(19)
(11) EP 4 824 319 A1

(12)

(43) Date of publication:
21.10.2026 Bulletin 2026/43

(21) Application number: 24904578.2

(22) Date of filing: 22.08.2024
(51) International Patent Classification (IPC): 
C23F 1/10(2006.01)
C23F 1/38(2006.01)
C23F 1/14(2006.01)
H01L 21/3213(2006.01)
(52) Cooperative Patent Classification (CPC):
C09K 13/04; C23C 18/24; C23C 18/1653; C23C 18/32; C23C 18/30
(86) International application number:
PCT/US2024/043422
(87) International publication number:
WO 2025/128164 (19.06.2025 Gazette 2025/25)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
GE KH MA MD TN

(30) Priority: 11.12.2023 US 202318534907

(71) Applicant: MacDermid Enthone Inc.
Waterbury, CT 06702 (US)

(72) Inventors:
  • HERDMAN, Roderick, D.
    Tamworth, Staffordshire B78 2JQ (GB)
  • CHAPANERI, Roshan, V.
    Coventry CV3 5AT (GB)

(74) Representative: Boult Wade Tennant LLP 
Salisbury Square House 8 Salisbury Square
London EC4Y 8AP
London EC4Y 8AP (GB)

   


(54) SUPPRESSION OF MANGANESE DIOXIDE FORMATION IN MANGANESE (III)-BASED ETCHING SOLUTIONS