EPITAXIAL GROWTH OF DEFECT-FREE, WAFER-SCALE SINGLE-LAYER GRAPHENE ON THIN FILMS OF COBALT

Description

FIELD OF THE INVENTION

[0001] The field of the invention relates generally to a method for producing atomically thick sheets of graphene on a substrate, such as a semiconductor substrate, and more specifically to a method for producing layers of atomically thick sheets of graphene on a cobalt layer, which is in contact with the semiconductor substrate.

BACKGROUND OF THE INVENTION

[0002] A single atom thick graphene is the youngest allotrope of carbon and in the last decade it has become one of the most researched material in the scientific community because of its excellent optical, mechanical, and electrical properties. Graphene is the hexagonal arrangement of carbon atoms forming a one-atom thick planar sheet of sp² hybridized (double bonded) carbon atoms arranged in a honeycomb lattice. Graphene is a promising electronic material. It has the potential to significantly impact the semiconductor industry due to its superior electrical, thermal, mechanical, and optical properties while at the same time offering compatibility with existing semiconductor processing techniques. Graphene has shown extraordinary applications, including single molecule detection, ultrafast FETs, hydrogen visualization-template for TEM, and tunable spintronic devices. Furthermore, it exhibits high thermal conductivity (25 x silicon), high mechanical strength (strongest nanomaterial), high optical transparency (80%), carrier controlled interband/optical-transition, and flexible structure. Electronically, graphene is a semi-metal with zero band-gap owing to the conduction band touching the valence band at two points (K and K') in the Brillouin zone. Graphene's high density of π-electrons from the sp² carbon atoms and carrier-confinement in an open crystallographic structure imparts it with the highest mobility measured to date.

[0003] In order to realize these benefits in volume manufacturing, paths to integrating graphene on large diameter semiconductor, e.g., silicon, substrates are necessary. Current processes require graphene to be transferred from a metal base to the desired substrate. This transfer process of an atomically-thick sheet is challenging and leads to low yield and a significant density of folds and tears.

[0004] Since the successful isolation, identification, and characterization of graphene by A. Geim and K. Novoselov in 2004, the most common method for producing flakes of graphene has been by tape exfoliation from graphite and transfer to an oxidized silicon wafer. The transfer process for graphene from a metal (a) is not feasible for large scale synthesis due to inconsistent coverage, (b) leaves transfer polymer residue on graphene (PMMA, PDMS, thermal-adhesive-tape) increasing carrier-scattering, and (c) produces folds, wrinkles, and tears. Therefore, transfer of graphene is not feasible for industrial processing. Clearly, the scotch-tape method is not scalable for semiconductor industry. As a result of these deficiencies, this method produces small, irregularly shaped flakes of graphene and is not suitable for scaling to large diameter integration with silicon. See A. K. Geim and K.S. Novoselov, "The Rise of Graphene" Nature Materials 6 (2007) 183-191.

[0005] Research into producing wafer level graphene and large area sheets of graphene has produced the development of two main options.

[0006] First, W. deHeer's group at Georgia Institute of Technology has demonstrated the formation of graphene layers on SiC wafer by silicon sublimation and out-diffusion at very high temperature. The disadvantage of this technique is the high cost of SiC wafers, the smaller diameter SiC wafers, and the absence of integration scale possible on silicon wafers. Some groups are working on depositing SiC on Silicon and attempting to form graphene on the deposited SiC layer. See P. First, W. deHeer et al, "Epitaxial Graphenes on Silicon Carbide" MRS Bulletin 35, 296-305 (2010).

[0007] Groups in Korea and the University of Texas system have demonstrated graphene formation on metal foils such as Cu and Ni. See S. Bae et al, "Roll-to Roll Production of 30 inch Graphene Films for Transparent Electrodes" Nature Nanotechnology 5, 574-578 (2010) and X. Li et al, ECS Transactions, "Synthesis, Characterization, and Properties of Large-Area Graphene Films" 19 (5), 41-52 (2005). Using a carbon source such as methane mixed with hydrogen at temperatures in the 700-1000°C range in a CVD chamber at pressure such as 500 millitorr, carbon is absorbed into the metal film and upon cooling segregates or precipitates to the surface of the metal foil forming single or multi-layer graphene depending on the process conditions and the metal foil. The graphene layer then has to be transferred to oxidized silicon. The transfer process generally uses a material like PMMA on graphene followed by dissolution of the metal foil, then graphene is interfaced to the silicon dioxide layer, and finally the PMMA is removed leaving graphene on SiO₂ on Silicon. Although the graphene formation on metal foils enables large sheets of graphene to be produced, the process for transferring large area graphene sheets to large diameter silicon substrates for electronic device fabrication is challenging. Issues such as film stress, chemical residues, bonding defects, and wrinkles in the graphene film are likely to be significant challenges for a manufacturable process.

[0008] E. Kim et al. describe the growth of few-layer graphene on a thin cobalt film on a Si/SiO₂ substrate in Chemical Vapor Deposition, vol. 17, pages 9 to 14 (March 2011).

[0009] M.E. Ramon et al. describe a synthesis of large-area, high mobility graphene by CVD of acetylene on cobalt films in ACS Nano, vol. 5, p. 7198 to 7204 (September 2011). According to this publication, graphene is grown on annealed Co films in a rapid thermal chemical vapor deposition (RTCVD) furnace at ∼800°C, using acetylene as the carbon source.

BRIEF DESCRIPTION OF THE INVENTION

[0010] Briefly, the present invention is directed to a method of forming a multilayer structure as defined in claim 1, the method comprising: epitaxially depositing a graphene layer on a layer comprising cobalt, wherein the layer comprising cobalt is in contact with a dielectric layer, and further wherein the dielectric layer is in contact with a front wafer surface of a semiconductor wafer.

BRIEF DESCRIPTION OF THE DRAWINGS

[0011] 

FIGS. 1A through 1D depict the process flow according to an embodiment of the present invention.

FIGS. 2A through 2D are X-ray diffraction spectra of deposited cobalt layers. FIG. 2A is the spectra after E-beam evaporation. FIG. 2B is the spectra after heating to 1000°C. FIG. 2C is the spectra after heating to 1000°C and annealing for 10 min. FIG. 2D is the spectra after graphene growth.

FIG. 3 is Raman spectroscopic analysis of single-layer graphene on Co surfaces. The spectrum shows graphene's characteristic G and 2D-bands with ratio of 7.5 with no D-band.

DETAILED DESCRIPTION OF THE EMBODIMENT(S) OF THE INVENTION

[0012] The present invention is directed to a method for forming graphene directly on a semiconductor substrate which is a silicon wafer which comprises a dielectric layer. By direct, it is meant that the graphene is formed on the substrate without layer transfer. A layer comprising cobalt is deposited on the front surface of the wafer, which comprises a dielectric layer. Thereafter, a layer of graphene is formed on the layer comprising cobalt. The result is a multilayer article comprising a semiconductor substrate, a layer comprising cobalt, and a layer of graphene. Advantageously, the method of the present invention enables coating at least a portion of a large diameter semiconductor wafer, i.e. a silicon wafer coated with silicon dioxide, with at least a layer of graphene.

[0013] This invention relies on the high-quality, defect-free, single-layer graphene with maximum coverage on thin films of cobalt (Co) on SiO₂/Si substrate via high temperature, and low-pressure chemical vapor deposition of a carbon-containing gas on the cobalt surface. The graphene formation on Co is precipitation-based due to high carbon solubility (0.9 wt%) in Co at high temperature (1320°C). Since the grain size of Co is increased, during the high temperature growth, surface nucleation of graphene is dominant and the graphene is able to grow in large single crystal (several micrometers). Furthermore, since the cooling stage is fast, the precipitation of carbon radical forms single-layer on the surface of the Cobalt. Due to the strong adhesion of graphene and cobalt, the growth is preferably epitaxial.

I. Substrates for Layer Deposition

[0014] According to the method of the present invention, the graphene layer or layers is/are formed directly on a semiconductor substrate, i.e., without a layer transfer step. With reference now to FIG. 1A, a semiconductor substrate 10 may comprise two major, generally parallel surfaces, one of which is a front surface of the substrate and the other of which is a back surface of the substrate. A circumferential edge joins the front and back surfaces, and a central plane lies between the front and back surfaces. The substrate 10 comprises a bulk region between the front and back surfaces. Prior to any operation as described herein, the front surface and the back surface of the substrate 10 may be substantially identical. A surface is referred to as a "front surface" or a "back surface" merely for convenience and generally to distinguish the surface upon which the operations of method of the present invention are performed. In the present invention, the operations of the invention are performed on the front surface of the semiconductor substrate 10. In some embodiments of the present invention, the operations of the present invention are performed on both the front surface and the back surface of the semiconductor substrate 10.

[0015] In general, the semiconductor wafer has a diameter of at least 20 mm, more typically between 20 mm and 500 mm. In some embodiments, the diameter is at least 20 mm, at least 45 mm, at least 90 mm, at least 100 mm, at least 150 mm, at least 200 mm, at least 250 mm, at least 300 mm, at least 350 mm, or even at least 450 mm. The semiconductor wafer may have a thickness between 100 micrometers and 5000 micrometers, such as between 100 micrometers and 1500 micrometers, suitably within the range of 500 micrometers to 1000 micrometers.

[0016] In particularly preferred embodiments, the semiconductor wafer comprises a wafer sliced from a single crystal silicon wafer which has been sliced from a single crystal ingot grown in accordance with conventional Czochralski crystal growing methods. Such methods, as well as standard silicon slicing, lapping, etching, and polishing techniques are disclosed, for example, in F. Shimura, Semiconductor Silicon Crystal Technology, Academic Press, 1989, and Silicon Chemical Etching, (J. Grabmaier ed.) Springer-Verlag, N.Y., 1982. In some preferred embodiments, the semiconductor silicon substrate is a polished silicon wafer grown by the CZ method. The silicon substrate may have any crystal orientation, e.g., (100), (110), and (111).

[0017] Silicon wafer resistivity is not critical to forming a graphene layer on the substrate. However, resistivity may vary depending upon end use requirements. In view thereof, the wafer may be heavily doped, may be semi-insulating, or may have a doping profile somewhere between. The resistivity may therefore vary from milliohm or less to megaohm or more. In some embodiments, the single crystal semiconductor wafer comprises a p-type or an n-type dopant. Suitable dopants include boron (p type), gallium (p type), phosphorus (n type), antimony (n type), and arsenic (n type). The dopant concentration is selected based on the desired resistivity of the wafer. In some embodiments, the wafer types may have resistivity so that they can be characterized as any of N++ type, N+ type, N type, N- type, and N--type. Typical N+ resistivity ranges are as low as 10 milliohm-cm for Sb doping, N++ as low as 2 milliohm-cm for As doping, and N+++ as low as 1 milliohm-cm for P doping. Specification ranges are usually 2-3X for max/min due to segregation in crystal growth. In some embodiments, the wafer types may have resistivity so that they can be characterized as any of P++ type, P+ type, P type, P- type, and P--type. Typical P+ resistivity range is as low as 10 milliohm-cm and P++ as low as 5 milliohm-cm. Specification ranges are usually 1.5-2X for max/min due to segregation in crystal growth. The resistivity of the wafer may therefore vary from 0.1 milliohm-cm to 10 kiloohm-cm. In some embodiments, the resistivity may range from 0.1 milliohm-cm to 1 kiloohm-cm, such as from 0.1 milliohm-cm to 100 ohm-cm, such as from 0.1 milliohm-cm to 10 ohm-cm, or from 0.1 milliohm-cm to 1 ohm-cm. Substrate are also available in lightly doped form, such as nominal values of 1 ohm-cm or 10 ohm-cm or 100 ohm-cm, in both N-type (Phos) and P-type (Boron). Choice of substrate resistivity depends on application (for example, if substrate is used as backgate then lower resistivity is preferred) but should not impact growth of the graphene layer.

[0018] With reference now to FIG. 1B, one or more of the major surfaces of the semiconductor substrate 10 is modified with a dielectric layer 20. The dielectric layer is a silicon dioxide layer.. In preferred embodiments wherein the semiconductor substrate 10 comprises a silicon wafer, the front surface of the silicon wafer is preferably oxidized such that the front surface layer of the silicon wafer comprises a silicon dioxide (SiO₂) dielectric layer 20 having a thickness between 10 nm and 1000 nm, between 30 nm and 1000 nm, between 50 nm and 500 nm, preferably between 50 nm and 300 nm, such as between 90 nm and 300 nanometers thick, or between 90 nm and 200 nanometers thick. Deposition of the dielectric layer may be accomplished by means known in the art, such as thermal oxidation (in which some portion of the deposited semiconductor material film will be consumed) and/or CVD oxide deposition. In some embodiments, the wafer may be thermally oxidized (in which some portion of the deposited semiconductor material film will be consumed) or the film may be grown by CVD oxide deposition. In some embodiments, the wafer may be thermally oxidized in a furnace such as an ASM A400. The front surface of the silicon wafer may be thermally oxidized via wet or dry oxidation, as is known in the art. Oxidation generally occurs at temperatures between 800°C and 1200°C using water vapor and/or oxygen. The oxidizing ambient atmosphere can be a mixture of inert gas, such as Ar or N₂, and O₂. The oxygen content may vary from 1 to 10 percent, or higher. In some embodiments, the oxidizing ambient atmosphere may be up to 100% (a "dry oxidation"). In some embodiments, the ambient atmosphere may comprise a mixture of inert gas, such as Ar or N₂, and oxidizing gases, such as O₂ and water vapor (a "wet oxidation"). In an exemplary embodiment, semiconductor wafers may be loaded into a vertical furnace, such as an A400. The temperature is ramped to the oxidizing temperature with a mixture of N₂ and O₂. After the desired oxide thickness has been obtained, the O₂ is turned off and the furnace temperature is reduced and wafers are unloaded from the furnace.

[0019] In some embodiments, the semiconductor substrate 10 may comprise a dielectric layer 20 comprising silicon nitride. In some embodiments, the semiconductor substrate 10 comprises a silicon wafer, the front surface layer of which is oxidized as described above, which is followed by deposition of a silicon nitride layer. A silicon nitride layer may be deposited on the silicon oxide layer since silicon nitride advantageously forms a barrier layer to reduce diffusion of metal atoms, e.g., nickel, into the silicon oxide layer. In some embodiments, the silicon nitride layer may range in thickness between 10 nm and 1000 nm, between 30 nm and 1000 nm, or from 50 nanometers to 1000 nanometers. In some embodiments, the silicon nitride layer may range in thickness from 50 nanometers to 500 nanometers. In some embodiments, the silicon nitride layer may range in thickness from 70 nanometers to 250 nanometers. The thickness of the silicon nitride layer is determined in view of the trade-off between device performance, such that thinner layers are preferred, and an effective barrier to prevent in-diffusion of impurities into the semiconductor substrate, such that thicker layers are preferred. Silicon nitride may be deposited on the surface of the silicon oxide layer by contacting the substrate with an atmosphere of nitrogen at elevated temperature. For example, the semiconductor may be exposed to nitrogen gas or ammonia at temperatures ranging from 700°C to 1300°C. In some embodiments, silicon nitride is formed by chemical vapor deposition at 800°C. In order to incorporate nitrogen and oxygen to deposit silicon oxynitride, the atmosphere may comprise a combination of oxygen and nitrogen, and the temperature may be increased to a temperature between 1100°C and 1400°C. An alternative nitrogen source is ammonia.

[0020] In some embodiments, the semiconductor substrate 10 comprising the dielectric layer 20 is cleaned prior to deposition of the layer comprising cobalt, for example to remove organic matter or other impurities. A suitable cleaning solution is the piranha solution, which comprises H₂SO₄ (concentrated) and H₂O₂ (30% solution), typically in a 3:1 ratio, but other ratios, such as 4:1 or 7:1 are suitable. Cleaning duration is suitably between 15 minutes and 2 hours.

II. Deposition of Layer comprising Cobalt

[0021] With reference to FIG. 1C, according to the method of the present invention, the major surface of the semiconductor substrate 10, i.e., a silicon wafer comprising a dielectric layer 20, i.e., a silicon oxide layer and optionally a silicon nitride layer and/or a silicon oxynitride layer, is coated with a layer comprising cobalt 30. In some embodiments, the layer comprising cobalt 30 may be deposited over the entire major surface of the semiconductor substrate 10 comprising a dielectric layer 20. In some embodiments, the layer comprising cobalt 30 may be deposited over a portion of the semiconductor substrate 10 comprising a dielectric layer 20, such as at least 10% of the total area of the major surface, or at least 25% of the total area, or at least 50% of the total area, or at least 75% of the total area. In some embodiments, the layer comprising cobalt 30 may be deposited over the entire major surface of the semiconductor substrate 10 comprising a dielectric layer 20 and thereafter metal may be removed selectively, using conventional lithography techniques, to thereby leave a desired pattern of metal deposition on the major surface of the substrate. The front surface layer of the semiconductor substrate 10 comprising a dielectric layer 20 is coated with a layer comprising cobalt 30. In some embodiments, the semiconductor substrate 10 comprises a silicon wafer having a silicon dioxide front surface layer, and the layer comprising cobalt 30 is deposited onto the silicon dioxide front surface layer. The silicon dioxide layer may be completely coated with cobalt, partially coated with cobalt, or coated with a cobalt pattern by lithography. In some embodiments, the semiconductor substrate 10 comprises a silicon wafer having a silicon dioxide layer and a silicon nitride front surface layer, and the layer comprising cobalt 30 is deposited onto the silicon nitride front surface layer. The silicon nitride layer may be completely coated with cobalt, partially coated with cobalt, or coated with a cobalt pattern by lithography. For the sake of convenience, the surfaces of the layer comprising cobalt 30 may be referred to as a "front cobalt layer surface" and "a back cobalt layer surface." Herein, the back cobalt layer surface is in contact with the dielectric layer 20. The graphene layer is deposited on the front cobalt layer surface. A bulk metal region is between the front and back cobalt layer surfaces.

[0022] The layer comprising cobalt 30 is deposited by techniques known in the art, including sputtering, evaporation, electron-beam evaporation, ion beam evaporation, chemical vapor deposition, electrolytic plating, and metal foil bonding. In some embodiments, the layer comprising cobalt 30 is deposited by sputtering or evaporation using, e.g., a Sputtering and Metal evaporation Unit. In some embodiments, a cobalt layer may be deposited via electron-beam evaporation technique in a clean room environment, using, for example, a Varian Electron Beam Evaporator. Electrolytic metal plating may occur according to the methods described by Supriya, L.; Claus, R. O. Solution-Based Assembly of Conductive Gold Film on Flexible Polymer Substrates: Langmuir 2004, 20, 8870-8876. In some embodiments, the layer comprising cobalt 30 may be deposited by chemical vapor deposition at relatively low temperatures, such as between 100°C and 300°C, such as 200°C. Preferably, the layer comprising cobalt 30 is between 50 nanometers and 20 micrometers thick, such as between 50 nanometers and 10 micrometers thick, such as between 50 nanometers and 1000 nanometers (1 micrometer), such as between 100 nanometers and 500 nanometers, such as between 100 nanometers and 400 nanometers, such as 300 nanometers or 500 nanometers.

[0023] The use of cobalt for the deposition of a graphene layers is advantageous since, unlike copper (with carbon solubility of 0.01 wt% at 1084°C), the graphene formation in Co is precipitation-based. This is due to the high carbon solubility (0.9 wt%) in Co at high temperature (1320°C). Accordingly, the carbon prefers to precipitate near the grain boundaries during cooling. It has been observed that high temperature growth enhances the rapid precipitation and surface nucleation so that graphene nuclei try to attach to each other preferentially in the same orientation resulting epitaxial growth of large coverage single-layer graphene.

[0024] After deposition of the metal film, the multilayer structure is cleaned. The multilayer structure comprises the semiconductor substrate 10, dielectric layer 20 (i.e., silicon dioxide, which may additionally comprise a silicon nitride layer), and a layer comprising cobalt 30. The multilayer structure may be cleaned by heating the structure in a vacuum furnace in a reducing atmosphere. A chemical vapor deposition system may be used where only baking under high vacuum is performed. In preferred embodiments, the reducing atmosphere comprises hydrogen gas or other reducing gas. An inert carrier gas may be used, such as argon or helium. The temperature during exposure to the reducing atmosphere is between 800°C and 1200°C, such as 1000°C. The pressure is preferably sub-atmospheric, such as less than 100 Pa (less than 1 Torr), preferably less than 1 Pa (less than 0.01 Torr), even more preferably less than 0.1 Pa (less than 0.001 Torr), and even more preferably less than 0.01 Pa (less than 0.0001 Torr). The cleaning anneal may adjust the grain size of the metal film, e.g., increase the grain size at elevated temperatures.

[0025] After heat treatment, the multilayer substrate (FIG. 1C) is analyzed by X-ray diffraction to confirm crystallographic orientations. The X-ray diffraction analysis reveals a single crystalline Co film on SiO₂/Si substrate, which enables the formation of very-high quality graphene. Annealing the multilayer structure after deposition of the layer comprising cobalt promotes epitaxial growth, as confirmed by analyzing the Co surface before and after annealing via X-ray diffraction (XRD). See FIGS. 2A through 2D. That is, before anneal, the XRD pattern for room temperature (RT) evaporated Co reveals three diffraction peaks. See FIG. 2A. The strong peak at 44° corresponds to either hexagonal closed packed (hcp) Co(0002) or face centered cubic (fcc) Co(111). See Ago et al., ACS Nano, 4, 7407 (2010). The XRD pattern for non-annealed cobalt also reveals another two weak peaks at 42° (Co(200)) and 47° (hcp Co(101)). See J. Mater. Chem., 2009, 19, 7371-7378. These results confirm the polycrystalline nature of the evaporated Co surface prior to anneal. The layer comprising cobalt that has been subjected to anneal reveals a different XRD pattern. For example, the Co(0002) or Co(111) peak at 44° for CVD annealed Co (1000°C for 10 min) become stronger and narrower at its full width. See FIGS. 2B and 2C. Additionally, anneal causes the weak peaks at 42° and 47° to disappear, which implies improvement in the crystallinity of the annealed cobalt layer. A weak peak at 52° appears, which may be due to Co(200). The XRD pattern of Co surface after graphene formation shows the Co(0002) or Co(111) peak with little less strength because of formation of the graphene layer. See FIG. 2D.

III. Deposition of Graphene Layer

[0026] According to some embodiments of the method of the present invention and with reference to FIG. 1C, the multilayer structure comprising the semiconductor substrate 10, a dielectric layer 20, and a layer comprising cobalt 30 may be exposed to a carbon-containing gas to thereby nucleate atomic carbon on the front cobalt layer surface of the layer comprising cobalt 30 and between crystalline cobalt grains.

[0027] In some embodiments, the structure is placed in an appropriate chamber, such as a CVD system, and brought to a vacuum, such as a pressure of 0.1 Pa (1 mTorr). Thereafter, the structure is brought to the appropriate anneal temperature in a reducing atmosphere. The reducing atmosphere may comprise hydrogen. It may comprise between 1% and 99% hydrogen, such as between 70% and 99% hydrogen, preferably 95% hydrogen, balance inert gas.

[0028] In some embodiments, a carbon-containing gas flow may be added to the reducing gas flow. The carbon-containing gas may be selected from among volatile hydrocarbons, for example, methane, ethane, ethylene, acetylene, propane, propylene, propyne, butane, isobutane, butylenes, butynes. The carbon-containing gas, e.g., methane, is a source of carbon that may precipitate into graphene according to the process of the present invention. The atmosphere may be a reducing atmosphere, further comprising a reducing gas, such as hydrogen. In some embodiments, the gas may comprise methane gas and hydrogen gas in a ratio from 1:1 to 200:1, such as between 1:1 and 100:1, such as 144:15. The minimum temperature during carbon absorption and/or adsorption is generally at least 500°C. The maximum temperature during carbon absorption and/or adsorption is generally no more than 1100°C. In general, the temperature is preferably between 700°C and 1000°C. In general, the pressure inside the reaction chamber during hydrogen gas/methane flow is between 10 Pa (0.1 Torr) and 1500 Pa (100 Torr), such as between 50 P (0.4 Torr) and 150 Pa (1 Torr).

[0029] Optionally, after the flow of gases is stopped, the structure may be held at the absorption temperature in order to promote equilibrium of nucleation and adsorption between the crystalline cobalt grains. The duration of equilibration after the flow of carbon-containing gas is stopped may range from 5 seconds to 3600 seconds, such as 600 seconds to 1800 seconds. In some embodiments, the duration of carbon in-diffusion is very short, such as 10 seconds.

[0030] Thereafter, the multilayer structure is rapidly cooled, such as at a rate of at least 10°C/min, at least 50°C/min, at least 100°C/min. In general, the pressure inside the reaction chamber during cooling is between 10 Pa (0.1 Torr) and 1500 Pa (100 Torr), such as between 50 Pa (0.4 Torr) and 150 Pa (1 Torr). The atmosphere is preferably a reducing atmosphere, which may comprise between 1% and 99% hydrogen, such as between 70% and 99% hydrogen, preferably 95% hydrogen, balance inert gas. High temperature growth and rapid cooling enhance the precipitation and surface nucleation fast so that graphene nuclei try to attach each other preferentially in the same orientation resulting in epitaxial growth of large coverage, high quality single-layer graphene. See FIG. 1D, depicting a multilayer structure comprising the semiconductor substrate 10, the dielectric layer 20, the layer comprising cobalt 30, and the single-layer graphene 40.

IV. Graphene Layer Quality Testing

[0031] The deposited and cooled graphene layer 40 in contact with the layer comprising cobalt 30 may be analyzed by Raman spectroscopy to determine the quality of the deposited layer. Raman spectroscopy is a commanding technique to ascertain the number of graphene layers and defects. Raman spectroscopy and 2D mapping to determine the quality of the deposited graphene may be performed with a 532 nm excitation laser. The quality of the deposited graphene may be determined by reference to several bands in the resultant Raman spectrum. See FIG. 3. These bands include: (i) the D band (∼1,350 cm^-1) attributing to the breathing mode of sp² carbons activated by presence of defects, (ii) the G band (∼1,580 cm^-1) representing the E_2g mode of the C-C stretching vibration in the graphitic lattice at the γ-point, and (iii) the 2D band (∼2,690 cm^-1) due to the second order two-phonon process in graphene. Additionally, in the representative sample surface (the D-band map), it is also noticed that the intensity ratio i.e. I_D/I_G are negligibly small and near the background level for most of the graphene area, indicating low defect contents and an absence of crystal grain boundaries, which also indicates the formation of single grain graphene. The G-band map and 2D-band map clearly show the presence of single-layer graphene in the whole sample surface. The quality of a single-layer graphene may be determined by the ratio of the intensities of Raman 2D to G-band peaks (I_2D/I_G≥2). This ratio of the intensities of Raman 2D to G-band peaks may be referred to herein as a "quality factor." High quality graphene exhibits a Raman 2D to G-band peak ratio (I_2D/I_G) or quality factor ratio of at least 4, such as at least 7, at least 7.5, at least 8, or even at least 10. Additionally, in high quality graphene, no defect induced D-band is observed. In comparison, I_2D/I_G for high-quality exfoliated graphene is 3 - 4.

[0032] The graphene may be further quality tested by transferring to transmission electron microscopy grids for analysis of the selected area electron diffraction (SAED) patterns. The SAED patterns confirm the hexagonal nature of graphene indicating the d-spacing of 2.15 Å.

[0033] The following examples are provided to further illustrate the present invention.

Example 1. Cobalt Deposition on Silicon Wafer Substrate

[0034] Suitable silicon wafer substrates include:

1. A silicon wafer (n++ type) comprising a SiO₂ dielectric having a thickness of 90 nm,

2. A silicon wafer (n++ type) comprising a SiO₂ dielectric having a thickness of 300 nm,

3. A silicon wafer (p+ type) comprising a SiO₂ dielectric having a thickness of 90 nm, and

4. A silicon wafer (p+ type) comprising a SiO₂ dielectric having a thickness of 300 nm.

[0035] The bulk silicon substrates were obtained from SunEdison Semiconductor, Ltd. (St. Peters, MO). The substrates may be provided with thermal silicon oxide layer, or they may be provided without a thermal oxide layer.

[0036] The silicon wafers were cleaned using Piranha solution (H₂SO₄:H₂O₂ = 3:1) as necessary for durations between 15 minutes and 2 h. After cleaning and rinsing, a thin film of cobalt having a thickness between about 100 nanometers and about 300 nanometers were deposited on the silicon oxide layers of each wafer. The cobalt layer was deposited via electron-beam evaporation technique in a clean room environment. The instrument used was a Varian Electron Beam Evaporator. The source of cobalt, i.e., the cobalt target, was cobalt pellets having 99.99% purity and approximate dimensions of 1/4" diameter x 1/4" length. The metal evaporation parameters in the reaction chamber were: Pressure: 10^-7 Torr; Voltage: 10 KV; Current: 45 mA; Tooling factor: 140%; Z-Ratio: 0.343; Density: 8.9 kg/m³; Thickness of the deposited cobalt: 100 nm and 300 nm.

Example 2. Quality Testing of Cobalt Layer

[0037] The crystallinity of the cobalt layer is determined both before anneal and after anneal. Crystallinity of the cobalt layer was measured by X-ray diffraction and analysis of the XRD peaks. The multilayer structure (Co/SiO₂/Si) prepared according to Example 1 is heat-treated and subsequently analyzed via X-ray diffraction (XRD) to confirm crystallographic orientations. See FIGS. 2A through 2D, which are X-ray diffraction spectra of deposited cobalt layers. FIG. 2A is the spectra after E-beam evaporation according to the parameters set forth in Example 1. FIG. 2B is the spectra after heating to 1000°C. FIG. 2C is the spectra after heating to 1000°C and annealing for 10 min. FIG. 2D is the spectra after graphene growth. The X-ray diffraction analysis reveals a single crystalline Co film on SiO₂/Si substrate, which enables the formation of very-high quality graphene.

[0038] The XRD pattern for room temperature (RT) evaporated Co is performed in which three diffraction peaks were observed. See FIG. 2A. The strong peak at 44° corresponds to either hexagonal closed packed (hcp) Co(0002) or face centered cubic (fcc) Co(111) and another two weak peaks are also observed at 42° (CoO (200)) and 47° (hcp Co(101)). These peaks confirm the polycrystalline nature of evaporated Co surface.

[0039] The structure is subjected to anneal at 1000°C for 10 min. See FIG. 2B (at temperature and before anneal) and FIG. 2C (after anneal at 1000°C for 10 minutes). The Co(0002) and Co(111) peak at 44° in the annealed cobalt layer become stronger and narrower at it full width. The weak peaks at 42° and 47° disappear. The change in XRD peaks confirms improvement in the crystallinity of Co. A weak peak at 52° appears, which may be due to Co(200).

Example 3. Growth of graphene on the prepared substrate via chemical vapor deposition (CVD)

[0040] A CVD system was designed where the substrate (1x1 inches) was placed in a split tube furnace with a fused quartz tube (outside diameter of 1 inch). The precursor gases included methane (CH₄) and hydrogen (H₂). Initially, the chamber is allowed to achieve a base pressure of 1 mTorr. Substrates prepared according to Example 1 were directly placed in the center of quartz tube's heating zone and heated to 1000°C in a hydrogen atmosphere at a flow rate of 100 standard cubic centimeters per minute (SCCM) to restrict further oxidation. Right after the temperature reaches 1000°C, the substrates were annealed for 5-10 minutes at the same temperature at a pressure of 500 mTorr in a hydrogen atmosphere at a flow rate of 15 standard cubic centimeters per minute (SCCM). To nucleate carbon on the cobalt surface and between cobalt grains, the gas composition was changed to CH₄:H₂ at a vol:vol ratio of 144:15. The pressure during methane:hydrogen flow was 1 Torr for 10 minutes. This was followed by cooling at a rate of about 100°C/min. See FIG. 2D for the XRD spectra of the structure after deposition of graphene.

Example 4. Quality Testing of Epitaxially Deposited Graphene on Cobalt

[0041] The quality of the epitaxially deposited graphene on cobalt was tested by Raman spectroscopy and 2D mapping with a 532 nm excitation laser. See FIG. 3, which is Raman spectroscopic analysis of single-layer graphene on Co surfaces. The spectrum shows graphene's characteristic G and 2D-bands with ratio of 7.5 with no D-band. The Raman spectrum of the epitaxial graphene exhibited: (i) a negligible D band (∼1,350 cm^-1) attributing to the breathing mode of sp² carbons activated by presence of defects, (ii) a strong and sharp G band (∼1,580 cm^-1) representing the E_2g mode of the C-C stretching vibration in the graphitic lattice at the γ-point, and (iii) a strong and sharp 2D band (∼2,690 cm^-1) due to the second order two-phonon process in graphene. In the representative sample surface (the D-band map), it is also noticed that the intensity ratio, i.e. I_D/I_G are negligibly small and near the background level for most of the graphene area, indicating low defect contents and an absence of crystal grain boundaries, which also claims the formation of single grain graphene. The G-band map and 2D-band map clearly show the presence of single-layer graphene in the whole sample surface. The quality of a single-layer graphene may be determined by the ratio of the intensities of Raman 2D to G-band peaks (I_2D/I_G≥2). A superior Raman 2D to G-band peak ratio (I_2D/I_G) > 7.5 and no defect induced D-band is observed. In comparison, I_2D/I_G for high-quality exfoliated graphene is about 3 - 4.

[0042] The graphene is further transferred to transmission electron microscopy grids for analysis of the selected area electron diffraction (SAED) patterns. The SAED patterns confirm the hexagonal nature of graphene indicating the d-spacing of 2.15 Å.

Claims

1. A method of forming a multilayer structure, the method comprising:

depositing a layer comprising cobalt on a dielectric layer comprising a silicon dioxide layer in contact with a front wafer surface of a silicon wafer, wherein the layer comprising cobalt is deposited by a technique selected from the group consisting of sputtering, evaporation, electron-beam evaporation, ion beam evaporation, chemical vapor deposition, electrolytic plating, and metal foil bonding to thereby prepare a structure comprising the silicon wafer, the dielectric layer, and the layer comprising cobalt;

annealing the structure comprising the silicon wafer, the dielectric layer comprising a silicon dioxide layer, and the layer comprising cobalt in a reducing atmosphere at a temperature between 800°C and 1200°C to thereby prepare the layer comprising single crystalline cobalt; and

epitaxially depositing a graphene layer on the layer comprising single crystalline cobalt, wherein the graphene layer has a single mono-atomic thickness.

2. The method of claim 1 wherein the silicon wafer comprises a dopant selected from the group consisting of boron (p type), gallium (p type), phosphorus (n type), antimony (n type), and arsenic (n type), and any combination thereof.

3. The method of claim 1 or 2 wherein the layer comprising single crystalline cobalt comprises a front cobalt layer surface, a back cobalt layer surface, and a bulk cobalt layer region between the front cobalt layer surface and the back cobalt layer surface, wherein the back cobalt layer surface is in contact with the dielectric layer.

4. The method of any one of claims 1 through 3 wherein the layer comprising single crystalline cobalt is between about 50 nanometers and about 20 micrometers thick, preferably between about 50 nanometers and about 10 micrometers thick, more preferably between about 50 nanometers and about 1 micrometer thick.

5. The method of any one of claims 1 through 4 wherein the layer comprising graphene having a single mono-atomic thickness is epitaxially deposited on the layer comprising single crystalline cobalt according to the following steps:

contacting the front cobalt layer surface of the layer comprising single crystalline cobalt with a carbon-containing gas in a reducing atmosphere at a temperature sufficient to nucleate carbon atoms on the front cobalt layer surface; and

precipitating carbon atoms to thereby epitaxially deposit the layer of graphene having a single mono-atomic thickness on the front cobalt layer surface.

6. The method of claim 5 wherein the carbon atoms are precipitated by cooling the layer comprising single crystalline cobalt in contact with a dielectric layer.

7. The method of claims 5 or 6 wherein the carbon-containing gas is selected from the group consisting of methane, ethane, ethylene, acetylene, propane, propylene, propyne, butanes, butylenes, butynes, and combinations thereof.

8. The method of any one of claims 5 through 7 wherein the reducing atmosphere comprises hydrogen gas.

9. The method of claim 8 wherein the carbon-containing gas comprises methane and a ratio of the methane and the hydrogen gas is from 1:1 to 200:1.

10. The method of claim 8 wherein the carbon-containing gas comprises methane and a ratio of the methane and the hydrogen gas is 144:15.

11. The method of any one of claims 1 through 10 wherein the graphene layer having a single mono-atomic thickness has a quality factor of at least 4, wherein the quality factor is determined by the ratio of the intensities of the Raman 2D band peak to the Raman G-band peak (I_2D/I_G).

12. The method of any one of claims 1 through 10 wherein the graphene layer having a single mono-atomic thickness has a quality factor of at least 7.5, wherein the quality factor is determined by the ratio of the intensities of the Raman 2D band peak to the Raman G-band peak (I_2D/I_G).

13. The method of claim 12 wherein a Raman spectrum of the graphene layer exhibits a negligible D band.

Ansprüche

1. Ein Verfahren zur Herstellung einer Mehrschicht-Struktur, das Verfahren umfassend:

Ablagern einer kobalthaltigen Schicht auf einer dielektrischen Schicht umfassend eine Siliciumdioxidschicht in Kontakt mit einer Wafervorderseite eines Siliciumwafers, wobei die kobalthaltige Schicht abgelagert wird mit einer Technik ausgewählt aus der Gruppe bestehend aus Sputtern, Verdampfung, Elektronenstrahl-Verdampfung, Ionenstrahl-Verdampfung, Chemical Vapor Deposition, Elektrolytbeschichtung und Metallfolien-Bonding, um so eine Struktur herzustellen, die den Siliciumwafer, die dielektrische Schicht und die kobalthaltige Schicht umfasst;

Annealen der Struktur umfassend den Siliciumwafer, die dielektrische Schicht umfassend eine Siliciumdioxidschicht, und die kobalthaltige Schicht in einer reduzierenden Atmosphäre bei einer Temperatur zwischen 800°C und 1200°C, um so die Schicht umfassend Einkristall-Kobalt zu erzeugen; und

Epitaxial-Ablagerung einer Graphenschicht auf der Schicht umfassend das Einkristall-Kobalt, wobei die Graphenschicht eine monoatomischen Dicke hat.

2. Das Verfahren gemäß Anspruch 1 wobei der Siliciumwafer ein Dotiermittel enthält, ausgewählt aus der Gruppe bestehend aus Bor (p-Typ), Gallium (p-Typ), Phosphor (n-Typ), Antimon (n-Typ), und Arsen (n-Typ) und jeglicher Kombination davon.

3. Das Verfahren gemäß Anspruch 1 oder 2 wobei die Schicht umfassend das Einkristall-Kobalt eine Kobaltschicht-Frontoberfläche, eine Kobaltschicht-Rückseitenoberfläche und eine Kobaltschicht-Bulkregion zwischen der Kobaltschicht-Frontoberfläche und der Kobaltschicht-Rückseitenoberfläche aufweist, wobei Kobaltschicht-Rückseitenoberfläche mit der dielektrischen Schicht in Kontakt ist.

4. Das Verfahren gemäß irgendeinem der Ansprüche 1 bis 3 wobei die Schicht umfassend das Einkristall-Kobalt zwischen etwa 50 Nanometern und etwa 20 Mikrometern dick ist, bevorzugt zwischen etwa 50 Nanometern und etwa 10 Mikrometern dick ist, bevorzugter zwischen etwa 50 Nanometern und etwa 1 Mikrometer dick ist.

5. Das Verfahren gemäß irgendeinem der Ansprüche 1 bis 4 wobei die graphenhaltige Schicht mit der monoatomischen Dicke epitaxial abgelagert wird auf der Schicht umfassend das Einkristall-Kobalt, gemäß den folgenden Schritten:

Kontaktieren der Frontoberfläche der Kobaltschicht der Schicht umfassend das Einkristall-Kobalt mit einem kohlenstoffhaltigen Gas in einer reduzierenden Atmosphäre bei einer Temperatur, die ausreicht um Kohlenstoffatome auf der Frontoberfläche der Kobaltschicht als Kristallisationskeime zu binden; und

Präzipitieren von Kohlenstoffatomen, um so die graphenhaltige Schicht mit der monoatomischen Dicke auf der Frontoberfläche der Kobaltschicht epitaxial abzulagern.

6. Das Verfahren gemäß Anspruch 5 wobei die Kohlenstoffatome präzipitiert werden indem die Schicht umfassend das Einkristall-Kobalt in Kontakt mit einer dielektrischen Schicht gekühlt wird.

7. Das Verfahren gemäß Anspruch 5 oder 6 wobei das kohlenstoffhaltige Gas ausgewählt ist aus der Gruppe bestehend aus Methan, Ethan, Ethylen, Acetylen, Propan, Propylen, Propin, Butanen, Butylenen, Butinen und Kombinationen davon.

8. Das Verfahren gemäß irgendeinem der Ansprüche 5 bis 7 wobei die reduzierende Atmosphäre Wasserstoffgas enthält.

9. Das Verfahren gemäß Anspruch 8 wobei das kohlenstoffhaltige Gas Methan enthält und das Verhältnis von Methan zu Wasserstoffgas von 1:1 bis 200:1 beträgt.

10. Das Verfahren gemäß Anspruch 8 wobei das kohlenstoffhaltige Gas Methan enthält und das Verhältnis von Methan zu Wasserstoffgas 144:15 ist.

11. Das Verfahren gemäß irgendeinem der Ansprüche 1 bis 10 wobei die graphenhaltige Schicht mit der monoatomischen Dicke einen Qualitätsfaktor von wenigstens 4 hat, wobei der Qualitätsfaktor bestimmt wird durch das Verhältnis der Intensitäten des Raman-2D-Bandenpeaks zum Raman-G-Bandenpeak (I_2D/I_G).

12. Das Verfahren gemäß irgendeinem der Ansprüche 1 bis 10 wobei die graphenhaltige Schicht mit der monoatomischen Dicke einen Qualitätsfaktor von wenigstens 4 hat, wobei der Qualitätsfaktor bestimmt wird durch das Verhältnis der Intensitäten des Raman-2D-Bandenpeaks zum Raman-G-Bandenpeak (I_2D/I_G).

13. Das Verfahren gemäß Anspruch 12 wobei ein Ramanspektrum der Graphenschicht eine vernachlässigbare D-Bande aufweist.

Revendications

1. Un procédé de formation d'une structure multicouche, le procédé comprenant :

le fait de déposer une couche comprenant du cobalt sur une couche diélectrique comprenant une couche de dioxyde de silicium en contact avec une surface de plaquette avant d'une plaquette de silicium, la couche comprenant du cobalt étant déposée par une technique choisie dans le groupe constitué par la pulvérisation, l'évaporation, l'évaporation par faisceau d'électrons, l'évaporation par faisceau d'ions, dépôt chimique en phase vapeur, placage électrolytique et liaison de feuille métallique, pour préparer ainsi une structure comprenant la plaquette de silicium, la couche diélectrique et la couche comprenant du cobalt ;

le fait de recuire la structure comprenant la plaquette de silicium, la couche diélectrique comprenant une couche de dioxyde de silicium, et la couche comprenant du cobalt dans une atmosphère réductrice à une température comprise entre 800° C et 1200° C pour préparer ainsi la couche comprenant du cobalt monocristallin ; et

le fait de déposer de façon épitaxiale une couche de graphène sur la couche comprenant du cobalt monocristallin, la couche de graphène ayant une seule épaisseur monoatomique.

2. Le procédé selon la revendication 1, dans lequel la plaquette de silicium comprend un dopant choisi dans le groupe constitué du bore (type p), du gallium (type p), du phosphore (type n), de l'antimoine (type n) et de l'arsenic (type n), et toute combinaison de ceux-ci.

3. Le procédé selon la revendication 1 ou la revendication 2, dans lequel la couche comprenant du cobalt monocristallin comprend une surface avant de couche de cobalt, une surface arrière de couche de cobalt et une zone pleine de couche de cobalt entre la surface avant de couche de cobalt et la surface arrière de couche de cobalt, la surface arrière de couche de cobalt étant en contact avec la couche diélectrique.

4. Le procédé selon l'une quelconque des revendications 1 à 3, dans lequel la couche comprenant du cobalt monocristallin a une épaisseur comprise entre environ 50 nanomètres et environ 20 micromètres, de préférence entre environ 50 nanomètres et environ 10 micromètres d'épaisseur, de façon encore préférée entre environ 50 nanomètres et environ 1 micromètre d'épaisseur.

5. Le procédé selon l'une quelconque des revendications 1 à 4, dans lequel la couche comprenant du graphène ayant une seule épaisseur monoatomique est déposée de façon épitaxiale sur la couche comprenant du cobalt monocristallin selon les étapes suivantes :

mettre en contact de la surface avant de couche de cobalt de la couche comprenant du cobalt monocristallin avec un gaz contenant du carbone dans une atmosphère réductrice à une température suffisante pour nucléer des atomes de carbone sur la surface avant de couche de cobalt ; et

précipiter des atomes de carbone pour, ainsi, déposer de façon épitaxiale la couche de graphène ayant une seule épaisseur monoatomique sur la surface avant de couche de cobalt.

6. Le procédé selon la revendication 5, dans lequel les atomes de carbone sont précipités en refroidissant la couche comprenant du cobalt monocristallin en contact avec une couche diélectrique.

7. Le procédé selon les revendications 5 ou 6, dans lequel le gaz contenant du carbone est choisi dans le groupe consistant en du méthane, de l'éthane, de l'éthylène, de l'acétylène, du propane, du propylène, du propyne, des butanes, des butylènes, des butynes et les combinaisons de ceux-ci.

8. Le procédé selon l'une quelconque des revendications 5 à 7, dans lequel l'atmosphère réductrice comprend de l'hydrogène gazeux.

9. Le procédé selon la revendication 8, dans lequel le gaz contenant du carbone comprend du méthane, et un rapport entre le méthane et l'hydrogène gazeux est de 1:1 à 200:1.

10. Le procédé selon la revendication 8, dans lequel le gaz contenant du carbone comprend du méthane et un rapport du méthane et de l'hydrogène gazeux est de 144:15.

11. Le procédé selon l'une quelconque des revendications 1 à 10, dans lequel la couche de graphène ayant une seule épaisseur monoatomique a un facteur de qualité d'au moins 4, le facteur de qualité étant déterminé par le rapport des intensités du pic de bande Raman 2D au pic de bande Raman G (I_2D/I_G).

12. Le procédé selon l'une quelconque des revendications 1 à 10, dans lequel la couche de graphène ayant une seule épaisseur monoatomique a un facteur de qualité d'au moins 7,5, le facteur de qualité étant déterminé par le rapport des intensités du pic de bande Raman 2D au pic de bande Raman G (I_2D/I_G).

13. Le procédé selon la revendication 12, dans lequel un spectre Raman de la couche de graphène présente une bande D négligeable.

Drawing