EP 0757372 A1 19970205 - Field emission display fabrication method
Title (en)
Field emission display fabrication method
Title (de)
Herstellungsverfahren einer Feldemissionsanzeigevorrichtung
Title (fr)
Procédé de fabrications d'un dispositif de visualisation à émission de champ
Publication
Application
Priority
US 547595 P 19950731
Abstract (en)
A process for fabricating vacuum microelectronic devices (especially field-emission displays) using a maskless self-aligned dense patterning step to define the emitter locations. This maskless patterning step is performed by applying charged particles to a pattern-transfer layer. Coulombic repulsion provides some self-regulating control of spacing, to approximate uniform density. Once the particles have thus been deposited, they can be used as the mask for an etching technique which will form the pointed cathode structures used for field emission displays. Thus, the present invention provides maskless patterning of one key step, and a corresponding reduction in cost. <IMAGE>
IPC 1-7
IPC 8 full level
B81B 1/00 (2006.01); B81C 5/00 (2006.01); B81C 99/00 (2010.01); H01J 9/02 (2006.01); H01J 31/12 (2006.01)
CPC (source: EP)
H01J 9/025 (2013.01)
Citation (search report)
- [A] US 5312514 A 19940517 - KUMAR NALIN [US]
- [A] WO 9119023 A2 19911212 - SAVIN CORP [US]
- [A] HUANG Z ET AL: "200-NM GATED FIELD EMITTERS", IEEE ELECTRON DEVICE LETTERS, vol. 14, no. 3, 1 March 1993 (1993-03-01), pages 121/122, XP000424038
Designated contracting state (EPC)
DE FR GB IT
DOCDB simple family (publication)
DOCDB simple family (application)
EP 96302725 A 19960418; JP 20179396 A 19960731