Stamp device with stamp plate and stamp plate producing apparatus for producing stamp plate used in stamp device

Description

[0001] The present invention relates to a stamp device provided with a stamp plate constructed from a porous base plate wherein an ink impermeable melted-solidified portion and an ink permeable non-melted portion are formed by selectively heating and melting a stamp surface of the porous base plate having open cells through a thermal head having a plurality of dot heating elements, and a support member which supports the stamp plate from one side thereof, and more particularly to a stamp device with improved various stamping characteristics by giving various characteristics to the porous base plate used for the stamp plate.

[0002] The present invention also relates to a stamp plate producing apparatus for producing a stamp plate constructed from a porous base plate on which an ink permeable non-melted portion ( figure portion ) and an ink impermeable melted-solidified portion ( non-figure portion ) are formed by contacting a thermal head having a plurality of dot heating elements to a stamp surface of the porous base plate with ink permeability and selectively heating and melting the stamp surface of the porous base plate while moving the thermal head.

(1) Heretofore, a number of proposals have been made regarding stamp devices each using a stamp plate constructed from a porous base plate formed of cellular plastic or rubber having open cells therein, on which an ink permeable non-melted portion and an ink impermeable melted-solidified portion are formed by selectively heating and melting a stamp surface of the porous base plate by means of a thermal head. The ink permeable non-melted portion is the portion where open cells are left according to the shape of mirror images and the like to be stamped. The ink impermeable melted-solidified portion is the portion where open cells in the portion excepting the above part forming the mirror images are melted and solidified to be sealed.
When stamping of characters and the like is conducted by using the above stamp device, ink is impregnated in the non-melted portion of the stamp plate and the stamp plate is pressed onto a stamp sheet, thereby stamping of characters is done.
By the way, in the above stamp device, it is inevitable to be able to clearly stamp characters over plural stamping times, on the basis of characteristic in the stamp device. Therefore, it is demanded the following characteristics for the stamp device. That is, the first characteristic is that the non-melted portion in the stamp plate can satisfactorily retain ink therein. The second characteristic is that the border between the melted-solidified portion and the melted portion can be sharply formed by means of the thermal head. The third characteristic is that edges of characters can also be clearly stamped. And the fourth characteristic is that dimension of the stamp plate can be retained for a long time.
In order to satisfy the above characteristics, pore size ( diameter ) formed on the basis of open cells in the porous base plate used for the stamp plate, hardness of the stamp surface, melting point and thickness of the stamp plate, must be set in a suitable range. However, it is difficult to produce the stamp plate so as to satisfy the above characteristics demanded therefor, and sufficient study on the stamp plate has not been made yet.

(2) Conventionally, as shown in Figs. 23, 24, it is well-known a stamp device 202. The stamp device 202 has a stamp plate 200 constructed from an ink permeable porous base plate on a surface of which stamping area is formed, and a support member 201 which supports the stamp plate 200 from the back surface thereof. The stamp device 200 can continuously stamp characters through the stamping area while impregnating ink in the stamp plate 200.
Further, it is well-known a stamp plate producing apparatus in which the stamp plate 200 used for the above stamp device 202 is produced. In such apparatus, the thermal head having dot heating elements is contacted to the surface of the ink permeable porous base plate and the dot heating elements are selectively heated while moving the thermal head. Thereby, it is formed on the surface of the porous base plate a stamp surface having the ink impermeable melted-solidified portion 203 ( non-figure portion ) and the ink permeable non-melted portion 204 ( figure portion ).
By the way, when the stamp surface is formed by selectively heating the dot heating elements while moving the thermal head on the surface of the porous base plate, the border between the melted-solidified portion 203 and the non-melted portion 204 is forcedly dragged by the edge of the thermal head in case that the dot heating elements are positioned upstream the moving direction of the thermal head from the contact point between the thermal head and the porous base plate. As a result, there is a problem that the border between the melted-solidified portion 203 and the non-melted portion 204 cannot be made clear. For example, as shown in Fig. 23, the central portion of the porous base plate ( stamp plate 200 ) is dragged and extended in the direction E by the thermal head when melted, and after the stamp plate 200 is produced, the central portion of the porous base plate is contracted in the direction F as shown in Fig. 24. Thereby, torsion occurs in the stamp plate 200.
Reversely, if the dot heating elements are positioned downstream the moving direction of the thermal head from the contact point between the thermal head and the porous base plate, the dot heating elements cannot be uniformly contacted to the porous base plate in case that the distance between the edge of the thermal head and the dot heating elements becomes long to an extent passing the limit.

(3) As mentioned, it is conventionally known a stamp plate producing apparatus for producing the stamp plate on which an ink permeable non-melted portion ( figure portion ) and an ink impermeable melted-solidified portion ( non-figure portion ) are formed by contacting a thermal head having a plurality of dot heating elements to a stamp surface of a porous base plate with ink permeability and selectively heating and melting the stamp surface of the porous base plate while moving the thermal head.

[0003] In the thermal head, the dimension of the dot heating element in both the primary scanning direction and the secondary scanning direction is generally set so as to become smaller than the dot pitch and the feed pitch, respectively, taking into consideration ink blurring in stamping.

[0004] However, in case that the stamp surface is formed on the porous base plate by selectively melting, it is necessary to be able to form the melted-solidified portion corresponding to one dot heating element by heating one element and to form the non-melted portion corresponding to one dot heating element without heating one element.

[0005] The inventors have variously studied to realize both melting one dot area corresponding the one dot heating element and remaining thereof without melting, as a result, found that it was important to consider the relation between the melting area and the energy applied to the thermal head. For example, as shown in Fig. 20, the melting area is apt to be influenced by change of the energy in the low energy region, thus stable melting cannot be done. On the other hand, it is possible that the thermal head is broken in the high energy region. Therefore, the energy for stable melting should be in a predetermined region.

[0006] Further, considering the melting area, to completely seal the melted-solidified portion it is necessary that the melting area has the same size of the dot pitch, as shown in Fig. 21(A) and (B). On the other hand, as shown in Fig. 22, since the non-melted portion is pressed while stamping, the non-melted portion can be wholly used as the stampable area, thus if the stampable area is about 70% of the dot pitch, stamping for the one dot area can be done taking ink blurring into consideration. At that time, the melting area necessary to remain the non-melted portion of the one dot area becomes about 110% of the dot pitch.

[0007] Assuming that the thermal head is driven with the energy region capable of melting the porous base plate, the inventors found that the melting area necessary to completely seal the melted-solidified portion and to remain the non-melted portion corresponding to the one dot area became 100% - 110% of the dot pitch. Based on the above, this invention was made.
JP-08,104048 discloses a porous base plate having a thermoplastic resin with a melting temperature of 50-150 °C, a JISA hardness of 60-95, a porosity of 40-90% and a pore opening of 1-50µm.

[0008] The inventors of the present invention have variously studied on the porous base plate used for the stamp plate while taking the above characteristics required for the stamp device into consideration, and as a result, found out that various stamping characteristics could be improved so as to satisfy the above characteristics of the stamp device by preparing the average pore size, hardness, etc. in a predetermined range.

[0009] The present invention has been made in view of the above circumstances and has the first object to overcome the above problems and to provide a stamp device with improved stamping characteristics by giving various characteristics to the porous base plate used for the stamp plate.

[0010] The present invention also has the second object to provide a stamp plate producing apparatus in which the border between the melted-solidified portion and the non-melted portion can be clearly formed.

[0011] Further, the present invention has the third object to provide a stamp plate producing apparatus in which both the melting and remaining of the one dot area on the stamp plate can be conducted.

[0012] Accordingly, the present invention provides a stamp device provided with a stamp plate which is constructed from a porous base plate with open cells therein having a stamp surface on which an ink permeable
   non-melted portion and an ink impermeable melted-solidified portion are formed, and a support member for supporting the stamp plate from one side thereof,
   wherein an average pore diameter formed on the basis of the open cells lies in a range of 10µm - 40µm, one side of the stamp surface in the porous base plate lies in a range of 20'- 50°, the hardness being measured according to the Asker Type C hardness test.

[0013] In the stamp device, since the average pore diameter is set in range of 10µm - 40µm, the melting characteristic of the stamp surface can be improved when forming the non-melted portion and the stamp concentration of characters stamped by the non-melted portion can be stably retained. Here,it is preferable to set the average pore diometer in a range of 15µm - 25µm. More preferably, the average pore diameter is set to 20µm.

[0014] In the stamp device, since the hardness of the stamp surface in the porous base plate is set in a range of 20' - 50', it can prevent the stamp plate from being deformed when stamping characters through the non-melted portion, thus characters can be clearly stamped. Further, when the non-melted portion is formed on the stamp surface through the thermal head, the thermal head can be uniformly contacted to the stamp surface, thus the border between the non-melted portion and the melted-solidified portion can be clearly formed. Here, it is preferable to set the hardness in a range of 30° - 40°. More preferably, the hardness is set to 35'.

[0015] The present invention preferably also further provides a stamp device provided with a stamp plate which is constructed from a porous base plate wherein the thickness of the porous base plate lies in a range of 1mm - 4mm.

[0016] In the stamp device, since the thickness of the porous base plate is set in a range of 1mm - 4mm, the thermal head can be uniformly contacted to the stamp surface without breaking the stamp surface when the non-melted portion is formed on the stamp surface through the thermal head, thereby the border between the non-melted portion and the melted-solidified portion can be clearly formed. Further, the stamp plate can be easily handled. Here, it is preferable to set the thickness in a range of 2mm - 2.5mm.

[0017] Furthermore, the present invention preferably also provides a stamp device provided with a stamp plate which is constructed from a porous base plate
   wherein the porous base plate is annealed under a temperature lying in a range of 40°C - 60°C.

[0018] In the stamp device, since the porous base plate is annealed under the temperature lying in a range of 40°C - 60 °C, the dimension of the stamp plate can be retained for a long time under this temperature range or less, thus excellent dimension stability can be given to the stamp plate under the normal circumstance. Here, it is preferable to set the temperature in a range of 45°C - 55°C.

[0019] Also, to accomplish the second object, the present invention provides

a stamp plate producing apparatus for producing a stamp plate constructed from a porous base plate having a stamp surface on which an ink permeable non-melted portion and an ink impermeable melted-solidified portion are formed by contacting a thermal head with a plurality of dot heating elements at a contact point on one surface of the porous base plate with ink permeability and selectively heating and melting the surface of the porous base plate while moving the thermal head, said apparatus comprising a thermal head and a porous base plate,

wherein a distance between the contact point where the thermal head and the porous base plate contact and the dot heating element is set in a range of 0mm - 1.0mm, and

wherein hardness of the porous base plate lies in a range of 20' - 60' under 25°C, the hardness being measured according to the Asker Type C hardness test.

[0020] In the stamp plate producing apparatus, since the positional relation between the dot heating element of the thermal head and the porous base plate and the hardness of the porous base plate is set according to the above, the thermal head can be uniformly contacted to the porous base plate, thus it can prevent the torsion of figure stamped through the non-melted portion.

[0021] Here, on the basis of the following reason, the distance between the contact point where the thermal head and the porous base plate contact and the dot heating element is set in a range of 0mm - 1.0mm. That is, the thermal head should be uniformly contacted to the porous base plate without partial contacting, to form correctly the stamp surface on the porous base plate and stamp clearly the figure. Here, it is preferable to set the distance in a range of 0mm - 0.4mm.
It should be noted that the invention requires the hardness of the porous base plate to be measured by an ASKER TYPE C hardness meter.

[0022] The reason that the hardness is set in a range of 20' - 60' under 25°C is as follows. If the hardness is less than 20', the porous base plate is extended in the moving direction of the thermal head when the thermal head is contacted to the porous base plate with a predetermined contact pressure. Thus, the stamp pitch of the figure stamped by the non-melted portion on the stamp plate deviates and the torsion of the figure occurs. On the other hand, if the hardness of the porous base plate exceeds 60', the thermal head is partially contacted to the porous base plate, thus stamping load force in stamping becomes too large.

[0023] Further, to accomplish the third object, the present invention preferably also provides a stamp plate producing apparatus for producing a stamp plate

wherein the dot heating elements are arranged on the thermal head with an arranging pitch and the dot heating element has an area capable of melting the porous base plate, the area being set in a range of 100% - 110% of the arranging pitch, and

wherein the dot heating element has a predetermined size in both the primary scanning direction and the secondary scanning direction and the predetermined size is set in a range of 70% - 130% of the arranging pitch.

[0024] In the stamp plate producing apparatus, on the basis of the following reason, the area capable of melting the porous base plate is set in a range of 100% - 110% of the arranging pitch and the size of the dot heating element is set in a range of 70% - 130% of the arranging pitch. As shown in Fig. 19, considering the energy capable of melting on the basis of the energy applied to the thermal head, the size of the dot heating element necessary to completely seal the melted portion and remain the non-melted portion of the one dot area becomes in a range of 70% - 130% of the dot pitch. Here, the primary scanning direction of the dot heating element means the direction perpendicular to the moving direction of the thermal head. The secondary scanning direction means the direction along the moving direction of the thermal head, the secondary scanning direction being perpendicular to the primary scanning direction.

[0025] The above and further objects and novel features of the invention will more fully appear from the following detailed description when the same is read in connection with the accompanying drawings. It is to be expressly understood, however, that the drawings are for purpose of illustration ' only and not intended as a definition of the limits of the invention.

[0026] The invention will be further described by way of example only with reference to the accompanying drawings, in which:

Fig. 1 is a perspective view of a stamp plate according to the first embodiment of the present invention ;

Fig. 2 is a perspective view of a processed stamp plate ;

Fig. 3 is a perspective view of a main part of a stamp producing apparatus ;

Fig. 4 is a sectional view of the stamp producing apparatus of Fig. 3 viewed along a IV-IV line ;

Fig. 5 is a sectional view of the stamp producing apparatus of Fig. 3 viewed along a V-V line ;

Fig. 6 is an explanatory view showing a work to assemble the stamp plate with a support member, constructing the stamp device in the first embodiment;

Fig. 7 is a partial perspective view of the support member;

Fig. 8 is a side sectional view of the stamp plate assembled with the support member;

Fig. 9 is a partial view of Fig. 8 viewed along a IX-IX line;

Fig. 10 a table showing the relation between the average pore size and melting characteristic, stamp concentration in the porous base plate ;

Fig. 11 is a table showing the relation between the hardness of the porous base plate and deformation characteristic of figure portion, the melting characteristic, stamping load force while melting of the porous base plate ;

Fig. 12 is a table showing the relation between the thickness of the porous base plate and strength of the stamp surface, handling characteristic, cost ;

Fig. 13 is a table showing the relation between annealing temperature and the stamp concentration, dimension stability against time passage, resisting characteristic against environmental temperature ;

Fig. 14 is a perspective view of the stamp device according to the second embodiment ;

Fig. 15 is a partially enlarged sectional view of the stamp device shown in Fig. 14 ;

Fig. 16 is an explanatory view showing the relation between the porous base plate and the thermal head ;

Fig. 17 is a graph showing the relation between contact pressure and the hardness, deformation amount of the porous base plate ;

Fig. 18 is an explanatory view showing the relation between arrangement pitch of dot heat elements and dimension thereof in both the primary and secondary scanning directions, in the thermal head ;

Fig. 19 is an explanatory view showing the relation between melting region/dot size and dot heating element size/dot pitch ;

Fig. 20 is an explanatory view showing the relation between melting energy and melting region ;

Fig. 21 is a schematic view showing melting region ;

Fig. 22 is a schematic view showing a printable region ;

Fig. 23 is a perspective view of the stamp device in the prior art when the stamp plate is extended ; and

Fig. 24 is a perspective view of the stamp device in the prior art when the stamp plate is contracted.

[0027] A detailed description of the preferred embodiments of a stamp device embodying the present invention will now be given referring to the accompanying drawings. At first, the stamp device of the first embodiment will be described.

[0028] A structure of a stamp plate to be used in the stamp device is first described with reference to Fig. 1. Fig. 1 is a perspective view of the stamp plate formed from a porous base plate having open cells, which is processed to make four side faces except upper and lower faces having a wider width be impermeable with ink.

[0029] In Fig. 1, the porous base plate forming the stamp plate 1 is made of rigid or semi-rigid rubber material having continuous fine open cells therein. Such the porous base plate can be manufactured by the following methods.

[0030] First, polybutadiene 14 weight % and dibutyl phthalate (plasticizer ) 86 weight % are mixed and heated under 100-200 °C for a predetermined time. Thereafter, the mixture is poured into a plate with a mold and rapidly cooled down under normal temperature, thereby the mixture is shaped according to the plate with a mold. At that time, porous structure in the porous base plate is determined corresponding to the cooling condition. For example, when the mixture in the plate with a mold is rapidly cooled down, pore diameter (size) formed in the porous base plate due to the open cells becomes small. In the first embodiment, the mixture is cooled down under a cooling condition so that the average pore size lies in a range of 10µm - 40µm. Thereby, the mixed solid material can be obtained.

[0031] At the time that fabrication is finished after cooling down of the mixture, dibutyl phthalate remains in polybutadien while maintaining gel state, in the mixed solid material. Thus, it is conducted removal process for removing a predetermined amount of the plasticizer from the mixed solid material. In the removal process, the mixed solid material is taken out from the plate with a mold and pressed with predetermined pressure, thereby dibutyl phthalate in gel state is removed from polybutadien. Through the removal process, content of dibutyl phthalate decreases in a range of 5 - 30 weight %.

[0032] Further, after the removal process, vacuum drying of the mixed solid material is conducted, and the mixed solid material is annealed at temperature in a range of 40°C - 60°C. Thereby, the porous base plate is obtained. Here, structure of polybutadien in the porous base plate is stabilized by the annealing process, and dimension stability of the porous base plate is improved in a range of annealing temperature and temperature lower than such temperature range.

[0033] The thickness of the above processed porous base plate lies in a range of 1mm - 4mm, on the basis of thickness of the plate with a mold, and it is found that the hardness in the surface ( which becomes the stamp surface 2 later ) of the porous base plate lies in a range of 20' - 40'when measured by means of ASKER TYPE C hardness meter, and the melting point thereof lies in a range of 70°C - 130°C.

[0034] Instead of the rubber material, usable is foamed plastic made of a selected one of polyolefine resin, polyurethane resin, vinyl chloride resin, ABS resin, ethylene-vinyl acetate copolymer, and other resin, each of which is rigid or semi-rigid and has open fine cells therein. These foamed plastics may be used by removing a surface layer covering the outside of the foamed plastic after foaming, and slicing it into a flat plate. Alternatively, one plane of the foamed plastic in contact with the mold for forming the foamed plastic may be used as a stamp surface of the stamp device.

[0035] As shown in Fig. 1, to form a stamp surface 2 in a predetermined region of an upper surface of the stamp plate 1, wherein cells are visible, other portions are pressed by a heated die to form a convex-shaped portions 3 and 4 and four side faces 5 below the convex-shaped portions 3 and 4 into melted-solidified portions. In these melted-solidified portions 3, 4 and 5, cells are covered with a thin film layer of ink impermeability. If a back surface (a lower surface in Fig. 1) of the stamp plate 1 is left as non-melted so as to be permeable with ink, a long-term ink supply in continuous stamping operations can be achieved by attaching an ink occlusion pad to the back surface of the stamp plate 1.

[0036] Fig. 2 is a perspective view of the stamp plate after processed on which figure portions 6 in the shape of mirror images of desired characters, figures and the like are formed on the stamp surface 2, which is referred to as a processed stamp plate 10 hereinafter. This processed stamp plate 10 is, for example, manufactured by a stamp producing apparatus 60 shown in Fig. 3 through Fig. 5.

[0037] In Figs. 3 through 5, the stamp producing apparatus 60 is provided with a guide rod 64 to guide a carriage 63 in an axial direction and a head change rod 67 to guide the carriage 63 and operate a cam member 66 whereby a thermal head 65 mounted on the carriage 63 is moved up and down, both rods 64 and 67 being arranged between a right and left side walls 61a and 61b of a frame 61. The cam member 66 is mounted on the head change rod 67 so as not to be rotatable about the rod 67, but slidable in the axial direction. The head change rod 67 is rotatably supported in bearings 73 provided in the side walls 61a and 61b.

[0038] The stamp plate 1 is attached on a lower surface of a stamp device 11 mentioned later. This stamp device 11 is fixedly positioned above the moving carriage 63 by a supporting means not shown. The carriage 63 is mounted on the guide rod 64 and the head change rod 67 so as to be movable in the axial direction of the rods 64 and 67. At a front end (a left end in Fig. 5) of the carriage 63, a rack 68 having an appropriate length in a longitudinal direction of the carriage 63 is integrally fixed with an appropriate fixing means. The carriage 63 can be moved in a lateral direction (indicated by arrows A and B in Figs. 3 and 4) by a power transmitted from a driving pinion 70 of a driving motor 69 which is reversely rotatable and fixedly mounted on a front wall 61c of the frame 61 through a group of reduction gears 71 arranged on a back surface of the front wall 61c to an engaging gear 72 which is engaged with the rack 68.

[0039] The carriage 63 is provided with a cam contact plate 74 and a heat release plate 75, both of which are mounted rotatably upward and downward about a support shaft 76 arranged in an orthogonal direction with respect to the head change rod 67, and a thermal head 65 fixed on the upper end side of the heat release plate 75. This heat release plate 75 is always pressed elastically by means of a spring 77 disposed between the cam contact plate 74 and the heat release plate 75.

[0040] The cam member 66 is formed in the shape of an ellipse and the like thereby to come into contact with a lower surface of the cam contact plate 74. This cam member 66 can be changed its position according to rotation of the head change rod 67 in a direction indicated by an arrow C or D in Fig. 3. When the cam member 66 is positioned sideways, becoming oblong in a horizontal direction with respect to the head change rod 67, the heat release plate 75 mounting the thermal head 65 thereon is put down. When the cam member 66 is positioned oblongly in a vertical direction with respect to the rod 67, i.e., in a stand-up state, causing the rotation of the cam contact plate 74 in an upward direction, the heat release plate 75 is rotated upward through the cam contact plate 74 and the spring 77, whereby the thermal head 65 is pressed against the lower surface of the stamp plate 1 fixedly positioned above the carriage 63.

[0041] The rotation of the head change rod 67 in the direction C or D to change the position of the cam member 66 is caused by means of a gear 78 mounted on an end of the head change rod 67, a gear 79 supported on the right end wall 61b and a lever 80 to rotate the gear 79.

[0042] The thermal head 65 has substantially the same structure as that of a well known thermal printer in which, for example, ninety-six point-like ( dot ) heating elements are arranged in a line in an orthogonal direction with respect to the arrow A, in which a length (H1 in the Fig. 5) of one line of the heating elements is a little longer than the width of the stamp plate 1.

[0043] The stamp producing apparatus 60 has a control unit not shown of microcomputer type including a central processing unit (CPU), a read-only memory (ROM), a random-access memory (RAM) and an interface and the like. The control unit drives the thermal head 65 and the driving motor 69. As shown in Fig. 4, the control unit controls the cam member 66 to be positioned in a stand-up state thereby to press the thermal head 65 against an end portion (an upper end in Fig. 4) of the stamp surface 2 of the stamp plate 1, and the thermal head 65 to activate all heating elements in one line, while activating the driving motor 69 to move the carriage 63 at a constant speed in the direction of the arrow A, thereby melting the part of the stamp surface 2 in contact with the thermal head 65, and then the melted part is solidified. Then a thin film which is impermeable with ink is formed on the melted-solidified part of the stamp surface 2, resulting in ink impermeable melted-solidified portion 7 (see Fig. 2). Succeedingly, in a predetermined part of the stamp surface 2, the thermal head 65 is controlled to allow the point-like heating elements not to emit heat in accordance with image dot patterns based on predetermined characters data input in advance and as a result, the predetermined part are not melted to form the figure portion 6 in the shape of mirror images of the predetermined characters as being permeable with ink, and other part becomes the melted and solidified portion 7 impermeable with ink. In this way, the finished stamp plate 10 can be manufactured. In the figure portion 6 of the processed stamp plate 10, the mean diameter of pores formed from the open cells is 10 to 40 µm.

[0044] A structure of the stamp device 11 will be described hereinafter with reference to Figs 6 to 9. In Figs. 6 to 9, the stamp device 11 is constructed from the stamp plate 1 (processed stamp plate 10) in the shape of a substantially rectangular plate, a support member 12 for supporting the stamp plate 1 from the back surface. This support member 12 is rectangular in a plan view and is integrally or separately provided with a hand-hold portion 14.

[0045] The support member 12 is also provided, in its surface side (i.e., an upper side in Fig. 6), with a pair of longitudinal claws 13 formed in parallel with both longitudinal side faces 1a of the stamp plate 1, serving as engaging means to elastically hold the stamp plate 1, and a concave slot portion 15 formed in one end of the support member 12, in which an end face 1b orthogonal to the side faces 1a is inserted so as not to come off. On the surface side of the support member 12, as shown in Fig. 6, an inclination 16 is formed in the concave slot portion 15 and a pressure sensitive weak adhesive layer 17 is provided along a longitudinal direction of the claws 13.

[0046] With the above structure, the stamp plate 1 is assembled to the support member 12 by inserting one end (1b) of the stamp plate 1 along the inclination 16 into the concave slot portion 15 and then pushing the stamp plate 1 between the pair of claws 13 so as to stick the back surface of the plate 1 to the adhesive layer 17 between the pair of claws 13. In this way, the side opposite faces 1a or the lateral edge corner portions of the stamp surface 2 can elastically be engaged with the claws 13.

[0047] Accordingly, the back face of the stamp plate 1 is thus fixed to a part of a support plane 12a of the support member 12 by a weak adhesive strength of the pressure sensitive weak adhesive layer 17. The side opposite faces 1a and 1a are engaged with the pair of claws 13 and 13 of the support member 12. The end face 1b of the stamp plate 1 is fixed in the concave slot portion 15. Thus, the stamp plate 1 is securely assembled in the support member 12 and prevented from coming off.

[0048] The claws 13 may be formed longitudinally continuously along the side faces 1a (see Fig. 6) and, alternatively, formed intermittently so as not to partially hold the side faces 1a. As shown in Figs. 7 through 9, an open hole 18 may be made in the concave slot portion 15 so as to go through a part of the support member 12.

[0049] Next, the porous base plate was produced while variously changing the pore diameter ( size ), hardness, thickness and annealing temperature thereof, and both the stamp plate 1 and the processed stamp plate 10 were produced from the porous base plate. Further, various stamping characteristics were experimented while using the stamp plate 1 and the processed stamp plate 10.

[0050] First, the relation between the average pore diameter and the melting characteristic, stamp concentration was examined by using the processed stamp plate 10 produced from the porous base plates in which the pore diameters were variously changed. Here, the pore diameter ( size ) can be changed by changing mixing ratio of polybutadien and dibutyl phthalate or cooling temperature in molding. The experimental results are indicated in the table of Fig. 10. In Fig. 10, the melting characteristic was appreciated by visually observing clearness of the stamped characters which were actually stamped by the processed stamp plate 10, the clearness being dependent on sealing state of the melted-solidified portion 7 on the stamp surface 2. The stamp concentration was appreciated as follows. First, ink of a predetermined amount ( 0.15g ) was coated on the processed stamp plate 10 and stamping operation was conducted thirty (30) times on a plain paper under stamping pressure of 4kgf at 25 °C. Further, concentration of characters stamped at the thirtieth stamping operation was measured by Macbeth permeation densitometer. As ink used for the processed stamp plate 10, it was used ink in which oil soluble dye was dissolved in polyoxyethylene alkyl phenylether as organic solvent having good affinity with rubber material.

[0051] In Fig. 10, the melting characteristic is satisfactory until the pore diameter is 40µm, and gradually decreases when the pore diameter becomes more than 40µm, further is out of permissible range when the pore diameter exceeds 50µm. The reason is as follows. If the average pore diameter is small, the melted-solidified portion 7 with good sealing property can be formed since the stamp surface 2 is enough melted by the thermal head. But, according to that the average pore diameter becomes larger, sealing property goes down, thus the border between the figure portion 6 and the melted-solidified portion 7 becomes unclear and the stamped characters also becomes unclear.

[0052] As the stamp concentration, if the average pore diameter is less than 10µm, concentration value becomes less than 0.75 and the concentration goes down. On the other hand, if the average pore diameter is more than 10µm, the concentration value more than 0.75 can be obtained. The reason is as follows. If the average pore diameter is small, ink retaining ability becomes unsatisfactory. But, according to that the average pore diameter becomes larger, ink retaining ability becomes satisfactory.

[0053] Therefore, taking both the melting characteristic and the stamp concentration into consideration, it is preferable that the average pore diameter of the porous base plate lies in a range of 10µm - 40µm, more preferably in a range of 15µm - 42µm. The most preferable value of the average pore diameter is 20µm.

[0054] Next, the relation between the hardness and the deformation amount of the figure portion 6 in melting, the melting characteristic, the stamping load force was examined by using the processed stamp plate 10 produced from the porous base plates in which the hardness was variously changed. Here, the hardness can be changed by changing mixing ratio of polybutadien and dibutyl phthalate or the average pore diameter under various cooling temperatures in molding. The experimental results are indicated in the table of Fig. 11. In Fig. 11, the hardness was measured in the porous base plate with 10mm thickness by means of ASUKA C-type hardness meter. The deformation amount of the figure portion 6 in melting was appreciated by visually observing deformation amount ( distortion of the characters ) of the figure portion 6 formed on the stamp surface 2 by the thermal head. The melting characteristic was appreciated by the same method mentioned above. The stamping load force was appreciated on the basis of pressure to be applied to the stamp device 11 so that the concentration value measured by Macbeth permeation densitometer became approximately 0.8.

[0055] In Fig. 11, as the deformation amount of the figure portion 6 in melting, if the hardness is less than 10°, the deformation amount of the figure portion 6 becomes large. The reason is as follows. If the hardness is low, the figure portion 6 is apt to deform when the thermal head contacts to the stamp surface 2. As a result, if the thermal head is scanned on the stamp surface 2, the figure portion 6 is easily deformed. Further, according to that the hardness becomes higher than 20', the deformation amount of the figure portion 6 becomes small. The reason as follows. If the hardness is high, the stamp surface 2 can overcome the pressure by the thermal head and the stamp surface 2 is scarcely deformed,

[0056] As the melting characteristic, if the hardness is less than 20° and exceeds 50', the melting characteristic goes down in comparison with the permissible range. On the other hand, if the hardness lies in a range of 20° - 50°, the melting characteristic becomes satisfactory. The reason that the melting characteristic goes down in case of less than 20° of the hardness is as follows. In this case, the stamp surface 2 is apt to deform when the thermal head contacts thereto, as a result, clearness of the characters goes down on the basis of deformation in the figure portion 6. The reason that the melting characteristic goes down in case of more than 50° of the hardness is as follows. In this case, contact force between the thermal head and the stamp surface 2 becomes large, and due to this circumstance, the thermal head is apt to partially contact to the stamp surface 2. Therefore, there will partially occur non-melted portions, as a result, the melting characteristic goes down.

[0057] Further, as the stamping load force, if the hardness is less than 50°, the stamping load force becomes less than 5kgf. This stamping load force is suitable for the stamp device 11. On the contrary, if the hardness becomes more than 60°, the stamping load force becomes more than 5kgf which is not suitable for the stamp device 11.

[0058] Therefore, taking into consideration the deformation amount of the figure portion 6, the melting characteristic and the stamping load force, it is preferable that the hardness of the porous base plate lies in a range of 20° - 50° ,more preferably in a range of 30° - 40°. The most preferable value of the handness is 35°.

[0059] In addition to the above, when the processed stamp plate 10 is produced through the stamp plate 1 from the porous base plate while variously changing the thickness of the porous base plate, the relation between the thickness of the porous base plate and strength of the stamp surface 2 ( stamp surface strength ), the handling characteristic of the processed stamp plate 10 ( handling ability ), the cost was examined. The experimental results are indicated in the table of Fig. 12. The stamp surface strength was appreciated by visually observing whether the porous base plate was broken when the melted-solidified portion 7 is formed by contacting the thermal head on the stamp surface 2. The thickness of the porous base plate can be changed by changing the thickness dimension of the plate with a mold used when molding the porous base plate.

[0060] In Fig. 12, as the stamp surface strength, if the thickness of the porous base plate is less than 1mm, it was found that the porous base plate broke. And if the thickness thereof is more than 1.6mm, the stamp surface 2 with satisfactory stamp surface strength can be obtained without breaking the porous base plate. The reason is as follows. If the porous base plate is excessively thin, the thermal head partially contacts to the stamp surface 2 since the thermal head is scanned on the stamp surface 2 while contacting thereto when the melted-solidified portion 7 is formed. As a result, the stamp surface 2 is extended and apt to be broken.

[0061] As the handling ability, if the thickness of the porous base plate is less than 1mm, the handling ability goes down. If the thickness thereof is more than 1.6mm, the handling ability is not enough yet. But, if the thickness thereof becomes more than 2mm, the handling ability becomes satisfactory. The reason is as follows. The processed stamp plate 10 is pressed into the concave slot portion 15 of the support member 12. Thus, if the thickness thereof is small, it is difficult to press the processed stamp plate 10 into the concave slot portion 15. And if the processed stamp plate 10 is thin, it is conceivable that the processed stamp plate 10 is out of the concave slot portion 15 when melted by the thermal head.

[0062] Further, as the cost, if the thickness of the porous base plate is small, the cost thereof becomes, of course, low. Thus, if the thickness thereof exceeds 4mm, cost performance goes down.

[0063] Therefore, taking into consideration the stamp surface strength, the handling ability and the cost, it is preferable that the thickness of the porous base plate lies in a range of 1mm - 4mm, more preferably in a range of 2mm - 2.5mm.

[0064] Next, when the processed stamp plate 10 is produced through the stamp plate 1 from the porous base plate while variously changing the annealing temperature, it was examined the relation between the annealing temperature of the porous base plate and the stamp concentration, the dimension stability against time passage, the resisting characteristic against environmental temperature. The experimental results are indicated in the table of Fig. 13. The stamp concentration was appreciated by the same method mentioned above. That is, ink of a predetermined amount ( 0.15g ) was coated on the processed stamp plate 10 and stamping operation was conducted thirty (30) times on a plain paper under stamping pressure of 4kgf at 25 °C. Further, concentration of characters stamped at the thirtieth stamping operation was measured by Macbeth permeation densitometer. The dimension stability and the resisting characteristic were appreciated by actually measuring the deformation amount in the dimension of the porous base plate after being preserved under 45°C for ten days.

[0065] In Fig. 13, as the stamp concentration, if the annealing temperature is 40°C, the stamp concentration slightly goes down. But, if the annealing temperature lies in a range of 50°C - 60°C,
the stamp concentration becomes satisfactory. If the annealing temperature exceeds 60°C, the stamp concentration extremely goes down. The reason is as follows. If the annealing temperature is less than 40°C, structural stability of the porous base plate is not enough. If the annealing temperature exceeds 60°C, the porous base plate is degradated and its quality goes down, thus it occurs bad influence to the ink permeability or the stamp concentration.

[0066] Further, as the dimension stability and the resisting characteristic, if the annealing temperature is less than 40°C, there exists deficiency in both the dimension stability and the resisting characteristic. But, if the annealing temperature becomes more than 50°C, both the dimension stability and the resisting characteristic become satisfactory. The reason is as follows. In general, if the porous base plate is annealed under a predetermined temperature, such base plate can satisfactorily retain the dimension stability under the annealing temperature and the temperature lower than the annealing temperature, since the structure is stabilized. However, if the annealing temperature is less than 40°C, the structural stability of the porous base plate is not enough.

[0067] Therefore, taking into consideration the stamp concentration, the dimension stability and the resisting characteristic, it is preferable that the annealing temperature of the porous base plate lies in a range of 40°C - 60°C, more preferably in a range of 45°C - 55°C.

[0068] As mentioned in detail, in the stamp device 11 of the first embodiment, since the average pore diameter formed in the porous base plate is set in a range of 10µm - 40µm, the melting characteristic of the stamp surface 2 can be improved when the figure portion 6 is formed, and the stamp concentration of characters stamped by the figure portion 6 can be stably retained.

[0069] Since the hardness of the stamp surface 2 in the porous base plate is set in a range of 20'- 50' when measured by the ASKER TYPE C hardness meter, it can prevent the stamp plate 1 from being deformed when characters are stamped by the figure portion 6, thus characters can be clearly stamped. Further, the thermal head can uniformly contact to the stamp surface 2 when the figure portion 6 is formed on the stamp surface 2 by the thermal head, thus the border between the figure portion 6 and the melted-solidified portion 7 can be clearly formed.

[0070] Further, since the thickness of the porous base plate is set in a range of 1mm - 4mm, the thermal head can uniformly contact to the stamp surface 2 without breaking the stamp surface 2 when the figure portion 6 is formed on the stamp surface 2 by the thermal head. Therefore, the border between the figure portion 6 and the melted-solidified portion 7 can be clearly formed and the stamp plate can be easily handled.

[0071] Since the porous base plate is annealed under a temperature range of 40°C - 60°C, the dimension of stamp plate can be retained for a long time under the annealing temperature and the temperature lower than it, thus the stamp plate 1 can retain the excellent dimension stability under the normal condition.

[0072] Next, the stamp device according to the second embodiment will be described with reference to Figs. 14, 15. In Fig. 14, a stamp device 111 has a stamp plate 112 formed from a rectangular sheet of stamp material, and a stamp support 113 supporting the back surface of the stamp plate 112. In the stamp support 113, a hand-hold portion 113a is formed at the opposite side where the stamp plate 112 is retained.

[0073] As the stamp material used for the stamp plate 112, it is preferable to use the porous base sheet ( plate ) such as foamed resin sheet which can impregnate ink therein, the hardness thereof lying in a range of 20'- 60', more pereferably 30'- 40', under 25°C and the contact pressure against the thermal head 65 ( mentioned later ) being set in a range of 0.1 - 0.5 N/mm , more preferably 0.1 - 0.3 N/mm , per unit length. In detail, for example, it is used the porous base sheet ; the hardness is 35' under 25°C; main component is polybutadien rubber which is used as rubber material; the open cells are formed with the average pore diameter of 20µm; the thickness is 2 -2.5mm.

[0074] On the surface of the stamp plate 112, there are formed the melted-solidified portion 114 which is formed by melting and solidifying the surface pores and becomes ink impermeable, and the non-melted portion 115 (figure portion) which is formed without melting the surface pores and becomes ink permeable, as shown in Figs. 14, 15. Thus, since ink impregnated in the stamp plate 112 can run from only the non-melted portion 115, characters,
figures formed by the non-melted portion 115 are stamped when the stamp plate 112 is presses onto the stamp sheet.

[0075] As the stamp plate producing apparatus of the second embodiment, the stamp producing apparatus used in the first embodiment is basically utilized. Thus, since such stamp producing apparatus is described in detail with reference to Figs. 3 -5, its description will be omitted. In the second embodiment, the stamp plate producing apparatus has a characteristic structure as follows. Such structure will be described with reference to Fig. 16.

[0076] In Fig. 16, length between the contact point of the porous base plate 112A and the thermal head 65 and the dot heating element 65a is defined by the length L1, and this length L1 is set so as to become in a range of 0 -1.0mm , more preferably 0 - 0.4mm, from the contact point to the downstream side along moving direction of the thermal head 65. At that time, the dot heating element 65a of the thermal head 65 contacts to the surface of the porous base plate 112A with a contact angle θ.

[0077] Further, experimental example will be described. First, the porous base plate 112A with the following characteristics was prepared. The characteristics are ; the hardness is 35° under 25 °C when measured by ASKER TYPE C hardness meter; main component is polybutadien rubber; the average pore diameter is 20µm in open cells; the thickness is 2mm - 2.5mm. The thermal head 65 is contacted to the above porous base plate 112A with the contact angle 13'. At that time, the thermal head 65 was set so that the length L1 became 0.38mm. The contact pressure of the thermal head 65 was 3.9N against the porous base plate 112A having the width of 16.9mm, and deformation amount of the porous base plate 112A was 0.3mm. Under the above condition, it was not found that the thermal head 65 partially contacted to the porous base plate 112A and the porous base plate 112A was extended toward the moving direction of the thermal head 65. Thus, after the stamp plate 112 was produced, distortion in the figure portion 115 was not found in the stamp plate 112.

[0078] Next, the relation between the contact pressure and the hardness, the deformation amount of the porous base plate 112A was examined. The result is shown in Fig 17. As shown in Fig. 17, if the contact pressure between the thermal head 65 and porous base plate 112A is less than 0.1N/mm and the hardness of the porous base plate 112A exceeds 60', the deformation amount becomes less than 0.1mm. In this case, it is possible that parallelism between the thermal head 65 and the porous base plate 112A fluctuates and the thermal head partially contacts to the porous base plate 112A. On the other hand, if the contact pressure between the thermal head 65 and porous base plate 112A exceeds 0.5N/mm and the hardness of the porous base plate 112A is less than 20°, the deformation amount becomes too large since the porous base plate 112A is dragged toward the moving direction of the thermal head 65. In this case, it is possible that the porous base plate 112A is out of retaining part and torsion in the figure portion 115 occurs. Therefore, it is preferable that the hardness of the porous base plate 112A lies in a range of 20° - 60° under 25°C and the contact pressure between the porous base plate 112A and the thermal head 65 lies in a range of 0.1 - 0.5N.mm. This relation was confirmed.

[0079] Next, the stamp plate producing apparatus of the third embodiment will be described. Here, the stamp device of the third embodiment is basically same as that of the second embodiment, thus its explanation will be omitted. Further, the stamp plate producing apparatus is also basically same as that of the second embodiment. In third embodiment, the following construction is different from the second embodiment. Such structural characteristic will be described with reference to Fig. 18. As shown in Fig. 18, in the thermal head 65, a plurality of dot heating elements 65a are arranged in a line perpendicular to the direction shown by the arrow A. The width H1 of the heat release plate 75, as shown in Fig. 5, is set so as to become slightly longer than the width of the porous base plate 12A. The width H1 corresponds to the row length of the dot heating elements 65a.

[0080] The melting area by the dot heating element 65a is set in a range of 100% - 110% of the dot ( arrangement ) pitch P between the elements 65a, and the width L1 of the dot heating element 65a in the primary scanning direction and the width L2 thereof in the secondary scanning direction are set in a range of 70% - 130% of the dot pitch P. The reason is as follows. As shown in Fig. 19, considering the energy capable of melting ( see Fig. 20 ) on the basis of the energy applied to the thermal head 65, the size ( width L1, L2 ) of the dot heating element 65a necessary to completely seal the melted portion and remain the non-melted portion of the one dot area becomes in a range of 70% - 100% of the dot pitch.

[0081] As the width L1 of the dot heating element 65a along the primary scanning direction, it is difficult to form it with a size larger than the dot pitch, therefore it is preferable to set the width L1 of the element 65a in a range of 70% - 130% of the dot pitch when producing.

[0082] Next, both the width L1 in the primary scanning direction and the width L2 in the secondary scanning direction will be concretely described.

( the width L2 in the secondary scanning direction )

[0083] The width L2 is set 0.140mm against the feed pitch 0.141mm of the thermal head. The reason is as follows. If the width L2 exceeds 0.183mm, it becomes difficult to remain the non-melted portion corresponding to the one dot area. Further, if the width L2 is less than 0.099mm, it concludes that the energy applied to the thermal head exceeds the rated power of the thermal head.

( the width L1 in the primary scanning direction )

[0084] The width L1 is set 0.125mm against the feed pitch 0.141mm of the thermal head. The reason is as follows. If the width L1 exceeds 0.141mm, it becomes difficult to produce it. Further, if the width L1 is less than 0.099mm, it concludes that the energy applied to the thermal head exceeds the rated power of the thermal head.

[0085] The foregoing description of the preferred embodiment of the invention has been presented for purposes of illustration and description. It is intended that the scope of the invention be defined by the claims appended hereto.

Claims

1. A stamp device provided with a stamp plate which is constructed from a porous base plate with open cells therein having a stamp surface on which an ink permeable

non-melted portion and an ink impermeable melted-solidified portion are formed, and a support member for supporting the stamp plate from one side thereof,

wherein an average pore diameter formed on the basis of the open cells lies in a range of 10µm - 40µm, and the hardness of the stamp surface in the porous base plate lies in a range of 20' - 50, the hardness being measured according to the Asker Type C hardness test..

2. The stamp device according to claim 1, wherein the average pore diameter lies in a range of 15µm - 25µm.

3. The stamp device according to claim 2, wherein the average pore diameter is set to 20µm.

4. The stamp device according to claim 1, 2 or 3 wherein the porous base plate is formed of porous material with fine open cells selected from a group consisting of polyolefin resin, polyurethane resin, vinyl chloride resin, ABS resin, ethylene-vinyl acetate copolymer.

5. The stamp device according to claim 1, 2 or 3 wherein the porous base plate is formed of polybutadien and plasticizer.

6. The stamp device according to claim 5, wherein the plasticizer is dibutyl phthalate.

7. The stamp device according to any preceding claim, wherein the hardness lies in a range of 30' - 40'.

8. The stamp device according to claim 7, wherein the hardness is set to 35'.

9. A stamp device according to any preceding claim, wherein the thickness of the porous base plate lies in a range of 1mm - 4mm.

10. The stamp device according to claim 9, wherein the thickness lies in a range of 2mm - 2.5mm.

11. The stamp device according to any proceeding claim, wherein the porous base plate is annealed under a temperature lying in a range of 40°C - 60°C.

12. The stamp device according to claim 11, wherein the temperature lies in a range of 45°C - 55°C.

13. The stamp device according to any preceding claim, wherein the support member further comprises :

a receiving part having a support surface for supporting the stamp plate ;

a pair of claws formed at both sides of the receiving part, the claws resiliently holding the stamp plate.

14. The stamp device according to claim 13, wherein the receiving part has a concave slot portion and the stamp plate is set in the receiving part by inserting one end thereof into the concave slot portion.

15. The stamp device according to claim 13, further comprising an adhesive layer formed on the support surface, wherein the stamp plate is fixed on the support surface by the adhesive layer.

16. A stamp plate producing apparatus for producing a stamp plate constructed from a porous base plate having a stamp surface on which an ink permeable non-melted portion and an ink impermeable melted-solidified portion are formed by contacting a thermal head with a plurality of dot heating elements at a contact point on one surface of the porous base plate with ink permeability and selectively heating and melting the surface of the porous base plate while moving the thermal head, said apparatus comprising a thermal head and a porous base plate,

wherein a distance between the contact point where the thermal head and the porous base plate contact and the dot heating element is set in a range of 0mm - 1.0mm, and

wherein hardness of the porous base plate lies in a range of 20' - 60' under 25°C, the hardness being measured according to the Asker Type C hardness test.

17. The stamp apparatus according to claim 16 wherein the distance is set in a range of 0mm - 0.4mm.

18. The stamp plate producing apparatus according to claim 16 or 17 wherein contact pressure between the thermal head and the porous base plate is set in a range of 0.1 - 0.5N/mm.

19. The stamp apparatus according to claim 18, wherein the contact pressure is set in a range of 0.1N/mm - 0.3N/mm.

20. The stamp apparatus according to any one of claims 16 to 19, wherein the hardness of the porous base plate is set in a range of 30' - 40' under 25°C.

21. The stamp plate producing apparatus according to claim 20, wherein the hardness of the porous base plate is set 35' under 25°C.

22. The stamp plate producing apparatus according to any one of claims 16 to 21 wherein the porous base plate is formed of rubber material and has open cells therein, and wherein an average pore diameter is set 20µm on the basis of the open cells.

23. The stamp plate producing apparatus according to any one of claims 16 to 22 wherein thickness of the porous base plate is set in a range of 2mm - 2.5mm.

24. The stamp plate producing apparatus according to any one of claims 16-23,

wherein the dot heating elements are arranged on the thermal head with an arranging pitch and the dot heating element has an area capable of melting the porous base plate, the area being set in a range of 100% - 110% of the arranging pitch, and

wherein the dot heating element has a predetermined size in both the primary scanning direction and the secondary scanning direction and the predetermined size is set in a range of 70% - 130% of the arranging pitch.

25. The stamp plate producing apparatus according to claim 24, wherein the size of the dot heating element in the primary scanning direction is set in a range of 70% - 100% of the arranging pitch.

Ansprüche

1. Stempelvorrichtung,

die mit einer Stempelplatte, die aus einer porösen Basisplatte mit offenen Zellen darin aufgebaut ist, mit einer Stempeloberfläche,

auf der ein tintendurchlässiger nichtgeschmolzener Abschnitt und ein tintenundurchlässiger geschmolzen-verfestigter Abschnitt gebildet sind, und einem Tragteil zum Tragen der Stempelplatte von einer Seiten davon versehen ist,

worin ein mittlerer Porendurchmesser,

der auf der Basis der offenen Zellen gebildet ist,

in einem Bereich von 10µm - 40µm liegt und

die Härte der Stempeloberfläche in der porösen Basisplatte in einem Bereich von 20' - 50' liegt,

wobei die Härte gemäß dem Askerhärtetest Typ C gemessen ist.

2. Stempelvorrichtung nach Anspruch 1, bei der der mittlere Porendurchmesser in einem Bereich von 15µm - 25µm liegt.

3. Stempelvorrichtung nach Anspruch 2, bei der der mittlere Porendurchmesser auf 20µm gesetzt ist.

4. Stempelvorrichtung nach Anspruch 1, 2 oder 3, bei der die poröse Basisplatte aus porösem Material mit feinen offenen Zellen gebildet ist, das aus einer Gruppe gewählt ist, die aus Polyolefinharz, Polyurethanharz, Vinylchloridharz, ABS-harz, Ethylenvinylacetatcopolymer besteht.

5. Stempelvorrichtung nach Anspruch 1, 2 oder 3, bei der die poröse Harzplatte aus Polybutadien und einem Weichmacher gebildet ist.

6. Stempelvorrichtung nach Anspruch 5, bei der der Weichmacher Dibutylphthalat ist.

7. Stempelvorrichtung nach einem der vorhergehenden Ansprüche, bei der die Härte in einem Bereich von 30' - 40' liegt.

8. Stempelvorrichtung nach Anspruch 7, bei der die Härte auf 35' gesetzt ist.

9. Stempelvorrichtung nach einem der vorhergehenden Ansprüche, bei der die Dicke der porösen Basisplatte in einem Bereich von 1mm - 4mm liegt.

10. Stempelvorrichtung nach Anspruch 9, bei der die Dicke in einem Bereich von 2mm - 2,5mm liegt.

11. Stempelvorrichtung nach einem der vorhergehenden Ansprüche, bei der die poröse Basisplatte einer Wärmebehandlung unter einer Temperatur unterzogen ist, die in einem Bereich von 40°C - 60°C liegt.

12. Stempelvorrichtung nach Anspruch 11, bei der Temperatur in einem Bereich von 45°C - 55°C liegt.

13. Stempelvorrichtung nach einem der vorhergehenden Ansprüche, bei der das Tragteil weiter aufweist:

ein empfangendes Teil mit einer Tragoberfläche zum Tragen der Stempelplatte;

ein Paar von Klauen, die an beiden Seiten des empfangenden Teiles gebildet sind, wobei die Klauen federnd die Stempelplatte halten.

14. Stempelvorrichtung nach Anspruch 13, bei der das empfangende Teil einen konkaven Schlitzabschnitt aufweist und die Stempelplatte in das empfangende Teil durch Einführen von einem Ende davon in den konkaven Schlitzabschnitt gesetzt ist.

15. Stempelvorrichtung nach Anspruch 13, weiter mit einer Klebeschicht, die auf der Tragoberfläche gebildet ist, wobei die Stempelplatte auf der Tragoberfläche durch die Klebeschicht befestigt ist.

16. Gerät zum Herstellen einer Stempelplatte zum Erzeugen einer Stempelplatte, die aus einer porösen Basisplatte aufgebaut ist, mit einer Stempeloberfläche, auf der ein tintendurchlässiger nichtgeschmolzener Abschnitt und ein tintenundurchlässiger geschmolzen-verfestigter Abschnitt gebildet sind, durch Kontaktieren eines Thermokopfes mit einer Mehrzahl von Punktheizelementen an einem Kontaktpunkt auf einer Oberfläche der porösen Basisplatte mit Tintendurchlässigkeit und selektives Erwärmen und Schmelzen der Oberfläche der porösen Basisplatte, während der Thermokopf bewegt wird,

wobei das Gerät einen Thermokopf und eine poröse Basisplatte aufweist,

worin ein Abstand zwischen dem Kontaktpunkt, an dem der Thermokopf und die poröse Basisplatte in Kontakt kommen und dem Punktheizelement in einem Bereich von 0mm - 1,0mm gesetzt ist und

worin die Härte der porösen Basisplatte in einem Bereich von 20' - 60' unter 25°C liegt, wobei die Härte gemäß den Askerhärtetest Typ C gemessen ist.

17. Stempelgerät nach Anspruch 16, bei dem der Abstand in einem Bereich von 0mm - 0,4mm gesetzt ist.

18. Gerät zum Herstellen einer Stempelplatte nach Anspruch 16 oder 17, bei dem der Kontaktdruck zwischen dem Thermokopf und der porösen Basisplatte in einem Bereich von 0,1 - 0,5N/mm gesetzt ist.

19. Stempelgerät nach Anspruch 18, bei dem der Kontaktdruck in einem Bereich von 0,1N/mm - 0,3N/mm gesetzt ist.

20. Stempelgerät nach einem der Ansprüche 16 bis 19, bei dem die Härte der porösen Basisplatte in einem Bereich von 30'- 40' unter 25°C gesetzt ist.

21. Gerät zum Herstellen einer Stempelplatte nach Anspruch 20, bei dem die Härte der porösen Basisplatte auf 35' unter 25°C gesetzt ist.

22. Gerät zum Herstellen einer Stempelplatte nach einem der Anprüche 16 - 21, bei dem die poröse Basisplatte aus Gummimaterial hergestellt ist und offene Zellen darin aufweist und bei dem ein mittlerer Porendurchmesser auf 20µm auf der Basis der offenen Zellen gesetzt ist.

23. Gerät zum Herstellen einer Stempelplatte nach einem der Ansprüche 16 - 22, bei dem die Dicke der porösen Basisplatte in einem Bereich von 2mm - 2,5mm gesetzt ist.

24. Gerät zum Herstellen einer Stempelplatte nach einem der Ansprüche 16 - 23, bei dem die Punktheizelemente auf dem Thermokopf mit einem Anordnungsabstand angeordnet sind und das Punktheizelement eine Fläche aufweist, die die poröse Basisplatte schmelzen kann, wobei die Fläche in einem Bereich von 100% - 110% des Anordnungsabstandes gesetzt ist, und bei dem das Punktheizelement eine vorbestimmte Größe in sowohl der Primärabtastrichtung als auch der Sekundärabtastrichtung aufweist und die vorbestimmte Größe in einem Bereich von 70% - 130% des Anordnungsabstandes gesetzt ist.

25. Gerät zum Herstellen einer Stempelplatte nach Anspruch 24, bei dem die Größe des Punktheizelementes in der Primärabtastrichtung in einem Bereich von 70% - 100% des Anordnungsabstandes gesetzt ist.

Revendications

1. Dispositif muni d'une plaque de tampon qui est conçue à partir d'une plaque de base poreuse comprenant des cellules ouvertes dans celle-ci présentant une surface de tampon sur laquelle une partie non fondue perméable à l'encre et une partie fondue-solidifiée imperméable à l'encre sont formées, et un élément de support destiné à supporter la plaque de tampon depuis une face de celle-ci,
   dans lequel un diamètre moyen des pores formé sur la base des cellules ouvertes se situe dans une plage de 10 µm à 40 µm, et la dureté de la surface de tampon dans la plaque de base poreuse se situe dans une plage de 20° à 50°, la dureté étant mesurée conformément à l'essai de dureté de type C Asker.

2. Dispositif de tampon selon la revendication 1, dans lequel le diamètre moyen des pores se situe dans une plage de 15 µm à 25 µm.

3. Dispositif de tampon selon la revendication 2, dans lequel le diamètre moyen des pores est établi à 20 µm.

4. Dispositif de tampon selon la revendication 1, 2 ou 3, dans lequel la plaque de base poreuse est formée d'un matériau poreux comprenant de fines cellules ouvertes choisi parmi un groupe constitué d'une résine de polyoléfine, d'une résine de polyuréthane, d'une résine de chlorure de vinyle, d'une résine ABS, d'un copolymère éthylène-acétate de vinyle.

5. Dispositif de tampon selon la revendication 1, 2 ou 3, dans lequel la plaque de base poreuse est formée de polybutadiène et de plastifiant.

6. Dispositif de tampon selon la revendication 5, dans lequel le plastifiant est le phtalate de dibutyle.

7. Dispositif de tampon selon l'une quelconque des revendications précédentes, dans lequel la dureté se situe dans une plage de 30° à 40°.

8. Dispositif de tampon selon la revendication 7, dans lequel la dureté est établie à 35°.

9. Dispositif de tampon selon l'une quelconque des revendications précédentes, dans lequel l'épaisseur de la plaque de base poreuse se situe dans une plage de 1 mm à 4 mm.

10. Dispositif de tampon selon la revendication 9, dans lequel l'épaisseur se situe dans une plage de 2 mm à 2,5 mm.

11. Dispositif de tampon selon l'une quelconque des revendications précédentes, dans lequel la plaque de base poreuse est recuite à une température se situant dans une plage de 40 °C à 60 °C.

12. Dispositif de tampon selon la revendication 11, dans lequel la température se situe dans une plage de 45 °C à 55 °C.

13. Dispositif de tampon selon l'une quelconque des revendications précédentes, dans lequel l'élément de support comprend en outre :

une partie de réception comprenant une surface de support destinée à supporter la plaque de tampon,

une paire de griffes formées des deux côtés de la partie de réception, les griffes maintenant de façon élastique la plaque de tampon.

14. Dispositif de tampon selon la revendication 13, dans lequel la partie de réception comporte une partie de fente concave et la plaque de tampon est installée dans la partie de réception en insérant une extrémité de celle-ci jusque dans la partie de fente concave.

15. Dispositif de tampon selon la revendication 13, comprenant en outre une couche adhésive formée sur la surface de support, dans lequel la plaque de tampon est fixée sur la surface de support par la couche adhésive.

16. Dispositif de fabrication de plaque de tampon destiné à fabriquer une plaque de tampon conçue à partir d'une plaque de base poreuse comprenant une surface de tampon, sur laquelle une partie non fondue perméable à l'encre et une partie fondue-solidifiée imperméable à l'encre sont formées par la mise en contact d'une tête thermique comprenant une pluralité d'éléments chauffants ponctuels au niveau d'un point de contact sur une surface de la plaque de base poreuse présentant une perméabilité à l'encre et le chauffage et la fusion de façon sélective de la surface de la plaque de base poreuse tout en déplaçant la tête thermique, ledit dispositif comprenant une tête thermique et une plaque de base poreuse,

dans lequel une distance entre le point de contact, où la tête thermique et la plaque de base poreuse viennent en contact, et l'élément chauffant ponctuel est établie dans une plage de 0 mm à 1,0 mm, et

dans lequel la dureté de la plaque de base poreuse se situe dans une plage de 20° à 60° à 25 °C, la dureté étant mesurée conformément à l'essai de dureté de type C Asker.

17. Dispositif de tampon selon la revendication 16, dans lequel la distance est établie dans une plage de 0 mm à 0,4 mm.

18. Dispositif de fabrication de plaque de tampon selon la revendication 16 ou 17, dans lequel la pression de contact entre la tête thermique et la plaque de base poreuse est établie dans une plage de 0,1 à 0,5 N/mm.

19. Dispositif de tampon selon la revendication 18, dans lequel la pression de contact est établie dans une plage de 0,1 N/mm à 0,3 N/mm.

20. Dispositif de tampon selon l'une quelconque des revendications 16 à 19, dans lequel la dureté de la plaque de base poreuse est établie dans une plage de 30° à 40° à 25 °C.

21. Dispositif de fabrication de plaque de tampon selon la revendication 20, dans lequel la dureté de la plaque de base poreuse est établie à 35° à 25 °C.

22. Dispositif de fabrication de plaque de tampon selon l'une quelconque des revendications 16 à 21, dans lequel la plaque de base poreuse est formée de matériau de caoutchouc et comporte des cellules ouvertes dans celui-ci, et dans lequel un diamètre moyen des pores est établi à 20 µm sur la base des cellules ouvertes.

23. Dispositif de fabrication de plaque de tampon selon l'une quelconque des revendications 16 à 22, dans lequel l'épaisseur de la plaque de base poreuse est établie dans une plage de 2 mm à 2,5 mm.

24. Dispositif de fabrication de plaque de tampon selon l'une quelconque des revendications 16 à 23,

dans lequel les éléments chauffants ponctuels sont disposés sur la tête thermique avec un pas d'agencement et l'élément chauffant ponctuel présente une zone capable de fondre la plaque de base poreuse, la zone étant établie dans une plage de 100 % à 110 % du pas d'agencement, et

dans lequel l'élément chauffant ponctuel présente une taille prédéterminée, à la fois dans la direction de balayage primaire et la direction de balayage secondaire, et la taille prédéterminée est établie dans une plage de 70 % à 130 % du pas d'agencement.

25. Dispositif de fabrication de plaque de tampon selon la revendication 24, dans lequel la taille de l'élément chauffant ponctuel dans la direction de balayage primaire est établie dans une plage de 70 % à 100 % du pas d'agencement.

Drawing