TECHNICAL FIELD
[0001] The present invention relates to a method for producing aluminum in which aluminum
with higher purity can be obtained from, for example, a casting alloy or the like.
BACKGROUND OF THE INVENTION
[0002] Unlike iron and steel materials, widely used aluminum cannot be smelted from raw
ore using thermal reduction reaction with carbon, and thus it is generally necessary
to use electricity in the smelting processes, such as in Bayer process or Hall-Héroult
process. For this reason, production of virgin aluminum metal emits a large amount
of carbon dioxide, imposing heavy burden on environment.
[0003] Thus, it is preferable to reuse used aluminum products through recycling. For example,
attempts have been made to easily produce highly purified aluminum material from aluminum
alloy scrap (Patent Document 1, for example).
PRIOR ART
SUMMARY OF THE INVENTION
(PROBLEMS TO BE SOLVED BY THE INVENTION)
[0005] The term "aluminum" includes a wide variety of alloys that are used depending on
applications. For example, in a case of aluminum cans, A3000 series (Al-Mn series)
wrought materials are used, and there is no problem if such materials are directly
recycled back into aluminum cans. However, when converting such materials into other
alloys, components thereof may cause a problem. In such the case, it is required to
reduce an amount of the recycled alloy and to mix a certain amount of virgin metal.
For this reason, recycling into the same alloy series is most efficient.
[0006] However, although there has been a large amount of scrap of aluminum alloys that
have been used for automobile engine parts etc., the amount of reused aluminum alloys
is in decline due to widespread use of electric vehicles and the like in the recent
years. This makes it difficult to reuse the aluminum alloys within the same field.
In particular, metals in the above field are often cast products (castings, die-castings)
containing more alloy components than wrought materials, which makes it difficult
to be converted into products in other fields. For example, an AC2A alloy (JIS) used
as a casting material contains 4.0 mass% or more and 6.0 mass% or less of silicon
(Si) and the content of Si and the like is much higher compared to the wrought materials.
This makes it extremely difficult to reuse such the alloy for other wrought material
applications.
[0007] The present invention was made in view of such problems. It is an object of the present
invention to provide a method for producing aluminum, in which aluminum base metal
or a used aluminum alloy, particularly an aluminum alloy with high Si content, is
used as aluminum raw material such that aluminum having higher purity than the aluminum
raw material can be produced.
(MEANS FOR SOLVING PROBLEMS)
[0008] To achieve the above object, an aspect of the present invention is a method for producing
aluminum from an aluminum raw material, in which aluminum with higher purity than
the aluminum raw material can be obtained. The method includes immersing an anode
electrode, which includes the aluminum raw material containing 0.1 mass% or more and
24 mass% or less of Si, and a cathode electrode in an electrolytic solution, and applying
a current to flow at a current density of 0.1 mA/cm
2 or more and 25 mA/cm
2 or less on a surface of the anode electrode where the aluminum raw material comes
into contact with the electrolytic solution, thereby depositing aluminum on the cathode
electrode.
[0009] The aluminum raw material of the anode electrode may further contain 0.1 mass% or
more and 5 mass% or more of copper (Cu).
[0010] The aluminum raw material of the anode electrode may further contain 0.15 mass% or
more and 1.8 mass% or less of iron (Fe).
[0011] It is preferable to apply the current to the anode electrode while stirring the electrolytic
solution around the anode electrode.
[0012] It is preferable to make a surface area of a portion of the anode electrode where
the aluminum raw material is in contact with the electrolytic solution larger than
a surface area of a portion of the cathode electrode that is in contact with the electrolytic
solution.
[0013] It is preferable that the electrolytic solution includes dialkyl sulfone and aluminum
halide.
[0014] It is preferable that a molar ratio of the dialkyl sulfone to the aluminum halide
in the electrolytic solution is 1.5 mol or more and 5 mol or less of the aluminum
halide per 10 mol of the dialkyl sulfone.
[0015] It is preferable that the electrolytic solution further includes at least one nitrogen-containing
compound selected from a group consisting of ammonium halide, a hydrogen halide salt
of primary amine, a hydrogen halide salt of secondary amine, a hydrogen halide salt
of tertiary amine, and a quaternary ammonium salt represented by a general formula
of R
1R
2R
3R
4N•X where R
1 to R
4 are the same or different alkyl groups and X is a counter anion for a quaternary
ammonium cation.
[0016] It is preferable that, while the current is flowing through the anode electrode,
the aluminum is deposited on the cathode electrode such that an arithmetic mean height
Sa of the anode electrode is 2.3 µm or more and 10 µm or less.
[0017] It is preferable that the current density is 0.1 mA/cm
2 or more and 20 mA/cm
2 or less.
[0018] Also, the above-mentioned features may be combined with each other in any combination.
(EFFECTS OF THE INVENTION)
[0019] The present invention can provide a method for producing aluminum from an aluminum
raw material such as a used aluminum alloy, particularly an aluminum alloy with high
Si content, so that aluminum with higher purity can be produced.
BRIEF DESCRIPTION OF DRAWINGS
[0020]
FIG. 1 is a schematic view showing an aluminum producing device used in a method for
producing aluminum according to an embodiment of the present invention.
FIG. 2A is a scanning electron microscope (SEM) image of a cross section in proximity
of a surface of an anode electrode after electrolysis when a current density at the
anode electrode is 10 mA/cm2.
FIG. 2B is an SEM image of the cross section in proximity of the surface of the anode
electrode after electrolysis when the current density at the anode electrode is 20
mA/cm2.
FIG. 2C is an SEM image of the cross section in proximity of the surface of the anode
electrode after electrolysis when the current density at the anode electrode is 40
mA/cm2.
FIG. 2D is an SEM image of the cross section in proximity of the surface of the anode
electrode after electrolysis when the current density at the anode electrode is 80
mA/cm2.
FIG. 3 is a view showing a correlation between the current density at the anode electrode
and surface roughness of the anode electrode surface.
FIG. 4A is an SEM image of a surface of an electrodeposited film deposited on the
cathode electrode when high-purity aluminum is used as the anode electrode.
FIG. 4B is an SEM image of a cross section of the electrodeposited film deposited
on the cathode electrode when high-purity aluminum is used as the anode electrode.
FIG. 5A is an SEM image of a surface of an electrodeposited film deposited on the
cathode electrode when an AC2A alloy is used as the anode electrode and the electrolysis
is performed with the high current density.
FIG. 5B is an SEM image of a cross section of the electrodeposited film deposited
on the cathode electrode when the AC2A alloy is used as the anode electrode and the
electrolysis is performed with the high current density.
FIG. 6A is an SEM image of a surface of an electrodeposited film deposited on the
cathode electrode when an AC2A alloy is used as the anode electrode and the electrolysis
is performed with the low current density.
FIG. 6B is an SEM image of a cross section of the electrodeposited film deposited
on the cathode electrode when the AC2A alloy is used as the anode electrode and the
electrolysis is performed with the low current density.
FIG. 7 is a view showing concentration of impurities in the electrodeposited film
deposited on the cathode electrode.
DETAILED DESCRIPTION
[0021] A method for producing aluminum from an aluminum alloy to obtain high-purity aluminum
according to an embodiment of the present invention includes immersing an anode electrode,
which includes an aluminum alloy containing 0.1 mass% or more and 24 mass% or less
of Si, and a cathode electrode in an electrolytic solution, and applying a current
to flow at a current density of 0.1 mA/cm
2 or more and 25 mA/cm
2 or less on a surface of the anode electrode where the aluminum material comes into
contact with the electrolytic solution, thereby depositing aluminum on the cathode
electrode.
[0022] Hereinafter, a method for producing aluminum according to the embodiment of the present
invention will be described with reference to the accompanying drawings. FIG. 1 is
a schematic view of an aluminum producing device 1 used for the method for producing
aluminum according to the embodiment of the present invention. In the descriptions
hereafter, concentration of each element can be measured by ICP emission spectrometry.
[0023] The aluminum producing device 1 used for the method for producing aluminum according
to the present embodiment includes an electrolysis tank 3, a DC power supply 5, an
anode electrode 7, a cathode electrode 9, and an electrolytic solution 11. The anode
electrode 7 includes an aluminum alloy extracted from scrap or the like. And, the
anode electrode 7 and the cathode electrode 9 on which highly purified aluminum is
to be deposited are immersed in the electrolytic solution 11, and the DC power supply
5 applies a DC voltage between the anode electrode 7 and the cathode electrode 9.
At this time, while the DC voltage is applied between the anode electrode 7 and the
cathode electrode 9, a current flowing between the anode electrode 7 and the cathode
electrode 9 is controlled, or a surface area of a portion of the aluminum alloy contained
in the anode electrode 7 that is in contact with the electrolytic solution 11 is adjusted
so that the current density at the portion of the surface of the aluminum alloy of
the anode electrode 7 that is in contact with the electrolytic solution 11 falls within
a predetermined range. By applying the current to flow through the anode electrode
7 in this way, an electrodeposited film of high-purity aluminum is deposited on the
cathode electrode 9.
[0024] In the present description, the current density at a portion of the surface of the
aluminum alloy contained in the anode electrode that is in contact with the electrolytic
solution will be referred to as the "current density at the anode electrode". Also,
in the present description, the current density at the portion of the surface of the
aluminum alloy contained in the anode electrode that is in contact with the electrolytic
solution is a value obtained by dividing the current between the anode electrode and
the DC power supply by an area of the portion of the surface of the aluminum alloy
contained in the anode electrode that is in contact with the electrolytic solution.
[0025] The electrolysis tank 3 provided in the aluminum producing device 1 stores the electrolytic
solution 11 in which aluminum can be dissolved, and the anode electrode 7 and the
cathode electrode 9 are immersed in the electrolytic solution 11. The anode electrode
7 and the cathode electrode 9 are connected with each other via the DC power supply
5. The anode electrode 7 is made of an aluminum alloy with aluminum purity lower than
a target purity, and contains 0.1 mass% or more and 24 mass% or less of Si. Furthermore,
the aluminum alloy may also contain 0.1 mass% or more and 5 mass% or less of Cu and
0.15 mass% or more and 1.8 mass% or less of Fe. If the content of Si exceeds the above-mentioned
upper limit, Si may become a factor that hinders elution of aluminum during the electrolysis,
slowing down a rate of deposition of the targeted high-purity aluminum and causing
a decrease in throughput. On the other hand, if the contents of Cu and Fe exceed the
above-mentioned upper limits, Cu and Fe tend to be eluted into the electrolytic solution
11. This makes it harder to obtain the targeted high-purity aluminum. The anode electrode
7 can be obtained by molding a used material, such as an AC2A alloy, into a shape
of an electrode by casting or the like. The anode electrode 7 may contain at least
0.1 mass% or more and 24 mass% or less of Si and may further contain elements, except
for magnesium (Mg), that are more noble than aluminum.
[0026] The cathode electrode 9 is made of aluminum, for example, and pure aluminum or an
aluminum alloy specified by JIS standard for wrought materials can be applied. That
is, the cathode electrode 9 has a lower content of at least Si and Cu than the aluminum
alloy contained in the anode electrode 7. By making the cathode electrode 9 from aluminum,
the entire cathode electrode on which aluminum is electrodeposited can be used as
high-purity aluminum base metal. Thus, it is preferable that the cathode electrode
9 is made of aluminum having the purity that is equal to or higher than the target
purity. Other than aluminum, metals such as titanium or stainless steel may be used
for the cathode electrode 9. Titanium or stainless steel has a dense oxide film on
a surface thereof. Thus, when the cathode electrode made of titanium or stainless
steel is used and aluminum is electrodeposited on the surface thereof, the electrodeposited
aluminum can be easily peeled off from the cathode electrode 9.
[0027] The DC power supply 5 that applies DC voltage between the anode electrode 7 and the
cathode electrode 9 may be any known DC power supply device. However, to reduce an
amount of impurities eluted into the electrolytic solution 11, which will be described
below, it is preferable that the DC power supply is provided with a current control
mechanism that controls the output current. Also, to control the current density at
the anode electrode 7, a current detector (not shown) for measuring the current flowing
between the anode electrode 7 and the DC power supply 5 may be provided near the anode
electrode 7. The current density at the anode electrode can be calculated from the
surface area of the anode electrode 7 that is in contact with the electrolytic solution
11 and the electric current detected by the current detector. For this reason, it
is preferable that the output current of the DC power supply 5 can be adjusted by
the current control mechanism of the DC power supply 5 such that the current density
at the anode electrode falls within a predetermined range. Also, an area of the aluminum
alloy used for the anode electrode 7 that is in contact with the electrolytic solution
11 may be changed depending on the current flowing through the anode electrode 7.
For example, the current density at the anode electrode may be adjusted by changing
an area of the anode electrode exposed above a liquid surface of the electrolytic
solution 11, thereby changing the contact area of the anode electrode 7 with the electrolytic
solution 11.
[0028] The electrolytic solution 11 in which the anode electrode 7 and the cathode electrode
9 are to be immersed is a non-aqueous system (non-aqueous electrolytic solution) containing,
for example, (1) dialkyl sulfone and (2) aluminum halide. By using such the electrolytic
solution 11, high-purity aluminum can be formed on the surface of the cathode electrode
9 at a high film-forming rate. Furthermore, it is preferable that the electrolytic
solution 11 further includes (3) at least one nitrogen-containing compound selected
from a group consisting of ammonium halide, a hydrogen halide salt of primary amine,
a hydrogen halide salt of secondary amine, a hydrogen halide salt of tertiary amine,
and a quaternary ammonium salt represented by a general formula of R
1R
2R
3R
4N•X where R
1 to R
4 are the same or different alkyl groups and X is a counter anion for a quaternary
ammonium cation. The above-mentioned electrolytic solution 11 is industrially advantageous
compared to electrolytic solutions using ionic liquids in terms of easy availability
of reagents and low cost.
[0029] Examples of the dialkyl sulfone to be contained in the above-mentioned electrolytic
solution 11 include those having an alkyl group with one to six carbon atoms (which
may be linear or branched), such as dimethyl sulfone, diethyl sulfone, dipropyl sulfone,
dihexyl sulfone, and methyl ethyl sulfone. From viewpoints of good electrical conductivity
and easy availability, dimethyl sulfone can be preferably used.
[0030] Examples of the aluminum halide include aluminum chloride and aluminum bromide. The
aluminum halide is preferably anhydrous. An anhydrous compound does not include water
molecules that cause a decrease in electrodeposition efficiency, and thus the electrodeposition
efficiency is not to be decreased.
[0031] Examples of the ammonium halide that can be used as the nitrogen-containing compound
include ammonium chloride and ammonium bromide. Also, examples of the primary amine
to tertiary amine in the hydrogen halide salts of primary to tertiary amine include
those in which the alkyl group has one to six carbon atoms (which may be linear or
branched), such as methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine,
triethylamine, propylamine, dipropylamine, tripropylamine, hexylamine, and methylethylamine.
Examples of the hydrogen halide include hydrogen chloride and hydrogen bromide. Examples
of the alkyl groups represented by R
1 to R
4 in the quaternary ammonium salt represented by the general formula: R
1R
2R
3R
4N•X where R
1 to R
4 are the same or different alkyl groups and X is a counter anion for a quaternary
ammonium cation are those having one to six carbon atoms (which may be linear or branched),
such as a methyl group, ethyl group, propyl group, and hexyl group. Examples of X
include halide ions such as chloride ions, bromide ions, and iodide ions, as well
as BF
4- and PF
6-. Specific examples of the compounds include tetramethylammonium chloride, tetramethylammonium
bromide, tetramethylammonium iodide, and tetramethylammonium boron tetrafluoride.
Preferable examples of the nitrogen-containing compound include tertiary amine hydrochlorides,
such as trimethylamine hydrochloride, in viewpoints of facilitating the formation
of high-purity aluminum at the high film-forming rate.
[0032] A compounding ratio of the dialkyl sulfone and the aluminum halide is, for example,
preferably 1.5 mol or more and 5 mol or less of the aluminum halide per 10 mol of
the dialkyl sulfone. Furthermore, an upper limit of the compounding ratio is more
preferably 4.0 mol or less, 3.0 mol or less, or 2.5 mol or less in order, and is most
preferably 1.5 mol or more and 2.0 mol or less. If a compounding amount of the aluminum
halide is less than 1.5 mol per 10 mol of the dialkyl sulfone, the aluminum formed
may be darkened (a phenomenon called "burning") or the film-formation efficiency may
be deteriorated. On the other hand, if the compounding amount of the aluminum halide
exceeds 5.0 mol per 10 mol of the dialkyl sulfone,
liquid resistance of the electrolytic solution 11 becomes too high, which may cause
the electrolytic solution 11 to generate heat and decompose.
[0033] Also, if a composition ratio of the aluminum halide to the dialkyl sulfone is too
high, concentration of ions that serve as aluminum source may become too high, which
may hinder transfer of aluminum ions from the anode electrode side. On the other hand,
if the composition ratio of the aluminum halide to the dialkyl sulfone is too low,
the number of ions contributing to electrical conduction decreases, which may deteriorate
the efficiency of progress of the electrolysis.
[0034] On the other hand, the nitrogen-containing compound that is to be compounded together
with the dialkyl sulfone and the aluminum halide is preferably 0.01 mol or more and
2.0 mol or less, or more preferably 0.05 mol or more and 1.5 mol or less, per 10 mol
of the dialkyl sulfone. If the compounding amount of the nitrogen-containing compound
is below 0.01 mol per 10 mol of the dialkyl sulfone, it may be difficult to obtain
the effects of compounding thereof, such as an effect of improving the film-forming
rate through an improvement in the electrical conductivity of the electrolytic solution
11, and effects of improvement in purity and ductility of aluminum. Also, if the compounding
amount of the nitrogen-containing compound exceeds 2.0 mol per 10 mol of the dialkyl
sulfone, the composition of the electrolytic solution 11 may be essentially changed,
which may hinder aluminum from depositing.
[0035] The electrolysis of aluminum using the above-mentioned electrolytic solution 11 may
be carried out under conditions where a temperature of the electrolytic solution 11
is 80°C or higher and 120°C or lower and the applied current density is 0.1 mA/cm
2 or more and 25 mA/cm
2 or less. It is more preferable to be carried out under conditions where the applied
current density is 0.1 mA/cm
2 or more and 20 mA/cm
2 or less. A lower limit of the temperature of the electrolytic solution 11 is to be
decided taking into consideration a melting point of the electrolytic solution 11,
and is preferably 85°C or higher, or more preferably 95°C or higher (if the temperature
falls below the melting point of the electrolytic solution 11, a plating solution
solidifies and plating is no longer possible). When the temperature of the electrolytic
solution 11 is 120°C or lower, active reaction generated between aluminum and the
electrolytic solution can be suppressed, which makes it harder for a large amount
of impurities to be incorporated into aluminum. To efficiently obtain an electrodeposited
film of high-purity aluminum by electrolysis, it is necessary to efficiently transfer
metal ions, which are to be deposited on the cathode electrode, from the anode electrode
to the surface of the cathode electrode. Here viscosity of the electrolytic solution
decreases by increasing the temperature and, as a result, transport efficiency of
substances increases, thereby improving electrical conductivity. Thus, considering
the electrical conductivity, the temperature of the electrolytic solution is to be
high. However, if the temperature of the electrolytic solution becomes too high, the
surface of the cathode electrode becomes activated, and deposition of impurities is
more likely to proceed. This may result in deterioration of purity. For such reasons,
the temperature of the electrolytic solution 11 during electrolysis is preferably
85°C or higher, or more preferably 95 °C or higher, and the upper limit thereof is
preferably 120°C or lower.
[0036] Also, the anode current density of 0.1 mA/cm
2 or more can suppress a decrease in the film-forming efficiency. On the other hand,
the anode current density of 25 mA/cm
2 or less can facilitate achievement of the high-purity aluminum, as will be described
below. Furthermore preferably, the anode current density of 20 mA/cm
2 or less can more easily achieve high purity. There is no particular limitation for
the electrolytic solution 11 to be used.
[0037] Next, a theory for obtaining high-purity aluminum in the aluminum producing device
1 according to the embodiment of the present invention will be described with reference
to FIG. 1. When the anode electrode 7 and the cathode electrode 9 are immersed in
the electrolytic solution and a DC current is applied to flow, aluminum loses its
electrons on the surface of the anode electrode 7 and is eluted into the electrolytic
solution 11 as aluminum ions (A in FIG. 1). On the surface of the cathode electrode
9, electrons are supplied to the aluminum ions and aluminum metal is deposited.
[0038] To efficiently supply the aluminum ions to the cathode electrode 9, it is preferable
to stir the electrolytic solution 11 while the current is flowing through the anode
electrode 7. Thus, it is preferable that a release outlet for releasing inert gas
such as nitrogen gas is provided at a lower portion of the electrolysis tank 3 and
bubbles of the inert gas are released from such the release outlet into the electrolytic
solution 11 (the cathode electrode 9) (so-called bubbling). Convection also occurs
in the electrolytic solution 11 due to flow of the bubbles, thereby stirring the electrolytic
solution 11. Alternatively, a pump or a stirring device may be used to provide liquid
current, or the electrodes themselves may be swung. Also, although a pair of one each
of the anode electrode 7 and the cathode electrode 9 is disposed in the illustrated
example, a plurality of the anode electrodes 7 and the cathode electrodes 9 may also
be disposed alternately.
[0039] Here, the inventors of the present invention have found that (1) when metal ions
are eluted from the anode electrode 7, the eluted metal ions vary depending on the
current density at the anode electrode 7. For example, since Cu has a higher standard
electrode potential than aluminum, aluminum is ionized preferentially at the anode
electrode 7 in an equilibrium state. However, in reality, ionization of Cu also progresses
when Cu is dissolved in aluminum, or the current density is equal to or more than
a predetermined value and concentration of the aluminum ions on the surface of the
anode electrode is increased. In contrast, it has been found that keeping the current
density at the anode electrode 7 at 25 mA/cm
2 or less can suppress elution of elements that are more noble than aluminum, such
as Cu. Thus, in the aluminum producing device 1 according to the present embodiment
of the present invention, the DC power supply 5 having the current adjustment mechanism
is used. The current adjustment mechanism of the DC power supply 5 can change the
current flowing from the DC power supply 5 to the anode electrode 7, so that the current
through the anode electrode 7 can be adjusted to achieve the above-mentioned current
density even when the surface shape of the anode electrode 7 changes and the area
of the surface in contact with the electrolytic solution 11 changes.
[0040] The inventors have also found (2) conditions under which, when aluminum ions are
eluted from the anode electrode 7, segregated portions of Cu, Si, and the like (crystallized
portions of Cu and Si) that have been present in the material constituting the anode
electrode 7 come out to the surface of the anode electrode 7 and fall off. It has
been found that high-purity aluminum can be efficiently produced if Cu and Si are
not eluted into the electrolytic solution 11 and different element components such
as Cu and Si that are crystallized on the surface of the anode electrode 7 fall off
in a solid phase (B in FIG. 1) as above. That is, by setting the current density at
the anode electrode 7 equal to or less than the predetermined value, it has been found
that, in a case in which Cu and Si are not completely uniformly dispersed in the material
constituting the anode electrode 7 but a Cu phase, Si phase, or an intermetallic compound
phase including the same (a phase with a maximum diameter of 10 µm or more, for example)
is present, such the phase falls off from the anode electrode 7 and can be removed
without being eluted.
[0041] To allow the impurities contained in aluminum of the anode electrode 7 to fall off
from the anode electrode 7 efficiently without being eluted into the electrolytic
solution 11, it is preferable to apply a DC voltage between the anode electrode 7
and the cathode electrode 9 while, for example, stirring the electrolytic solution
11 around the anode electrode 7. For example, instead of or in addition to the above-mentioned
bubbling directed toward the cathode electrode 9 or the like, stirring the electrolytic
solution by bubbling in proximity of the anode electrode 7 or by using a stirring
device or the like may be performed, or the anode electrode 7 can be swung or rotated.
Also, the surface of the anode electrode 7 may be physically rubbed with another insulating
member during electrolysis to allow the impurities to fall off.
[0042] Also, to allow the impurities to efficiently fall off from the anode electrode 7,
a process for coarsening the impurity phase may be performed during manufacturing
of the anode electrode 7 to facilitate falling off of impurities. This makes it easier
for the impurities to fall off. For example, when forming the anode electrode by melting
and casting an aluminum material containing Si or Cu, such as an aluminum alloy or
aluminum base metal extracted from scrap, it is possible to form the Cu phase, Si
phase, or intermetallic compound phase including the same, to have a size of 10 µm
or more (or even 20 µm or more) by reducing the cooling rate after solidification.
[0043] To reduce the current density at the anode electrode 7, it is preferable to make
the surface area of the anode electrode (the area in contact with the electrolytic
solution 11, the same applies hereafter) sufficiently larger (1.5 times or more, for
example) than the surface area of the portion of the cathode electrode 9 that is in
contact with the electrolytic solution 11. Although there is an upper limit to the
current density at the anode electrode 7 as mentioned above, the deposition rate of
aluminum deposited on the cathode electrode 9 increase as the current flowing through
the anode electrode 7 increases. Thus, it is possible to improve efficiency of electrodeposition
of high-purity aluminum by making the surface area of the portion of the aluminum
alloy of the anode electrode 7 that comes into contact with the electrolytic solution
larger than the surface area of the portion of the cathode electrode 9 that comes
into contact with the electrolytic solution 11.
[0044] Also, the anode electrode 7 of the present embodiment may be configured by a mesh
cage formed of a metal material of an element that is more noble than aluminum, with
an aluminum alloy extracted from scrap and processed into granules housed inside the
cage. By using such the anode electrode 7, it is possible to increase the current
flowing through the anode electrode 7 while keeping the current density at the anode
electrode 7 at or below the above-mentioned upper limit value, thereby increasing
the deposition rate of aluminum deposited on the cathode electrode 9.
[0045] Also, in the electrolytic solution 11, particles of the impurities (sludge) falling
off from the anode electrode 7 are precipitated below the anode electrode 7. Thus,
a step of collecting such the sludge at the time of electrolysis or after the electrolysis
step may be included. For example, the sludge can be collected by filtering using
filter paper, a filter, an anode bag, or a cathode bag, so that the electrolytic solution
11 can be reused. The filter paper, filter, anode bag, or cathode bag used may have
a nominal aperture size of 0.1 µm to 100 µm. A lower limit thereof is preferably 1
µm or more. In a case of the aluminum material in which crystal grains of the Cu phase,
Si phase, or intermetallic compound phase including the same are increased, the lower
limit is preferably 10 µm or more, or more preferably 20 µm or more.
[0046] As described above, according to the present embodiment, high-purity aluminum can
be efficiently obtained, particularly from an aluminum alloy containing large amounts
of Si and Cu, with reduced amounts of such impure elements. For example, the total
content of Si, Fe, and Cu in the high-purity aluminum that can be obtained from the
present embodiment may be 0.1 mass% or less. Also, an amount of CO
2 emitted by the electrolysis of the present embodiment to obtain 1 kg of high-purity
aluminum can be reduced by approximately 45% compared to the amount of CO
2 emitted when obtaining 1 kg of virgin metal from ore using conventional smelting
method.
[0047] Generally, a three-layer electrolysis method is known for purification of aluminum
to a high degree. However, it is difficult to increase purity of used materials of
casting alloys by the three-layer electrolysis method since casting alloys in particular
have high impurity concentration and the anode composition cannot be maintained. Thus,
it is difficult to apply the three-layer electrolysis method. Furthermore, Si, which
is a typical alloy element, has a density similar to that of aluminum and is lighter
than a molten salt used. Thus, Si may be mixed into refined aluminum and thus separation
of Si is difficult.
[0048] In contrast, the method for producing aluminum according to the present embodiment
can efficiently remove the impurity elements including Si, and thus the obtained aluminum
can be further purified to a higher degree through the three-layer electrolysis method.
That is, aluminum obtained by the present embodiment is effectively used as an aluminum
raw material (an anode-side raw material) in the three-layer electrolysis method.
[0049] As above, according to the method for producing aluminum according to the present
embodiment, aluminum having higher purity can be obtained from an aluminum alloy or
aluminum base metal containing 0.1 mass% or more and 24 mass% or less of Si. Thus,
recycled casting alloys, for example, can be highly purified to be converted for other
purposes. Also, it is easier to convert recycled alloys, such as automobile engine
parts including, in particular, a large amount of Cu, into products for other purposes,
thereby making it possible to utilize used alloys more effectively. Also, it is possible
to produce high-purity aluminum from aluminum base metal.
[0050] Also, by stirring the liquid near the anode electrode 7, sludge can efficiently fall
off from the anode. Also, by making the surface area of the anode electrode 7 that
comes into contact with the electrolytic solution larger than the surface area of
the cathode electrode, it is possible to suppress the current density at the anode
while efficiently depositing high-purity aluminum onto the cathode.
[0051] Also, by using the electrolytic solution including dialkyl sulfone, aluminum halide,
and nitrogen-containing compound, it is possible to carry out the operation at a lower
temperature than when a molten salt or the like is used, and handling is safe and
easy.
[0052] Also, by collecting the sludge fallen off from the anode electrode 7, contamination
and the like can be suppressed, and the aluminum alloy can be highly purified efficiently.
[0053] At this time, by collecting the sludge with filtering paper or the like with appropriate
aperture size, a sludge collection rate can be increased.
(EXAMPLES)
[0054] Using a device having the similar configuration to the aluminum producing device
shown in FIG. 1, electrolysis of an aluminum alloy used as an anode electrode and
deposition of high-purity aluminum onto a cathode electrode were carried out. As the
anode electrode, an AC2A aluminum alloy (Si: 4.0 mass% or more and 6.0 mass% or less,
Cu: 3.0 mass% or more and 4.5 mass% or less, Fe: 0.8 mass% or less) was used. FIG.
2A to FIG. 2D are SEM images of a cross section in proximity of a surface of the anode
electrode, showing the difference in the anode electrode surface after electrolysis
when the current density at the anode electrode is changed. In each of the SEM images,
the current density at the anode electrode is 10 mA/cm
2 in FIG. 2A, 20 mA/cm
2 in FIG. 2B, 40 mA/cm
2 in FIG. 2C, and 80 mA/cm
2 in FIG. 2D. A cumulative amount of current per unit volume of an electrolytic solution
is in a range of 9.2 to 10.6 Ah/L.
[0055] As mentioned above, by applying an electric current through the anode electrode,
aluminum of a parent material of the AC2A aluminum alloy is eluted. Here, segregations
(crystallized products) of Cu, Si, Fe, and the like or intermetallic compounds (hereinafter,
simply referred to as impurities) are partially present in each of structures of the
AC2A aluminum alloy of the anode electrode. Such impurities remain on the surface
when aluminum is eluted when the current density at the anode electrode is 10 mA/cm
2 (FIG. 2A) or 20 mA/cm
2 (FIG. 2B). Thus, when elution of aluminum progresses, such impurities eventually
fall off from the surface of the anode electrode to be sludge.
[0056] On the other hand, when the current density at the anode electrode is 40 mA/cm
2 (FIG. 2C) or 80 mA/cm
2 (FIG. 2D), the aluminum surface and the impurity surface almost coincide with each
other. This indicates that the impurities are partially eluted together with aluminum.
As above, when the current density increases, Cu, which has a higher standard electrode
potential than aluminum, for example, ionizes together with aluminum.
[0057] FIG. 3 shows results of measuring surface roughness of the anode electrode surface
after electrolysis. When the current density at the anode electrode is 25 mA/cm
2 or less, i.e. in the cases in which the current density is 10 mA/cm
2 and 20 mA/cm
2, both an arithmetic mean height Sa and the maximum height Sz are relatively high,
in inverse proportion to the current density at the anode electrode. On the other
hand, when the current density at the anode electrode is more than 25 mA/cm
2 i.e., when the current density is 40 mA/cm
2 or 80 mA/cm
2, the surface roughness has a smaller value. This is because impurities contained
in the aluminum alloy used as the anode electrode remained on the anode electrode
surface at the time of high purification of aluminum when the current density was
25 mA/cm
2 or less. By setting the current density at 25 mA/cm
2 or less in this way, the surface roughness (the arithmetic mean height Sa and the
maximum height Sz) of the anode electrode surface can be controlled, thereby suppressing
elution of the impurities.
[0058] It is preferable that aluminum is deposited on the cathode electrode such that the
arithmetic mean height Sa is 2.3 µm or more and 10 µm or less during electrolysis
(any time from the start of electrolysis until the scheduled end time of electrolysis
at which a predetermined time has passed) or at the scheduled end time of electrolysis.
For example, while a current is flowing through the anode electrode, elements contained
in the aluminum alloy is eluted from the anode electrode into the electrolytic solution,
and thus, during such the time, it is preferable to deposit aluminum onto the cathode
electrode while controlling the current through the anode electrode or adjusting the
area of the anode electrode exposed above the liquid surface such that the arithmetic
mean height Sa is 2.3 µm or more and 10 µm or less.
[0059] When the arithmetic mean height Sa of a portion of the aluminum alloy of the anode
electrode surface that is in contact with the electrolytic solution is 2.3 µm or more,
elution of Cu or the like is reduced. When the arithmetic mean height Sa is 10 µm
or less, the current is concentrated onto tip portions of the small roughness appearing
on the surface of the anode electrode, and this suppresses the rise of the anode current
density, thereby reducing the elution of Cu or the like. The arithmetic mean height
Sa and the maximum height Sz were measured using a laser microscope at five locations
of 100 µm by 100 µm square area with n = 5 each, and average values thereof were calculated.
The laser microscope used was a pinhole confocal optical system (VK-X100 manufactured
by Keyence corporation was used) with a wavelength of 658 nm, a 50x objective lens,
a display vertical resolution of 5 nm, and a display horizontal resolution of 10 nm.
[0060] To perform electrolysis while maintaining the surface roughness within a predetermined
range, an electrolysis test may be carried out in advance under various conditions
using an anode electrode produced with the same composition as the anode electrode
that is to be actually used (the aluminum alloy or aluminum base metal obtained from
scrap, for example), and the electrolysis conditions can be set using information,
which is obtained from the electrolysis test, on correlation between each condition
and the surface roughness. For example, by applying a DC voltage between an anode
electrode and a cathode electrode in the same electrolytic solution while varying
the current flowing through the anode electrode to perform electrolysis and measuring
the roughness over elapsed time, information on correlation between the elapsed time
and change in the surface roughness for each current can be obtained. Also, by varying
the current and the surface area of the anode electrode that is in contact with the
electrolytic solution, the information on correlation between the current density
and the surface roughness can be obtained. For example, as mentioned above, after
a predetermined time has elapsed since the start of electrolysis, coarse impurities
remain on the surface of aluminum, increasing the surface roughness (Sa and Sz), and
then falling off and exposure of the coarse impurities are repeated thereafter. Thus,
it is preferable to maintain such the state while performing the electrolysis.
[0061] Such the electrolysis conditions are set based on the above-mentioned correlation
information. Also, if it is determined by the correlation information that the surface
roughness at any time from the start of electrolysis until the end of electrolysis
after the predetermined time has elapsed or at the scheduled end time of electrolysis
would exceed the above-mentioned predetermined range, the current density may be reduced
before the surface roughness exceeds the range so as to suppress further increase
in the surface roughness. That is, the current may be reduced based on the correlation
information obtained in advance after a predetermined period of time since the start
of electrolysis. Note that when setting electrolysis information by obtaining the
correlation information based on the surface roughness after the predetermined period
of time since the start of electrolysis, the timing for changing the current value
and an amount of reduction of the current value can be set by measuring in advance
the correlation information between the surface roughness and the current density
when the current density is changed after the predetermined time has elapsed since
the start of electrolysis. Also, conversely, as the electrolysis progresses, the surface
roughness increases and thus the surface area of the anode electrode increases substantially.
For this reason, the current may be increased so as to be within the range of set
current density, taking into account the increase in the surface area of the anode
electrode. That is, based on the above-mentioned correlation information, the current
may be increased after the predetermined time has elapsed since the start of electrolysis.
[0062] Next, electrodeposited films deposited on the surface of the cathode electrode were
observed. FIG. 4A is an SEM image of a surface of an electrodeposited film and FIG.
4B is an SEM image of a cross section of the electrodeposited film, which were the
results of cases where high-purity aluminum (99.99%) was used as the anode electrode
and the anode current density and the cathode current density were set to 80 mA/cm
2. If the high-purity aluminum is used as the anode electrode, there is almost no contamination
with impurities and a high-purity electrodeposited film can be obtained even at a
high current density.
[0063] On the other hand, FIG. 5A and FIG. 5B are SEM images of a surface and cross section
of an electrodeposited film, respectively, when an AC2A alloy is used as the anode
electrode and the anode current density and the cathode current density were varied
10 mA/cm
2 to 80 mA/cm
2. When the AC2A alloy was used as the anode electrode and the current density exceeded
40 mA/cm
2, particles appeared to be Cu were observed on a part of the cross section. This indicates
that Cu ions were reduced on the surface of the cathode electrode.
[0064] In contrast, FIG. 6A is an SEM image of a surface of an electrodeposited film and
FIG. 6B is an SEM image of a cross section of the electrodeposited film, which were
the results of cases where the AC2A alloy was used as the anode electrode and the
anode current density and the cathode current density were kept constant at 10 mA/cm
2. When the AC2A alloy was used as the anode electrode and the current density was
25 mA/cm
2 or less, no Cu was observed on the cross section and it was possible to obtain the
electrodeposited film of approximately the same form as in the cases in which the
high-purity aluminum was used as the anode electrode (FIG. 4A and FIG. 4B).
[0065] FIG. 7 shows the results of component analysis of the electrodeposited films, showing
the difference between the case where the current was varied 10 mA/cm
2 to 80 mA/cm
2 and the case where the current was kept constat at 10 mA/cm
2. By setting the current density at the anode electrode to a predetermined value or
less, it was possible to reduce concentration of impurities of the obtained electrodeposited
film.
[0066] Also, the concentration of impurities of the electrodeposited films were evaluated
in more detail by changing the electrolysis conditions. Table 1 shows the various
conditions and evaluation results for each working example.
[Table 1]
| |
Electrolytic Solution |
Current Density (mA/cm2) |
Electrodeposited Film Impurities (ppm) |
Evaluation |
| No. |
Composition Ratio |
Temperature (°C) |
Electrical Conductivity (mS/m) |
Si |
Cu |
Fe |
Total |
Si |
Cu |
Fe |
Total Impurities |
| 1 |
10:3.8 |
95 |
443 |
10 |
23 |
193 |
81 |
816 |
A |
A |
A |
A |
| 2 |
10:3.8 |
95 |
443 |
25 |
11 5 |
386 |
98 |
855 |
B |
A |
A |
A |
| 3 |
10:3.8 |
120 |
700 |
25 |
65 |
1201 |
193 |
1119 |
B |
B |
B |
B |
| 4 |
10:2 |
120 |
805 |
25 |
0 |
363 |
126 |
859 |
A |
A |
B |
A |
| 5 |
10:2 |
95 |
720 |
25 |
9 |
408 |
8 |
786 |
A |
A |
A |
A |
| 6 |
10:3.8 |
95 |
443 |
10-80 |
71 |
3169 |
711 |
4470 |
B |
C |
C |
C |
[0067] The electrolytic solutions used for the electrolysis in No. 1 to No. 6 all contained
dialkyl sulfone, aluminum chloride, and additives of ammonium chloride and tetramethylammonium
chloride. The electrolytic solutions used for the electrolysis in the examples No.
1 to No. 3 and No. 6 contained 0.2 mol of aluminum chloride as well as 1.0 mol of
tetramethylammonium chloride per 10 mol of dialkyl sulfone. On the other hand, the
electrolytic solutions used in the examples No. 4 and No. 5 contained 0.1 mol of aluminum
chloride as well as 0.5 mol of tetramethylammonium chloride per 10 mol of dialkyl
sulfone.
[0068] In the table, "Composition Ratio" of the electrolytic solution is a molar ratio of
dialkyl sulfone to aluminum halide (aluminum chloride). The electrical conductivity
varies depending mainly on the composition ratio of dialkyl sulfone to aluminum halide
and the temperature.
[0069] The current density at the anode electrode for each of examples No. 1 to No. 6 is
as shown in the table, where the current density in No. 6 was varied within a range
of 10 mA/cm
2 to 80 mA/cm
2.
[0070] The concentration of impurities in the electrodeposited films was evaluated as below.
[0071] For Si, the concentration of 50 ppm or less was rated A (excellent), the concentration
of more than 50 ppm and 150 ppm or less was rated B (good), and the concentration
of more than 150 ppm was rated C (bad). Also, for Cu, the concentration of 1000 ppm
or less was rated A (excellent), the concentration of more than 1000 ppm and 1500
ppm or less was rated B (good), and the concentration of more than 1500 ppm was rated
C (bad). Also, for Fe, the concentration of 100 ppm or less was rated A (excellent),
the concentration of more than 100 ppm and 200 ppm or less was rated B (good), and
the concentration of more than 200 ppm was rated C (bad). Also, for the total impurity
concentration of Si+Cu+Fe, the concentration of 1000 ppm or less was rated A (excellent),
the concentration of more than 1000 ppm and 2000 ppm or less was rated B (good), and
the concentration of more than 2000 ppm was rated C (bad). In all cases, impurity
contents are expressed as mass ratios.
[0072] From the results, when considering Si only, all tests were passed (achieving evaluation
B or higher). On the other hand, in No. 6 where the current density reached 80 mA/cm
2 exceeding 25 mA/cm
2, although the Si content was 150 ppm or less and evaluated as good, the contents
of Cu and Fe exceeded 1500 ppm and 200 ppm, respectively. Thus, Cu and Fe were evaluated
as fail (evaluation C), and, as a result, the impurity concentration as a whole failed.
That is, it is found that the current density has a greater effect on Cu and Fe than
on Si.
[0073] In addition, it is also found that, for the same composition ratio, the electrical
conductivity tends to increase as the temperature rises.
[0074] Considering the results of Table 1 based on the above, from a comparison between
No. 1, No. 2 and No. 6, the impurity concentration can be reduced by decreasing the
current density. Also, from a comparison between No. 2 and No. 3 and a comparison
between No. 4 and No. 5, it is found that the impurity concentration tends to increase
as the temperature rises. Also, from a comparison between No. 2 and No. 5 and a comparison
between No. 3 and No. 4, it is found that the impurity concentration tends to increase
as the composition ratio of the aluminum halide becomes too high.
[0075] It is preferable that the temperature of the electrolytic solution is 80°C or more
and 120°C or less, more preferably 85°C or more and 110°C or less, or furthermore
preferably 95°C or more and 110°C or less.
[0076] Although the embodiments of the present invention have been described referring to
the attached drawings, the technical scope of the present invention is not limited
to the embodiments described above. It is obvious that persons skilled in the art
can think out various examples of changes or modifications within the scope of the
technical idea disclosed in the claims, and it will be understood that they naturally
belong to the technical scope of the present invention.
(DESCRIPTION OF NOTATIONS)
[0077]
- 1
- aluminum producing device
- 3
- electrolysis tank
- 5
- DC power supply
- 7
- anode electrode
- 9
- cathode electrode
- 11
- electrolytic solution