(19)
(11) EP 4 681 024 A1

(12)

(43) Date of publication:
21.01.2026 Bulletin 2026/04

(21) Application number: 24703390.5

(22) Date of filing: 08.02.2024
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)
(52) Cooperative Patent Classification (CPC):
G03F 7/70341; G03F 7/707; G03F 7/70875
(86) International application number:
PCT/EP2024/053231
(87) International publication number:
WO 2024/188552 (19.09.2024 Gazette 2024/38)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
GE KH MA MD TN

(30) Priority: 13.03.2023 EP 23161486
28.09.2023 EP 23200625

(71) Applicant: ASML Netherlands B.V.
5500 AH Veldhoven (NL)

(72) Inventors:
  • ROSET, Niek, Jacobus, Johannes
    5500 AH Veldhoven (NL)
  • BOS, Edwin, Johannes, Cornelis
    5500 AH Veldhoven (NL)
  • RAVENSBERGEN, Simon, Karel
    5500 AH Veldhoven (NL)
  • VAN DEN BERKMORTEL, Frank, Pieter, Albert
    5500 AH Veldhoven (NL)
  • HUANG, Zhuangxiong
    5500 AH Veldhoven (NL)
  • HOSSEINI, Sayyed Hamid
    5500 AH Veldhoven (NL)
  • DEWANJI, Dipanjay
    5500 AH Veldhoven (NL)
  • HECK, Dennis, Johannes, Franciscus
    5500 AH Veldhoven (NL)
  • HERTOG, Wladimir, Fransiscus, Gerardus, Maria
    5500 AH Veldhoven (NL)
  • HOFMAN, Johannes, Marinus, Abraham
    5500 AH Veldhoven (NL)
  • BLOM, Sander
    5500 AH Veldhoven (NL)
  • ROPS, Cornelius, Maria
    5500 AH Veldhoven (NL)

(74) Representative: ASML Netherlands B.V. 
Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven
5500 AH Veldhoven (NL)

   


(54) SUBSTRATE SUPPORT AND LITHOGRAPHIC APPARATUS