(19)
(11) EP 4 817 087 A1

(12)

(43) Date of publication:
07.10.2026 Bulletin 2026/41

(21) Application number: 24898564.0

(22) Date of filing: 25.11.2024
(51) International Patent Classification (IPC): 
H01L 21/28(2025.01)
C23C 14/34(2006.01)
H01L 21/02(2006.01)
C23C 14/14(2006.01)
C23C 14/54(2006.01)
(52) Cooperative Patent Classification (CPC):
C23C 14/02; C23C 14/165; C23C 14/5806; H10P 14/44
(86) International application number:
PCT/US2024/057227
(87) International publication number:
WO 2025/117408 (05.06.2025 Gazette 2025/23)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
GE KH MA MD TN

(30) Priority: 29.11.2023 US 202318523238

(71) Applicant: Applied Materials, Inc.
Santa Clara, California 95054 (US)

(72) Inventors:
  • ZHONG, Yaoying
    Singapore Technology Pte Ltd 10 Science Park Road, 02-03, The Alpha Science Park II Singapore 117684 (SG)
  • XU, Haomin
    Singapore Technology Pte Ltd 10 Science Park Road, 02-03, The Alpha Science Park II Singapore 117684 (SG)
  • HOI, Siew Kit
    Singapore Technology Pte Ltd 10 Science Park Road, 02-03, The Alpha Science Park II Singapore 117684 (SG)
  • SOH, Jay Min
    Singapore Technology Pte Ltd 10 Science Park Road, 02-03, The Alpha Science Park II Singapore 117684 (SG)
  • TAN, Xiao
    Singapore Technology Pte Ltd 10 Science Park Road, 02-03, The Alpha Science Park II Singapore 117684 (SG)
  • CHOO, Li Ying
    Singapore Technology Pte Ltd 10 Science Park Road, 02-03, The Alpha Science Park II Singapore 117684 (SG)

(74) Representative: Zimmermann & Partner Patentanwälte mbB 
P.O. Box 330 920
80069 München
80069 München (DE)

   


(54) STRESS CONTROL METHOD FOR PHYSICAL VAPOR DEPOSITION OF ALUMINUM