(19)
(11) EP 4 799 017 A1

(12)

(43) Date of publication:
02.09.2026 Bulletin 2026/36

(21) Application number: 24894945.5

(22) Date of filing: 20.11.2024
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)
H01L 23/544(2006.01)
G03F 9/00(2006.01)
(52) Cooperative Patent Classification (CPC):
G03F 7/70633; G03F 7/70475
(86) International application number:
PCT/US2024/056582
(87) International publication number:
WO 2025/111293 (30.05.2025 Gazette 2025/22)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
GE KH MA MD TN

(30) Priority: 21.11.2023 US 202363601539 P

(71) Applicant: Psiquantum, Corp.
Palo Alto, CA 94304 (US)

(72) Inventors:
  • HOSLER, Erik R.
    Palo Alto, California 94304 (US)
  • LICAUSI, Nicholas V.
    Palo Alto, California 94304 (US)

(74) Representative: Hamer, Thomas Daniel et al
Kilburn & Strode LLP Lacon London 84 Theobalds Road
London WC1X 8NL
London WC1X 8NL (GB)

   


(54) INTERLEAVED LITHOGRAPHY OVERLAY CONTROL METHOD