(57) An X-ray exposure apparatus for exposing a semiconductor wafer to a mask with X-rays,
to print a pattern of the mask onto the wafer, is disclosed. The ambience within a
stage accommodating chamber, accommodating a mask, a semiconductor wafer and the like,
is replaced by helium and, thereafter, a predetermined quantity of helium is supplied
into the stage accommodating chamber. This effectively prevents degradation in purity
of helium due to air leakage into the chamber and, therefore, undesirable decrease
in quantity of X-ray transmission can be avoided. Thus, high-precision and high-throughput
exposure is ensured.
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