Global Patent Index - EP 4116474 A1

EP 4116474 A1 20230111 - ULTRA-LIGHT SILK FABRIC AND METHOD FOR ITS PRODUCTION

Title (en)

ULTRA-LIGHT SILK FABRIC AND METHOD FOR ITS PRODUCTION

Title (de)

ULTRALEICHTES SEIDENGEWEBE UND HERSTELLVERFAHREN DAFÜR

Title (fr)

TISSU DE SOIE ULTRA-LEGER ET PROCÉDÉ DE PRODUCTION

Publication

EP 4116474 A1 20230111 (EN)

Application

EP 22182502 A 20220701

Priority

IT 202100017822 A 20210706

Abstract (en)

The invention relates to a fine silk fabric made by using an extremely thin silk thread for both weft and warp (1a, 1b, 5a, 5b), with a very large number of twists.The extreme fineness of this thread makes it possible to obtain a fabric commonly referred to as chiffon, but having fineness, softness and lightness characteristics much superior to those of prior-art silk fabrics, which, on average, were normally created with counts twice as high. The raw count of the thread used to obtain the fabric is within a range from a minimum of 7-9 denier to a maximum of 13-15 denier, singly stranded, twisted with a high number of twists ≥ 2,500 turns/m.

IPC 8 full level

D03D 15/233 (2021.01); D02G 3/28 (2006.01); D02G 3/40 (2006.01); D03D 15/283 (2021.01); D03D 15/41 (2021.01); D03D 15/47 (2021.01)

CPC (source: EP)

D02G 3/28 (2013.01); D02G 3/406 (2013.01); D03D 15/235 (2021.01); D03D 15/283 (2021.01); D03D 15/41 (2021.01); D03D 15/47 (2021.01); D10B 2211/04 (2013.01); D10B 2321/06 (2013.01)

Citation (search report)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

Designated validation state (EPC)

KH MA MD TN

DOCDB simple family (publication)

EP 4116474 A1 20230111; IT 202100017822 A1 20230106

DOCDB simple family (application)

EP 22182502 A 20220701; IT 202100017822 A 20210706