Global Patent Index - EP 2382165 A1

EP 2382165 A1 20111102 - SUBSTRATE EN VERRE TRANSPARENT GLASS SUBSTRATE AND METHOD FOR PRODUCING SUCH A SUBSTRATE

Title (en)

SUBSTRATE EN VERRE TRANSPARENT GLASS SUBSTRATE AND METHOD FOR PRODUCING SUCH A SUBSTRATE

Title (de)

TRANSPARENTES GLASSUBSTRAT UND VERFAHREN ZUR HERSTELLUNG EINES SOLCHEN SUBSTRATS

Title (fr)

SUBSTRAT EN VERRE TRANSPARENT ET PROCEDE DE FABRICATION D'UN TEL SUBSTRAT

Publication

EP 2382165 A1 20111102 (FR)

Application

EP 10707572 A 20100122

Priority

  • FR 2010050097 W 20100122
  • FR 0950422 A 20090123

Abstract (en)

[origin: WO2010084290A1] The transparent glass substrate(1) has at least one face (3), provided with a texturing formed by a number of geometrical patterns (5) in relief with regard to a general plan of said face (3). The texturing provides a transmission of radiation through the substrate greater than the transmission of radiation through an identical substrate without the texturing. The face (3) of the substrate is furthermore provided with an anti-reflective layer (7) with a refractive index between the refractive index of air and the refractive index of the glass. The anti-reflective layer (7) is a superficial hollow part of the glass substrate (1) at the level of the face (3) comprising a basic silica structure and hollow spaces with characteristic dimensions between 0.5 and 50 nanometres.

IPC 8 full level

C03C 23/00 (2006.01); C03B 11/08 (2006.01); C03B 13/08 (2006.01); F24J 2/50 (2006.01); H01L 31/042 (2006.01)

CPC (source: EP KR US)

C03B 11/08 (2013.01 - KR); C03B 13/08 (2013.01 - EP KR US); C03C 23/00 (2013.01 - KR); C03C 23/008 (2013.01 - EP US); F24S 80/52 (2018.05 - EP US); H01L 31/0236 (2013.01 - EP US); H01L 31/02366 (2013.01 - EP US); H01L 31/0392 (2013.01 - EP US); H01L 31/03923 (2013.01 - EP US); C03C 2204/08 (2013.01 - EP US); Y02E 10/40 (2013.01 - EP US); Y02E 10/541 (2013.01 - EP US); Y02P 40/57 (2015.11 - EP US); Y10T 428/2457 (2015.01 - EP US); Y10T 428/24612 (2015.01 - EP US)

Citation (examination)

US 7368655 B2 20080506 - BLIESKE ULF [DE], et al

Citation (third parties)

Third party :

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

DOCDB simple family (publication)

WO 2010084290 A1 20100729; CN 102361833 A 20120222; CN 102361833 B 20160504; EA 027284 B1 20170731; EA 201170956 A1 20120330; EP 2382165 A1 20111102; FR 2941447 A1 20100730; FR 2941447 B1 20120406; JP 2012515702 A 20120712; JP 5926054 B2 20160525; KR 101455448 B1 20141027; KR 20110113189 A 20111014; US 2011281078 A1 20111117; US 9340453 B2 20160517

DOCDB simple family (application)

FR 2010050097 W 20100122; CN 201080013375 A 20100122; EA 201170956 A 20100122; EP 10707572 A 20100122; FR 0950422 A 20090123; JP 2011546913 A 20100122; KR 20117019443 A 20100122; US 201013145379 A 20100122