Title (en)

PROJECTION OBJECTIVE HAVING A HIGH APERTURE AND A PLANAR END SURFACE

Title (de)

PROJEKTIONSOBJEKTIV MIT EINER HOHEN APERTUR UND EINER PLANARENDOBERFLÄCHE

Title (fr)

OBJECTIF DE PROJECTION A GRANDE OUVERTURE ET SURFACE D'EXTREMITE PLANE

Publication

EP 1697798 A2 20060906 (EN)

Application

EP 04803712 A 20041210

Priority

• EP 2004014062 W 20041210
• US 73462303 A 20031215
• US 53062303 P 20031219
• US 53097803 P 20031222
• US 53624804 P 20040114
• US 54496704 P 20040213
• US 56800604 P 20040504
• US 58750404 P 20040714
• US 59177504 P 20040727
• US 59220804 P 20040729
• US 61282304 P 20040924
• US 61767404 P 20041013
• DE 102004051730 A 20041022

Abstract (en)

[origin: WO2005059617A2] A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n >= 1.6 at the operating wavelength.

IPC 8 full level

G02B 17/00 (2006.01); G03F 7/20 (2006.01)

CPC (source: EP KR)

G01B 13/00 (2013.01 - KR); G01B 17/00 (2013.01 - KR); G02B 13/18 (2013.01 - KR); G02B 17/0828 (2013.01 - EP); G02B 17/0892 (2013.01 - EP); G03F 7/20 (2013.01 - KR); G03F 7/70225 (2013.01 - EP); G03F 7/70341 (2013.01 - EP); G03F 7/7035 (2013.01 - EP); G03F 7/70958 (2013.01 - EP); G03F 7/70966 (2013.01 - EP)

Citation (search report)

See references of WO 2005059617A2

Designated contracting state (EPC)

DE NL

DOCDB simple family (publication)

WO 2005059617 A2 20050630; WO 2005059617 A3 20060209; EP 1697798 A2 20060906; JP 2007514192 A 20070531; JP 5106858 B2 20121226; KR 101200654 B1 20121112; KR 20060109935 A 20061023

DOCDB simple family (application)

EP 2004014062 W 20041210; EP 04803712 A 20041210; JP 2006543484 A 20041210; KR 20067011811 A 20041210