Global Patent Index - EP 1274880 A2

EP 1274880 A2 20030115 - METHOD FOR THE SELECTIVE, METAL-BASED ACTIVATION OF SUBSTRATE SURFACES FOR THE WET-CHEMICAL METAL DEPOSITION WITHOUT EXTERNAL CURRENT AND A MEANS THEREFORE

Title (en)

METHOD FOR THE SELECTIVE, METAL-BASED ACTIVATION OF SUBSTRATE SURFACES FOR THE WET-CHEMICAL METAL DEPOSITION WITHOUT EXTERNAL CURRENT AND A MEANS THEREFORE

Title (de)

VERFAHREN ZUR SELEKTIVEN, METALLBASIERTEN AKTIVIERUNG VON SUBSTRATOBERFLÄCHEN FÜR DIE NASSCHEMISCHE, AUSSENSTROMLOSE METALLABSCHEIDUNG UND MITTEL HIERFÜR

Title (fr)

PROCEDE D'ACTIVATION SELECTIVE A BASE METALLIQUE DE SURFACES DE SUBSTRATS POUR LE DEPOT METALLIQUE PAR VOIE CHIMIQUE HUMIDE SANS COURANT EXTERIEUR ET MOYEN CORRESPONDANT

Publication

EP 1274880 A2 20030115 (DE)

Application

EP 01929548 A 20010411

Priority

  • DE 10017887 A 20000411
  • DE 10113857 A 20010321
  • EP 0104195 W 20010411

Abstract (en)

[origin: WO0177409A2] The invention relates to a method for the selective metal-based activation of substrate surfaces for the wet-chemical metal deposition without external current. The inventive method is characterised in that the substrate surface is activated by means of an activator metal which, as such or in the form of a precursor, has been selectively transported to the location of the surface by means of vesicles, whereby said location has to be activated. The invention also relates to a vesicle mixture comprising vesicles that are filled with an activator metal precursor and to vesicles that are filled with a reaction partner for the activator metal precursor. The reaction partner can convert the activator metal precursor into activator metal as soon as the vesicle membranes are opened. Said vesicle mixture is present as such or suspended in a suspension agent and is suitable for use in said method.

IPC 1-7

C23C 18/16

IPC 8 full level

B01J 13/04 (2006.01); C23C 18/16 (2006.01); C23C 18/30 (2006.01); H05K 3/18 (2006.01)

CPC (source: EP)

B01J 13/04 (2013.01); C23C 18/1608 (2013.01); C23C 18/30 (2013.01); H05K 3/182 (2013.01)

Citation (search report)

See references of WO 0177409A2

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

WO 0177409 A2 20011018; WO 0177409 A3 20020718; EP 1274880 A2 20030115

DOCDB simple family (application)

EP 0104195 W 20010411; EP 01929548 A 20010411