<?xml version="1.0" encoding="UTF-8"?><!--This XML data has been generated under the supervision of the European Patent Office --><!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.7.1//EN" "ep-patent-document-v1-7-1.dtd">
<ep-patent-document country="EP" date-publ="20260121" doc-number="4681024" dtd-version="ep-patent-document-v1-7-1" file="24703390.5" id="EP24703390A1" kind="A1" lang="en" status="n"><SDOBI lang="en"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIROMKCYALTRBGCZEEHUPLSKBAHRIS..MTNORSMESMMAKHTNMDGE........</B001EP><B003EP>*</B003EP><B005EP>X</B005EP><B007EP>0009010-RPUB02</B007EP></eptags></B000><B100><B110>4681024</B110><B130>A1</B130><B140><date>20260121</date></B140><B190>EP</B190></B100><B200><B210>24703390.5</B210><B220><date>20240208</date></B220><B240><B241><date>20250812</date></B241></B240><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>23161486</B310><B320><date>20230313</date></B320><B330><ctry>EP</ctry></B330><B310>23200625</B310><B320><date>20230928</date></B320><B330><ctry>EP</ctry></B330></B300><B400><B405><date>20260121</date><bnum>202604</bnum></B405><B430><date>20260121</date><bnum>202604</bnum></B430></B400><B500><B510EP><classification-ipcr sequence="1"><text>G03F   7/20        20060101AFI20240920BHEP        </text></classification-ipcr></B510EP><B520EP><classifications-cpc><classification-cpc sequence="1"><text>G03F   7/70341     20130101 FI20240508BHEP        </text></classification-cpc><classification-cpc sequence="2"><text>G03F   7/707       20130101 LI20240508BHEP        </text></classification-cpc><classification-cpc sequence="3"><text>G03F   7/70875     20130101 LI20240508BHEP        </text></classification-cpc></classifications-cpc></B520EP><B540><B541>de</B541><B542>SUBSTRATTRÄGER UND LITHOGRAPHISCHE VORRICHTUNG</B542><B541>en</B541><B542>SUBSTRATE SUPPORT AND LITHOGRAPHIC APPARATUS</B542><B541>fr</B541><B542>SUPPORT DE SUBSTRAT ET APPAREIL LITHOGRAPHIQUE</B542></B540></B500><B700><B710><B711><snm>ASML Netherlands B.V.</snm><iid>101985721</iid><irf>2023P00011WE</irf><adr><str>P.O. Box 324</str><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B711></B710><B720><B721><snm>ROSET, Niek, Jacobus, Johannes</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>BOS, Edwin, Johannes, Cornelis</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>RAVENSBERGEN, Simon, Karel</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>VAN DEN BERKMORTEL, Frank, Pieter, Albert</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>HUANG, Zhuangxiong</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>HOSSEINI, Sayyed Hamid</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>DEWANJI, Dipanjay</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>HECK, Dennis, Johannes, Franciscus</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>HERTOG, Wladimir, Fransiscus, Gerardus, Maria</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>HOFMAN, Johannes, Marinus, Abraham</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>BLOM, Sander</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721><B721><snm>ROPS, Cornelius, Maria</snm><adr><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B721></B720><B740><B741><snm>ASML Netherlands B.V.</snm><iid>101863923</iid><adr><str>Corporate Intellectual Property
P.O. Box 324</str><city>5500 AH Veldhoven</city><ctry>NL</ctry></adr></B741></B740></B700><B800><B840><ctry>AL</ctry><ctry>AT</ctry><ctry>BE</ctry><ctry>BG</ctry><ctry>CH</ctry><ctry>CY</ctry><ctry>CZ</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>EE</ctry><ctry>ES</ctry><ctry>FI</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>HR</ctry><ctry>HU</ctry><ctry>IE</ctry><ctry>IS</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LT</ctry><ctry>LU</ctry><ctry>LV</ctry><ctry>MC</ctry><ctry>ME</ctry><ctry>MK</ctry><ctry>MT</ctry><ctry>NL</ctry><ctry>NO</ctry><ctry>PL</ctry><ctry>PT</ctry><ctry>RO</ctry><ctry>RS</ctry><ctry>SE</ctry><ctry>SI</ctry><ctry>SK</ctry><ctry>SM</ctry><ctry>TR</ctry></B840><B844EP><B845EP><ctry>BA</ctry></B845EP></B844EP><B848EP><B849EP><ctry>GE</ctry></B849EP><B849EP><ctry>KH</ctry></B849EP><B849EP><ctry>MA</ctry></B849EP><B849EP><ctry>MD</ctry></B849EP><B849EP><ctry>TN</ctry></B849EP></B848EP><B860><B861><dnum><anum>EP2024053231</anum></dnum><date>20240208</date></B861><B862>en</B862></B860><B870><B871><dnum><pnum>WO2024188552</pnum></dnum><date>20240919</date><bnum>202438</bnum></B871></B870></B800></SDOBI></ep-patent-document>