further aspect of the invention, a reconfigurable intelligent surface (RIS)
is provided, wherein the RIS comprises a plurality of cells of the first aspect of
the invention.
[0035] Additional advantages and features of the invention will become apparent from the
detailed description that follows and will be particularly pointed out in the appended
claims.
BRIEF DESCRIPTION OF THE DRAWINGS
[0036] To complete the description and in order to provide for a better understanding of
the invention, a set of drawings is provided. Said drawings form an integral part
of the description and illustrate embodiments of the invention, which should not be
interpreted as restricting the scope of the invention, but just as examples of how
the invention can be carried out. The drawings comprise the following figures:
Fig. 1 illustrates a preferred embodiment of an array according to the invention.
Fig. 2A illustrates an exploded view of parts of a preferred embodiment of a cell
according to the invention.
Fig. 2B illustrates a view of the part of the embodiment of Fig. 2B.
Fig. 2C illustrates part of the embodiment of Fig. 2A, and two equivalent circuits
for said part.
Fig. 2D illustrates part of the embodiment of Fig. 2A.
Fig. 2E illustrates part of the embodiment of Fig. 2A.
Fig. 3A illustrates an example I-V curve for a switching mechanism operation of bi-polar
memristors.
Fig. 3B illustrates an H-bridge biasing circuit for the memristor of the cell of Fig.
2A.
Fig. 4 illustrates a control system for the embodiment of Fig. 1.
Fig. 5A illustrates an exploded view of parts of a preferred embodiment of a cell
according to the invention.
Fig. 5B illustrates a side view of parts of the embodiment of Fig. 5A.
Fig. 5C illustrates a view of a part of the embodiment of Fig. 5A.
Fig. 5D illustrates a view of a part of the embodiment of Fig. 5A.
Fig. 5E illustrates a view of a part of the embodiment of Fig. 5A.
Fig. 5F illustrates a view of a part of the embodiment of Fig. 5A.
Fig. 6A illustrates an exploded view of parts of a preferred embodiment of a cell
according to the invention.
Fig. 6B illustrates a side view of parts of the embodiment of Fig. 6A.
Fig. 6C illustrates a view of a part of the embodiment of Fig. 6A.
Fig. 6D illustrates a view of a part of the embodiment of Fig. 6A.
Fig. 6E illustrates a view of a part of the embodiment of Fig. 6A.
Fig. 6F illustrates a view of a part of the embodiment of Fig. 6A.
Fig. 7A illustrates an exploded view of parts of a preferred embodiment of a cell
according to the invention.
Fig. 7B illustrates a side view of parts of the embodiment of Fig. 7A.
Fig. 7C illustrates a view of a part of the embodiment of Fig. 7A.
Fig. 7D illustrates a view of a part of the embodiment of Fig. 7A.
Fig. 8A illustrates an exploded side view of parts of a preferred embodiment of a
cell according to the invention.
Fig. 8B illustrates a view of a part of the embodiment of Fig. 8A.
Fig. 8C illustrates a view of a part of the embodiment of Fig. 8A.
Fig. 8D illustrates a view of a part of the embodiment of Fig. 8A.
Fig. 8E illustrates a view of a part of the embodiment of Fig. 8A.
Fig. 8F illustrates a preferred embodiment of an array according to the invention.
Fig. 9A illustrates a preferred embodiment of an array according to the invention.
Fig. 9B illustrates an exploded side view of parts of a cell of the embodiment of
Fig. 9A, wherein said cell is also a preferred embodiment according to the invention.
Fig. 9C illustrates a view of part of the embodiment of Fig. 9B.
Fig. 9D illustrates a view of part of the embodiment of Fig. 9B.
Fig. 9E illustrates a view of part of the embodiment of Fig. 9B.
Fig. 9F illustrates a view of part of the embodiment of Fig. 9B.
Fig. 9G illustrates a view of part of the embodiment of Fig. 9B.
Fig. 10A illustrates a simulation set up of the unit cell of Fig. 2A.
Fig. 10B illustrates the simulated current distribution over the unit cell of Fig.
2A, when (a) the cell is at the ON state, and (b) the cell is at the OFF state.
Fig. 11 illustrates simulation results of the unit cell of Fig. 2A, specifically (a)
Reflection loss, (b) Reflection phase, and (c) reflection phase difference.
Fig. 12 illustrates a preferred embodiment of a RIS according to the invention, illuminated
by a 10-dBi horn antenna showing a reflected beam steered to an angle of 30°, and
also shows patch and ground layers of 2x2 elements in the array of the RIS.
Fig. 13 illustrates a realized gain of an embodiment of a 8x8 RIS according to the
invention, at a central frequency of 26.7 GHz in the plane Φ=0° for steering angles
0°, 30°, and 60° and the corresponding phase distribution.
DESCRIPTION OF A WAY OF CARRYING OUT THE INVENTION
[0037] The following description is not to be taken in a limiting sense but is given solely
for the purpose of describing the broad principles of the invention. Next embodiments
of the invention will be described by way of example, with reference to the above-mentioned
drawings, showing cells, arrays, RISs and systems according to the invention.
[0038] A preferred embodiment of a reflective array according to the second aspect of the
invention is illustrated in Fig. 1. The array 1 of Fig. 1 comprises a plurality of
cells 2 which are arranged at a surface of the array 2. Said surface can be considered
as being a reconfigurable intelligent surface (RIS). The array configuration (i.e.
the array 1) has a side length of
D, is illuminated by a horn antenna 3 at a focal length of F. Each element, known as
a unit cell 2, is equipped with a reconfigurable component that controls the phase
distribution of the RIS, enabling, for example, precise control of beam steering characteristics.
Said reconfigurable component is at least one memristor connected in series with a
respective conductive region of the antenna of the cell. Given the pressing need for
high-gain antennas in the 6G wireless communications technology, RISs are of high
technological importance because they may offer high performance, lightweight design,
compact size, and lower loss when compared to other types of devices such as parabolic
reflectors. RISs may advantageously offer considerable benefits, particularly in beamforming
radiation capabilities, making them of high interest for single user and multi-user
communication applications in 6G networks. Therefore, RISs may play a vital role in
customizing the coverage area by adapting radiation patterns and enhancing energy
efficiency for various applications, including satellite communications, sensing,
localization, and network security improvement.
[0039] It is noted that a unit cell of a reflect array according to an aspect of the invention
may preferably be electronically controlled via one of the following three main approaches:
the tunable resonator approach, the guided wave approach, and the element rotation
approach.
[0040] The tunable resonator approach corresponds to manipulating the phase of the scattered
field from the elements by changing the resonance characteristics of the elements.
This may for example be made in an element (i.e. a cell) that comprises a main patch
and a secondary/parasitic patch connected to the main patch, by electronically controlling
the connection of a main patch to the secondary/parasitic patch, therefore creating
a change in the resonance characteristics of the element.
[0041] The guided wave approach comprises transitioning the space-waves received by the
element to guided-waves, then imposing a phase-shift to the guided-waves using a guided-wave
electronically controlled circuit ended with a short or open circuited transmission
line stub, and then re-radiating the resulting wave.
[0042] The element rotation approach corresponds to the use of an electronically controlled
element arrangement that can mimic a physical element rotation with a controlled phase
shift. This is typically applied for circularly polarized waves.
[0043] It should be noted that combinations of the above-mentioned approaches can also enable
the control of a unit cell installed in a reflect array, as well as in a transmit
array. In particular, the element rotation approach may also be used to create a 180°
phase shift in a linearly polarized wave. The at least one memristor when it is being
controlled between an HRS and LRS may be be used for realizing any of the aforementioned
three control approaches. A transition between the HRS and the LRS may be considered
as corresponding to a 1-bit control (manipulation of the reflection or transmission
phase with a granularity of 180°). A higher resolution phase granularity (better than
180°) may preferably be achieved by combining multiple memristor devices (i.e. memristors)
in a unit cell. Since a memristor in some cases may enable resistance control through
the multilevel cell operation mode, this may be used to provide control of the reflection
or transmission wave magnitude, which can be useful as an additional degree of freedom
when computing a phase/amplitude profile of the reflect- or transmit-array.
[0044] A preferred embodiment of a cell according to the first aspect of the invention is
described next with reference to Fig. 2A-2E which illustrate the structure of each
cell 2 of the array 1 of Fig. 1. The cell 2 comprises a patch antenna and one memristor
13 which is electrically connected in series with a conductive region 11 of the antenna.
Said conductive region 11 is a metallic square formed on a first surface of a first
dielectric layer 51 of the cell 2. The memristor 13 is found in region A of said surface
51, and electrically connects said conductive region 11 to a second conductive region
17 of the antenna. The second conductive region 17 is connected via a first conductive
channel 14 to a second biasing line 44 and to a first ground plane 21 of the cell.
The first conductive channel 14 crosses the first dielectric substrate 51 and also
crosses the first ground plane 21 and a second dielectric substrate 52 of the cell.
The first ground plane 21 is located between the first dielectric substrate 51 and
the second dielectric substrate 52. The conductive region 11 of the antenna is also
connected to a first biasing line 41 of the cell via a second conductive channel 15
which contacts the first conductive region 11 and crosses and is substantially normal
to the first dielectric substrate 51, the second dielectric substrate 52 and the first
ground plane 21. The first ground plane 21 comprises an opening 22 the diameter of
which is larger than a diameter of s cross section of the second conductive channel
15 such that the latter crosses the first ground plane 21 through said opening 22
such that it does not directly contact the first ground plane 21. Integrated at the
first biasing line 41 there is also a radial stub 43 that serves for avoiding RF signal
losses though this conduction path/line.
[0045] Also, it is noted that in the embodiment of Fig. 2A-2E the cell has a side size of
p = 0.4λ
0 = 4.5 mm (considering a central frequency of 26.7 GHz). Also the first dielectric
substrate 51 that is made of Fused Silica (ε
r = 3.81, tanδ = 0.0004, thickness t
1 = 0.5 mm) and the second dielectric substrate 52 that is made of Taconic TLY-5 (ε
r = 2.2, tanδ = 0.0009, thickness t
2 =0.25 mm), are separated by the ground plane 21 that is a copper ground plane (dimensions:
4.45 mm × 4.45 mm). Fused Silica has been selected as the first substrate material
due to its low surface roughness, advantageously offering favorable characteristics
for fabricating directly memristors and benefiting their good performance. In the
embodiment of Fig. 2A-2F, the first conductive region 11 that is a square patch with
side length of X = 2.5 mm is printed on the top of the Fused Silica substrate layer
and connected to one of the two biasing lines 41, 44 on the bottom of the Taconic
substrate layer through the radial stub 43 that has with a size of λ
0/4, in order to avoid RF signal losses through this path. The memristor element may
preferably be fabricated directly in the RIS unit cell, in a 10 µm × 10 µm empty space
between two tapering sections as shown in Fig. 2C. The two biasing lines 41, 44 are
designed (i.e. are configured or are suitable) to be connected to an FPGA-based digital
controller through an H-bridge comprising four transistors to control the memristor
switching mechanism. So, the memristor's HRS and LRS modes may be achieved by setting
a single digital controller pin to either 'high' or 'low' voltage state to initiate
either the SET or RESET state of the memristor. In a simulation model, the memristor
element may be replaced by its equivalent circuit as a lumped element in either the
High Resistance State (HRS) or the Low Resistance State (LRS). In the HRS, it is represented
by an OFF-Resistance (ROFF) in parallel with a Capacitor (COFF), while a low ON-Resistance
(RON) represents the LRS, as illustrated in Fig. 2C. For the embodiment of Fig. 2A-2F,
it may be considered that the principle of operation from an electromagnetic point
of view comprises the following: the incident electromagnetic wave on the unit cell
is converted into a surface current, and the square patch reradiates it based on the
distributed current density. The reflection phase of the unit cell is electronically
controlled by routing the current along different paths. When the memristor element
is switched to an HRS state the current is distributed over the patch and re-radiated
directly, while when the memristor element is switched to an LRS state the current
distribution is subject to an additional path to the ground plane, leading to re-radiation
with a 180° phase shift. Consequently, a difference in the reflection phase is achieved
using both switching states of the memristor. The geometrical dimensions of the unit
cell may preferably be optimized through a parametric study, and in the particular
embodiment of Fig. 2A-2F, said dimensions are the following: p = 4.5 mm, x = 2.5 mm,
w = 0.2 mm, l = 0.4 mm, v =0.2 mm, t
1 =0.5 mm and t
2 = 0.25 mm.
[0046] The unit cell of Fig. 2A-2F achieves reconfigurability through a non-volatile switching
technique, where no continuous power is needed to maintain the reconfiguration state;
a voltage pulse is sufficient to change the state of the switch. Said non-volatile
switching technique for the embodiment of Fig. 2A-2F is explained next with reference
to the I-V curve of Fig. 3A which shows the schematic diagram of the complete memristor
switching cycle, including the transition from HRS to LRS (curves 1+2) and the reverse
transition from LRS to HRS (curves 3+4) in four steps. The memristor of the preferred
embodiment of Fig. 2A-2F comprises two conducting layers separated with an insulating
sheet resulting in the high-resistance state (HRS). The SET state is attained by applying
a positive voltage difference between the two terminals of the memristor (V1), leading
to the formation of a metallic filament between its conducting layers (step 1). Once
the filament is formed, the applied voltage can be removed, and the memristor memorizes
its resistance state (LRS) (step 2). On the other hand, when a reverse voltage is
applied to the memristor (-V2), the conducting filament begins to break, preventing
the transfer of electrons between terminals (step 3). As a result, the metallic filament
is totally broken, and the memorized resistance state returns to HRS (step 4). The
fact that both positive and negative voltages are required to switch between states
implies that it may be possible, depending on the used circuit configuration, that
the ground planes of different unit cells cannot be connected, as will be further
explained further below. Yet, although in the embodiment of Fig. 2A-2F a bipolar memristor
is used, it may be possible to use bipolar memristors that could in principle circumvent
this restriction.
[0047] Hence, the memristor of the cell may preferably be configured to exhibit a bipolar
switching behavior, where positive and negatives voltages are used to achieve set
and reset functions, respectively. However, depending on the type of the memristor,
and particularly of the materials used for fabricating the memristor, it may be possible
to achieve also unipolar resistive switching, where the amplitude of current/voltage
is responsible to set and reset the device rather than the polarity of the voltage
bias.
[0048] Also, the memristor of the cell may preferably be configured to exhibit a multilevel
cell (MLC) operation mode. The multilevel cell (MLC) operation mode allows one to
achieve intermediate resistance levels. Through this method, at the set side, one
may advantageously achieve a resistance higher than the typical value at the LRS,
while on the reset side, one can achieve a resistance lower than the typical value
at the HRS. This effect may be achieved either by the application of different current
compliance (CC) on the set side to control the achieved LRS, or via reset-stop voltage
on the reset side to control the final achieved LRS.
[0049] Preferably, the switching between the two states of the memristor, HRS and LRS, may
be controlled by a digital controller through an H-bridge interface circuit comprising
four transistors, providing two alternative conductive paths to the DC ground, as
shown in Fig. 3B. The circuit generates a positive voltage difference for the SET
operation (V1), a negative voltage difference (-V2) for the RESET operation, and passes
through zero Volt during transitions. Both SET and RESET operations are associated
with the logic levels of the digital controller (e.g., 'Logic high' for SET and 'Logic
low' for RESET). Fig. 4 illustrates the control circuit for the entire RIS configuration
of Fig. 1, wherein said RIS configuration comprises a plurality of cells as the one
of Fig. 2A-2F. Fig. 4 may also be considered as illustrating the control of a preferred
embodiment of a system according to an aspect of the invention, wherein said system
comprises the RIS configuration, a digital controller and also, connectable to the
digital controller, a corresponding interface circuit for each cell of the plurality
of cells, wherein the digital controller in combination with the corresponding interface
circuit are configured to controllably set the at least one memristor of each cell
to any of the first resistivity state (i.e. the HRS) and the second resistivity state
(i.e. the LRS). Each unit cell in the RIS contains an individual memristor controlled
independently by the digital controller pins, s1 to sM (with M being the total number
of memristors/unit cells) through an H-bridge circuit. Finally, the digital controller
may preferably be connected to a computer for providing an encoding to achieve the
desired amplitude/phase distribution and beamforming characteristics. Hence, the system
according to the invention, very preferably further comprises computing equipment
(e.g. a computer) that is configured (e.g. is programmed) to provide to the digital
controller an encoding to achieve desired amplitude/phase distribution and beamforming
characteristics.
[0050] Another embodiment of a cell that is according to first aspect of the invention is
explained next with reference to Fig. 5A-5F. The cell is suitable for implementing
the guided wave approach, has a multilayered structure and comprises a square-shaped
conductive region 111 that is the square patch of a patch antenna and is located attached
to a first surface 110 of a first dielectric substrate 151. A second surface 120,
opposite the first surface 110, of the first dielectric substrate 151 is attached
via an adhesive layer 153 to a first surface 130 of a second dielectric substrate
152 which also comprises a second surface 140 that is opposite the first surface 130
of the second dielectric substrate 152. The conductive region 111 is electrically
connected in series to a first terminal of a memristor 13, and a second terminal of
the memristor is connected via a respective conductive line 112 to a first conductive
channel 114. Said first conductive channel 114 is normal to and crosses the first
and the second dielectric substrates 151, 152, as well as a first ground plane 121
and a second ground plane 131 of the cell. In the embodiment of Fig. 5A-5F the first
ground plane 121 is an RF ground and is attached to the second surface 120 of the
first dielectric substrate 151, and the second ground plane 131 is an DC ground and
is attached to the first surface 130 of the second dielectric substrate 152. On the
second surface 140 of the second dielectric substrate 152 there is an interface circuit
that comprises two parts which are respectively connectable to a first external biasing
line and a second external biasing line. Voltages V1 and V2 may be applied to the
first and second external biasing lines, respectively. The first of the two parts
of the interface circuit comprises two transistors 42 which are connected to each
other via a line 141 that also integrates a radial stub 43 and is connected, via a
third conductive channel 115 and a line 112 which is the first surface 110 of the
first dielectric substrate 151, to the conductive region 111 of the antenna. Also,
one of the two transistors 41 of the first part is connectable to the first external
biasing line, and the other of the two transistors 41 is also connected via a respective
line 141a and a fourth conductive channel 132 to the second ground plane 131. The
two transistors 42 of the second part of the interface circuit are also connected
to each other via a respective line 141b that is further connected to the first conduction
channel 141. One of the two transistors of said second section is connected to the
second external biasing line, and the other one of the two transistors is connected
via a second conduction channel 134 to the second ground plane 131. The first 114
and the third 115 conduction channels are substantially normal and cross the first
151 and second 152 dielectric substrates and the adhesive layer 153. The first conduction
channel 114 contacts the first ground plane 121, and does not contact directly the
second ground plane 131 which comprises a respective opening 135 through which the
first conduction channel 114 passes without contacting directly the second ground
plane 131. Also, the second conductive channel 115 does not contact directly the first
ground plane 121 which comprises a respective opening 122 through which the second
conduction channel 115 passes without contacting directly the first ground plane 121.
Similarly, the second conductive channel 115 does not contact directly the second
ground plane 131 which comprises a respective opening 133 through which the second
conduction channel 115 passes without contacting directly the second ground plane
131.
[0051] Another embodiment of a cell that is according to first aspect of the invention is
explained next with reference to Fig. 6A-6F. The cell is suitable for implementing
the tunable resonator approach, has a multilayered structure and comprises a ring
resonator antenna that comprises a conductive region 211 that is shaped as a square
ring and attached to a first surface 210 of a first dielectric substrate 251. A second
surface 220, opposite the first surface 210, of the first dielectric substrate 251
is attached via an adhesive layer 253 to a first surface 230 of a second dielectric
substrate 252 which also comprises a second surface 240 that is opposite the first
surface 230 of the second dielectric substrate 252. The cell also comprises a first
ground plane 221 that is attached to the second surface 220 of the first dielectric
substrate 251, and a second ground plane 231 that is attached to the first surface
230 of the second dielectric substrate 252. The ring-shaped conductive region 211
is electrically connected in series to a first terminal of a memristor 13, and a second
terminal of the memristor is connected to another conductive region 216 that is square-shaped
and is also attached to the first surface 210 of the first dielectric substrate and
is surrounded by the ring-shaped conductive region 211. The square-shaped conductive
region 216 and the ring-shaped conduction region 211 of the ring-resonator antenna
of the cell do not directly contact each other. The square-shaped conductive region
216 of the antenna is connected via a first conductive channel 214 to a fist part
of an interface circuit that is at the second surface 240 of the second dielectric
substrate 252. Said first part of the interface circuit is connectable to a first
external biasing line and comprises two transistors 42 that are connected to each
via a respective line 241a that is also connected to said first conductive channel
214, and one of said two transistors 42 is connectable to said external biasing line
whereas the other of the two transistors is connected via a second conduction channel
232 to the second ground plane 231 of the cell. Also, the ring-shaped conductive region
211 of the antenna is connected via two third conduction channels 215a, 215b to a
second part of the interface circuit. The second part of the interface circuit is
connectable to a second external biasing line, and also comprises two transistors
42 which are connectable to each other via a line 241b that is connected to each of
the third conduction channels 215a, 245b. Voltages V1 and V2 may be applied to the
first and second external biasing lines, respectively. Also, said second part of the
interface circuit comprises two radial stubs 43 each of which is integrated in said
line 241b close to a respective one of the third conductive channels 215a, 215b. One
of the two transistors 42 of the second part of the interface circuit is connectable
to the second external biasing line whereas the other one is connected via a fourth
conduction channel 234 to the second ground plane 231. The second 232 and the fourth
234 conduction channels pass through (i.e. cross) and are substantially normal to
the second dielectric substrate 252. The first 214 and the third 215a, 215b conduction
channels pass through (i.e. cross) and are substantially normal to the first dielectric
substrate 251, the first ground plane 221, the second ground plane 231 and the second
dielectric substrate 252. The first conduction channel 214 contacts, and hence is
directly connected to, the first ground plane 221, but does not contact directly the
second ground plane 231 which comprises a respective first opening 235 through which
the first conductive channel 214 passes without contacting directly the second dielectric
substrate 231. Each of the third conduction channels 215a, 215b does not contact directly
nor the first ground plane 221 nor the second ground plane 231, and for this purpose,
the first ground plane comprises respective openings 222a, 222b through which a respective
one of the third conduction channels 215a, 215b passes. Likewise, the second ground
plane 231 comprises second openings 233a, 233b though which passes a respective one
of the third conduction channels 215a, 215b. For this purpose, each of the second
openings 233a, 233b has a diameter that is larger than the diameter of the respective
third conduction channel 215a, 215b that passes therethrough. It is noted that the
first ground plane 221 may be considered as being an RF ground, and the second ground
plane 231 may be considered as being a DC ground. It is also noted, that the four
transistors 42 advantageously enable achieving the a bipolar memristor control.
[0052] Another embodiment of a cell that is according to first aspect of the invention is
explained next with reference to Fig. 7A-7D. The cell is suitable for implementing
the tunable resonator approach, and comprises a main patch antenna which comprises
a square shaped conductive region 311, and a parasitic patch antenna that comprises
a rectangle-shaped conductive region 316, whereas said conductive regions 311, 316
are attached to a first surface 310 of a first dielectric substrate 351. The square
shaped conductive region 311 is connected to a first terminal of the memristor 13,
and the rectangle-shaped conductive region 316 is connected to a second terminal of
the memristor 13. The cell also comprises an interface circuit that comprises two
parts for respectively connecting the square-shaped conductive region 311 and the
rectangle shaped conductive region 316 to two biasing lines to which voltages V1 and
V2 may be applied respectively. The first and the second parts of said interface circuit
are also on the first surface 310 of the dielectric substrate 351. The first part
comprises two transistors 42 which are connected to each other via line 341a that
also integrates a radial stub 43 and is connected to the square-shaped conductive
region 311 of the main antenna, whereas the one of the two transistors is connectable
to the first biasing line, and the other of the two transistors of the first part
is connectable via one first conductive channel 332 to a ground plane 321 of the cell.
Said ground plane 231 is attached to a second surface 320 of the first dielectric
substrate 351, said second surface 320 being opposite the first surface 310. The second
part of the interface circuit also comprises two more transistors 42 which are connected
to each other via line 341b that also integrates a respective radial stub 43 and is
connected to the rectangle-shaped conductive region 316 of the parasitic antenna,
whereas the one of the two transistors is connectable to the second biasing line,
and the other of the two transistors of the second part is connectable via another
first conductive channel 334 to the ground plane 321 of the cell. The first conductive
channels 332, 334 cross (i.e. pass through) the dielectric substrate 351. It is noted
that advantageously the radial stubs 43 enable avoiding the RF signal from escaping
through the DC, and the four transistors 42 advantageously enable achieving a bipolar
memristor control. The ground plane 320 of the cell may also be considered as being
an RF ground.
[0053] Another embodiment of a cell that is according to first aspect of the invention is
explained next with reference to Fig. 8A-6E. The cell is suitable for implementing
the element rotation approach, has a multilayered structure and comprises a ring resonator
that comprises a first 411, a second 417, a third 416 and a fourth 418 conductive
regions which are on a first surface 410 of a first dielectric substrate 451. Each
of the first conductive region 411 and the second conductive region 417 is shaped
as a half square-ring, and said first and second conductive regions are separated
from each other and are arranged around a region of said first surface 410 at which
there are the third 416 and the fourth 418 conductive regions each of which is square
shaped and separated from the rest of the four conductive regions. The cell comprises
two memristors 13a, 13b which are also on said first surface 410 of the first dielectric
substrate 451. The first conductive region 411 is connected to a first terminal of
the first memristor 13a, and the third conductive region 416 is connected to a second
terminal of the first memristor 13a. The third conductive region 416 is also connected
to a first terminal of the second memristor 13b, and the fourth conductive region
418 is connected to a second terminal of the second memristor 13b. The first dielectric
substrate 451 also comprises a second surface 420 which is opposite to the first surface
410 and is attached via an adhesive layer 453 to a first surface 430 of a second dielectric
substrate 452 which also comprises a second surface 440 that is opposite the first
surface 430 of the second dielectric substrate 452. The cell also comprises a first
ground plane 431 that is attached to the second surface 440 of the second dielectric
substrate 452. The third conductive region 416 of the ring resonator antenna is connected
via a first conductive channel 414 to the first ground plane 431 of the cell. On the
first surface 430 of the second dielectric substrate the first conductive channel
414 is also connected via lines 436, 437 to additional conduction lines 432, 434 which
cross the second dielectric substrate 452, extending from the first 430 to the second
440 surface of the second dielectric substrate 452 and also contact and, hence, are
connected to the ground plane 431. The cell further comprises two biasing lines 441a,
441b which are on the second surface 420 of the first dielectric substrate 451. The
first biasing line 441a is connectable to a first external biasing line, and the second
biasing line 441b is connectable to a second external biasing line. Voltages V1 and
V2 may be applied to the first and second external biasing lines, respectively. Also,
the first biasing line 441a integrates two radial stubs 43 and is connected via two
second conductive lines 415a, 415b to two respective opposite ends of the first ring-shaped
conductive region 411 of the ring resonator antenna. The second biasing line 441b
also integrates two respective radial stubs 43 and is connected via two third conductive
lines 433a, 433b to two respective opposite ends of the second ring-shaped conductive
region 417 of the ring resonator antenna. The fourth conductive region 418 of the
antenna is also connected to a fourth conductive channel 419, and the second conductive
region is also connected to a fifth conductive channel 433c. At the second surface
420 of the first dielectric substrate 451 the fourth 419 and the fifth 433c conductive
channels are connected via a respective conductive line. The second 415b, 415a, the
third 433a, 433b, the fourth 419 and the fifth conduction channels extend from the
first surface 410 to the second surface 420 of the first dielectric substrate 451,
passing through the latter. The first conduction channel 414 passes through (i.e.
crosses) the first 451 and the second 452 dielectric substrates, and the adhesion
layer 453 that in the particular embodiment is a layer of glue. It is noted that the
embodiment of Fig. 8A-8E may be used in a reflect array, and Fig. 8F illustrates such
a reflect array 403 which comprises a plurality of cells 405 which are according to
the embodiment of Fig. 8A-8E. The antenna 400 of Fig. 8F comprises a source 43, but
it may alternatively comprise a plurality of sources 43. The source(s) irradiates,
i.e. emits radiation towards, the cells 405 of the array 403. Each cell 405 comprises
a first antenna element 205a that is the layer that faces the source 43 and is on
the first surface 410 of the first dielectric substrate 451 and comprises the aforementioned
conductive regions 411, 417, 416, 418. The cell 405 further comprises reflector element
405b that is the ground plane 431. The first surface 410 of the first dielectric substrate
451 can be considered as being the first surface of the array 403, and the second
surface 440 of the second dielectric substrate 452 can be considered as being the
second surface of the array 403. Each cell 405 of the embodiment of Fig. 8F is preferably
capable, in reflection mode, to receive the radiation emitted by source 43 on its
antenna element 405a, Also, in said reflection mode, each of said cells 405 is capable
to retransmit said radiation from its antenna element 405a, after reflection of said
radiation by the reflector element 405b, for example by introducing a phase shift
φ which may be known. Moreover, in reflection mode, each cell 405 of the embodiment
of Fig. 8F, is preferably capable to receive the radiation on its antenna element
405b and to retransmit with the same phase shift φ this radiation from its antenna
element 405a towards source 201, after reflection by reflector element 405b. The radiation
reemitted by antenna element 405a may for example be focused on source 43, or on any
other desired target. It is contemplated that the characteristics of a beam generated
by antenna 400, and particularly its shape or profile and its maximum transmission
direction or pointing direction, may depend on the values of the phase shifts respectively
introduced by the cells 405 of the array 403.
[0054] A further embodiment of the invention is explained next with reference to Fig. 9A-9F.
According to this embodiment, a first antenna element 805a of elementary cell 805
comprises a patch antenna which is adapted to capturing an electromagnetic radiation
800 emitted by a source 83, and a second antenna element 805b which comprises another
patch antenna adapted to transmitting towards the outside of the antenna 805, a phase-shifted
signal. Hence, Fig. 9A-9F illustrate an embodiment of a cell 805 that can be used
as part of a transmit array 803 according to the first aspect of the invention. Said
cell 805 comprises a first dielectric substrate 851 and a second dielectric substrate
852 which are attached together via an intermediate layer 853 that is prepreg adhesive
layer. The second dielectric substrate 852 comprises a first surface 814, and also
comprises a second surface on which there is deposited the first antenna element 805a,
wherein the first surface 814 is opposite the second surface of the second dielectric
substrate 852. The first dielectric substrate 851 comprises a first surface, and also
comprises a second surface 850 which is attached via the prepreg layer 853 to the
first surface 814 of the second substrate 852. The first surface of the first dielectric
substrate 851 is opposite to the latter's second surface 850 and has attached on it
the second antenna element 805b. The first antenna element 805a comprises a conductive
region 820 a perimeter of which is square and inside which there is a U-turn slot
which is substantially centered with respect to the conductive region 820 of the antenna
and is arranged around a central region of said conductive region 820. Said central
region is connected via a first conductive channel 816 to the center of a central
square conductive region 840C of the second antenna element 805b. The cell further
comprises a first ground plane 830 that is attached to the first surface 814 of the
second dielectric substrate 852 and is connected to the conductive region 820 via
two second conductive channels 818 which respectively contact the first conductive
region 820 at positions which are opposite to each and are aligned with the position
where the first conductive channel 816 contacts the square conductive region 820 at
about the latter's center. The second conductive channels 818 cross the second dielectric
substrate 852 extending from the first surface 814 to the second surface of the said
second substrate 852. The first conductive channel 816 crosses the second dielectric
substrate 852, the ground plane 830 and the first substrate 851, and extend from the
first antenna element 805a to the second antenna element 805b. The ground plane 830
comprises an orifice (i.e. an opening) 832 through which passes the first conductive
channel 816 without directly contacting the ground plane 830. For this purpose, a
diameter of the said orifice 832 is larger than a diameter of a cross section of the
first conductive channel 816. On the second surface 850 of the first dielectric substrate
851 the cell further comprises an interface circuit that comprise a first biasing
line 845 that is connectable to a first external biasing line, and a second biasing
line that is connectable to a second external biasing line. Voltages V1 and V2 may
be applied to the first and second external biasing lines, respectively. Each of the
biasing lines 845, 846 of the interface circuit integrates two respective radial stubs
41. Each of the radial stubs 41 of the first biasing line 845 is positioned between
the point of contact of the line 845 with the first external biasing circuit and a
respective one of two third conductive channels 843 via which the biasing line 845
is respectively connected to a respective one of two ends of a second conductive region
840P of the second antenna element 805b. Similarly, each of the radial stubs 43 of
the second biasing line 846 is positioned between the point of contact of the second
biasing line 846 with the second external biasing circuit and a respective one of
two fourth conductive channels 844 via which the second biasing line 846 is respectively
connected to a respective one of two ends of a third conductive region 840N of the
second antenna element 805b. Each of the second 840P and the third 840N conductive
regions of the second antenna element 805b is U-shaped, and said second 840P and third
840N conductive regions are separated from each other (i.e. do not contact directly
each other) via respective gaps located in between the respective ends at which the
second 843 and the third conductive channels 844 conduct said second 840P and third
840N conductive regions. The second 840P and third 840N conductive regions are also
separated from the central square-shaped region 840C which can be considered as being
a first conductive region of the second antenna element 805b. Said first conductive
region 840C is substantially surrounded by the second 840P, the third conductive region
840N and the gaps in between the second 840P and the third 840N conductive regions.
The cell 803 further comprises a first memristor 13a and a second memristor 13b which
may be controlled via the biasing lines 845, 846 in opposite. The second conductive
region 840P is connected to a first terminal of the first memristor 13a, and the first
conductive region 840C is connected to a second terminal of the first memristor 13a.
Similarly, the third conductive region 840N is connected to a first terminal of the
second memristor 13b, and the first conductive region 840C is connected to a second
terminal of the second memristor 13b. At the vicinity of the respective memristor
13a, 13b a respective portion of each of the first, second and third conductive region
may preferably have a substantially triangular shape with characteristic dimensions
D3, D6 and D7 as illustrate in Fig. 9G. Preferably, the first antenna element 805a,
the second antenna element 805b, the ground plane 830 and the first and second biasing
lines 845, 846 may be formed on the respective surface of the corresponding dielectric
substrate by a respective metallization step.
[0055] From all the above it can be understood that in the embodiments of Fig. 2A-2E, Fig.
5A-5F, Fig. 6A-6F, Fig. 7A-7D, Fig. 8A-8F, Fig. 9A-9D, the cell comprises an antenna
which is a patch antenna or a ring resonator antenna, and at least one memristor 13,
13a, 13b which is electrically connected in series with a respective conductive region
11, 111, 211, 311, 411, 418, 840P, 840N of the antenna.
[0056] Also, it can be understood that in the embodiments of Fig. 2A-2E, Fig. 5A-5F, Fig.
6A-6F, Fig. 7A-7D, Fig. 8A-8F, Fig. 9A-9D, the cell further comprises a first dielectric
substrate 51, 151, 251, 351, 451, 851, wherein the at least one memristor 13, 13a,
13b and the respective conductive region 11, 111, 211, 311, 411, 418, 840P, 840N of
the antenna are attached to a first surface 110, 210, 310, 410 of the first dielectric
substrate 51, 151, 251, 351, 451, 851.
[0057] Also, it can be understood that in the embodiments of Fig. 2A-2E, Fig. 5A-5F, Fig.
6A-6F, Fig. 7A-7D, Fig. 8A-8F, Fig. 9A-9D, the cell further comprises at least one
first conductive channel 14, 114, 214, 334, 332, 414, 816, 843, 844 which passes through
the first dielectric substrate 51, 151, 251, 351, 451, 851, and the cell also comprises
a first ground plane 21, 121, 221, 321, 431, 830 that is electrically conductive.
Also, it can be understood that in some of the aforementioned embodiments, a corresponding
first terminal of the at least one memristor 13, 13a, 13b is connected to the first
ground plane 21, 121, 221, 431 via the at least one first conductive channel 14, 114,
214, 414. Also, in some of the aforementioned embodiments, the first ground plane
21, 121, 221, 321 is attached to a second surface of the first dielectric substrate
51, 151, 251, 351, the second surface being opposite to the first surface 110, 210,
310.
[0058] Also, it can be understood that in some of the aforementioned embodiments, the cell
further comprises a second dielectric substrate 52, 152, 252, 452, 852 attached at
a second surface of the first dielectric substrate 51, 151, 251, 451, 851 oppositely
the first surface 110, 210, 410 of the first dielectric substrate 51, 151, 251, 451,
851, the second dielectric substrate 52, 152, 252, 452, 852 being glued to the first
dielectric substrate 51, 151, 251, 451, 851 via a an intermediate layer 153, 253,
453, 853.
[0059] Also, it can be understood that in the embodiments of Fig. 2A-2E, Fig. 5A-5F, Fig.
6A-6F, Fig. 7A-7D, Fig. 8A-8F, Fig. 9A-9D, the cell further comprises an electrical
configuration which is electrically connected to the antenna and the memristor 13,
13a, 13b and is suitable for an application via the same of two or more different
voltage difference values across the at least one memristor 13, 13a, 13b for respectively
setting the at least one memristor 13, 13a, 13b to a first resistivity state (e.g.
the LRS), a second resistivity state (e.g. the HRS) or intermediate resistivity states.
Preferably the electrical configuration comprises transistors 42, radio frequency
decoupling elements or stubs 43, one or more H-bridges or microcontrollers, biasing
(conductive) lines or combinations thereof.
[0060] Also, it can be understood that in some of the aforementioned embodiments, at least
a part of the electrical configuration is at the first surface 310 of the first dielectric
substrate 351, or at a second surface 420, 850 of the first dielectric substrate 451,
851, the second surface 420 being opposite to the first surface 410.
[0061] Also, it can be understood that in some of the aforementioned embodiments, at least
part of the electrical configuration is attached to a second surface 140, 240 of the
second dielectric substrate 152, 252.
[0062] Also, it can be understood that in some of the aforementioned embodiments, the cell
further comprises at least one second conductive channel 134, 234, 232 passing through
the second dielectric substrate 152, 252, and the cell also comprises a second ground
plane 131, 231 that is electrically conductive and is at a first surface 130, 230
of the second dielectric substrate 152, 252 that is opposite the second surface 140,
240 of the second dielectric substrate 152, 252, and a first member of the part of
the electrical configuration attached to the second surface 140, 240 of the second
dielectric substrate 152, 252 is connected to the second ground plane 131, 231 via
the second conductive channel 134, 234, 232.
[0063] Also, it can be understood that in some of the aforementioned embodiments, the at
least one first conductive channel 114, 214 also passes through the second dielectric
substrate 152, 252 and electrically contacts a second member of the part of the electrical
configuration attached to the second surface 140, 240 of the second dielectric substrate
152, 252, the at least one first conductive channel 114, 214 also passing through
a corresponding opening 135, 235 of the second ground plane 131, 231 such that the
at least one first conductive channel 114, 214 does not contact directly the second
ground plane 131, 231.
[0064] Also, it can be understood that in some of the aforementioned embodiments, the first
ground plane 431, 830 is attached to a surface 440, 814 of the second dielectric substrate
452, 852, and the at least one first conductive channel 414, 816 passes through the
second dielectric substrate 452, 852.
[0065] Also, it can be understood that in the embodiments of Fig. 9A-9D, the antenna is
a patch antenna which comprises a first conductive region 840C, a second conductive
region 840P and a third conductive region 840N, wherein the second and the third conductive
regions 840P, 840N are separated from each other and from the first conductive region
840C and are located on opposite positions with respect to the first conductive region
840C, and the cell comprises two memristors 13a, 13b of which one 13a electrically
connects to each other the first and the second conductive regions of the antenna,
and the other one 13b of the two memristors electrically connects to each other the
first and the third conductive regions of the antenna.
[0066] Also, it can be understood that in the embodiments of Fig. 8A-8F, the antenna is
a ring resonator antenna which comprises a first conductive region 411, a second conductive
region 417, a third conductive region 416 and a fourth conductive region 418 which
are separated from each other, wherein the first 411 and the second 417 conductive
regions are arranged around an area in which the third 416 and the fourth conductive
regions 418 are located, and the cell comprises two memristors 13a, 13b of which one
13a electrically connects to each other the first 411 and the third 416 conductive
regions of the antenna, and the other one 13b of the two memristors electrically connects
to each other the third 416 and the fourth 418 conductive regions of the antenna.
[0067] Also, it can be understood that a preferred embodiment, the cell comprises two memristors
13a, 13b and an interface circuit connected to the two memristors, wherein the interface
circuit is connectable to an external circuit and is configured to control the two
memristors 13a, 13b in opposition such that the interface circuit can set any of the
two memristors to a first or a second resistivity state, and when it sets a first
one of the two memristors to a first resistivity state, it also sets a second one
of the two memristors to a second resistivity state, and when the external circuit
sets the first memristor to the second resistivity state, it also sets the second
memristor to the first resistivity state, preferably the interface circuit comprising
any of an H-bridge or a microcontroller.
[0068] An operation of the cell illustrated by Fig. 2A-2E was performed, and particular
findings from the performed simulations are explained below. The unit cell simulation
model was excited using a Floquet port with normal incidence and analyzed with the
full-wave EM simulator ANSYS HFSS under a periodic boundary condition, as depicted
in Fig. 10A. The simulation results for the optimized structure were also confirmed
using a CST simulation platform. Controlling the current distribution over the radiating
element between the two states, State OFF and State ON, results in the reflection
phase difference of 180°, as shown in the resultant current distribution illustrated
in Fig. 10B. In Fig. 10B (a), a positive voltage difference has been applied to the
memristor device through logic level 'high' in the digital controller resulting in
a LRS state. Consequently, the current is shorted to the ground plane, minimizing
the current value on the square patch element. On the other hand, when logic level
'low' is applied, a negative voltage difference is achieved across the memristor,
resulting in HRS and high current distribution on the unit cell surface, as shown
in Fig. 10B (b). The simulation of the proposed unit cell has been performed using
two 3D electromagnetic simulator platforms, HFSS and CST. This validation and verification
process using both platforms ensures confidence in the accuracy of the simulation
results. The performance of the unit cell, in terms of reflection loss and reflection
phase difference, is presented in Fig. 11, where it is shown that both HFSS and CST
results are in perfect alignment, with only a slight shift in the reflection phase
difference, as shown in graph (c) of Fig. 11. The reflection loss is less than 1 dB
across the frequency band of 25-28.3 GHz. Additionally, the unit cell achieves a 180°
phase difference at the central frequency of 26.7 GHz with an operation bandwidth
of approximately 1 GHz (26.3-27.3 GHz), considering a phase difference between the
two states of the RIS element of |ΔΦ| = 180°±20°, as shown in graph (c) of Fig. 11.
[0069] To demonstrate and validate the simulated unit cell's capability when integrated
into an array configuration, a simple 8×8 array with overall dimensions of 36 × 36
× 0.855 mm
3 and total number of 64 reflective elements has been designed and illuminated using
a standard 10-dBi horn antenna. For simplicity, the horn antenna is positioned perpendicularly
to the RIS at a height corresponding to the focal distance F. As represented in Fig.
12, the focal distance is set to achieve a ratio of F/D = 0.8, where D represents
the aperture size of the RIS, ensuring a good compromise between both illumination
loss and spill-over loss. In the concerned simulated embodiment, the ground planes
of all memristors in the array configuration cannot be connected to each other to
allow for independent positive and negative voltage application to each memristor.
Consequently, in the simulated unit cell structure, the ground plane 21 is smaller
than the substrate 51 by 0.05 mm in all directions, resulting in a 0.1 mm separation
between all ground planes in the array configuration as depicted in Fig. 12.
[0070] Three scenarios were considered for beamforming the antenna electromagnetic radiation
towards different reflection angles: 0°, 30°, and 60°. The phase distribution of the
unit cells has been configured using MATLAB. For instance, as shown in Fig. 12, the
3D visualization demonstrates the incident beam from the horn antenna being reflected
towards an angle θ = 30°. These scenarios, with the phase distribution over the RIS
configuration for each desired reflection angle, were considered in the EM simulator
CST. In Fig. 13, the RIS gain has been plotted versus the beam steering angle (theta)
in the Φ = 0° plane for the discussed scenarios in addition to the RIS phase distribution
of each scenario. The 8x8 RIS successfully achieves the targeted beamforming characteristics
such that the main beam angle could be controlled with a maximum gain of 13.2 dBi,
13.6 dBi, and 11.5 dBi at steering angles of 0°, 30°, and 60°, respectively. The relatively
large side lobes may be explained by the small size of the modelled RIS.
[0071] Hence, the simulation study showed that the concerned unit cell of Fig. 2A-2F, achieved
1-bit phase reconfigurability at 26.7 GHz with an operational bandwidth of around
1 GHz. Additionally, the simulations showed that reflection loss over this frequency
range was less than 0.6 dB. The simulation also showed that the aforementioned exemplary
designed 8×8 RIS configuration has the ability to achieve beam steering. Also, preferred
embodiments of the invention may comprise memristors which are configured to provide
intermediate resistance levels between HRS and LRS through an effect known as multilevel
cell programming. This may for example be achieved by preferably applying different
current compliance levels in the memristor, thereby advantageously enabling additional
flexibility in the control over the RIS's performance.
[0072] In this text, the term "comprises" and its derivations (such as "comprising", etc.)
should not be understood in an excluding sense, that is, these terms should not be
interpreted as excluding the possibility that what is described and defined may include
further elements, steps, etc.
[0073] The invention is obviously not limited to the specific embodiment(s) described herein,
but also encompasses any variations that may be considered by any person skilled in
the art (for example, as regards the choice of materials, dimensions, components,
configuration, etc.), within the general scope of the invention as defined in the
claims.
1. A cell for a transmit array or a reflect array, the cell comprising an antenna which
is a patch antenna or a ring resonator antenna, and at least one memristor (13, 13a,
13b) which is electrically connected in series with a respective conductive region
(11, 111, 211, 311, 411, 418, 840P, 840N) of the antenna.
2. A cell according to claim 1, further comprising a first dielectric substrate (51,
151, 251, 351, 451, 851), wherein the at least one memristor (13, 13a, 13b) and the
respective conductive region (11, 111, 211, 311, 411, 418, 840P, 840N) of the antenna
are attached to a first surface (110, 210, 310, 410) of the first dielectric substrate
(51, 151, 251, 351, 451, 851).
3. A cell according to claim 2, further comprising at least one first conductive channel
(14, 114, 214, 334, 332, 414, 816, 843, 844) which passes through the first dielectric
substrate (51, 151, 251, 351, 451, 851), and the cell also comprises a first ground
plane (21, 121, 221, 321, 431, 830) that is electrically conductive, and wherein preferably
a corresponding first terminal of the at least one memristor (13, 13a, 13b) is connected
to the first ground plane (21, 121, 221, 431) via the at least one first conductive
channel (14, 114, 214, 414), more preferably the first ground plane (21, 121, 221,
321) being attached to a second surface of the first dielectric substrate (51, 151,
251, 351), the second surface being opposite to the first surface (110, 210, 310).
4. A cell according to any of claims 2-3, further comprising a second dielectric substrate
(52, 152, 252, 452, 852) attached at a second surface of the first dielectric substrate
(51, 151, 251, 451, 851) oppositely the first surface (110, 210, 410) of the first
dielectric substrate (51, 151, 251, 451, 851), preferably the second dielectric substrate
(52, 152, 252, 452, 852) being glued to the first dielectric substrate (51, 151, 251,
451, 851) via a an intermediate layer (153, 253, 453, 853).
5. A cell according to any of the previous claims, further comprising an electrical configuration
which is electrically connected to the antenna and the memristor (13, 13a, 13b) and
is suitable for an application via the same of two or more different voltage difference
values across the at least one memristor (13, 13a, 13b) for respectively setting the
at least one memristor (13, 13a, 13b) to a first resistivity state, a second resistivity
state or intermediate resistivity states, preferably the electrical configuration
comprising any of transistors (42), radio frequency decoupling elements or stubs (43),
one or more H-bridges or microcontrollers, biasing lines or combinations thereof.
6. A cell according to claim 2 and 5, wherein at least a part of the electrical configuration
is at the first surface (310) of the first dielectric substrate (351), or at a second
surface (420, 850) of the first dielectric substrate (451, 851), the second surface
(420, 850) being opposite to the first surface (410).
7. A cell according to claims 4 and 5, wherein at least part of the electrical configuration
is attached to a second surface (140, 240) of the second dielectric substrate (152,
252).
8. A cell according to claim 7, further comprising at least one second conductive channel
(134, 234, 232) passing through the second dielectric substrate (152, 252), and the
cell also comprises a second ground plane (131, 231) that is electrically conductive
and is at a first surface (130, 230) of the second dielectric substrate (152, 252)
that is opposite the second surface (140, 240) of the second dielectric substrate
(152, 252), and a first member of the part of the electrical configuration attached
to the second surface (140, 240) of the second dielectric substrate (152, 252) is
connected to the second ground plane (131, 231) via the second conductive channel
(134, 234, 232).
9. A cell according to claims 3 and 8, wherein the at least one first conductive channel
(114, 214) also passes through the second dielectric substrate (152, 252) and electrically
contacts a second member of the part of the electrical configuration attached to the
second surface (140, 240) of the second dielectric substrate (152, 252), preferably
the at least one first conductive channel (114, 214) also passing through a corresponding
opening (135, 235) of the second ground plane (131, 231) such that the at least one
first conductive channel (114, 214) does not contact directly the second ground plane
(131, 231).
10. A cell according to claims 2 and 4, wherein the first ground plane (431, 830) is attached
to a surface (440, 814) of the second dielectric substrate (452, 852), and the at
least one first conductive channel (414, 816) passes through the second dielectric
substrate (452, 852).
11. A cell according to any one of the previous claims, wherein the antenna is a patch
antenna which comprises a first conductive region (840C), a second conductive region
(840P) and a third conductive region (840N), wherein the second and the third conductive
regions (840P, 840N) are separated from each other and from the first conductive region
(840C) and are located on opposite positions with respect to the first conductive
region (840C), and the cell comprises two memristors (13a, 13b) of which one (13a)
electrically connects to each other the first and the second conductive regions of
the antenna, and the other one (13b) of the two memristors electrically connects to
each other the first and the third conductive regions of the antenna.
12. A cell according to any one of claim 1-10, wherein the antenna is a ring resonator
antenna which comprises a first conductive region (411), a second conductive region
(417), a third conductive region (416) and a fourth conductive region (418) which
are separated from each other, wherein the first (411) and the second (417) conductive
regions are arranged around an area in which the third (416) and the fourth conductive
regions (418) are located, and the cell comprises two memristors (13a, 13b) of which
one (13a) electrically connects to each other the first (411) and the third (416)
conductive regions of the antenna, and the other one (13b) of the two memristors electrically
connects to each other the third (416) and the fourth (418) conductive regions of
the antenna.
13. A cell according to any of the previous claims, comprising two memristors (13a, 13b)
and an interface circuit connected to the two memristors, wherein the interface circuit
is connectable to an external circuit and is configured to control the two memristors
(13a, 13b) in opposition such that the interface circuit can set any of the two memristors
to a first or a second resistivity state, and when it sets a first one of the two
memristors to a first resistivity state, it also sets a second one of the two memristors
to a second resistivity state, and when the external circuit sets the first memristor
to the second resistivity state, it also sets the second memristor to the first resistivity
state, preferably the interface circuit comprising any of an H-bridge or a microcontroller.
14. A transmit array or a reflect array comprising a plurality of cells which are according
to any of the previous claims.
15. A system comprising an array according to claim 14, further comprising a digital controller
and, connectable to the digital controller, a corresponding interface circuit for
each cell of the plurality of cells, wherein the digital controller in combination
with the corresponding interface circuit are configured to controllably set the at
least one memristor (13, 13a, 13b) of each cell to any of a first resistivity state
and a second resistivity state.