[Technical Field]
[0001] The present invention relates to a film forming apparatus for forming a thin film
on a flexible substrate by a vapor deposition method. More specifically, the present
invention relates to a vacuum film forming apparatus for forming a thin film by means
of gas phase deposition on a flexible substrate, while continuously or discontinuously
transporting the flexible substrate.
[Background Art]
[0002] Methods for forming a thin film by means of gas phase deposition can be broadly divided
into chemical vapor deposition (CVD) and physical vapor deposition (PVD).
[0003] PVD typically includes vacuum vapor deposition and sputter deposition. In particular,
sputter deposition enables production of a high quality thin film with uniform film
properties and film thickness, although the apparatus cost is usually high. For this
reason, sputter deposition is widely applied to display devices and the like. However,
the film may have defects.
[0004] CVD is a process of growing a solid thin film by introducing a raw material gas into
a vacuum chamber, and decomposing or reacting one type or two or more types of gas
on a substrate by means of thermal energy. In some CVD processes, a plasma or catalyst
reaction may be used in combination to promote the reaction or decrease reaction temperature.
CVD using plasma is called plasma enhanced CVD (PECVD), and CVD using a catalyst reaction
is called catalytic CVD (Cat-CVD). Although chemical vapor deposition is characterized
by having fewer defects in film formation and is mainly applied to production of semiconductor
devices such as film formation of a gate insulation film, it has a disadvantage in
that a relatively high temperature is required for film formation.
[0005] Atomic layer deposition (ALD), which is classified as CVD, is a film formation process
in which a film is formed in a layer-by-layer manner at an atomic level by chemically
reacting the substances which are adsorbed on the surface. ALD is distinguished from
general CVD in that general CVD uses a single gas or concurrently uses a plurality
of gases which are reacted on a substrate to thereby grow a thin film on a substrate,
while ALD is a particular film formation method which uses a highly reactive gas,
which is referred to as a precursor, and a reactive gas (which is also referred to
as a precursor) to perform adsorption on the substrate surface and subsequent chemical
reactions to thereby grow a thin film in a layer-by-layer manner at an atomic level.
[0006] Specifically, ALD uses a self-limiting effect in surface adsorption that prohibits
a certain type of gas from being adsorbed onto a surface after the surface is covered
by the gas. Accordingly, after one layer of precursor is adsorbed onto the surface,
unreacted precursor is purged. Then, another reactive gas is introduced to oxidize
or reduce the above precursor to thereby obtain one layer of a thin film having a
desired composition. After that, the reactive gas is purged. This cycle is repeated
so as to grow a thin film in a layer-by-layer manner. Accordingly, the thin layers
grow in two dimensions in the ALD process. ALD is characterized by reducing deficiencies
in film formation compared with typical CVD as well as with conventional vapor deposition
or sputtering, and is expected to be applied to various fields.
[0007] ALD may include a process of using plasma to enhance the reaction in the step of
decomposing a second precursor and reacting the decomposed second precursor with a
first precursor adsorbed on the substrate, which is called plasma enhanced ALD (PEALD)
or simply plasma ALD.
[0008] Since ALD is characterized by having no projection effect or the like compared with
other film formation methods, film formation only require a gap through which a gas
is introduced. Accordingly, ALD is expected to be applied to fields related to micro
electro mechanical systems (MEMS) for covering a three-dimensional structure, as well
as for covering lines and holes having a high aspect ratio.
[0009] By using the aforementioned film formation method, a thin film is formed on a variety
of targets including a small plate-shaped substrate such as a wafer or photomask,
a substrate having a large surface area and no flexibility such as a glass plate,
or a substrate having a large surface area and flexibility such as a film, and the
like. Accordingly, for mass production facilities that form a thin film on these substrates,
a variety of handling methods for the substrates which are different in cost, ease
of handling, film formation quality, and the like have been proposed and put to practical
use.
[0010] For example, there are sheet type deposition, batch type deposition, and the like.
In sheet type deposition, film formation is performed while one sheet of substrate
is supplied on a wafer in a film forming apparatus, and then, film formation is again
performed after the sheet is replaced with a subsequent substrate. In batch type deposition,
a plurality of substrates are collectively set so that the same film formation is
performed onto all the wafers.
[0011] Further, methods for forming a film on a glass substrate or the like include an in-line
method, in which film formation is concurrently performed while a substrate is successively
transported to a portion of a deposition source, and a web coating method using a
so-called roll-to-roll method, in which film formation is performed mainly on a flexible
substrate while the substrate is paid out from a roll and transported, and then the
substrate is taken up by another roll. The web-coating method also includes a transportation/continuous
film formation process, in which a substrate on which a film is formed, as well as
the flexible substrate, is continuously transported on a flexible sheet or on a partially
flexible tray.
[0012] An optimal combination is adopted from the above film formation methods and the
handling methods for the substrates, considering the cost, quality, ease of handling,
and the like.
[0013] ALD has disadvantages such as use of specific materials, and its cost. Among others,
since ALD is a process which grows a thin film at an atomic level by depositing a
layer in each cycle, the most significant disadvantage is that the film formation
speed is 5 to 10 times slower than other film formation methods such as vapor deposition
and sputtering.
[0014] To solve the above problem, contrary to the conventional process in which a precursor
is repeatedly supplied and discharged in a single chamber (which is called a time-divided
type), a space-divided type has been proposed, in which the chamber is divided into
several zones so that a single precursor or purge gas is supplied into the respective
zones while the substrate is reciprocated among the zones (for example, see PTL 1).
[Citation List]
[Patent Literature]
[Summary of the Invention]
[Technical Problem]
[0016] Emergence of the space-divided type ALD process has significantly improved the film
formation speed. However, the film formation speed is not still sufficiently improved
compared with CVD or sputter deposition, and this contributes to an increase in film
formation cost. In roll-to-roll ALD deposition, the film formation speed is determined
depending on a transport speed of the flexible material when the ideal conditions
such as saturated adsorption being accomplished are met. Further, in order to increase
the film thickness, there is a need to increase the area in which the substrate reciprocates
at least between two zones, that is, increase the size of apparatus, which also contributes
to increase in the cost.
[0017] However, a film thickness of a certain extent is required to increase durability
of the film produced.
[0018] To improve film formation speed, atomic vapor deposition (AVD) has been invented,
in which a precursor is introduced in a pulsed manner while a reactive gas is constantly
supplied. However, this process is directed to a batch type film forming apparatus
of a time-divided type, and is not suitable for use in a roll-to-roll film formation
of a time-divided type.
[0019] An object of the present invention is to provide a film forming apparatus for forming
a thin film on a flexible substrate, wherein the film forming apparatus is capable
of reducing the size of the entire apparatus and improving efficiency to thereby enhance
productivity.
[Solution to Problem]
[0020] An aspect of the present invention that solves the above problem is a film forming
apparatus which forms a thin film on a flexible substrate transported in a vacuum
chamber, characterized in that the film forming apparatus comprises: a partition wall
that separates the vacuum chamber into at least a first zone and a second zone, the
partition wall including an opening through which the flexible substrate passes; a
mechanism that reciprocates the flexible substrate between the first zone and the
second zone; a mechanism that supplies raw material gas containing metal or silicon
into the first zone; and a mechanism that is disposed in the second zone and performs
sputtering of a material containing metal or silicon as a target material.
[Advantageous Effects of Invention]
[0021] According to the present invention, the following effects can be obtained.
[0022] That is, a film of higher quality than that obtained by sputter film formation can
be obtained at a high film formation speed by using the above apparatus. Moreover,
as a result of that, the apparatus can be reduced in size.
[0023] Further, compared with the case where only sputter film formation is performed, film
formation defects specific to sputter film formation contained in the film can be
reduced.
[Brief Description of the Drawings]
[0024]
Fig. 1 is an exemplary configuration diagram of a vacuum chamber for illustrating
a film forming apparatus according to an embodiment of the present invention. The
diagram schematically illustrates only a film formation section, which is a core of
the apparatus.
Fig. 2 is a schematic diagram of an electrode of the film forming apparatus according
to an embodiment of the present invention.
Fig. 3 is a schematic diagram of an example which illustrates a film formation method
of the film forming apparatus according to an embodiment of the present invention.
[Description of Embodiments]
[0025] With reference to the drawings, an embodiment of the present invention will be described
in detail.
[0026] Fig. 1 illustrates only a portion of a vacuum chamber 100 which performs film formation.
Although film formation on a flexible substrate 205 is typically performed by a roll-to-roll
method as described above, the method is not limited thereto. In the drawing, a film
supplying unit uses a known technique and illustration thereof is omitted.
<Configuration>
[0027] The vacuum chamber 100 is separated into at least two zones by a zone separator 202.
As shown in Fig. 1, the vacuum chamber 100 of the present embodiment is separated
into three zones 101, 102 and 103 by two zone separators 202 positioned with a predetermined
space in a transportation direction of the substrate 205. That is, the present embodiment
shows an example in which the third zone 103 is disposed between the first zone 101
and the second zone 102. A plurality of third zones 103 may be provided.
[0028] The flexible substrate 205, which is fed into the vacuum chamber 100, is transported
by a plurality of rollers 201 to reciprocate between the first zone 101 and the second
zone 102 a plurality of times by changing the transportation direction by 180 degrees,
and then fed out from the vacuum chamber 100. The zone separators 202 constitute partition
walls. The plurality of rollers 201 constitutes a mechanism that reciprocates the
substrate 205 between the first zone 101 and the second zone 102.
[0029] A raw material gas is introduced into the first zone 101 by a raw material gas introduction
mechanism 501. The raw material gas mainly contains metal or silicon.
[0030] The second zone 102 is provided with electrodes 203, and a target material corresponding
to the target film type for film formation is set as the electrode 203. The electrodes
203 are positioned to face a sputtering surface of the substrate 205 which is transported.
When a plurality of electrodes 203 are provided, all the electrodes 203 may have the
same material and composition ratio. Alternatively, only one or some of the electrodes
203 or each of the electrodes 203 may have different material and composition ratio.
Fig. 1 shows an example in which electrodes 204 as well as the electrodes 203 are
provided as electrodes and disposed to face the sputtering surface. Using the electrodes
203 in addition to the electrodes 204 enables film formation on both surfaces of the
flexible substrate 205. Using different materials for the electrode 203 and 204 enables
formation of films of different materials on both surfaces of the flexible substrate
205.
[0031] A gas suitable for sputtering is introduced into the second zone 102 by a sputtering
gas introduction mechanism 502. When reactive sputtering is performed, a reactive
gas is also introduced. In addition, reactive sputtering also includes a case where
a lower oxide target having oxygen vacancy type conductivity is used instead of a
metal target, and a reactive gas is further introduced to form an oxide thin film.
For example, indium tin oxide having an oxygen content lower than the stoichiometric
composition ratio is used for the target material, and argon and oxygen are used for
the gas to form an oxide thin film. In the present invention, such a case is also
included in the reactive sputtering.
[0032] When the main component of the metal or silicon mainly contained in the raw material
gas is the same as the main component of the metal or silicon mainly contained in
the target, a thin film of the same (a single) species can be formed. On the other
hand, when they are different from each other, a thin film of a plurality of components
can be formed. Of the components which constitute the film, when the components of
sputter film formation accounts for a large portion and the components of the raw
material gas adsorbed in the first zone 101 accounts for a small portion, the components
of the raw material gas may also be used as a doping material for the sputter film.
[0033] The electrodes 203 and 204 serve as the electrodes for exciting plasma in sputter
film formation. Detailed configuration and features of the electrodes 203 and 204
will be described later.
[0034] The zone separators 202 include openings through which the flexible substrate 205
passes. The size of the opening is preferably minimized within the range in which
the substrate 205 is not in contact with the wall of the opening during transportation
of the flexible substrate 205. If the opening is large, the zone separator 202 fails
to perform its role sufficiently. That is, the gas present in the zone of concern
is mixed with the gas present in the adjacent zone. When the amount of such gas increases
to an extent which affects the film being deposited, problems that cannot be ignored
such as a failure in achieving the expected film quality occur. Therefore, the opening
is required to be small within the possible range.
[0035] In order to alleviate the effect described above, the third zone 103 according to
the present embodiment is provided as a buffer between the first zone 101 and the
second zone 102 as shown in Fig. 1. Further, a mechanism 503 that introduces an inert
gas into the third zone 103 is provided. Accordingly, an inert gas is introduced into
the third zone 103 during film formation, which can reduce direct mixture of the gas
introduced into the first zone 101 and the gas introduced into the second zone 102.
It is more effective to produce a flow of the inert gas introduced in the third zone
103 to be exhausted through the first zone 101 and/or the second zone 102.
[0036] Film formation is performed by reciprocating the flexible substrate 205 between the
first zone 101 and the second zone 102 via the third zone 103 through the openings
of the zone separator 202.
[0037] Fig. 2 is a schematic cross-sectional view of the configuration of the electrode
203 or 204. The electrode 203 or 204 constitutes a mechanism that performs sputtering.
[0038] The electrodes 203 and 204 are essentially the same except for that they are disposed
at different positions in the chamber 100, although considerations may be required
for positioning of left or right orientation depending on practical applications.
Of course, the electrodes 203 and 204 may be different from each other. When film
formation is performed on one surface of the flexible substrate 205, either one of
the groups of the electrodes is used. However, when film formation is performed on
both surfaces of the flexible substrate 205, both groups are provided and used at
the same time. In the following description, the electrode 203 and the electrode 204
can be replaced with each other unless otherwise specifically provided, and the electrode
203 will be described in the following description of the configuration.
[0039] Typically, a sputtering target serves as an electrode during plasma excitation. A
typical example is a copper plate (which is called a backing plate) with high conductivity
on which a target material that serves as a raw material during sputter film formation
is formed. Fig. 2 (1) illustrates an example in which a target material 303 is disposed
on one surface of a backing plate 302. In general sputter film formation, a rear surface
of the target is not exposed to vacuum. On the other hand, the electrode 203 used
in the present embodiment is mainly disposed between the flexible substrates 205.
Accordingly, an insulator 301 is disposed on one surface of the electrode 203 to prevent
electrical discharge from the backing plate 302, unless sputtering is performed on
both surfaces.
[0040] When sputtering is performed on both surfaces, the target materials 303 are disposed
on both surfaces of the backing plate 302 as shown in Fig. 2 (2). Here, the target
materials 303 may be made of the same material or materials different from each other.
When using different materials, sputter films having composition containing each of
the materials instead of a single material can be formed. A material containing metal
or silicon is used for the target material 303 to ensure conductivity required for
sputter film formation. Oxide or nitride may also be used as long as conductivity
can be ensured. For example, as previously described, indium tin oxide (ITO) or the
like can also be used as a conductive target material when it is produced with appropriate
control of the components and degree of oxidation. When the conductivity of the target
material is insufficient or when the conductivity decreases during film formation,
a known pulsed DC power supply or dual cathode technology can be used to prevent interruption
of electric discharge. When a non-conductive target material is used, an RF power
supply may be preferably used. However, in this case, there is a certain limitation
such as that all the electrodes need to be in phase for stabilization of electric
discharge.
[0041] Fig. 2 (3) illustrates the same configuration as that of Fig. 2 (1) except for the
target material 303 disposed on part of the backing plate 302. Using this configuration
enables a selective situation in which the sputter film formation is mainly performed
on a portion of the flexible substrate 205 which faces the target material 303, and
modification/activation of the surface of the substrate 205 by the excited plasma
is performed on the remaining portion. Accordingly, this is advantageous when film
formation and modification/activation are desired to be performed not at the same
time but at slightly different timings. However, in order to prevent the components
of the backing plate 302 from being sputtered, it is necessary to use a material of
low sputtering rate for the backing plate 302.
[0042] Fig. 2 (4) illustrates a configuration for alleviating such a limitation, in which
a magnetron is provided on the rear surface corresponding to only a portion on which
the target material 303 is disposed. This enables a high plasma density only in a
region adjacent to the target material 303. Accordingly, an electric power applied
can be reduced, and the amount of the backing plate 302 being sputtered can be relatively
reduced.
[0043] Fig. 2 (5) illustrates an example in which two magnetrons 304 are positioned back
to back so that sputtering on both surfaces can be performed. In order to prevent
interference between the two magnetrons 304, a magnetic shield sheet (not shown in
the figure) may be provided therebetween. Details of the magnetic shield sheet will
be described later.
[0044] Fig. 2 (6) illustrates an example in which the target material 303 is provided on
one surface of the backing plate 302, the magnetron 304 is provided on the rear surface
of the backing plate 302 and is protected by the insulator 301 disposed on the magnetron
304, and a conductor 305 is provided on the insulator 301 so that the target material
303 or the backing plate 302 is electrically connected to the conductor 305. The conductor
may be made of any material. Further, electrical connection may be established in
any manner. As a result, sputter film formation is performed on the surface having
the target material 303, and surface modification of the film during growth on the
flexible substrate 205 can be performed on the surface having the conductor 305. While
Fig. 2 (6) illustrates that the target material 303 is formed on a portion of the
backing plate 302, the target material 303 may also be entirely formed on one surface
of the backing plate 302 as illustrated in Fig. 2 (6)'. The size of the magnetron
304 is also modified as appropriate depending on the size of the target material 303.
[0045] Fig. 2 (7) illustrates an example in which a magnetic shield sheet 306 is provided
between the magnetron 304 and the conductor 305 of the electrode shown in Fig. 2 (6).
The type and material of the magnetic shield sheet are not specifically limited as
long as a sufficient magnetic shield effect can be performed. A known magnetic shield
sheet may be applied when it prevents leakage of the magnetic field from the magnetron
304 and minimizes sputtering from the conductor 305.
[0046] Although not shown in the figure, an electrode may also be provided with a water-cooling
or other cooling mechanism to prevent accumulation of excessive heat on the electrode.
The heat of the electrode is transmitted to the flexible substrate 205 as radiated
heat, which may cause damage to the flexible substrate 205. Accordingly, it is preferred
to prevent such heat.
<Film Formation Method>
[0047] Next, a film formation method using the above film forming apparatus will be described.
Film formation is performed in the following manner by using the present film forming
apparatus.
[0048] The effects due to different electrodes have been already described above. In addition,
since the film forming method is the same, the following description will be made
with reference to Fig. 3 by means of an example of Fig. 2 (7)' in which the target
material 303 of the Fig. 2 (7) is formed on the entire surface of the backing plate
302.
[0049] The target material 303 is a conductive material as described above. It is one of
features of the present invention that a material that is difficult to use in film
formation which uses raw material gas can be selected as a target material in sputter
film formation. That is, in CVD or ALD, high melting point metals and compounds thereof
generally require high temperature when they are taken out as a raw material gas,
and also require high temperature during film formation. Accordingly, film formation
onto the flexible substrate 205 is difficult. However, in sputter film formation,
these materials can also be used as a target material. Therefore, a variety of materials
can be used in this film formation.
[0050] In the exemplary configuration shown in the figure, the electrodes 203 are all the
same. However, each of the electrodes may be appropriately selected or eliminated
depending on the desired film. That is, in the above description, the electrodes 203
or 204 which constitute the sputtering film forming apparatus are configured to perform
sputtering each time the substrate 205 moves from the first zone 101 to the second
zone 102. However, the electrodes 203 or 204 may be disposed at least one position
in the second zone 102. Further, the positions or the number of the electrodes 203
or 204 is determined considering mutual effects between the film quality and film
formation speed.
[0051] In the film formation method according to the present film forming apparatus, the
flexible substrate 205 is first set in the vacuum chamber 100 in the film forming
apparatus, and the chamber 100 is evacuated. Since the required degree of vacuum varies
depending on the film quality to be produced or allowable processing speed, it should
be set according to requirements. The material for the flexible substrate 205 may
be PET, PEN, polyimide or the like, or any other material including a foil, paper,
and cloth that can bear the transport of the substrate 205 in the present apparatus
configuration. The material may also be silicon or glass which is thinned and bendable.
Alternatively, the material may be a composite material containing a plurality of
the above materials.
[0052] If necessary, the vacuum chamber 100 is heated as appropriate.
[0053] Subsequently, a raw material gas containing metal or silicon is introduced into the
first zone 101, and argon gas is introduced into the second zone 102. In the case
where reactive sputtering is performed in the second zone 102, a reactive gas such
as oxygen is also introduced. During this operation, cleaning of the target surface
by pre-sputtering is also performed.
[0054] Further, an inert argon or nitrogen gas may be introduced as a purge gas into the
third zone 103. Here, a gas pressure of the third zone 103 may be preferably set to
be the highest among those of the other zones. Accordingly, the probability or percentage
of mixture of the precursor introduced into the first zone 101 and the gas for sputtering
introduced into the second zone 102 can be reduced. However, this does not apply to
a case where a component inactive to the raw material gas introduced into the first
zone 101 is selected as the gas for sputtering.
[0055] Then, sputter film formation is performed along with the start of transportation
of the flexible substrate 205. Although general DC sputtering can be used, radio frequency
waves, microwaves, an inductively coupled plasma (ICP), and the like can also be used
as a plasma excitation source depending on the number of cathodes (targets). Known
techniques may also be applied to prevent arcing. Examples of these techniques include
use of a pulsed DC power supply and use of a DC power supply with an arc-cut control
circuit.
[0056] The power applied to plasma during sputter film formation can be freely set depending
on a desired film quality and film deposition speed. In sputter film formation, the
film thickness of the produced film generally increases in proportion to discharge
power. Since the feature of this film formation method is that adsorption of the raw
material gas and sputter film formation are repeated in a complementary and alternative
manner, the advantages of this film formation method may be impaired if the sputter
film formation is intensively performed.
[0057] Here, focusing on the flexible substrate 205 which is transported, the flexible substrate
205 introduced into a film formation chamber of the vacuum chamber 100 is exposed
to gas containing metal or silicon in the first zone 101. In this example, suppose
that the flexible substrate 205 enters the vacuum chamber 100 from the upper left
in Fig. 3. The raw material gas is adsorbed onto the surface of the flexible substrate
205. Then, the flexible substrate 205 moves to the third zone 103 through the opening
of the zone separator 202, and is exposed to an inert gas. The raw material gas which
has been adsorbed in the first zone 101 still remains on the surface of the flexible
substrate 205. Then, the flexible substrate 205 moves again through the opening of
the zone separator 202 to the second zone 102, and is exposed to the gas for sputter
film formation.
[0058] In the example of Fig. 3, the electrodes are housed at the orientation as shown in
in Fig. 2 (7)'. That is, in the region adjacent to the space 401, plasma is excited
by electric discharge from the electrode 203. Accordingly, the raw material gas adsorbed
on the surface of the flexible substrate 205 located adjacent to the space 401 is
modified. How it is modified varies depending on the elements that are present adjacent
to the surface. For example, when oxygen is present as an element, oxidation is expected.
Subsequently, the flexible substrate 205 is turned by the roller 201 by 180 degrees,
and is again guided to the front of the electrode 203. Here, as viewed from the flexible
substrate 205, the electrode 203 has the target material 303 on the surface thereof,
and components of the target material 303 are sputtered. Accordingly, sputter film
formation proceeds onto the flexible substrate 205 adjacent to the space 402. Then,
the flexible substrate 205 enters the third zone 103 through the opening of the zone
separator 202, and subsequently enters the first zone 101 again. A sequence of film
formation proceeds by repeating the above processes.
[0059] Although showing the numerical values is not appropriate since there may be a variety
of possibilities, it is advantageous to adjust the applied electric power of the sputter
film formation so that a film of the order of 0.2 to 1 nm is formed by sputter film
formation each time the flexible substrate 205 pass through the region adjacent to
the space 402. This increases the film growth speed while preventing a decrease in
film quality.
[0060] The flexible substrate 205 reciprocates between the first zone 101 and the second
zone 102 until a desired film thickness is achieved. For ease of description, only
five times of reciprocation is illustrated in Fig. 3. However, the number of reciprocation
is determined by the number of turns of the flexible substrate 205. Accordingly, the
apparatus used is designed in advance considering the number of turns (that is, the
number of rollers 201 and the number of electrodes 203) for the desired film thickness.
In general, a film thickness of 10 to 50 nm is thought to be necessary, and the number
of turns may be determined on the basis of such a film thickness.
[0061] Since the transport speed of the substrate 205 is limited by the throughput required
and permitted by the film quality, it is not advantageous to specify the speed.
[0062] After the film formation is performed until the desired film thickness is obtained,
the plasma is turned off, supply of gases including the raw material gas is stopped,
and the vacuum chamber 100 is evacuated to completely discharge the gas remaining
in the chamber. After that, the vacuum chamber 100 is vented and the flexible substrate
205 is removed. In a case where the flexible substrate 205 is paid out and taken up
in a roll-to-roll manner by a separate chamber, the separate chamber is vented and
the roll on which the film is formed is removed.
[0063] Thus, the film formation is completed.
<Effects of the Present Embodiment
[0064] By using the film forming apparatus of the present embodiment, the raw material gas
containing metal or silicon covers the entire surface of the flexible substrate in
a three dimensional manner including holes and pits present on the flexible substrate
205 in the step of transferring the flexible substrate 205 through the first zone
101. In the subsequent step of transferring the flexible substrate 205 through the
second zone 102, a thin film containing components which constitute the sputtering
target is formed by sputter film formation. Accordingly, deposition for a film thickness
from a few atomic layers to a few tens or a few hundreds of atomic layers is expected
depending on the sputter film formation conditions. By repeating these steps, a thin
film of one atomic layer level (ALD film) is obtained in the first zone 101, and a
thick film by the sputter film formation (sputtering film) is obtained in the second
zone 102.
[0065] Although the sputter film formation is a process having many defects, the raw material
gas in the first zone 101 covers the defects, if any, to thereby form a generally
good thin film. The above may be applied to film formation of an isolation film, dielectric
film, gas barrier film and the like.
[0066] That is, in ALD, a film is formed in layer (atomic layer) units, and the adsorption
of precursors varies depending on the state or foreign matter (contamination) on the
target substrate. Accordingly, there is a problem that atomic layers are not sequentially
formed on the substrate in an ideal manner. On the other hand, although sputtering
method cannot perform elaborate film formation in atomic layer units, sputtering film
formation is relatively easy compared to ALD.
[0067] In the present embodiment, combination of precursor adsorption (adsorption by ALD)
in the first zone 101 and the subsequent sputtering film formation in the second zone
102 allows for a mutually complementary relationship. Specifically, there are effects
that a gap in the sputtering film is filled by an ALD film, and further, precursors
can be well adsorbed onto the sputtering film, which facilitates formation of ALD
film.
[0068] Moreover, since the surface of the substrate made of a polymer material has irregularities
or cavities of the polymeric structure surface (the surface is not uniform when viewed
by an electron microscope), there is also an effect that a difficulty in forming an
ALS film in the initial stage of film formation can be solved. In this embodiment,
another effect is expected that brittleness of the ALD film is covered, including
the hardness of the sputtering film, although the barrier properties may not be the
same as that of a completely elaborately formed ALD film.
[0069] In addition, by providing the third zone 103 and adopting a configuration in which
an inert gas is introduced into the third zone 103, it is possible to prevent gas
mixing between the first zone 101 and the second zone 102 and reduce unintended film
deposition onto the flexible substrate 205. Further, film deposition onto the inner
wall of the chamber 100 can also be prevented in the first zone 101 and the third
zone 103.
[0070] Moreover, the target material is disposed on part of the electrode 203.
[0071] With this configuration, after the gas containing metal or silicon adsorbed onto
the flexible substrate 205 is efficiently decomposed or reacted in the first zone
101, the film formed by sputtering can be laminated on a portion of the surface of
the electrode 203 which is not covered by the target material.
[0072] In addition, a magnetron is disposed on the electrode 203 corresponding to a portion
where the target material is disposed.
[0073] Combining a sputtering target (electrode 203) with a magnetron itself is a known
technique. On the other hand, the present embodiment combines a magnetron with a portion
of the surface of the electrode 203 which is covered by the target material, and does
not provide a magnetron on a portion which is not covered by the target material.
[0074] With this configuration, a selective situation can be provided in which, depending
on the applied electric power, the amount of particles sputtered from the target material
can be drastically increased (increase in sputter ratio) in a portion combined with
a magnetron, while little sputtering is performed in the remaining portion.
[0075] Further, the target material is formed only on one of two surfaces of the electrode
203 that face the flexible substrate 205.
[0076] With this configuration, one of the surfaces can perform sputter film formation onto
the flexible substrate 205, while the other of the surfaces can perform surface modification
of the thin film formed on the flexible substrate 205 or the thin film during growth.
[0077] Further, in the electrode 203 in which a target material is disposed only on one
of two surfaces of the electrode 203 which faces the flexible substrate 205, a magnetron
is disposed on the other of the surfaces of the electrode 203, and a conductor is
formed to cover the magnetron so that the target material and the conductor are electrically
connected to each other.
[0078] With this configuration, one of the surfaces can perform magnetron sputtering, while
the other of the surfaces can perform surface modification of the thin film formed
on the flexible substrate 205 or the thin film during growth.
[0079] Further, a magnetic shielding structure is provided between the magnetron and the
conductor.
[0080] With this configuration, effect of the magnetic field acting on the conductor located
opposite to the target material can be eliminated or reduced. Accordingly, sputtering
onto the conductor surface can be prevented.
[0081] Further, when the sputtering is reactive sputtering, a thin film can be formed by
efficiently modifying the raw material gas adsorbed on the flexible substrate 205
by means of an active species derived by plasma from a reactive gas.
[0082] The present application claims the benefit of priority to Japanese patent application
No.
2015-053394 (filed on March 17, 2015), the entire contents of which are incorporated herein by reference.
[0083] Although the description has been given with reference to a limited number of embodiments,
the scope of the invention is not limited thereto, and modifications of the above
embodiments on the basis of the above disclosure are obvious to a person having ordinary
skill in the art. That is, the present invention may not be limited to the aforementioned
embodiments. Design modifications or the like can also be made to the above embodiments
on the basis of the knowledge of a person skilled in the art, and such modifications
or the like are encompassed within the scope of the present invention.
[Industrial Applicability]
[0084] The present invention can perform film formation without increasing the cost of facilities
in the process of forming a film on the substrate while transporting the substrate,
which contributes to reduction in production cost. Moreover, a variety of films can
be produced.
[Reference Signs List]
[0085]
100 vacuum chamber
101 first zone
102 second zone
103 third zone
201 roller
202 zone separator
203,204 electrode
205 flexible substrate
301 insulator
302 backing plate
303 target material
304 magnetron
305 conductor
306 magnetic shield sheet
401,402 space
501, 502, 503 mechanism for introducing gas