EP 0142414 B1 19890322 - ION SOURCE, IN PARTICULAR FOR HIGHLY CHARGED METALLIC IONS, WHOSE ION CURRENT IS CONTROLLED
Title (en)
ION SOURCE, IN PARTICULAR FOR HIGHLY CHARGED METALLIC IONS, WHOSE ION CURRENT IS CONTROLLED
Publication
Application
Priority
FR 8316465 A 19831017
Abstract (en)
[origin: US4582997A] The invention relates to a device for regulating an ionic current, particularly a highly charged metal ion current, obtained by vaporizing and then ionizing a solid material in an ultra-high frequency cavity with the aid of a hot electron plasma confined in said cavity. This plasma is produced by ionizing a gas as a result of the combined action of a high frequency electromagnetic field and a magnetic field, whose amplitude is such that the electron cyclotron resonance is satisfied. The device inter alia comprises a pulse generator, whereof the useful cycle is regulated in order to pulse the electromagnetic field and control its mean power, a valve for modifying the gas flow entering the cavity and means for controlling said valve in such a way that the pressure prevailing in the cavity remains constant.
IPC 1-7
IPC 8 full level
H01J 27/18 (2006.01); H05H 1/18 (2006.01)
CPC (source: EP US)
H01J 27/18 (2013.01 - EP US)
Designated contracting state (EPC)
DE GB NL
DOCDB simple family (publication)
EP 0142414 A2 19850522; EP 0142414 A3 19860604; EP 0142414 B1 19890322; DE 3477444 D1 19890427; FR 2553574 A1 19850419; FR 2553574 B1 19851227; JP S60101843 A 19850605; US 4582997 A 19860415
DOCDB simple family (application)
EP 84402080 A 19841016; DE 3477444 T 19841016; FR 8316465 A 19831017; JP 21531784 A 19841016; US 65931584 A 19841010