(19)
(11) EP 4 824 613 A1

(12)

(43) Date of publication:
21.10.2026 Bulletin 2026/43

(21) Application number: 24812091.7

(22) Date of filing: 18.11.2024
(51) International Patent Classification (IPC): 
G03F 1/36(2012.01)
G03F 7/00(2006.01)
(52) Cooperative Patent Classification (CPC):
G03F 1/36; G03F 7/705
(86) International application number:
PCT/EP2024/082675
(87) International publication number:
WO 2025/124841 (19.06.2025 Gazette 2025/25)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA
Designated Validation States:
GE KH MA MD TN

(30) Priority: 15.12.2023 US 202363610798 P

(71) Applicant: ASML Netherlands B.V.
5500 AH Veldhoven (NL)

(72) Inventors:
  • ONOSE, Alexandru
    5500 AH Veldhoven (NL)
  • RUIZ, Hans-Christian
    5500 AH Veldhoven (NL)
  • BOTARI, Tiago
    5500 AH Veldhoven (NL)
  • VAN KRAAIJ, Markus, Gerardus, Martinus, Maria
    5500 AH Veldhoven (NL)
  • BOONE, Robert, Elliott
    San Jose, California 95134 (US)
  • HAMOUDA, Ayman
    San Jose, California 95134 (US)

(74) Representative: ASML Netherlands B.V. 
Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven
5500 AH Veldhoven (NL)

   


(54) METHOD AND SYSTEM FOR PRIMITIVE-BASED MASK PREDICTION