EP 2005460 A1 20081224 - OPTICS FOR GENERATION OF HIGH CURRENT DENSITY PATTERNED CHARGED PARTICLE BEAMS
Title (en)
OPTICS FOR GENERATION OF HIGH CURRENT DENSITY PATTERNED CHARGED PARTICLE BEAMS
Title (de)
OPTIK ZUR ERZEUGUNG VON STRUKTURIERTEN STRAHLEN GELADENER TEILCHEN MIT HOHER STROMDICHTE
Title (fr)
OPTIQUE POUR LA GENERATION DE FAISCEAUX DE FORME DONNEE A PARTICULES CHARGEES PRESENTANT UNE DENSITE DE COURANT ELEVEE
Publication
Application
Priority
US 2006011303 W 20060327
Abstract (en)
[origin: WO2007111603A1] A charged particle beam lithography system and/or method, which comprises a patterned beam defining aperture (212) for generating a high current density shaped beams (222) without the need for multiple beam shaping apertures, lenses (205, 216) for focusing charged particle beams (222) on a wafer (221), and blanking deflectors (277, 278) for deflecting the charged particle beams (222) without the need for an intermediate crossover between an electron source (201) and the wafer (221).
IPC 8 full level
H01J 37/302 (2006.01)
CPC (source: EP)
B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01J 37/3174 (2013.01); H01J 2237/043 (2013.01); H01J 2237/045 (2013.01); H01J 2237/049 (2013.01); H01J 2237/10 (2013.01); H01J 2237/30472 (2013.01); H01J 2237/30477 (2013.01); H01J 2237/31754 (2013.01); H01J 2237/31761 (2013.01); H01J 2237/31776 (2013.01); H01J 2237/31793 (2013.01)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2007111603 A1 20071004; CN 101443877 A 20090527; EP 2005460 A1 20081224; EP 2005460 A4 20101124; JP 2009531855 A 20090903
DOCDB simple family (application)
US 2006011303 W 20060327; CN 200680054644 A 20060327; EP 06758214 A 20060327; JP 2009502733 A 20060327