(19)
(11) EP 4 680 427 A1

(12)

(43) Date of publication:
21.01.2026 Bulletin 2026/04

(21) Application number: 24709174.7

(22) Date of filing: 26.02.2024
(51) International Patent Classification (IPC): 
B23K 26/082(2014.01)
B23K 26/142(2014.01)
B23K 26/362(2014.01)
B23K 26/53(2014.01)
B23K 26/08(2014.01)
B23K 26/352(2014.01)
B23K 26/402(2014.01)
B41J 2/44(2006.01)
(52) Cooperative Patent Classification (CPC):
B23K 26/082; B23K 26/0838; B23K 26/142; B23K 26/352; B23K 26/362; B23K 26/402; B23K 26/53; B23K 26/0853; B41J 2/442; B41J 2/4753
(86) International application number:
PCT/IB2024/051796
(87) International publication number:
WO 2024/189445 (19.09.2024 Gazette 2024/38)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
GE KH MA MD TN

(30) Priority: 13.03.2023 JP 2023038703

(71) Applicant: Ricoh Company, Ltd.
Tokyo 143-8555 (JP)

(72) Inventor:
  • FUJII, Toshishige
    Tokyo 143-8555 (JP)

(74) Representative: SSM Sandmair 
Patentanwälte Rechtsanwalt Partnerschaft mbB Joseph-Wild-Straße 20
81829 München
81829 München (DE)

   


(54) LASER IRRADIATION APPARATUS, LASER IRRADIATION METHOD, AND LASER IRRADIATION SYSTEM